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    Pattern measurement apparatus
    1.
    发明授权
    Pattern measurement apparatus 有权
    图案测量装置

    公开(公告)号：US08445871B2

    公开(公告)日：2013-05-21

    申请号：US12763710

    申请日：2010-04-20

    申请人： Ryoichi Matsuoka ,  Akihiro Onizawa ,  Akiyuki Sugiyama ,  Hidetoshi Morokuma ,  Yasutaka Toyoda

    发明人： Ryoichi Matsuoka ,  Akihiro Onizawa ,  Akiyuki Sugiyama ,  Hidetoshi Morokuma ,  Yasutaka Toyoda

    IPC分类号： H01J37/28 ,  G01N23/00

    CPC分类号： G03F7/70616 ,  G06T7/0006 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2817

    摘要： Mutual compatibility is established between the measurement with a high magnification and the measurement in a wide region. A pattern measurement apparatus is proposed which adds identification information to each of fragments that constitute a pattern within an image obtained by the SEM, and which stores the identification information in a predetermined storage format. Here, the identification information is added to each fragment for distinguishing between one fragment and another fragment. According to the above-described configuration, it turns out that the identification information is added to each fragment on the SEM image which has possessed no specific identification information originally. As a result, it becomes possible to implement the SEM-image management based on the identification information.

    摘要翻译： 在高倍率的测量与广泛的测量之间建立相互兼容性。 提出了一种图案测量装置，其将识别信息添加到构成由SEM获得的图像内的图案的每个片段，并以预定的存储格式存储识别信息。 这里，将识别信息添加到每个片段以区分一个片段和另一个片段。 根据上述结构，原来在原始不具有特定识别信息的SEM图像上将识别信息添加到各片段。 结果，可以实现基于识别信息的SEM图像管理。

    Pattern shape evaluation method
    2.
    发明授权
    Pattern shape evaluation method 有权
    图案形状评估方法

    公开(公告)号：US08355562B2

    公开(公告)日：2013-01-15

    申请号：US12192317

    申请日：2008-08-15

    申请人： Yasutaka Toyoda ,  Ryoichi Matsuoka ,  Akiyuki Sugiyama

    发明人： Yasutaka Toyoda ,  Ryoichi Matsuoka ,  Akiyuki Sugiyama

    IPC分类号： G06K9/00

    CPC分类号： G06F17/5081 ,  G06K9/00 ,  G06K2209/19 ,  G06T7/0004

    摘要： A pattern shape evaluation method and semiconductor inspection system having a unit for extracting contour data of a pattern from an image obtained by photographing a semiconductor pattern, a unit for generating pattern direction data from design data of the semiconductor pattern, and a unit for detecting a defect of a pattern, through comparison between pattern direction data obtained from the contour data and pattern direction data generated from the design data corresponding to a pattern position of the contour data.

    摘要翻译： 一种图案形状评估方法和半导体检查系统，具有从通过拍摄半导体图案获得的图像中提取图案的轮廓数据的单元，用于从半导体图案的设计数据生成图案方向数据的单元和用于检测半导体图案的单元 通过比较从轮廓数据获得的图案方向数据和从对应于轮廓数据的图案位置的设计数据生成的图案方向数据，来对图案的缺陷进行比较。

    SAMPLE DIMENSION INSPECTING/MEASURING METHOD AND SAMPLE DIMENSION INSPECTING/MEASURING APPARATUS
    3.
    发明申请
    SAMPLE DIMENSION INSPECTING/MEASURING METHOD AND SAMPLE DIMENSION INSPECTING/MEASURING APPARATUS 有权
    样本尺寸检查/测量方法和样品尺寸检查/测量装置

    公开(公告)号：US20110158543A1

    公开(公告)日：2011-06-30

    申请号：US13041894

    申请日：2011-03-07

    申请人： Hidetoshi Morokuma ,  Akiyuki Sugiyama ,  Ryoichi Matsuoka ,  Takumichi Sutani ,  Yasutaka Toyoda

    发明人： Hidetoshi Morokuma ,  Akiyuki Sugiyama ,  Ryoichi Matsuoka ,  Takumichi Sutani ,  Yasutaka Toyoda

    IPC分类号： G06K9/00

    CPC分类号： G01B15/04 ,  G03F1/86 ,  G06T7/001 ,  G06T7/13 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/24592 ,  H01J2237/2817

    摘要： One of principal objects of the present invention is to provide a sample dimension measuring method for detecting the position of an edge of a two-dimensional pattern constantly with the same accuracy irrespective of the direction of the edge and a sample dimension measuring apparatus. According to this invention, to accomplish the above object, it is proposed to correct the change of a signal waveform of secondary electrons which depends on the direction of scanning of an electron beam relative to the direction of a pattern edge of an inspection objective pattern. It is proposed that when changing the scanning direction of the electron beam in compliance with the direction of a pattern to be measured, errors in the scanning direction and the scanning position are corrected. In this configuration, a sufficient accuracy of edge detection can be obtained irrespective of the scanning direction of the electron beam.

    摘要翻译： 本发明的主要目的之一是提供一种用于以与边缘的方向无关的方式以相同的精度恒定地检测二维图案的边缘的位置的样本尺寸测量方法和样本尺寸测量装置。 根据本发明，为了实现上述目的，提出了相对于检查对象图案的图案边缘的方向取决于电子束的扫描方向的二次电子的信号波形的变化。 建议当根据要测量的图案的方向改变电子束的扫描方向时，校正扫描方向和扫描位置的误差。 在该结构中，与电子束的扫描方向无关，可以获得足够的边缘检测精度。

    PATTERN MEASUREMENT APPARATUS
    4.
    发明申请
    PATTERN MEASUREMENT APPARATUS 有权
    图案测量装置

    公开(公告)号：US20090039263A1

    公开(公告)日：2009-02-12

    申请号：US12188791

    申请日：2008-08-08

    申请人： Ryoichi MATSUOKA ,  Akihiro Onizawa ,  Akiyuki Sugiyama ,  Hidetoshi Morokuma ,  Yasutaka Toyoda

    发明人： Ryoichi MATSUOKA ,  Akihiro Onizawa ,  Akiyuki Sugiyama ,  Hidetoshi Morokuma ,  Yasutaka Toyoda

    IPC分类号： G01N23/00

    CPC分类号： G03F7/70616 ,  G06T7/0006 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2817

    摘要： Mutual compatibility is established between the measurement with a high magnification and the measurement in a wide region. A pattern measurement apparatus is proposed which adds identification information to each of fragments that constitute a pattern within an image obtained by the SEM, and which stores the identification information in a predetermined storage format. Here, the identification information is added to each fragment for distinguishing between one fragment and another fragment. According to the above-described configuration, it turns out that the identification information is added to each fragment on the SEM image which has possessed no specific identification information originally. As a result, it becomes possible to implement the SEM-image management based on the identification information.

    摘要翻译： 在高倍率的测量与广泛的测量之间建立相互兼容性。 提出了一种图案测量装置，其将识别信息添加到构成由SEM获得的图像内的图案的每个片段，并以预定的存储格式存储识别信息。 这里，将识别信息添加到每个片段以区分一个片段和另一个片段。 根据上述结构，原来在原始不具有特定识别信息的SEM图像上将识别信息添加到各片段。 结果，可以实现基于识别信息的SEM图像管理。

    PATTERN MEASUREMENT APPARATUS
    7.
    发明申请
    PATTERN MEASUREMENT APPARATUS 有权
    图案测量装置

    公开(公告)号：US20100202654A1

    公开(公告)日：2010-08-12

    申请号：US12763710

    申请日：2010-04-20

    申请人： Ryoichi MATSUOKA ,  Akihiro Onizawa ,  Akiyuki Sugiyama ,  Hidetoshi Morokuma ,  Yasutaka Toyoda

    发明人： Ryoichi MATSUOKA ,  Akihiro Onizawa ,  Akiyuki Sugiyama ,  Hidetoshi Morokuma ,  Yasutaka Toyoda

    IPC分类号： G06K9/00

    CPC分类号： G03F7/70616 ,  G06T7/0006 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2817

    摘要： Mutual compatibility is established between the measurement with a high magnification and the measurement in a wide region. A pattern measurement apparatus is proposed which adds identification information to each of fragments that constitute a pattern within an image obtained by the SEM, and which stores the identification information in a predetermined storage format. Here, the identification information is added to each fragment for distinguishing between one fragment and another fragment. According to the above-described configuration, it turns out that the identification information is added to each fragment on the SEM image which has possessed no specific identification information originally. As a result, it becomes possible to implement the SEM-image management based on the identification information.

    摘要翻译： 在高倍率的测量与广泛的测量之间建立相互兼容性。 提出了一种图案测量装置，其将识别信息添加到构成由SEM获得的图像内的图案的每个片段，并以预定的存储格式存储识别信息。 这里，将识别信息添加到每个片段以区分一个片段和另一个片段。 根据上述结构，原来在原始不具有特定识别信息的SEM图像上将识别信息添加到各片段。 结果，可以实现基于识别信息的SEM图像管理。