公开(公告)号：US06917419B2

公开(公告)日：2005-07-12

申请号：US09956837

申请日：2001-09-20

申请人： John Fielden ,  Ady Levy ,  Kyle A. Brown ,  Gary Bultman ,  Mehrdad Nikoonahad ,  Dan Wack

发明人： John Fielden ,  Ady Levy ,  Kyle A. Brown ,  Gary Bultman ,  Mehrdad Nikoonahad ,  Dan Wack

IPC分类号： G01N21/21 ,  G01N21/47 ,  G01N21/55 ,  G01N21/63 ,  G01N21/64 ,  G01N21/95 ,  G03F7/20 ,  H01J37/317 ,  H01L21/02 ,  H01L21/265 ,  H01L21/66 ,  G01N21/00

CPC分类号： G03F7/70708 ,  G01N21/211 ,  G01N21/47 ,  G01N21/55 ,  G01N21/636 ,  G01N21/64 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N21/956 ,  G01N2021/646 ,  G01N2021/8825 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/70658 ,  G03F7/707 ,  H01J2237/31701 ,  H01L22/12 ,  H01L2924/0002 ,  Y10T117/1004 ,  H01L2924/00

摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, flatness, a presence of defects, and a thin film characteristic. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

摘要翻译： 提供了用于监测半导体制造工艺的方法和系统。 系统可以包括被配置为支撑样本并耦合到测量装置的台。 测量装置可以包括照明系统和检测系统。 照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。 例如，系统可以被配置为确定样本的多个属性，包括但不限于平坦度，缺陷的存在和薄膜特性。 以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

公开(公告)号：US20050110986A1

公开(公告)日：2005-05-26

申请号：US11020603

申请日：2004-12-21

申请人： Mehrdad Nikoonahad ,  Stanley Stokowski ,  Keith Wells ,  Brian Leslie

发明人： Mehrdad Nikoonahad ,  Stanley Stokowski ,  Keith Wells ,  Brian Leslie

IPC分类号： G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01N21/88

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/956

摘要： An optical scanning system and method for detecting anomalies, including pattern defects and particulate contaminants, on both patterned and unpatterned surfaces, using a light beam, scanning at a grazing angle with respect to the surfaces, a plurality of detectors and an interchannel communication scheme to compare data from each detector, which facilitates characterizing anomalies. The light beam illuminates a spot on the surface which is scanned over a short scan-line. The surface is moved in a manner so that the spot is scanned over its entire area in a serpentine fashion along adjacent striped regions. The plurality of detectors include groups of collector channels disposed circumferentially around the surface, a bright field reflectivity/autoposition channel, an alignment/registration channel and an imaging channel. The collector channels in each group are symmetrically disposed, in the azimuth, on opposite sides of the center of the scan line. The position of the collector channels, as well as the polarization of the beam, facilitates distinguishing pattern defects from particulate contaminants. The bright field reflectivity/autoposition channel is positioned to receive specularly reflected light that carries information concerning local variation in reflectivity, which is used to classify detected anomalies, as well as determine variations in the height of the surface. The alignment/registration channel is positioned to detect a maximum of the light scattered from the pattern on the surface to ensure that the streets of die present on the surface are oriented so as not to be oblique with respect to the scan line. The imaging channel combines the advantages of a scanning system and an imaging system while improving signal/background ratio of the present system.

摘要翻译： 一种光学扫描系统和方法，用于使用光束，相对于表面以掠射角扫描，在图案化和未图案化的表面上检测包括图案缺陷和颗粒污染物的异常，多个检测器和通道间通信方案， 比较每个检测器的数据，这有助于表征异常。 光束照射在短扫描线上扫描的表面上的斑点。 表面以使得斑点沿着相邻条纹区域以蛇形方式在其整个区域上扫描的方式移动。 多个检测器包括围绕表面周向设置的集电极通道组，亮场反射率/自动对位通道，对准/配准通道和成像通道。 每个组中的收集器通道在扫描线的中心的相对侧对称地设置在方位角上。 收集器通道的位置以及光束的极化有助于区分图案缺陷和颗粒污染物。 亮场反射率/自动定位通道被定位成接收镜面反射光，其携带关于反射率的局部变化的信息，其用于对检测到的异常进行分类，以及确定表面高度的变化。 定位/配准通道用于检测从表面上的图案散射的光的最大值，以确保表面上存在的模具的街道被定向成相对于扫描线不倾斜。 成像通道结合了扫描系统和成像系统的优点，同时提高了本系统的信号/背景比。

公开(公告)号：US20050094153A1

公开(公告)日：2005-05-05

申请号：US11016025

申请日：2004-12-17

申请人： Mehrdad Nikoonahad ,  Guoheng Zhao ,  Ian Smith ,  Mehdi Vaez-Iravani

发明人： Mehrdad Nikoonahad ,  Guoheng Zhao ,  Ian Smith ,  Mehdi Vaez-Iravani

IPC分类号： G03F7/20 ,  G01B9/02

CPC分类号： G03F7/70633

摘要： Misalignment error between two periodic structures such as two overlay targets placed side-by-side is measured. The two structures are illuminated by coherent radiation and the positive and negative diffraction beams of the input beam by the two structures are detected to discover the optical phase difference between the positive and negative diffraction beams. The misalignment between the two structures may then be ascertained from the phase difference.

摘要翻译： 测量两个周期性结构（如并排放置的两个叠加目标）之间的对准误差。 这两个结构被相干辐射照射，并且检测由两个结构的输入光束的正和负衍射光束以发现正和负衍射光束之间的光学相位差。 然后可以从相位差确定两个结构之间的未对准。

公开(公告)号：US06888627B2

公开(公告)日：2005-05-03

申请号：US10411646

申请日：2003-04-10

申请人： Brian C. Leslie ,  Mehrdad Nikoonahad ,  Keith B. Wells

发明人： Brian C. Leslie ,  Mehrdad Nikoonahad ,  Keith B. Wells

IPC分类号： G01N21/956 ,  G01N21/94 ,  G01N21/88

CPC分类号： G01N21/95607 ,  G01N21/94 ,  G01N21/9501

摘要： In an optical scanning system for detecting particles and pattern defects on a sample surface, a light beam is focused to an illuminated spot on the surface and the spot is scanned across the surface along a scan line. A detector is positioned adjacent to the surface to collect scattered light from the spot where the detector includes a one- or two-dimensional array of sensors. Light scattered from the illuminated spot at each of a plurality of positions along the scan line is focused onto a corresponding sensor in the array. A plurality of detectors symmetrically placed with respect to the illuminating beam detect laterally and forward scattered light from the spot. The spot is scanned over arrays of scan line segments shorter than the dimensions of the surface. A bright field channel enables the adjustment of the height of the sample surface to correct for errors caused by height variations of the surface. Different defect maps provided by the output of the detectors can be compared to identify and classify the defects. The imaging function of the array of sensors combines the advantages of a scanning system and an imaging system while improving signal/background ratio of the system.

摘要翻译： 在用于检测样品表面上的颗粒和图案缺陷的光学扫描系统中，光束被聚焦到表面上的照明光斑上，并且沿着扫描线扫描光斑。 检测器邻近表面定位以收集来自检测器包括传感器的一维或二维阵列的点的散射光。 沿着扫描线的多个位置中的每一个处从照明点散射的光被聚焦到阵列中的对应的传感器上。 相对于照明光束对称放置的多个检测器检测来自光斑的横向和前向散射光。 在比表面尺寸短的扫描线段的阵列上扫描该点。 亮场通道可以调整样品表面的高度，以校正由表面的高度变化引起的误差。 可以比较由检测器输出提供的不同缺陷图，以识别和分类缺陷。 传感器阵列的成像功能结合了扫描系统和成像系统的优点，同时提高了系统的信号/背景比。

公开(公告)号：US06867862B2

公开(公告)日：2005-03-15

申请号：US10718780

申请日：2003-11-20

申请人： Mehrdad Nikoonahad

发明人： Mehrdad Nikoonahad

IPC分类号： G01B11/24 ,  G01F20060101 ,  G01N21/47 ,  G01N21/88

CPC分类号： G01N21/4788

摘要： A metrology system for characterizing three-dimensional structures and methods for manufacturing and using same. The metrology system includes a measurement system that preferably comprises an energy source and energy detector and that is in communication with a processing system. Under control of the processing system, the metrology system rotates the measurement system relative to a structure while the energy source directs a beam of incident energy toward the structure. The incident energy rebounds from the structure as scattered energy, at least a portion of which propagates toward the energy detector. Due to the relative rotation, the energy detector receives scattered energy from the structure at a plurality of angles, and the measurement system produces data signals therefrom, which data signals are provided to the processing system. The processing system analyzes the data signals to determine whether the structure has any defects, such as yield limiting deviations or other processing defects.

摘要翻译： 用于表征三维结构的计量系统及其制造和使用方法。 测量系统包括优选地包括能量源和能量检测器并且与处理系统通信的测量系统。 在处理系统的控制下，计量系统相对于结构旋转测量系统，而能量源将入射能量束引向结构。 入射能量从结构反弹为散射能量，其中至少一部分向能量探测器传播。 由于相对旋转，能量检测器以多个角度从结构接收散射能量，并且测量系统从其产生数据信号，哪些数据信号被提供给处理系统。 处理系统分析数据信号以确定结构是否具有任何缺陷，例如屈服限制偏差或其他处理缺陷。

公开(公告)号：US20050036137A1

公开(公告)日：2005-02-17

申请号：US10948814

申请日：2004-09-22

申请人： Mehrdad Nikoonahad ,  Stanley Stokowski

发明人： Mehrdad Nikoonahad ,  Stanley Stokowski

IPC分类号： G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01N21/88

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/956

摘要： A high sensitivity and high throughput surface inspection system directs a focused beam of light at a grazing angle towards the surface, to be inspected. Relative motion is caused between the beam and the surface so that the beam scans a scan path covering substantially the entire surface and light scattered along the path is collected for detecting anamolies. The scan path comprises a plurality of arrays of straight scan path segments. The focused beam of light illuminates an area of the surface between 5-15 microns in width and this system is capable of inspecting in excess of about 40 wafers per hour for 150 millimeter diameter wafers (6-inch wafers), in excess of about 20 wafers per hour for 200 millimeter diameter wafers (8-inch wafers) and in excess of about 10 wafers per hour for 300 millimeter diameter wafers (12-inch wafers).

摘要翻译： 高灵敏度和高通量的表面检查系统将聚焦光束以掠射角朝向表面引导，以进行检查。 在光束和表面之间产生相对运动，使得光束扫描覆盖基本上整个表面的扫描路径，并且收集沿着路径散射的光以便用于检测烟雾。 扫描路径包括多个直扫描路径段阵列。 聚焦光束照射宽度为5-15微米之间的表面区域，该系统能够对于150毫米直径的晶片（6英寸晶片）每小时检查超过约40个晶片，超过约20个 对于300毫米直径的晶片（12英寸晶圆），每小时200毫米直径晶圆（8英寸晶圆）的晶片每小时超过约10片。

公开(公告)号：US06673637B2

公开(公告)日：2004-01-06

申请号：US09956851

申请日：2001-09-20

申请人： Dan Wack ,  Ady Levy ,  Kyle A. Brown ,  Gary Bultman ,  Mehrdad Nikoonahad ,  John Fielden

发明人： Dan Wack ,  Ady Levy ,  Kyle A. Brown ,  Gary Bultman ,  Mehrdad Nikoonahad ,  John Fielden

IPC分类号： H01L2166

CPC分类号： G03F7/70708 ,  G01N21/211 ,  G01N21/47 ,  G01N21/636 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/646 ,  G01N2021/8825 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/70658 ,  G03F7/707 ,  H01J2237/31701 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a presence of macro defects and overlay of a specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

公开(公告)号：US06215551B1

公开(公告)日：2001-04-10

申请号：US09213022

申请日：1998-12-16

申请人： Mehrdad Nikoonahad ,  Stanley E. Stokowski

发明人： Mehrdad Nikoonahad ,  Stanley E. Stokowski

IPC分类号： G01N2188

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/956

摘要： A high sensitivity and high throughput surface inspection system directs a focused beam of light at a grazing angle towards the surface to be inspected. Relative motion is caused between the beam and the surface so that the beam scans a scan path covering substantially the entire surface and light scattered along the path is collected for detecting anamolies. The scan path comprises a plurality of arrays of straight scan path segments. The focused beam of light illuminates an area of the surface between 5-15 microns in width and this system is capable of inspecting in excess of about 40 wafers per hour for 150 millimeter diameter wafers (6-inch wafers), in excess of about 20 wafers per hour for 200 millimeter diameter wafers (8-inch wafers) and in excess of about 10 wafers per hour for 300 millimeter diameter wafers (12-inch wafers).

摘要翻译： 高灵敏度和高通量的表面检查系统将聚焦光束以掠射角度朝向要检查的表面。 在光束和表面之间产生相对运动，使得光束扫描覆盖基本上整个表面的扫描路径，并且收集沿着路径散射的光以便用于检测烟雾。 扫描路径包括多个直扫描路径段阵列。 聚焦光束照射宽度为5-15微米之间的表面区域，该系统能够对于150毫米直径的晶片（6英寸晶片）每小时检查超过约40个晶片，超过约20个 对于300毫米直径的晶片（12英寸晶圆），每小时200毫米直径晶圆（8英寸晶圆）的晶片每小时超过约10片。

公开(公告)号：US5883710A

公开(公告)日：1999-03-16

申请号：US499995

申请日：1995-07-10

申请人： Mehrdad Nikoonahad ,  Stanley E. Stokowski

发明人： Mehrdad Nikoonahad ,  Stanley E. Stokowski

IPC分类号： G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/956

摘要： A high sensitivity and high throughput surface inspection system directs a focused beam of light at a grazing angle towards the surface to be inspected. Relative motion is caused between the beam and the surface so that the beam scans a scan path covering substantially the entire surface and light scattered along the path is collected for detecting anamolies. The scan path comprises a plurality of arrays of straight scan path segments. The focused beam of light illuminates an area of the surface between 5-15 microns in width and this system is capable of inspecting in excess of about 40 wafers per hour for 150 millimeter diameter wafers (6-inch wafers), in excess of about 20 wafers per hour for 200 millimeter diameter wafers (8-inch wafers) and in excess of about 10 wafers per hour for 300 millimeter diameter wafers (12-inch wafers).

公开(公告)号：US5825482A

公开(公告)日：1998-10-20

申请号：US827859

申请日：1997-04-09

申请人： Mehrdad Nikoonahad ,  Charles E. Wayman

发明人： Mehrdad Nikoonahad ,  Charles E. Wayman

IPC分类号： G01B11/30 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/956 ,  G01N2021/8825

摘要： An optical surface inspection system is designed to correct for misregistration errors. A reference vector of data samples is obtained by computing an average of adjacent data sample vectors. A comparison of the data samples in a current vector being processed to data samples that may be offset from such current vector along the direction of the current vector enables the detection and correction of misregistration errors. Alternatively, a target array of data samples is compared to a reference array of data samples collected from a different portion of the surface with various offsets for detection and correction of misregistration errors. The intensity of the reflection from the inspection beam may be monitored to vary the intensity of the inspection beam so as to reduce the dynamic range of background scattering.

摘要翻译： 光学表面检查系统设计用于校正不对准误差。 通过计算相邻数据样本向量的平均值来获得数据样本的参考向量。 将正在处理的当前矢量中的数据样本与可能沿着当前矢量的方向偏离这种电流矢量的数据样本的比较使得能够检测和校正不对准误差。 或者，将目标数据样本阵列与从表面的不同部分收集的具有各种偏移的数据样本的参考阵列进行比较，以检测和校正不对准误差。 可以监视来自检查光束的反射强度以改变检查光束的强度，以便减小背景散射的动态范围。