公开(公告)号：US20060262061A1

公开(公告)日：2006-11-23

申请号：US11439463

申请日：2006-05-23

申请人： Yun Liu ,  Tsau Hsieh ,  Hung Chen ,  Chao Lai ,  Chao Hung

发明人： Yun Liu ,  Tsau Hsieh ,  Hung Chen ,  Chao Lai ,  Chao Hung

IPC分类号： G09G3/36

CPC分类号： G02F1/136286 ,  G02F1/13439 ,  G02F2201/121 ,  G02F2201/122 ,  G09G3/3648 ,  G09G2320/0209 ,  G09G2320/0247

摘要： A liquid crystal display device (100 or 200) includes a first substrate (110 or 210) and a second substrate (120 or 220) opposite to each other, a liquid crystal layer (130 or 230) sandwiched between the first and second substrates; a common electrode (140 or 240) formed on the first substrate, and the common electrode having a plurality of openings (180 or 280); and a plurality of gate lines (150 or 250) formed on the second substrate and positionally corresponding the openings respectively. Moreover, the gate lines can be arranged with the areas of the second substrate corresponding to the openings. The coupled capacitor delaying of signals of gate electrodes in the TFTs can be reduced. Accordingly, flickering can be reduced, and the display performance can be improved.

摘要翻译： 液晶显示装置（100或200）包括彼此相对的第一基板（110或210）和第二基板（120或220），夹在第一和第二基板之间的液晶层（130或230） 形成在第一基板上的公共电极（140或240），以及具有多个开口（180或280）的公共电极; 以及形成在第二基板上并且分别对应于开口的多个栅极线（150或250）。 此外，栅极线可以布置成与第二基板对应于开口的区域。 可以减少TFT中栅电极的信号的耦合电容延迟。 因此，可以减少闪烁，并且可以提高显示性能。

公开(公告)号：US20060240750A1

公开(公告)日：2006-10-26

申请号：US11407695

申请日：2006-04-19

申请人： Jeonghoon Oh ,  Hung Chen ,  Thomas Brezoczky ,  Douglas McAllister ,  David Huo

发明人： Jeonghoon Oh ,  Hung Chen ,  Thomas Brezoczky ,  Douglas McAllister ,  David Huo

IPC分类号： B24B29/00 ,  B24B47/02

CPC分类号： B24B37/32

摘要： A two part retaining ring is described that has a lower ring and an upper ring. The lower ring contacts a polishing surface during chemical mechanical polishing. The upper surface and the lower surface of the lower ring have matching grooves formed therein to increase the flexibility of the lower ring.

摘要翻译： 描述了具有下环和上环的两部分保持环。 在化学机械抛光期间，下环接触抛光表面。 下环的上表面和下表面具有形成在其中的匹配凹槽，以增加下环的柔性。

公开(公告)号：US20060187899A1

公开(公告)日：2006-08-24

申请号：US11049422

申请日：2005-02-02

申请人： Hung Chen ,  Gang Qiang ,  Lee Wang

发明人： Hung Chen ,  Gang Qiang ,  Lee Wang

IPC分类号： H04L12/66

CPC分类号： H04M7/1225

摘要： In order to provide communication service across various networks, the method for providing communication service via the client representatives is disclosed. First, the communication service request from a first terminal would be received by a management system through Internet. By accessing the database, the management system then obtains the link information according to the communication service request, wherein the link information includes information of the client representative and the second terminal. After that, through Internet, the link information would be returned to the first terminal, and the first terminal may connect to the client representative. Finally, the communication service between the first terminal and the second terminal is therefore generated by relaying the connection to the second terminal through PSTN.

摘要翻译： 为了在各种网络中提供通信服务，公开了通过客户代表提供通信服务的方法。 首先，来自第一终端的通信服务请求将由管理系统通过因特网接收。 通过访问数据库，管理系统随后根据通信服务请求获得链接信息，其中链接信息包括客户代表和第二终端的信息。 之后，通过因特网，链接信息将被返回到第一终端，并且第一终端可以连接到客户代表。 最后，通过PSTN将连接中继到第二终端，从而产生第一终端与第二终端之间的通信服务。

公开(公告)号：US20060160479A1

公开(公告)日：2006-07-20

申请号：US11037919

申请日：2005-01-15

申请人： Hung Chen ,  Steven Zuniga

发明人： Hung Chen ,  Steven Zuniga

IPC分类号： B24B29/00 ,  B24B41/06

CPC分类号： B24B41/007 ,  B24B37/30 ,  B24B49/14

摘要： Systems and apparatus providing a carrier head for chemical mechanical polishing are described. The carrier head includes a base, a support structure attached to the base, a retaining structure attached to the base, and a connector attached to the base and the retaining structure. The support structure includes a receiving surface for contacting a substrate. The retaining structure prevents the substrate from moving along the receiving surface. The base and the retaining structure can thermally expand at different rates of expansion without causing distortion to one another.

摘要翻译： 描述了提供用于化学机械抛光的载体头的系统和设备。 承载头包括基座，附接到基座的支撑结构，附接到基座的保持结构以及连接到基座和保持结构的连接器。 支撑结构包括用于接触基底的接收表面。 保持结构防止基板沿接收表面移动。 底座和保持结构可以以不同的膨胀速率热膨胀，而不会相互扭曲。

公开(公告)号：US20060147345A1

公开(公告)日：2006-07-06

申请号：US11090220

申请日：2005-03-28

申请人： Horn Chen ,  Ren Wu ,  Hung Chen ,  Chuen Liu

发明人： Horn Chen ,  Ren Wu ,  Hung Chen ,  Chuen Liu

IPC分类号： G01N27/02

CPC分类号： G01N27/07

摘要： The present invention discloses a taste-sensing mixture, a taste sensor and a taste-sensing system using the same, which measures the conductivity of a solution and analyzes the measuring result by the principle component analysis to differentiate the taste of the solution. The taste-sensing mixture comprises a carrier and a dispersant dispersed in the carrier. Preferably, the carrier is selected from the group consisting of conductive polymer, salt compound and alkene polymer, while the dispersant is selected from the group consisting of alcohol and gel. The alkene polymer is selected from the group consisting of polyvinyl alcohol, polyethylene oxide and polystyrene, the alcohol is selected from the group consisting of glycerol, methanol and ethanol, the conductive polymer can be polypyrrole or polyaniline, the salt compound can be sodium chloride or sodium potassium, and the gel can be agar.

摘要翻译： 本发明公开了一种味觉感应混合物，味觉传感器和使用该味觉感测系统的味觉感测系统，其测量溶液的电导率，并通过主成分分析分析测量结果以区分溶液的味道。 味觉感测混合物包含分散在载体中的载体和分散剂。 优选地，载体选自导电聚合物，盐化合物和烯烃聚合物，而分散剂选自醇和凝胶。 烯烃聚合物选自聚乙烯醇，聚环氧乙烷和聚苯乙烯，醇选自甘油，甲醇和乙醇，导电聚合物可以是聚吡咯或聚苯胺，盐化合物可以是氯化钠或 钠钾，凝胶可以是琼脂。

公开(公告)号：US07040971B2

公开(公告)日：2006-05-09

申请号：US10946186

申请日：2004-09-20

申请人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

发明人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

IPC分类号： B24B1/00

CPC分类号： B24B37/30 ,  B24B37/32

摘要： A carrier head for a chemical mechanical polishing apparatus is described. The carrier head has a base, a rigid body, a membrane and a pressurizing structure. The rigid body is movable relative to the base and includes a downwardly-extending projection. The membrane has a mounting surface for a substrate. The membrane extends below the base to provide a chamber between the base and the membrane. The pressurizing structure applies a downward pressure on the rigid body to cause a lower surface of the rigid body to press on an inner surface of the membrane.

摘要翻译： 描述了用于化学机械抛光装置的载体头。 承载头具有底座，刚体，膜和加压结构。 刚体相对于基座可移动并包括向下延伸的突出部。 膜具有用于基底的安装表面。 膜延伸到底部下方以在基底和膜之间提供腔室。 加压结构向刚体施加向下的压力，以使刚体的下表面压在膜的内表面上。

公开(公告)号：US20060089092A1

公开(公告)日：2006-04-27

申请号：US10975564

申请日：2004-10-27

申请人： Hung Chen ,  Steven Zuniga

发明人： Hung Chen ,  Steven Zuniga

IPC分类号： B24B41/06

CPC分类号： B24B37/005 ,  B24B37/30

摘要： A carrier head for chemical mechanical polishing of a substrate. The carrier head includes a carrier base, a retaining ring, and a junction connecting the carrier base to the retaining ring. The junction is configured such that vertical movement of the retaining ring is substantially restrained relative to the carrier base. The junction is further configured such that the profile of a bottom surface of the retaining ring is substantially decoupled from flexing and/or expansion of carrier base.

摘要翻译： 用于基材的化学机械抛光的载体头。 承载头包括载体基座，保持环和将载体基部连接到保持环的接合部。 接合部构造成使得保持环的垂直移动相对于载体基座基本上受到限制。 连接部被进一步构造成使得保持环的底部表面的轮廓与载体基体的弯曲和/或膨胀基本上脱离。

公开(公告)号：US20060019582A1

公开(公告)日：2006-01-26

申请号：US11004223

申请日：2004-12-02

申请人： Hung Chen ,  Steven Zuniga ,  Tsz-Sin Siu

发明人： Hung Chen ,  Steven Zuniga ,  Tsz-Sin Siu

IPC分类号： B24B1/00

CPC分类号： B24B37/345 ,  B24B37/30

摘要： Techniques for removing a substrate from a polishing pad are described. A substrate is pulled away from the polishing pad such that the edges of the substrate are pulled away from the polishing pad before the center of the substrate is pulled from the polishing pad.

摘要翻译： 描述了从抛光垫去除衬底的技术。 将衬底从抛光垫拉出，使得在从抛光垫拉出衬底的中心之前将衬底的边缘从抛光垫拉出。

公开(公告)号：US20050221734A1

公开(公告)日：2005-10-06

申请号：US11144245

申请日：2005-06-02

申请人： Steven Zuniga ,  Hung Chen

发明人： Steven Zuniga ,  Hung Chen

IPC分类号： B24B1/00 ,  B24B37/30

CPC分类号： B24B7/22 ,  B24B37/30

摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base to define a chamber. The flexible membrane has a core of a first material and an outer layer of a second material having a lower adhesion to the substrate than the first material. An exposed surface of the outer layer provides a mounting surface for the substrate.

摘要翻译： 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸以限定室的柔性膜。 柔性膜具有第一材料的芯和与第一材料相比对基材具有较低粘合力的第二材料的外层。 外层的暴露表面为基底提供了安装表面。

公开(公告)号：US20050142993A1

公开(公告)日：2005-06-30

申请号：US11054128

申请日：2005-02-08

申请人： Hung Chen ,  Steven Zuniga

发明人： Hung Chen ,  Steven Zuniga

IPC分类号： B24B37/27 ,  B24B37/04 ,  B24B41/06 ,  B24B49/16 ,  H01L21/304 ,  B24B29/00

CPC分类号： B24B37/30 ,  B24B41/061 ,  B24B49/16

摘要： A carrier head that has a base assembly and a flexible membrane. The flexible membrane has a generally circular main portion with a lower surface that provides a substrate-mounting surface and a plurality of concentric annular portions extending from the main portion and secured to the base assembly. The volume between the base assembly and the flexible membrane forming a plurality of pressurizable chambers.

摘要翻译： 具有基座组件和柔性膜的承载头。 柔性膜具有大致圆形的主要部分，具有下表面，其提供基板安装表面和从主要部分延伸并固定到基座组件的多个同心环形部分。 基座组件和柔性膜之间的体积形成多个可加压室。