公开(公告)号：US07719669B2

公开(公告)日：2010-05-18

申请号：US11776912

申请日：2007-07-12

Applicant: Shigeru Matsui ,  Masayuki Hachiya

Inventor： Shigeru Matsui ,  Masayuki Hachiya

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Light from a light source becomes two illumination beams by a beam splitter. The beams are irradiated onto a semiconductor wafer from two mutually substantially orthogonal azimuthal angles having substantially equal elevation angles to form illumination spots. When the sum of scattered, diffracted, and reflected lights due to the illumination beams is detected, influence of the anisotropy which a contaminant particle and a defect existing in the wafer itself or thereon have with respect to an illumination direction, can be eliminated.

Abstract translation: 来自光源的光由分束器变成两个照明光束。 光束从具有基本相等的仰角的两个相互基本正交的方位角照射到半导体晶片上，以形成照明点。 当检测到由于照明光束引起的散射，衍射和反射光的总和时，可以消除晶片本身或其上存在的污染颗粒和缺陷相对于照明方向的各向异性的影响。

公开(公告)号：US20100020315A1

公开(公告)日：2010-01-28

申请号：US12574185

申请日：2009-10-06

Applicant: Takahiro Togashi ,  Shigeru Matsui

Inventor： Takahiro Togashi ,  Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/94 ,  G01N2021/8861 ,  G01N2021/8874 ,  G01N2021/95676

Abstract: A method and equipment which includes an illustrated-spot illumination-distribution data table for storing an illumination distribution within an illustrated spot and which calculates a coordinate position for a particle or a defect and the diameter of the particle on the basis of detection light intensity data about the particle or defect and the illustrated-spot illumination-distribution data table. Thus, even when the illumination distribution within the illustrated spot based on an actual illumination optical system is not a Gaussian distribution, the calculation of the particle diameter of the detected particle or defect and the calculation of a coordinate position on the surface of an object to be inspected can be attained with an increased accuracy.

Abstract translation: 一种方法和设备，其包括用于存储所示斑点内的照明分布的示出点照度分布数据表，并且基于检测光强度数据计算颗粒或缺陷的坐标位置和颗粒的直径 关于颗粒或缺陷以及所示的点光照度分布数据表。 因此，即使在基于实际的照明光学系统的所示光点内的照明分布不是高斯分布的情况下，检测出的粒子或缺陷的粒径的计算以及物体表面上的坐标位置的计算 被检查可以提高准确度。

公开(公告)号：US07619729B2

公开(公告)日：2009-11-17

申请号：US12266079

申请日：2008-11-06

Applicant: Takahiro Togashi ,  Shigeru Matsui

Inventor： Takahiro Togashi ,  Shigeru Matsui

IPC: G01N21/00 ,  G03B242/02 ,  H01J37/304

CPC classification number: G01N21/9501 ,  G01N21/94 ,  G01N2021/8861 ,  G01N2021/8874 ,  G01N2021/95676

Abstract: A method and equipment which includes an illustrated-spot illumination-distribution data table for storing an illumination distribution within an illustrated spot and which calculates a coordinate position for a particle or a defect and the diameter of the particle on the basis of detection light intensity data about the particle or defect and the illustrated-spot illumination-distribution data table. Thus, even when the illumination distribution within the illustrated spot based on an actual illumination optical system is not a Gaussian distribution, the calculation of the particle diameter of the detected particle or defect and the calculation of a coordinate position on the surface of an object to be inspected can be attained with an increased accuracy.

Abstract translation: 一种方法和设备，其包括用于存储所示斑点内的照明分布的示出点照度分布数据表，并且基于检测光强度数据计算颗粒或缺陷的坐标位置和颗粒的直径 关于颗粒或缺陷以及所示的点光照度分布数据表。 因此，即使在基于实际的照明光学系统的所示光点内的照明分布不是高斯分布的情况下，检测出的粒子或缺陷的粒径的计算以及物体表面上的坐标位置的计算 被检查可以提高准确度。

公开(公告)号：US07558683B2

公开(公告)日：2009-07-07

申请号：US11976015

申请日：2007-10-19

Applicant: Takanori Ninomiya ,  Seiji Isogai ,  Shigeru Matsui ,  Toshiei Kurosaki

Inventor： Takanori Ninomiya ,  Seiji Isogai ,  Shigeru Matsui ,  Toshiei Kurosaki

IPC: G01B5/28 ,  G06F19/00

CPC classification number: H01L21/67288 ,  G01N21/9501 ,  G01N23/22 ,  G01N2021/8861 ,  G06T7/0004 ,  G06T7/73 ,  G06T2207/30148 ,  H01J37/28 ,  H01J2237/24592

Abstract: Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.

公开(公告)号：US20080304055A1

公开(公告)日：2008-12-11

申请号：US12109548

申请日：2008-04-25

Applicant: Yoshimasa OSHIMA ,  Toshiyuki Nakao ,  Shigeru Matsui

Inventor： Yoshimasa OSHIMA ,  Toshiyuki Nakao ,  Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N2021/4716

Abstract: A surface defect inspection apparatus is structured to add detection signals of multi-directionally detected scattered lights to detect a tiny defect and to individually process the respective detection signals to prevent an error failing to detect an anisotropic defect.

Abstract translation: 表面缺陷检查装置被构造成添加多方向检测的散射光的检测信号以检测微小的缺陷，并且分别处理各个检测信号以防止错误检测各向异性缺陷。

公开(公告)号：US20080002194A1

公开(公告)日：2008-01-03

申请号：US11819712

申请日：2007-06-28

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/94

Abstract: In the conventional contaminant particle/defect inspection method, if the illuminance of the illumination beam is held at not more than a predetermined upper limit value not to give thermal damage to the sample, the detection sensitivity and the inspection speed being in the tradeoff relation with each other, it is very difficult to improve one of the detection sensitivity and the inspection speed without sacrificing the other or improve both at the same time. The invention provides an improved optical inspection method and an improved optical inspection apparatus, in which a pulse laser is used as a light source, and a laser beam flux is split into a plurality of laser beam fluxes which are given different time delay to form a plurality of illumination spots. The scattered light signal from each illumination spot is isolated and detected by using a light emission start timing signal for each illumination spot.

Abstract translation: 在常规污染物颗粒/缺陷检查方法中，如果照明光束的照度被保持在不对样品造成热损伤的预定上限值以下，则检测灵敏度和检查速度与 彼此难以提高检测灵敏度和检测速度之一而不牺牲另一方或同时改善两者。 本发明提供了一种改进的光学检查方法和改进的光学检查装置，其中使用脉冲激光器作为光源，并且激光束通量被分割成多个激光束，其被给予不同的时间延迟以形成 多个照明点。 通过使用每个照明点的发光开始定时信号来隔离并检测来自每个照明点的散射光信号。

公开(公告)号：US07305314B2

公开(公告)日：2007-12-04

申请号：US11302145

申请日：2005-12-14

Applicant: Takanori Ninomiya ,  Seiji Isogai ,  Shigeru Matsui ,  Toshiei Kurosaki

Inventor： Takanori Ninomiya ,  Seiji Isogai ,  Shigeru Matsui ,  Toshiei Kurosaki

IPC: G06F19/00

CPC classification number: H01L21/67288 ,  G01N21/9501 ,  G01N23/22 ,  G01N2021/8861 ,  G06T7/0004 ,  G06T7/73 ,  G06T2207/30148 ,  H01J37/28 ,  H01J2237/24592

Abstract: Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.

Abstract translation: 基于检查装置检测到的多个缺陷的位置坐标和属性，选择由观察装置容易检测到的缺陷。 利用这些选择的缺陷作为指标，观察装置检测并观察缺陷。 此外，创建用于表示两个装置之间的缺陷位置坐标中的相关关系的坐标变换公式，观察装置转换缺陷位置坐标以观察缺陷。

公开(公告)号：US20070170063A1

公开(公告)日：2007-07-26

申请号：US11654683

申请日：2007-01-18

Applicant: Motohiro Yamazaki ,  Ryoji Inaba ,  Satoshi Takahashi ,  Shigeru Matsui

Inventor： Motohiro Yamazaki ,  Ryoji Inaba ,  Satoshi Takahashi ,  Shigeru Matsui

IPC: G01N27/00

CPC classification number: G01N27/44721

Abstract: An object of the present invention is to provide a capillary electrophoresis apparatus in which simultaneity can be ensured between sensitivity and data acquisition to decrease a pull-up signal while spectral data acquisition is eliminated in each capillary exchange. The invention relates to a capillary electrophoresis apparatus characterized in that a multi-bandpass filter is provided in an optical detection system. In one aspect of the invention, a signal detection area of a two-dimensional detector is divided into plural regions corresponding to wavelength transmission regions of the multi-bandpass filter. An integrated value of the fluorescence spectrum signal is determined in the region including a fluorescence spectrum peak of an analysis sample in the plural regions. The analysis is performed with the integrated value.

Abstract translation: 本发明的目的是提供一种毛细管电泳装置，其中在每个毛细管交换中消除光谱数据采集时，可以在灵敏度和数据采集之间确保同时性，以减小上拉信号。 本发明涉及一种毛细管电泳装置，其特征在于在光学检测系统中提供多带通滤波器。 在本发明的一个方面，二维检测器的信号检测区域被分成与多带通滤波器的波长透射区域对应的多个区域。 在包括多个区域中的分析样品的荧光光谱峰的区域中确定荧光光谱信号的积分值。 分析用积分值进行。

公开(公告)号：US06259662B1

公开(公告)日：2001-07-10

申请号：US09210588

申请日：1998-12-14

Applicant: Shigeru Matsui ,  Kazuhiro Sugiyama ,  Yukari Hiratsuka ,  Noboru Yashima ,  Naoki Kizu

Inventor： Shigeru Matsui ,  Kazuhiro Sugiyama ,  Yukari Hiratsuka ,  Noboru Yashima ,  Naoki Kizu

IPC: G11B700

CPC classification number: G11B19/28

Abstract: When a detected value of the signal processing speed from a frequency comparator is larger than a prescribed value input from an input terminal, the rotation control of a disk is switched from constant linear velocity control to constant angular velocity control using an error signal from an arithmetic unit. Alternatively, when a detected value of the rotational velocity from a frequency comparator is larger than a prescribed value input form an input terminal, the rotation control of the disk is switched from the constant angular velocity control into the constant linear velocity control.

Abstract translation: 当来自频率比较器的信号处理速度的检测值大于从输入端子输入的规定值时，使用来自算术的误差信号将盘的旋转控制从恒定线速度控制切换到恒定角速度控制 单元。 或者，当来自频率比较器的旋转速度的检测值大于从输入端子输入的规定值时，盘的旋转控制从恒定角速度控制切换到恒定线速度控制。

公开(公告)号：US06256092B1

公开(公告)日：2001-07-03

申请号：US09198093

申请日：1998-11-23

Applicant: Koji Tomita ,  Muneo Maeshima ,  Shigeru Matsui ,  Yoshitaka Kodama ,  Hitoshi Komuro ,  Kazuo Takeda

Inventor： Koji Tomita ,  Muneo Maeshima ,  Shigeru Matsui ,  Yoshitaka Kodama ,  Hitoshi Komuro ,  Kazuo Takeda

IPC: G01N2188

CPC classification number: G01N21/9505 ,  G01N21/9501

Abstract: A defect inspection apparatus for detecting defects existing on a surface of a semiconductor sample and/or inside the sample based on light information from the sample obtained by irradiating a light beam onto the sample is provided, which comprises a detecting means for detecting positions in the depth direction where the defects exist and distribution of the defects based on the light information; a setting means for setting a position in the depth direction where defects exist; and a means for displaying the distribution of the defects obtained by the detecting means, the displaying means displaying the distribution of the defects corresponding to the position in the depth direction set by the setting means.

Abstract translation: 一种缺陷检查装置，用于根据来自通过将光束照射在样品上的样品的光信息，检测存在于半导体样品表面和/或样品内部的缺陷，该检测装置包括检测装置， 存在缺陷的深度方向和基于光信息的缺陷分布; 用于设置存在缺陷的深度方向上的位置的设定装置; 以及用于显示由检测装置获得的缺陷的分布的装置，显示装置显示与由设置装置设置的深度方向上的位置相对应的缺陷的分布。