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公开(公告)号：US20110139982A1
公开(公告)日：2011-06-16
申请号：US13059601
申请日：2009-09-16
IPC分类号： G01N23/225
CPC分类号： G03F7/70466 , B82Y10/00 , G01B15/00 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/2817 , H01L22/12
摘要： An object of the present invention is to provide a method that can properly carry out the evaluation of a displacement and an overlapping area between first and second patterns formed through double patterning and a device therefor.To accomplish the above object, a method and a device are provided that execute a two-step matching between combined information having information concerning the first pattern combined with design information of the second pattern formed through a second exposure of double patterning and images displaying the first and second patterns, and on the basis of a moving amount of the design information of the second pattern, a displacement amount between the first and second patterns is determined.
摘要翻译： 本发明的目的是提供一种可以适当地进行通过双重图案形成的第一和第二图案之间的位移和重叠区域的评估的方法及其装置。 为了实现上述目的，提供了一种方法和装置，其执行具有与通过双重图案化的第二曝光形成的第二图案的设计信息相组合的第一图案的信息的组合信息和显示第一图像的图像之间的两步匹配 和第二图案，并且基于第二图案的设计信息的移动量，确定第一图案和第二图案之间的位移量。
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公开(公告)号：US20090238443A1
公开(公告)日：2009-09-24
申请号：US12389885
申请日：2009-02-20
申请人： Hidetoshi Sato , Ryoichi Matsuoka
发明人： Hidetoshi Sato , Ryoichi Matsuoka
CPC分类号： G06K9/3216 , G06K9/42
摘要： An object of the present invention is to provide methods and equipment capable of providing highly accurate matching using a template including multiple patterns even when the shapes of some patterns of the template are different from corresponding ones of a SEM image, and when the template and the SEM image have a magnification error. Proposed, as a technique for achieving the object, is a method for performing matching by selectively using some of multiple patterns provided in a predetermined region of design data, and equipment for implementing the method. Moreover, proposed, as another technique for achieving the object, is a method for performing first matching by using multiple patterns provided in a predetermined region of design data and thereafter performing second matching by using some of the multiple patterns provided in the predetermined region, and equipment for implementing the method.
摘要翻译： 本发明的目的是提供即使当模板的某些图案的形状与SEM图像的对应图案不同时，也能够使用包括多个图案的模板来提供高精度匹配的方法和设备，并且当模板和 SEM图像具有放大误差。 提出，作为实现该目的的技术，是通过选择性地使用设计数据的预定区域中提供的多个模式中的一些来执行匹配的方法，以及用于实现该方法的设备。 此外，作为实现该目的的另一技术，提出了一种通过使用在设计数据的预定区域中提供的多个模式来执行第一匹配，然后通过使用在预定区域中提供的多个模式中的一些来执行第二匹配的方法，以及 设备实施方法。
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53.发明授权Method of creating template for matching, as well as device for creating template 有权创建匹配模板的方法，以及创建模板的设备公开(公告)号：US08867818B2
公开(公告)日：2014-10-21
申请号：US13387382
申请日：2010-07-15
CPC分类号： H01J37/28 , G01N23/225 , G06K9/6255 , G06T7/001 , G06T2207/30148 , H01J2237/221 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Disclosed is a method wherein a template for template matching is created with high accuracy and high efficiency. With respect to each individual pattern constituting a basic circuit, pattern information regarding a plurality of layers in a semiconductor device is stored in a library. On the basis of the designation of the position and the layer, pattern information regarding the designated position and layer is extracted from the pattern information stored in the library. A template is created on the basis of the extracted pattern information.
摘要翻译： 公开了一种以高精度和高效率创建用于模板匹配的模板的方法。 对于构成基本电路的每个单独图案，关于半导体器件中的多个层的图案信息被存储在库中。 基于位置和层的指定，从存储在库中的图案信息中提取关于指定位置和层的图案信息。 基于提取的模式信息创建模板。
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54.发明申请IMAGE PROCESSING DEVICE AND COMPUTER PROGRAM FOR PERFORMING IMAGE PROCESSING 有权图像处理设备和用于执行图像处理的计算机程序公开(公告)号：US20130326439A1
公开(公告)日：2013-12-05
申请号：US14000212
申请日：2012-02-27
申请人： Ryoichi Matsuoka , Hiroaki Mito
发明人： Ryoichi Matsuoka , Hiroaki Mito
IPC分类号： G06F17/50
CPC分类号： G06F17/50 , G01B15/04 , G03F7/70625 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： It is an object of the present invention to provide an image processing device for allowing an actual-image-closer pattern to be formed based on the design data, or its simulation image. In order to accomplish the above-described object, the proposal is made concerning an image processing device which includes an image processing unit which sets the operation condition of a charged-particle beam device on the basis of the design data on a semiconductor element. Here, the image processing device accesses a library for storing device-condition information on the charged-particle beam device, pattern types, and a plurality of combinations of pattern information on each pattern-region basis. Moreover, the image processing device forms a composite image of each pattern region, using the pattern information on each pattern-region basis, and based on the device-condition information and the selection of a pattern type from the pattern types.
摘要翻译： 本发明的目的是提供一种用于基于设计数据或其模拟图像来形成实际图像更近图案的图像处理装置。 为了实现上述目的，提出了一种图像处理装置，该图像处理装置包括基于半导体元件上的设计数据来设置带电粒子束装置的操作条件的图像处理单元。 这里，图像处理装置在每个图案区域的基础上访问用于存储关于带电粒子束装置的装置状态信息的库，图案类型和图案信息的多个组合。 此外，图像处理装置使用每个图案区域的图案信息，并且基于来自图案类型的设备状态信息和图案类型的选择来形成每个图案区域的合成图像。
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公开(公告)号：US08577125B2
公开(公告)日：2013-11-05
申请号：US12344000
申请日：2008-12-24
IPC分类号： G06K9/00
CPC分类号： G06T11/60 , G06T2200/32
摘要： The present invention provides a technique to generate an accurate connected image even in a monotonous pattern using design data as constrained conditions. A reference position is roughly determined through matching between the design data and image data, matching between neighboring images is performed using the amount of mismatch from the design data as a searching range and a connected image is generated at high speed and accurately. The image generation method of the present invention is an image generation method for inspecting an electronic device pattern using a scanning electron microscope and is constructed of a design data file that stores design data describing layout information of an electronic device pattern by inputting the data, a plurality of divided pieces of image data obtained by imaging the electronic device pattern at different imaging positions, and image connecting means for connecting the plurality of divided pieces of image data into one image using the plurality of divided pieces of image data and the design data of a file of the design data (see FIG. 1).
摘要翻译： 本发明提供了一种使用设计数据作为约束条件即使以单调模式生成精确连接图像的技术。 通过设计数据和图像数据之间的匹配粗略地确定参考位置，使用来自设计数据的失配量作为搜索范围来执行相邻图像之间的匹配，并且以高速和准确的方式生成连接的图像。 本发明的图像生成方法是使用扫描电子显微镜来检查电子设备图案的图像生成方法，并且由设计数据文件构成，该设计数据文件通过输入数据来存储描述电子设备图案的布局信息的设计数据， 通过在不同的成像位置对电子设备图案进行成像而获得的多个分割图像数据;以及图像连接装置，用于使用多个分割的图像数据和多个分割的图像数据将多个分割的图像数据片段连接到一个图像中 设计数据的文件（参见图1）。
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56.发明授权公开(公告)号：US08577124B2
公开(公告)日：2013-11-05
申请号：US13344409
申请日：2012-01-05
CPC分类号： G06T7/0006 , G06T2207/30148 , H01J2237/221 , H01J2237/2817
摘要： A pattern inspection apparatus can be provided, for example, in a scanning electron microscope system. When patterns of a plurality of layers are included in a SEM image, the apparatus separates the patterns according to each layer by using design data of the plurality of layers corresponding to the patterns. Consequently, the apparatus can realize inspection with use of only the pattern of a target layer to be inspected, pattern inspection differently for different layers, or detection of a positional offset between the layers.
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57.发明授权Method and apparatus of pattern inspection and semiconductor inspection system using the same 有权图案检查方法和装置以及使用其的半导体检查系统公开(公告)号：US07507961B2
公开(公告)日：2009-03-24
申请号：US11453229
申请日：2006-06-15
CPC分类号： G06T7/0006 , G06T2207/30148 , H01J2237/221 , H01J2237/2817
摘要： A pattern inspection apparatus can be provided, for example, in a scanning electron microscope system. When patterns of a plurality of layers are included in a SEM image, the apparatus separates the patterns according to each layer by using design data of the plurality of layers corresponding to the patterns. Consequently, the apparatus can realize inspection with use of only the pattern of a target layer to be inspected, pattern inspection differently for different layers, or detection of a positional offset between the layers.
摘要翻译： 例如，可以在扫描型电子显微镜系统中设置图案检查装置。 当在SEM图像中包含多层图案时，该装置通过使用与图案相对应的多个层的设计数据，根据每层分离图案。 因此，该装置可以仅使用要检查的目标层的图案，不同层的图案检查或层之间的位置偏移的检测来实现检查。
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公开(公告)号：US20060154016A1
公开(公告)日：2006-07-13
申请号：US10560000
申请日：2004-06-23
申请人： Ryoichi Matsuoka
发明人： Ryoichi Matsuoka
IPC分类号： D03D27/00
CPC分类号： E01C13/08 , Y10T428/23957 , Y10T428/23979
摘要： Imitation lawns are prevented from coming off a laying board 3 due to influence of temperature on an adhesive, secular deterioration of the adhesive, load of an external force exceeding an adhesive strength, load of a strong lateral slide force, and the like. In an artificial lawn including imitation lawns 2, and a laying board 3 onto which the imitation lawns are planted, the imitation lawns 2 each include a bunch of foliaceous pieces 4 and a root portion 5 which bundles the bunch of foliaceous pieces, while the laying board 3 includes a plurality of root portion pots 6 into which the root portions 5 of the imitation lawns 2 are forcibly fit, respectively. A bifurcate pin member 7 having two pin tips is driven onto an upper part of the root portion 5 of the imitation lawn 2 forcibly fit in the root portion pot 6 of the laying board 3, such that the pin member traverses a middle part of the root portion, from which the foliaceous pieces 4 are parted, and strides across both sides of an opening of the root portion pot 6, whereby the imitation lawn 2 is fixed to the laying board 3.
摘要翻译： 由于温度对粘合剂的影响，粘合剂的长期劣化，超过粘合强度的外力的载荷，强的侧向滑动力的载荷等，可以防止模拟草坪脱落。 在模仿草坪2的人造草坪和放置仿制草坪的铺设板3上，模仿草坪2各包括一堆叶片4和一根根部5，其捆扎一束叶片，而敷设 板3包括分别强制地装配仿制草坪2的根部5的多个根部盆6。 具有两个销尖的分叉销构件7被驱动到模拟草坪2的根部5的上部，强制地装配在铺设板3的根部部分6中，使得销构件穿过 根部分，叶片4从中分离，并且跨过根部罐6的开口的两侧，由此将模拟草坪2固定到铺设板3。
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59.发明授权Method and apparatus of evaluating layer matching deviation based on CAD information 有权基于CAD信息评估层匹配偏差的方法和装置公开(公告)号：US06757875B2
公开(公告)日：2004-06-29
申请号：US10147417
申请日：2002-05-16
申请人： Ryoichi Matsuoka
发明人： Ryoichi Matsuoka
IPC分类号： G06F1750
CPC分类号： G03F7/70616 , G03F7/70633 , G05B2219/37205 , G05B2219/45031
摘要： An apparatus of evaluating a layer matching deviation based on CAD information of the invention, is provided with means for storing CAD data and a function of displaying to overlap a scanning microscope image of a pattern of a semiconductor device formed on a wafer and a design CAD image read from the storing means and a function of evaluating acceptability of formation of the pattern by displaying to overlap a pattern image of the semiconductor device formed on the wafer and the design CAD image of the pattern, in addition thereto, a function capable of evaluating acceptability of formation of the pattern also with regard to a shape and positional relationship with a pattern formed at a later step by displaying to overlap a design CAD image of the pattern formed at the later step.
摘要翻译： 基于本发明的CAD信息评估层匹配偏差的装置具有用于存储CAD数据的装置和与晶片上形成的半导体器件的图案的扫描显微镜图像重叠的显示功能和设计CAD 从存储装置读取的图像以及通过显示来评估形成图案的可接受性的功能，与形成在晶片上的半导体器件的图案图像和图案的设计CAD图像重叠，以及能够评估 通过显示与形成在稍后步骤中形成的图案的设计CAD图像重叠的形状和与稍后步骤形成的图案的位置关系，也可以形成图案。
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60.发明授权公开(公告)号：US08977034B2
公开(公告)日：2015-03-10
申请号：US13381629
申请日：2010-06-29
申请人： Yasutaka Toyoda , Ryoichi Matsuoka
发明人： Yasutaka Toyoda , Ryoichi Matsuoka
摘要： An image of the joint portion of circuit patterns manufactured using a design pattern for double patterning is read out. Target boundary lines and evaluation regions are set on the image. In the evaluation regions, image processing is performed along the directions of the target boundary lines. Furthermore, binarization processing is performed. A decision is made based on an image obtained in this way as to whether the patterns have defects.
摘要翻译： 读出使用双重图案化的设计图案制造的电路图案的接合部分的图像。 目标边界线和评估区域设置在图像上。 在评价区域中，沿着目标边界线的方向进行图像处理。 此外，进行二值化处理。 基于以这种方式获得的关于图案是否具有缺陷的图像做出决定。
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