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公开(公告)号：US20070023976A1
公开(公告)日：2007-02-01
申请号：US11189010
申请日：2005-07-26
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithographic apparatus is disclosed that has an imprint template and a substrate table configured to hold a substrate, the imprint template having a patterned surface, a layer of heat absorbing material provided on the patterned surface of the imprint template.
摘要翻译： 公开了一种光刻设备，其具有压印模板和配置成保持衬底的衬底台，压印模板具有图案化表面，设置在压印模板的图案化表面上的吸热材料层。
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公开(公告)号：US20060268256A1
公开(公告)日：2006-11-30
申请号：US11138899
申请日：2005-05-27
IPC分类号： G03B27/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.
摘要翻译： 公开了一种光刻设备，其具有被配置为保持压印模板的模板保持器，布置成接收衬底的衬底台，布置成照射压印模板的一部分的辐射输出;以及被配置为检测从界面散射的辐射的检测器 在压印模板和设置在基板上的可压印材料之间。
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公开(公告)号：US20060196377A1
公开(公告)日：2006-09-07
申请号：US11072686
申请日：2005-03-07
IPC分类号： B41F33/00
CPC分类号： G03F7/0002 , B41M3/003 , B82Y10/00 , B82Y40/00
摘要： An imprinting method is disclosed that involves, in an embodiment, redistributing a volume of imprintable medium in a flowable state over a target portion of a surface of a substrate into regions of differing volume corresponding to regions of differing pattern density of an imprint pattern of a template, contacting the medium while in the flowable state with the template to form the imprint pattern in the medium, subjecting the medium to conditions to change the medium into a substantially non-flowable state, and separating the template from the medium while in the substantially non-flowable state.
摘要翻译： 公开了一种压印方法，其包括在一个实施例中，将可流动状态的可压印介质的体积重新分布在衬底的表面的目标部分上的不同体积的区域对应于不同图案密度的区域 模板，在可流动状态下与模板接触以在培养基中形成压印图案，使培养基经受条件以将培养基改变为基本上不可流动的状态，并将模板与培养基分离，同时基本上 不可流动状态。
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公开(公告)号：US20060144274A1
公开(公告)日：2006-07-06
申请号：US11025600
申请日：2004-12-30
IPC分类号： B41F33/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprinting method is disclosed, in which an embodiment involves subjecting an imprintable medium on a substrate to conditions such that the medium is at a first temperature so that it is in a flowable state, the imprintable medium comprising an imprint material selected from a group consisting of: a crystalline material and a polycrystalline material, pressing a template into the medium to form an imprint in the medium, cooling the medium to a second temperature such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while in the substantially non-flowable state.
摘要翻译： 公开了一种压印方法，其中一个实施例涉及使基材上的可压印介质经受使得介质处于第一温度使其处于可流动状态的状态，所述可压印介质包括压印材料，所述压印材料选自 的结晶材料和多晶材料，将模板压入介质以在介质中形成印迹，将介质冷却至第二温度，使得介质处于基本上不可流动状态，同时介质与 模板，并且在基本上不可流动的状态下将模板与介质分离。
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公开(公告)号：US20050148211A1
公开(公告)日：2005-07-07
申请号：US10976178
申请日：2004-10-29
IPC分类号： G03F7/20 , H01L21/027 , H01L21/302
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/70883 , H01J37/18
摘要： A device manufacturing method is disclosed. The method includes patterning a beam of radiation with a patterning device, projecting the patterned beam of radiation onto a target portion of a substrate, supplying a chemical reagent to a chamber that holds the patterning device and/or the substrate, and removing water from the chamber with use of the chemical reagent.
摘要翻译： 公开了一种器件制造方法。 该方法包括用图案形成装置构图辐射束，将图案化的辐射束投影到基板的目标部分上，将化学试剂供应到保持图案形成装置和/或基板的室，并从 使用化学试剂。
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公开(公告)号：US20050002004A1
公开(公告)日：2005-01-06
申请号：US10866077
申请日：2004-06-14
CPC分类号： G03F7/70341
摘要： Liquid is supplied to a space between a projection system of a lithographic apparatus and a substrate, but there is a space between the liquid and the substrate. An evanescent field may be formed between the liquid and the substrate allowing some photons to expose the substrate. Due to the refractive index of the liquid, the resolution of the system may be improved and liquid on the substrate may be avoided.
摘要翻译： 液体被供应到光刻设备的投影系统和基板之间的空间，但在液体和基板之间存在空间。 可以在液体和基底之间形成一个ev逝场，使一些光子露出基底。 由于液体的折射率，可以改善系统的分辨率，并且可以避免衬底上的液体。
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公开(公告)号：US10369386B2
公开(公告)日：2019-08-06
申请号：US13699027
申请日：2011-05-24
摘要： An ultrasound transducer is configured to be driven at multiple frequencies including a main frequency for efficient production of ultrasound waves and at least one alternative frequency, at which little or no ultrasound is generated and rather heat is generated in the ultrasound transducer for heating a sample.
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公开(公告)号：US20110228241A1
公开(公告)日：2011-09-22
申请号：US13149404
申请日：2011-05-31
申请人： Joeri LOF , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri LOF , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在所述结构和所述基板的表面之间形成气体密封，以在该空间内容纳液体。
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59.发明授权公开(公告)号：US07982850B2
公开(公告)日：2011-07-19
申请号：US12153276
申请日：2008-05-15
申请人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在所述结构和所述基板的表面之间形成气体密封，以在该空间内容纳液体。
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公开(公告)号：US07593092B2
公开(公告)日：2009-09-22
申请号：US11448990
申请日：2006-06-08
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。
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