Pigment-dispersed composition, curable composition, color filter and production method thereof
    51.
    发明授权
    Pigment-dispersed composition, curable composition, color filter and production method thereof 有权
    颜料分散组合物,固化性组合物,滤色器及其制造方法

    公开(公告)号:US08785087B2

    公开(公告)日:2014-07-22

    申请号:US12521316

    申请日:2007-12-27

    Abstract: The present invention provides a pigment-dispersed composition including at least a polymer compound (A-1) having at least one selected from the structural units represented by the following formulae (1) to (3), a pigment (B) and a solvent (C), and a pigment-dispersed composition including at least a resin (D) having an acid number of 100 mg KOH/g or more, a dispersion resin (A-2) having an acid number of less than 100 mg KOH/g and an unsaturation equivalent of less than 600, a pigment (B), and a solvent (C) [R1 to R20: a hydrogen atom, a monovalent organic group; A1 to A3: an oxygen atom, a sulfur atom, —N(R21)—; G1 to G3: a divalent organic group; X, Z: an oxygen atom, a sulfur atom, —N(R22)—; Y: an oxygen atom, a sulfur atom, a phenylene group, —N(R23)—; and R21 to R23: an alkyl group].

    Abstract translation: 本发明提供一种颜料分散组合物,其至少包含选自下述式(1)〜(3)所示的结构单元,颜料(B)和溶剂中的至少一种的高分子化合物(A-1) (C)和至少包含酸值为100mg KOH / g以上的树脂(D)的颜料分散组合物,酸值小于100mg KOH / g的分散树脂(A-2) g,不足于等于600的不饱和键,颜料(B)和溶剂(C)[R 1至R 20:氢原子,一价有机基团; A1至A3:氧原子,硫原子,-N(R21) - ; G1至G3:二价有机基团; X,Z:氧原子,硫原子,-N(R 22) - ; Y:氧原子,硫原子,亚苯基,-N(R 23) - ; 和R 21〜R 23:烷基]。

    Lithographic printing plate precursor and lithographic printing method
    55.
    发明授权
    Lithographic printing plate precursor and lithographic printing method 有权
    平版印刷版原版和平版印刷法

    公开(公告)号:US08127675B2

    公开(公告)日:2012-03-06

    申请号:US12549080

    申请日:2009-08-27

    Abstract: A lithographic printing plate precursor comprising a support and an image recording layer capable of drawing an image by exposure with an infrared laser, wherein the image recording layer contains (A) an infrared absorbent and (B) an iodonium salt represented by the following formula (1): wherein Ar1 and Ar2 each represents a benzene ring which may have a substituent, provided that two benzene rings are differing in the substituent from each other and a total of Hammett's σ values of substituents on at least one of the benzene rings is a negative value, and Z represents a counter anion.

    Abstract translation: 一种平版印刷版原版,其特征在于,具备能够通过红外线激光曝光来进行图像拉伸的载体和图像记录层,其中,图像记录层含有(A)红外线吸收剂和(B)下式表示的碘鎓盐 1):其中Ar1和Ar2各自表示可以具有取代基的苯环,条件是两个苯环彼此不同,并且总共有哈米特氏; 至少一个苯环上的取代基的值为负值,Z表示抗衡阴离子。

    Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor
    56.
    发明授权
    Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor 有权
    光敏树脂组合物,遮光滤色片及其制作方法及图像传感器

    公开(公告)号:US08119311B2

    公开(公告)日:2012-02-21

    申请号:US12411457

    申请日:2009-03-26

    CPC classification number: G03F7/0007 G03F7/031

    Abstract: A photosensitive resin composition is provided that includes at least (A) titanium black, (B) a polymerizable compound, (C) a photopolymerization initiator (D) a resin, and (E) an organic solvent, the photopolymerization initiator (C) using in combination two or more types of photopolymerization initiators including at least one type of oxime-based photopolymerization initiator. There are also provided a light-shielding color filter having a pattern formed by using the photosensitive resin composition, a process for producing a light-shielding color filter that includes a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern, and an image sensor having the light-shielding color filter.

    Abstract translation: 提供至少包含(A)钛黑,(B)可聚合化合物,(C)光聚合引发剂(D)和树脂)和(E)有机溶剂的光敏树脂组合物,所述光聚合引发剂(C)使用 组合两种或更多种类型的光聚合引发剂,其包括至少一种类型的肟基光聚合引发剂。 还提供了一种具有通过使用感光性树脂组合物形成的图案的遮光滤色器,制造遮光滤色器的方法,该遮光滤色器包括用感光性树脂组合物涂布基板的步骤,成像曝光步骤 ,以及形成图案的步骤,以及具有遮光滤色器的图像传感器。

    Positive photosensitive composition, pattern forming method using the composition and resin for use in the composition
    57.
    发明授权
    Positive photosensitive composition, pattern forming method using the composition and resin for use in the composition 有权
    正型感光性组合物,使用组合物中使用的组合物和树脂的图案形成方法

    公开(公告)号:US08043791B2

    公开(公告)日:2011-10-25

    申请号:US12678023

    申请日:2008-09-11

    Abstract: A positive photosensitive composition ensuring wide exposure latitude and reduced line edge roughness not only in normal exposure (dry exposure) but also in immersion exposure, a pattern forming method using the positive photosensitive composition, and a novel resin contained in the positive photosensitive composition are provided, which are a positive photosensitive composition comprising (A) a resin having a specific lactone structure in the side chain and being capable of increasing the solubility in an alkali developer by the action of an acid and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, a pattern forming method using the positive photosensitive composition, and a novel resin contained in the positive photosensitive composition.

    Abstract translation: 提供正光敏组合物,其不仅在正常曝光(干曝光)中,而且在浸渍曝光中,确保宽曝光宽容度和线边缘粗糙度,使用正光敏组合物的图案形成方法和包含在正感光组合物中的新型树脂 ,其是包含(A)侧链中具有特定内酯结构的树脂并且能够通过酸的作用增加在碱性显影剂中的溶解度的阳性感光性组合物和(B)能够产生酸的化合物 在用光化射线或辐射照射时,使用正型感光性组合物的图案形成方法,以及包含在正性感光性组合物中的新型树脂。

    POSITIVE PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION AND RESIN FOR USE IN THE COMPOSITION
    59.
    发明申请
    POSITIVE PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION AND RESIN FOR USE IN THE COMPOSITION 有权
    正性感光性组合物,使用组合物和树脂在组合物中使用的图案形成方法

    公开(公告)号:US20100216072A1

    公开(公告)日:2010-08-26

    申请号:US12678023

    申请日:2008-09-11

    Abstract: A positive photosensitive composition ensuring wide exposure latitude and reduced line edge roughness not only in normal exposure (dry exposure) but also in immersion exposure, a pattern forming method using the positive photosensitive composition, and a novel resin contained in the positive photosensitive composition are provided, which are a positive photosensitive composition comprising (A) a resin having a specific lactone structure in the side chain and being capable of increasing the solubility in an alkali developer by the action of an acid and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, a pattern forming method using the positive photosensitive composition, and a novel resin contained in the positive photosensitive composition.

    Abstract translation: 提供正光敏组合物,其不仅在正常曝光(干曝光)中,而且在浸渍曝光中,确保宽曝光宽容度和线边缘粗糙度,使用正光敏组合物的图案形成方法和包含在正感光组合物中的新型树脂 ,其是包含(A)侧链中具有特定内酯结构的树脂并且能够通过酸的作用增加在碱性显影剂中的溶解度的阳性感光性组合物和(B)能够产生酸的化合物 在用光化射线或辐射照射时,使用正型感光性组合物的图案形成方法,以及包含在正性感光性组合物中的新型树脂。

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