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公开(公告)号：US07369703B2
公开(公告)日：2008-05-06
申请号：US11501843
申请日：2006-08-10
CPC分类号： G01N23/2251 , G01N21/95684 , G03F7/70616 , G06T7/0004 , G06T2207/30148 , H01J2237/2817
摘要： A system for measuring a pattern on a sample, including: a data processing system that processes a set of two-dimensional distribution data of intensities from the sample, to calculate: a set of edge points indicative of position of edges of the pattern in a two-dimensional plane from the two-dimensional distribution data; an approximation edge indicative of the edge of the pattern; an edge fluctuation data by calculating a difference between the set of edge points and the approximation edge; and a correlation between a first portion of the edge fluctuation data and a second portion of the edge fluctuation data.
摘要翻译： 一种用于测量样本上的图案的系统，包括：数据处理系统，处理来自样本的一组强度的二维分布数据，以计算：一组边缘点，其指示图案的边缘的位置 二维平面从二维分布数据; 指示图案的边缘的近似边缘; 通过计算边缘点集合和近似边缘之间的差异的边缘波动数据; 以及边缘波动数据的第一部分与边缘波动数据的第二部分之间的相关性。
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公开(公告)号：US07214937B2
公开(公告)日：2007-05-08
申请号：US11052809
申请日：2005-02-09
申请人： Katsuaki Abe , Osamu Komuro , Kenichi Nishigata
发明人： Katsuaki Abe , Osamu Komuro , Kenichi Nishigata
IPC分类号： H01J37/153 , G21K7/00
CPC分类号： G01N23/04 , G06T1/0007 , G06T2207/30148 , H01J37/265 , H01J2237/24585 , H01J2237/2487 , H01J2237/2817
摘要： In order to provide an electron microscope which enables the operator to position the field-of-view easily and accurately on a target fault, the electron microscope for observing a surface or inside of a semiconductor wafer or a mask for exposing a semiconductor pattern for faults and/or foreign objects, is provided comprising a function of loading measurement data of coordinates or sizes of faults or objects which were observed by another wafer or mask inspecting apparatus, moving the field of view of the electron microscope to the area where said fault or object exists, and displaying the coordinates of faults or objects which were obtained by another wafer or mask inspecting apparatus, the field-of-view of the electron microscope and its vicinity, a function of a pointing device switch which moves the field-of-view of the electron microscope to a position which is pointed to by a pointer on said display, and a function of changing the display as said field-of-view moves.
摘要翻译： 为了提供电子显微镜，能够使操作者在目标故障上容易且精确地定位视场，用于观察半导体晶片的表面或内部的电子显微镜或用于暴露半导体图案以用于故障的掩模 和/或异物被提供，其包括加载由另一晶片或掩模检查装置观察到的故障或物体的坐标或尺寸的测量数据的功能，将电子显微镜的视场移动到所述故障或 并且显示由另一个晶片或掩模检查装置获得的故障或物体的坐标，电子显微镜及其附近的视场，指示装置开关的功能， 电子显微镜的视图到由所述显示器上的指针指向的位置，以及当所述视场移动时改变显示的功能。
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53.发明授权Method for determining depression/protrusion of sample and charged particle beam apparatus therefor 有权用于确定样品和带电粒子束装置的凹陷/突起的方法公开(公告)号：US07166840B2
公开(公告)日：2007-01-23
申请号：US11056191
申请日：2005-02-14
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J2237/2815
摘要： A method for determining a depression/protrusion, especially of a line and space pattern formed on a sample, and an apparatus therefor. A charged particle beam is scanned with its direction being inclined to the original optical axis of the charged particle beam or a sample stage is inclined, broadening of a detected signal in a line scanning direction of the charged particle beam is measured, the broadening is compared with that when the charged particle beam is scanned with its direction being parallel to the original optical axis of the charged particle beam, and a depression/protrusion of the scanned portion is determined on the basis of increase/decrease of the broadening.
摘要翻译： 用于确定凹陷/突起的方法，特别是用于形成在样本上的线和空间图案及其装置。 扫描带电粒子束的方向与带电粒子束的原始光轴倾斜，或者样品台倾斜，测量带电粒子束的扫描方向上的检测信号的变宽，比较加宽 其中当带电粒子束的扫描方向平行于带电粒子束的原始光轴时，并且基于增宽的增加/减小来确定扫描部分的凹陷/突起。
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公开(公告)号：US20060269121A1
公开(公告)日：2006-11-30
申请号：US11501843
申请日：2006-08-10
IPC分类号： G06K9/00
CPC分类号： G01N23/2251 , G01N21/95684 , G03F7/70616 , G06T7/0004 , G06T2207/30148 , H01J2237/2817
摘要： A system for measuring a pattern on a sample, including: a data processing system that processes a set of two-dimensional distribution data of intensities from the sample, to calculate: a set of edge points indicative of position of edges of said pattern in a two-dimensional plane from said two-dimensional distribution data; an approximation edge indicative of the edge of the pattern; an edge roughness data by calculating a difference between the set of edge points and said approximation edge; and a correlation between a first portion of the edge roughness data and a second portion of the edge roughness data.
摘要翻译： 一种用于测量样本上的图案的系统，包括：数据处理系统，处理来自样本的一组强度的二维分布数据，以计算：一组指示所述图案的边缘位置的边缘点， 二维平面从所述二维分布数据; 指示图案的边缘的近似边缘; 通过计算所述一组边缘点和所述近似边缘之间的差异的边缘粗糙度数据; 以及边缘粗糙度数据的第一部分与边缘粗糙度数据的第二部分之间的相关性。
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公开(公告)号：US07095884B2
公开(公告)日：2006-08-22
申请号：US10071097
申请日：2002-02-11
IPC分类号： G06K9/00
CPC分类号： G01N23/2251 , G01N21/95684 , G03F7/70616 , G06T7/0004 , G06T2207/30148 , H01J2237/2817
摘要： The present invention provides a circuit pattern edge inspection method of finding out a failure in a fabricating process and image distortion in an observing apparatus by analyzing, by a non-destructive inspection, the shape of an edge of a line of a fine pattern in which characteristics of the material, process, and an exposure optical system in a semiconductor fabricating process appear, and performing analysis quantitatively. The method includes a step of detecting a set of edge points indicative of positions of edges of the pattern in a two-dimensional plane by a threshold method; a step of obtaining an approximation line for the set of edge points detected; and a step of obtaining an edge roughness shape and a characteristic by calculating the difference between the set of the edge points and the approximation line. A plurality of values are used as thresholds used for the threshold method.
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公开(公告)号：US20060145076A1
公开(公告)日：2006-07-06
申请号：US11322559
申请日：2006-01-03
申请人： Atsuko Yamaguchi , Hiroshi Fukuda , Osamu Komuro , Hiroki Kawada
发明人： Atsuko Yamaguchi , Hiroshi Fukuda , Osamu Komuro , Hiroki Kawada
IPC分类号： G21K7/00
CPC分类号： G01N23/2251
摘要： A quantity (or dispersion value) of a distribution of edge position due to random noise is expected to be reduced statistically to 1/N when N edge position data items are averaged. Using this property, the single page image is averaged in a vertical direction with various values of parameter S, and then the edge roughness index is calculated. The S-dependence of the edge roughness index is analyzed and a term of a dispersion value directly proportional to 1/S is determined as being due to noise.
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公开(公告)号：US20050211897A1
公开(公告)日：2005-09-29
申请号：US11066219
申请日：2005-02-28
IPC分类号： G01B15/00 , G01N23/00 , G01N23/225 , G21K7/00 , H01J37/28
CPC分类号： H01J37/222 , G01N23/225 , G03F7/70625 , H01J37/28 , H01J2237/24578 , H01J2237/2814
摘要： A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.
摘要翻译： 图案测量方法从使用电子显微镜拍摄的图像中出现的多个相同图案计算平均图案形状，并且将每个测量位置处的图案信息与平均图案信息进行比较以确定粗糙度。
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公开(公告)号：US20050145793A1
公开(公告)日：2005-07-07
申请号：US11052809
申请日：2005-02-09
申请人： Katsuaki Abe , Osamu Komuro , Kenichi Nishigata
发明人： Katsuaki Abe , Osamu Komuro , Kenichi Nishigata
CPC分类号： G01N23/04 , G06T1/0007 , G06T2207/30148 , H01J37/265 , H01J2237/24585 , H01J2237/2487 , H01J2237/2817
摘要： In order to provide an electron microscope which enables the operator to position the field-of-view easily and accurately on a target fault, the electron microscope for observing a surface or inside of a semiconductor wafer or a mask for exposing a semiconductor pattern for faults and/or foreign objects, is provided comprising a function of loading measurement data of coordinates or sizes of faults or objects which were observed by another wafer or mask inspecting apparatus, moving the field of view of the electron microscope to the area where said fault or object exists, and displaying the coordinates of faults or objects which were obtained by another wafer or mask inspecting apparatus, the field-of-view of the electron microscope and its vicinity, a function of a pointing device switch which moves the field-of-view of the electron microscope to a position which is pointed to by a pointer on said display, and a function of changing the display as said field-of-view moves.
摘要翻译： 为了提供电子显微镜，能够使操作者在目标故障上容易且精确地定位视场，用于观察半导体晶片的表面或内部的电子显微镜或用于暴露半导体图案以用于故障的掩模 和/或异物被提供，其包括加载由另一晶片或掩模检查装置观察到的故障或物体的坐标或尺寸的测量数据的功能，将电子显微镜的视场移动到所述故障或 并且显示由另一个晶片或掩模检查装置获得的故障或物体的坐标，电子显微镜及其附近的视场，指示装置开关的功能， 电子显微镜的视图到由所述显示器上的指针指向的位置，以及当所述视场移动时改变显示的功能。
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公开(公告)号：US20050109937A1
公开(公告)日：2005-05-26
申请号：US10933342
申请日：2004-09-03
申请人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
发明人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
IPC分类号： H01L21/66 , G01N23/04 , G01Q10/00 , G01Q20/00 , G01Q30/02 , G01Q30/04 , G21K7/00 , H01J37/22 , H01J37/28 , G01N23/00
CPC分类号： H01J37/28 , G01N23/04 , G01N23/225 , G06T7/74 , G06T2207/10056 , G06T2207/30148 , H01J37/222 , H01J2237/2817
摘要： An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.
摘要翻译： 本发明的目的是提供一种用于减少与检查定位或输入操作相关的处理的扫描电子显微镜，从而以高速度高精度地运行。 为了实现上述目的，本发明提供了一种扫描电子显微镜，其具有基于预先登记的图案来识别期望位置的功能，该扫描电子显微镜包括用于设置关于图案种类的信息的装置，多个部分之间的间隔 构成图案的部分，以及构成图案的部分的尺寸，以及基于由相关装置获得的信息形成由多个部分组成的图案图像的装置。
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公开(公告)号：US06803573B2
公开(公告)日：2004-10-12
申请号：US10615864
申请日：2003-07-10
申请人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
发明人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
IPC分类号： H01J3728
CPC分类号： H01J37/28 , G01N23/04 , G01N23/225 , G06T7/74 , G06T2207/10056 , G06T2207/30148 , H01J37/222 , H01J2237/2817
摘要： An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.
摘要翻译： 本发明的目的是提供一种用于减少与检查定位或输入操作相关的处理的扫描电子显微镜，从而以高速度高精度地运行。 为了实现上述目的，本发明提供了一种扫描电子显微镜，其具有基于预先登记的图案来识别期望位置的功能，该扫描电子显微镜包括用于设置关于图案种类的信息的装置，多个部分之间的间隔 构成图案的部分，以及构成图案的部分的尺寸，以及基于由相关装置获得的信息形成由多个部分组成的图案图像的装置。
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