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公开(公告)号：US08477302B2
公开(公告)日：2013-07-02
申请号：US12412776
申请日：2009-03-27
Applicant: Yuta Urano , Toshiyuki Nakao , Yoshimasa Oshima , Akira Hamamatsu
Inventor： Yuta Urano , Toshiyuki Nakao , Yoshimasa Oshima , Akira Hamamatsu
IPC: G01N21/00
CPC classification number: G01N21/9501 , G01N21/9505 , G01N2021/8854 , G01N2021/8874 , G01N2201/103 , G01N2201/1045
Abstract: A defect inspection apparatus for inspecting a surface of a sample includes a stage for holding the sample, an illumination optical system that irradiates a laser beam to form a linear illuminated area on the surface of the sample, a detection optical system, and a signal processing system. The detection optical system includes a detector device having a plurality of pixels for detecting light scattered from the linear illuminated area of the surface of the sample, and that outputs in parallel a plurality of detection signals having mutually different sensitivities acquired from the plurality of pixels of the detector device. The signal processing system selects an unsaturated detection signal from the plurality of detection signals and detects a defect in accordance with the selected detection signal.
Abstract translation: 用于检查样品表面的缺陷检查装置包括用于保持样品的载物台，照射光学系统，其照射激光束以在样品的表面上形成线性照射区域，检测光学系统和信号处理 系统。 检测光学系统包括具有多个像素的检测器装置，用于检测从样品表面的线性照射区域散射的光，并且并行地输出具有从多个像素获得的具有相互不同的灵敏度的多个检测信号 检测器装置。 信号处理系统从多个检测信号中选择不饱和检测信号，并根据所选择的检测信号检测缺陷。
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公开(公告)号：US08400629B2
公开(公告)日：2013-03-19
申请号：US13221314
申请日：2011-08-30
Applicant: Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
Inventor： Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
CPC classification number: G01N21/9501 , G01N2021/4716
Abstract: A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.
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公开(公告)号：US20120320373A1
公开(公告)日：2012-12-20
申请号：US13597553
申请日：2012-08-29
Applicant: Yoshimasa Oshima , Yuta Urano , Toshiyuki Nakao
Inventor： Yoshimasa Oshima , Yuta Urano , Toshiyuki Nakao
IPC: G01N21/88
CPC classification number: G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/94 , G01N2021/4707 , G01N2021/4709 , G01N2021/8864
Abstract: An inspection method and apparatus for detecting defects or haze of a sample, includes illuminating light to the sample from an oblique direction relative to a surface of the sample with an illuminator, detecting first scattered light at a forward position relative to an illuminating direction from the sample with a first detector, detecting sec and scattered light at a sideward or backward position relative to the illuminating direction from the sample with a second detection, and processing a first signal of the first scattered light and a second signal of the second scattered light with different weighting for the first signal and for the second signal with a processor.
Abstract translation: 一种用于检测样品的缺陷或雾度的检查方法和装置，包括使用照明器从相对于样品表面的倾斜方向向样品照射光，从相对于照射方向的前方位置检测第一散射光， 采用第一检测器，利用第二检测从样品检测相对于照明方向的向后或向后位置处的秒和散射光，并且处理第一散射光的第一信号和第二散射光的第二信号， 对于第一信号和与处理器的第二信号的加权不同。
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公开(公告)号：US08310665B2
公开(公告)日：2012-11-13
申请号：US13404749
申请日：2012-02-24
Applicant: Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
Inventor： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
IPC: G01N21/00
CPC classification number: G01B11/303 , G01N21/47 , G01N21/94 , G01N21/9501
Abstract: An inspecting method and apparatus for inspecting a substrate surface includes application of a light to the substrate surface, detection of scattered light or reflected light from the substrate surface due to the applied light at a plurality of positions to obtain a plurality of electrical signals, extraction of a signal in a mutually different frequency band from each of the plurality of electrical signals, and calculation of a value regarding a state of film of the substrate through an arithmetical operation process of a plurality of extracted signals in the frequency bands.
Abstract translation: 用于检查基板表面的检查方法和装置包括：由于在多个位置处施加的光，向基板表面施加光，检测散射光或来自基板表面的反射光，以获得多个电信号，提取 在与所述多个电信号中的每一个相互不同的频带中的信号的信号，以及通过所述频带中的多个提取的信号的算术运算处理来计算关于所述衬底的膜的状态的值。
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公开(公告)号：US20110063603A1
公开(公告)日：2011-03-17
申请号：US12950243
申请日：2010-11-19
Applicant: Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
Inventor： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
CPC classification number: G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
Abstract: A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.
Abstract translation: 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。
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Patent Agency Ranking
公开(公告)号：US07710557B2
公开(公告)日：2010-05-04
申请号：US12109548
申请日：2008-04-25
Applicant: Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
Inventor： Yoshimasa Oshima , Toshiyuki Nakao , Shigeru Matsui
CPC classification number: G01N21/9501 , G01N2021/4716
Abstract: A surface defect inspection apparatus is structured to add detection signals of multi-directionally detected scattered lights to detect a tiny defect and to individually process the respective detection signals to prevent an error failing to detect an anisotropic defect.
Abstract translation: 表面缺陷检查装置被构造成添加多方向检测的散射光的检测信号以检测微小的缺陷，并且分别处理各个检测信号以防止错误检测各向异性缺陷。
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公开(公告)号：US20090279081A1
公开(公告)日：2009-11-12
申请号：US12412776
申请日：2009-03-27
Applicant: Yuta Urano , Toshiyuki Nakao , Yoshimasa Oshima , Akira Hamamatsu
Inventor： Yuta Urano , Toshiyuki Nakao , Yoshimasa Oshima , Akira Hamamatsu
IPC: G01N21/896
CPC classification number: G01N21/9501 , G01N21/9505 , G01N2021/8854 , G01N2021/8874 , G01N2201/103 , G01N2201/1045
Abstract: A defect inspection apparatus for inspecting a surface of a sample includes a stage for holding the sample, an illumination optical system that irradiates a laser beam to form a linear illuminated area on the surface of the sample, a detection optical system, and a signal processing system. The detection optical system includes a detector device having a plurality of pixels for detecting light scattered from the linear illuminated area of the surface of the sample, and that outputs in parallel a plurality of detection signals having mutually different sensitivities acquired from the plurality of pixels of the detector device. The signal processing system selects an unsaturated detection signal from the plurality of detection signals and detects a defect in accordance with the selected detection signal.
Abstract translation: 用于检查样品表面的缺陷检查装置包括用于保持样品的载物台，照射光学系统，其照射激光束以在样品的表面上形成线性照射区域，检测光学系统和信号处理 系统。 检测光学系统包括具有多个像素的检测器装置，用于检测从样品表面的线性照射区域散射的光，并且并行地输出具有从多个像素获得的具有相互不同的灵敏度的多个检测信号 检测器装置。 信号处理系统从多个检测信号中选择不饱和检测信号，并根据所选择的检测信号检测缺陷。
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公开(公告)号：US20090122303A1
公开(公告)日：2009-05-14
申请号：US12328357
申请日：2008-12-04
Applicant: Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
Inventor： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
IPC: G01N21/88
CPC classification number: G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
Abstract: A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.
Abstract translation: 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。
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公开(公告)号：US07333192B2
公开(公告)日：2008-02-19
申请号：US11653322
申请日：2007-01-16
Applicant: Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
Inventor： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
IPC: G01N21/88
CPC classification number: G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
Abstract: A defect inspection apparatus includes an irradiation optical system 20, a detection optical system 30, and an image processor 40. In the irradiation optical system, a mirror 2603 is disposed to reflect downward a beam flux that has been guided to a first or second optical path, and a cylindrical lens 251 and an inclined mirror 2604 are disposed to focus the beam flux that has been directed downward by the mirror, at an inclination angle from a required oblique direction extending horizontally, onto a substrate 1 to be inspected, as a slit-shaped beam 90.
Abstract translation: 缺陷检查装置包括照射光学系统20，检测光学系统30和图像处理器40。 在照射光学系统中，设置反射镜2603以向下反射已经被引导到第一或第二光路的光束，并且设置柱面透镜251和倾斜镜2604以聚焦已导向的光束 作为狭缝状光束90，通过反射镜向下倾斜，从与水平方向延伸的所需倾斜方向倾斜的角度，到被检查的基板1上。
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公开(公告)号：US4614427A
公开(公告)日：1986-09-30
申请号：US611947
申请日：1984-05-18
Applicant: Mitsuyoshi Koizumi , Yoshimasa Oshima , Nobuyuki Akiyama , Toshiaki Yachi
Inventor： Mitsuyoshi Koizumi , Yoshimasa Oshima , Nobuyuki Akiyama , Toshiaki Yachi
IPC: G01N21/88 , G01B11/30 , G01N21/21 , G01N21/94 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/66
CPC classification number: G01N21/94 , G01N21/21 , G01N21/956
Abstract: An automatic contaminants detection apparatus comprises a polarized laser beam source, a polarized laser beam irradiation optical system having irradiation angle switching means for switching an irradiation angle depending on the presence or absence of a pattern on a sample surface to irradiate the polarized laser beam emitted by the polarized laser beam source to the sample surface with an angle of grazing, a detector for detecting condensed scattered or reflected lights of the laser beam from the sample surface with or without interleave of an analyzer, and analyzer switching means for inserting or removing the analyzer into or from a detection light path of the detector depending on the presence or absence of the pattern on the sample surface. The apparatus can detect contaminants on the patterned or non-patterned sample surface with a high sensitivity.
Abstract translation: 一种自动污染物检测装置，包括：偏振激光束源，具有照射角度切换装置的偏光激光束照射光学系统，用于根据样品表面上有无图案切换照射角度，照射由 将偏振激光束源以放牧角度放置到样品表面，用于检测来自样品表面的来自样品表面的聚集的散射或反射光的检测器，具有或不具有分析仪的交错;以及分析器切换装置，用于插入或移除分析器 取决于样品表面上图案的存在或不存在，进入或离开检测器的检测光路。 该装置可以以高灵敏度检测图案化或非图案化样品表面上的污染物。
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