公开(公告)号：US20070156278A1

公开(公告)日：2007-07-05

申请号：US11646564

申请日：2006-12-28

申请人： Kaoru Hiraga ,  Toshiyuki Ogata

发明人： Kaoru Hiraga ,  Toshiyuki Ogata

IPC分类号： G06F19/00

CPC分类号： G05B19/406

摘要： A monitoring device capable of automatically plotting a machining path according to a machining program to be executed or being executed for a machining apparatus in which workpieces and machining programs are automatically changed and executed successively. When a machining program is selected from machining managing means, the selected machining program is stored to be renewed in machining program execution means. When machining program analysis means determines the renewal of the machining program in the machining program, the machining program analysis means analyzes the machining program stored in the machining program execution means, so that a machining path according to the machining program is plotted on a display device.

摘要翻译： 一种监视装置，其能够根据要对所述加工装置执行或正在执行的加工程序自动绘制加工路径，所述加工装置在其中自动地改变和执行工件和加工程序。 当从加工管理装置中选择加工程序时，所选择的加工程序被存储以在加工程序执行装置中更新。 当加工程序分析装置确定加工程序中的加工程序的更新时，加工程序分析装置分析存储在加工程序执行装置中的加工程序，使得根据加工程序的加工路径被绘制在显示装置上 。

公开(公告)号：US07239936B2

公开(公告)日：2007-07-03

申请号：US11397624

申请日：2006-04-05

申请人： Koji Suzuki ,  Toshiyuki Ogata

发明人： Koji Suzuki ,  Toshiyuki Ogata

IPC分类号： G06F19/00

CPC分类号： G05B19/408 ,  G05B19/4148 ,  G05B2219/31421 ,  G05B2219/34273 ,  G05B2219/34376

摘要： When the system is powered on, a BOOT device detecting unit detects which data exchange device (memory card or the like) is to be booted first, and the detected data exchange device is booted first. A data exchange process program which is set as software starting at BOOT is started to detect a data exchange file. At this time, with reference to a type code of a numerical control apparatus to be used, data matched to the type code is selected. A data exchange file is transferred to an internal storing device to which the data exchange device is connected. Then, a data exchange file is transferred to an internal storing device to which the data exchange device is not connected.

摘要翻译： 当系统通电时，BOOT设备检测单元首先检测哪个数据交换设备（存储卡等）被引导，并且检测到的数据交换设备首先启动。 开始设置为以BOOT开始的软件的数据交换处理程序来检测数据交换文件。 此时，参考要使用的数字控制装置的类型代码，选择与类型代码相匹配的数据。 数据交换文件被传送到数据交换设备连接到的内部存储设备。 然后，将数据交换文件传送到未连接数据交换装置的内部存储装置。

公开(公告)号：US06897398B2

公开(公告)日：2005-05-24

申请号：US10855503

申请日：2004-05-28

申请人： Toshiyuki Ogata ,  Koji Suzuki

发明人： Toshiyuki Ogata ,  Koji Suzuki

IPC分类号： B23H11/00 ,  B23H7/20 ,  G05B19/4068 ,  B23H7/02

CPC分类号： B23H7/20

摘要： A machining monitor has a depicting function for depicting the machining status of a wire electric discharge machine controlled by a numerical control device. The machining monitor has current position depicting means for depicting a current position according to current position information obtained during machining by the wire electric discharge machine and/or during an operation check by depicting, and has workpiece shape depicting means for depicting a workpiece shape according to workpiece shape information obtained during machining and/or workpiece shape information during an operation check by depicting. The machining monitor displays the workpiece shape and current position concurrently.

摘要翻译： 机械监视器具有描绘由数控装置控制的放线机的加工状态的描绘功能。 加工监视器具有当前位置描述装置，用于根据当前位置信息描绘当前位置信息，该当前位置信息是通过放线机进行加工和/或通过描绘操作检查期间获得的，并且具有用于描绘根据 在加工期间获得的工件形状信息和/或通过描绘操作检查期间的工件形状信息。 加工显示器同时显示工件形状和当前位置。

公开(公告)号：US06683202B2

公开(公告)日：2004-01-27

申请号：US10079506

申请日：2002-02-22

申请人： Toshiyuki Ogata ,  Kotaro Endo ,  Hiroshi Komano

发明人： Toshiyuki Ogata ,  Kotaro Endo ,  Hiroshi Komano

IPC分类号： C08F6900

CPC分类号： C07C69/653 ,  C07C2602/42 ,  C07C2603/74 ,  G03F7/0046 ,  G03F7/0397

摘要： The invention discloses a novel ester compound of an unsaturated carboxylic acid represented by the general formula in which R1 is preferably a hydrogen atom or methyl group, R2 is preferably a trifluoromethyl group, R3 is a non-aromatic polycyclic hydrocarbon group or, preferably, an adamantyl group and R4 is preferably a hydrogen atom or methyl group. This unsaturated ester compound is polymerizable to give a (co)polymeric resin which can be used as a base resinous ingredient in a photoresist composition for light exposure with ultraviolet light of a very short wavelength by virtue of the high transparency to the short-wavelength light. A synthetic method for the preparation of the novel ester compound is disclosed.

摘要翻译： 本发明公开了一种由通式表示的不饱和羧酸的酯化合物，其中R 1优选为氢原子或甲基，R 2优选为三氟甲基，R 3为非芳族 多环烃基或优选金刚烷基，R 4优选为氢原子或甲基。 这种不饱和酯化合物是可聚合的，得到（共）聚合物树脂，其可以用作光致抗蚀剂组合物中的基础树脂成分，用于通过对短波长光的高透明度而具有非常短的波长的紫外光进行曝光 。 公开了一种制备新型酯化合物的合成方法。

公开(公告)号：US06638684B2

公开(公告)日：2003-10-28

申请号：US09799549

申请日：2001-03-07

申请人： Waki Okubo ,  Kazufumi Sato ,  Kazuyuki Nitta ,  Toshiyuki Ogata

发明人： Waki Okubo ,  Kazufumi Sato ,  Kazuyuki Nitta ,  Toshiyuki Ogata

IPC分类号： G03F7039

CPC分类号： G03F7/0045 ,  G03F7/0392 ,  G03F7/0395 ,  Y10S430/106 ,  Y10S430/111

摘要： A photosensitive laminate includes a substrate and a resist layer 500 to 5800 angstroms thick formed on the substrate. A composition for the resist layer includes (A) a compound which generates an acid upon irradiation with radioactive ray, (B) an alkali-soluble novolak resin, and (C) a compound having at least one acid-decomposable dissolution-inhibiting group, and the dissolution-inhibiting group is decomposable by action of an acid generated from the ingredient (A) to yield an organic carboxylic acid. This photosensitive laminate is sequentially subjected to selective exposure to KrF excimer laser light or to light having a short wavelength equal to or less than that of F2 laser, post-exposure baking, and developing with an alkali to yield a resist pattern.

摘要翻译： 感光层压板包括基材和形成在基材上的500至5800埃的抗蚀剂层。 抗蚀层的组合物包括（A）在放射线照射时产生酸的化合物，（B）碱溶性酚醛清漆树脂，（C）具有至少一个可酸分解溶解抑制基团的化合物， 并且溶解抑制基团可以通过由成分（A）产生的酸的作用而分解，得到有机羧酸。 依次对该感光性层叠体进行KrF准分子激光的选择性曝光或者等于或小于F2激光的短波长，曝光后烘烤和用碱显影以产生抗蚀剂图案的光。

公开(公告)号：US08920583B2

公开(公告)日：2014-12-30

申请号：US12452765

申请日：2008-07-22

申请人： Hitoshi Asahi ,  Tetsuo Ishitsuka ,  Motofumi Koyuba ,  Toshiyuki Ogata

发明人： Hitoshi Asahi ,  Tetsuo Ishitsuka ,  Motofumi Koyuba ,  Toshiyuki Ogata

IPC分类号： B32B1/08 ,  C22C38/58 ,  C22C38/42 ,  C22C38/54 ,  C22C38/04 ,  C21D9/08 ,  C21D8/10

CPC分类号： C22C38/04 ,  C21D8/105 ,  C21D9/08 ,  Y10T428/12292

摘要： The invention provides a steel pipe excellent in deformation characteristics, most notably a steel pipe for expandable-pipe oil well and a low-yield-ratio line pipe, and a method of producing the same without conducting water cooling requiring large-scale heat treatment equipment, namely a method of producing a steel pipe excellent in deformation characteristics whose microstructure is a two-phase structure including a martensite-austenite constituent at an area fraction of 2 to 10% and a soft phase, which method comprises: heating at Ac1+10° C. to Ac1+60° C. and thereafter cooling a precursor steel pipe which contains, in mass %, C: 0.04 to 0.10% and Mn: 1.00 to 2.50%, is limited to Si: 0.80% or less, P: 0.03% or less, S: 0.01% or less, Al: 0.10% or less and N: 0.01% or less, further contains one or more of Ni: 1.00% or less, Mo: 0.60% or less, Cr: 1.00% or less and Cu: 1.00% or less, where content of Mn and content of one or more of Cr, Ni, Mo and Cu satisfy Mn+Cr+Ni+2Mo+Cu≧2.00, and a balance of iron and unavoidable impurities.

摘要翻译： 本发明提供一种变形特性优异的钢管，特别是可膨胀管油管用钢管和低屈服比管线管，以及不进行需要大型热处理设备的水冷却的制造方法 即具有优异的变形特性的钢管的制造方法，其特征在于微结构为包含2〜10％面积分数的马氏体 - 奥氏体组分和软相的两相组织，该方法包括：在Ac1 + 10 ℃至Ac1 + 60℃，然后将质量％C：0.04〜0.10％，Mn：1.00〜2.50％的前体钢管冷却至Si：0.80％以下，P： 0.03％以下，S：0.01％以下，Al：0.10％以下，N：0.01％以下，还含有Ni：1.00％以下，Mo：0.60％以下，Cr：1.00％ 以下，Cu：1.00％以下，其中，Cr，Ni，Mo，Cu中的一种以上的Mn含量满足Mn + Cr + Ni + 2Mo +Cu≥2.00， 和铁和不可避免的杂质的平衡。

公开(公告)号：US08741538B2

公开(公告)日：2014-06-03

申请号：US12707462

申请日：2010-02-17

申请人： Toshiyuki Ogata ,  Syogo Matsumaru ,  Hideo Hada ,  Masaaki Yoshida

发明人： Toshiyuki Ogata ,  Syogo Matsumaru ,  Hideo Hada ,  Masaaki Yoshida

IPC分类号： G03F7/00 ,  G03F7/004

CPC分类号： C08F220/28 ,  C07C69/54 ,  C07C2601/14 ,  C08F222/1006 ,  C08F232/08 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

摘要： A polymer compound that, within a chemically amplified positive resist system, exhibits a significant change in alkali solubility from a state prior to exposure to that following exposure, as well as a photoresist composition that includes such a polymer compound and a method for forming a resist pattern, which are capable of forming fine patterns with a high level of resolution. The polymer compound includes, as an alkali-soluble group (i), a substituent group in which a group selected from amongst alcoholic hydroxyl groups, carboxyl groups, and phenolic hydroxyl groups is protected with an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1) shown below: [Formula 1] —CH2—O-AO—CH2—]n  (1) (wherein, A represents an organic group of 1 to 20 carbon atoms with a valency of at least n+1, and n represents an integer from 1 to 4).

摘要翻译： 化学放大型正性抗蚀剂体系内的曝光后的状态下的碱溶解度显着变化的高分子化合物以及包含这种高分子化合物的光致抗蚀剂组合物和形成抗蚀剂的方法 图案，能够以高分辨率形成精细图案。 高分子化合物作为碱溶性基团（i）包括其中选自醇羟基，羧基和酚羟基的基团用酸解离的溶解抑制基团（ii）保护的取代基， 通式（1）表示：[式1] -CH 2 -O-AO-CH 2 - ] n（1）（其中，A表示1〜20个碳原子的有机基团， 1，n表示1〜4的整数）。

公开(公告)号：US08304163B2

公开(公告)日：2012-11-06

申请号：US12980914

申请日：2010-12-29

申请人： Daiju Shiono ,  Taku Hirayama ,  Toshiyuki Ogata ,  Shogo Matsumaru ,  Hideo Hada

发明人： Daiju Shiono ,  Taku Hirayama ,  Toshiyuki Ogata ,  Shogo Matsumaru ,  Hideo Hada

IPC分类号： G03F7/004

CPC分类号： G03F7/0392 ,  C07J9/00 ,  G03F7/0045 ,  Y10S430/106

摘要： A positive type resist composition for forming a high resolution resist pattern and a method of forming a resist pattern are provided which use a low-molecular-weight material as a base component, and a compound and a dissolution inhibitor that are each suitable for the positive type resist composition. Here, the compound is a non-polymer having a molecular weight of 500 to 3000, and is decomposed under the action of an acid to produce two or more molecules of a decomposition product having a molecular weight of 200 or more; the dissolution inhibitor comprises the compound; the positive type resist composition comprises the compound and the acid generator component; and the method of forming a resist pattern uses the positive type resist composition.

摘要翻译： 提供了用于形成高分辨抗蚀剂图案的正型抗蚀剂组合物和形成抗蚀剂图案的方法，其使用低分子量材料作为基础组分，并且化合物和溶解抑制剂各自适用于阳性 型抗蚀剂组合物。 这里，该化合物是分子量为500〜3000的非聚合物，在酸的作用下分解，生成分子量为200以上的分解产物的2个以上分子; 该溶解抑制剂包含该化合物; 正型抗蚀剂组合物包含化合物和酸产生剂组分; 并且形成抗蚀剂图案的方法使用正型抗蚀剂组合物。

公开(公告)号：US20100010182A1

公开(公告)日：2010-01-14

申请号：US12458259

申请日：2009-07-07

申请人： Motoki Takahashi ,  Hirofumi Imai ,  Takahiro Asai ,  Koichi Misumi ,  Toshiyuki Ogata

发明人： Motoki Takahashi ,  Hirofumi Imai ,  Takahiro Asai ,  Koichi Misumi ,  Toshiyuki Ogata

IPC分类号： C08F122/40 ,  C08F120/10 ,  C08F120/18 ,  C08F112/08

CPC分类号： C09J7/02 ,  C07B63/00 ,  C08F6/001 ,  C08F6/10 ,  C08F6/12 ,  C08F212/08 ,  C08F220/12 ,  C08F220/14 ,  C08F2220/1825 ,  C08F2222/402 ,  C08J3/095 ,  C08J2325/08 ,  C08J2325/14 ,  C09J7/20 ,  C09J125/04 ,  C09J125/08 ,  C09J125/14 ,  C09J133/04 ,  C09J133/24 ,  C09J135/00 ,  C09J135/06 ,  C09J2425/00 ,  C09J2433/00 ,  C08F2220/1875 ,  C08L25/14

摘要： An adhesive composition is disclosed which includes a polymer prepared by copolymerizing a monomer containing a polymerizable group, the polymer including a low-molecular-weight component having a molecular weight equivalent to 1% or less of the weight-average molecular weight of the polymer, the low-molecular-weight component is contained in a range of not less than 0 weight % to less than 0.3 weight % of the total weight of the polymer. This allows provision of an adhesive composition having great adhesive strength in a high-temperature environment, especially at temperatures from 140° C. to 200° C., as well as high heat resistance and favorable crack resistance.

摘要翻译： 公开了一种粘合剂组合物，其包括通过共聚含有可聚合基团的单体制备的聚合物，所述聚合物包括分子量等于聚合物的重均分子量的1％或更低的低分子量组分， 低分子量成分的含量为聚合物总重量的0重量％〜小于0.3重量％。 这允许提供在高温环境下，特别是在140℃至200℃的温度下具有很大粘附强度的粘合剂组合物，以及高耐热性和良好的抗裂性。

公开(公告)号：US20090234087A1

公开(公告)日：2009-09-17

申请号：US12322145

申请日：2009-01-29

申请人： Takahiro Asai ,  Koichi Misumi ,  Toshiyuki Ogata ,  Motoki Takahashi ,  Hirofumi Imai

发明人： Takahiro Asai ,  Koichi Misumi ,  Toshiyuki Ogata ,  Motoki Takahashi ,  Hirofumi Imai

IPC分类号： C08F222/40

CPC分类号： C09J133/064

摘要： An adhesive composition of the present invention includes a polymer as a main component. The polymer is produced by copolymerization of a monomer composition which includes chain-structured alkyl (meth)acrylate and a monomer containing a maleimide group. This makes it possible to provide an adhesive composition used for forming an adhesive layer in which adhesive strength is kept in a high temperature environment. That is, it becomes possible to provide an adhesive composition that allows forming an adhesive layer which has high adhesive strength in a high temperature environment (particularly at 200° C. to 250° C.).

摘要翻译： 本发明的粘合剂组合物包括聚合物作为主要成分。 聚合物通过包含链状结构的（甲基）丙烯酸烷基酯和含有马来酰亚胺基团的单体的单体组合物的共聚来制备。 这使得可以提供用于形成粘合剂层的粘合剂组合物，其中粘合强度保持在高温环境中。 也就是说，可以提供一种粘合剂组合物，其可以在高温环境（特别是在200℃至250℃）下形成具有高粘合强度的粘合剂层。