摘要:
An overlay target includes two pairs of test patterns used to measure overlay in x and y directions, respectively. Each test pattern includes upper and lower grating layers. A single pitch (periodic spacing) is used for all gratings. Within each test pattern, the upper and lower grating layers are laterally offset from each other to define an offset bias. Each pair of test patterns has offset biases that differ by the grating pitch/4. This has the important result that the combined optical response of the test patterns is sensitive to overlay for all values of overlay. An algorithm obtains overlay and other physical properties of the two or more test patterns from their optical responses in one combined regression operation.
摘要:
A system and method for characterizing an imaging system causes a diffraction image indicative of a test structure having a generalized line-grating to be formed and then extracts from a measurement of the diffraction image a lens transmittance function, a photoresist property or a defocus distance.
摘要:
A method of modifying polygons in a data set mask-less or mask based optical projection lithography includes: 1) mapping the data set to a figure-of-demerit; 2) moving individual polygon edges to decrease the figure-of-demerit; and 3) disrupting the set of polygons to enable a further decrease in the figure-of-demerit, wherein disrupting polygons includes any of the following polygon disruptions: breaking up, merging, or deleting polygons.
摘要:
A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.
摘要:
Pupil intensity distribution of an imaging system is measured by exposing an image field of a radiation detector with a bright feature, positioning the detector at a distance away from the image plane, and exposing the image field of the detector with a bright feature, resulting in a cumulative exposure of the image field of the detector from the two exposures. A characteristic of a spatial pattern in the cumulative exposure of the image field of the detector is then determined.
摘要:
Alignment accuracy between two or more patterned layers is measured using a metrology target comprising substantially overlapping diffraction gratings formed in a test area of the layers being tested. An optical instrument illuminates all or part of the target area and measures the optical response. The instrument can measure transmission, reflectance, and/or ellipsometric parameters as a function of wavelength, polar angle of incidence, azimuthal angle of incidence, and/or polarization of the illumination and detected light. Overlay error or offset between those layers containing the test gratings is determined by a processor programmed to calculate an optical response for a set of parameters that include overlay error, using a model that accounts for diffraction by the gratings and interaction of the gratings with each others' diffracted field. The model parameters might also take account of manufactured asymmetries. The calculation may involve interpolation of pre-computed entries from a database accessible to the processor. The calculated and measured responses are iteratively compared and the model parameters changed to minimize the difference.
摘要:
The invention is a method and apparatus for determining characteristics of a sample. The system and method provide for detecting a monitor beam reflected off a mirror, where the monitor beam corresponds to the intensity of light incident upon the sample. The system and method also provide for detecting a measurement beam, where the measurement beam has been reflected off the sample being characterized. Both the monitor beam and the measurement beam are transmitted through the same transmission path, and detected by the same detector. Thus, potential sources of variations between the monitor beam and the measurement beam which are not due to the characteristics of the sample are minimized. Reflectivity information for the sample can be determined by comparing data corresponding to the measurement beam relative to data corresponding the monitor beam.
摘要:
A permeability estimation technique for use with spin echo signals that are received from a sample includes summing indications of the amplitudes of the spin echo signals. The results of the summing are used to determine an indication of a permeability of the sample, without using a distribution of relaxation times in the determination. The products of indications of the amplitudes of the spin echo signals may be summed, and the results of the summing may be used to determine an indication of a permeability of the sample, without using a distribution of relaxation times in the determination.
摘要:
In a method for determining the presence of gas in a region of investigation of earth formations surrounding a borehole. A movable logging device is used to generate two sequences of magnetic field pulses having different pulse spacing times. Each of the pulse sequences elicits a corresponding sequence of nuclear magnetic resonance spin echoes. The presence of gas in the formation, is determined from ratios of signals derived from the two spin echoes sequences.
摘要:
Apparatus and method are disclosed for determining a nuclear magnetic resonance property of formations surrounding a borehole while drilling the borehole with a rotating drill bit on a drill string. An embodiment of the method includes the following steps: providing a logging device in the drill string, the logging device being rotatable with the drill string or a portion of the drill string, the logging device having a rotational axis; producing a static magnetic field and an RF magnetic field at the logging device, the static and RF magnetic fields having mutually orthogonal components in an investigation region in the formations surrounding the logging device, the magnitudes of the static and RF magnetic fields in the investigation region being substantially rotationally invariant as the logging device rotates around its axis; receiving nuclear magnetic resonance spin echoes at at least one circumferential sector on the logging device; and determining a nuclear magnetic resonance property of the formations, for different portions of the investigation region, from the received nuclear magnetic resonance spin echoes.