DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20240306470A1

    公开(公告)日:2024-09-12

    申请号:US18408087

    申请日:2024-01-09

    CPC classification number: H10K59/80518 H10K59/80515 H10K71/60 H10K2102/101

    Abstract: A display panel includes: a base layer including a display region and a non-display region, where the display region has a first light-emitting region, a second light-emitting region, and a non-light-emitting region; a first lower electrode disposed on the base layer and overlapping the first light-emitting region; a second lower electrode disposed on the base layer and overlapping the second light-emitting region; and a filling layer disposed on the base layer and between the first lower electrode and the second lower electrode. The filling layer includes an inorganic material containing silicon and an organic material, and covers at least a portion of a side surface of each of the first lower electrode and the second lower electrode.

    DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20240172483A1

    公开(公告)日:2024-05-23

    申请号:US18454908

    申请日:2023-08-24

    Abstract: A display panel includes a base layer, a pixel definition layer disposed on the base layer and including a first light emitting opening passing through the pixel definition layer, a bank disposed on the pixel definition layer and including a first bank opening passing through the bank and overlapping the first light emitting opening, and a first light emitting element disposed in the first bank opening and including a first anode including at least a portion exposed through the first light emitting opening, a first cathode that is in contact with the bank, and a first light emitting pattern layer disposed between the first anode and the first cathode. The bank includes a first layer including an AlNiLa alloy and a second layer disposed on the first layer and including a MoTa alloy oxide.

    SPUTTERING TARGET AND SPUTTERING APPARATUS INCLUDING THE SAME

    公开(公告)号:US20240084441A1

    公开(公告)日:2024-03-14

    申请号:US18132420

    申请日:2023-04-10

    Abstract: A sputtering target includes a first target part and a second target part both including a metal oxide and adjacent to each other and a target dividing part disposed between a first target part and a second target part. The target dividing part includes a same metal element as a metal element included in a first target part and a second target part. Therefore, size and/or length of the sputtering target may be increased. Thus, efficiency of a manufacturing process of the sputtering target is improved and a manufacturing cost is reduced. In addition, even after a thin film is deposited on a target substrate using the sputtering target, stains caused by sputtering of non-uniform amounts of metal elements by location on the target substrate do not occur on a target substrate. In addition, the uniformity of a thin film deposited on a target substrate is secured by using the sputtering target. Thus, process quality of a sputtering process is improved.

    DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE

    公开(公告)号:US20220157925A1

    公开(公告)日:2022-05-19

    申请号:US17398336

    申请日:2021-08-10

    Abstract: A display device includes an active layer in a display area, a first gate insulation layer on the active layer, a first gate line on the first gate insulation layer in the display area, a first signal line in the same layer as the first gate line in a non-display area and including the same material as that of the first gate line including molybdenum, a second gate insulation layer on the first gate line and the first signal line, a second gate line on the second gate insulation layer in the display area, and a second signal line in the same layer as the second gate line in the non-display area and including the same material as that of the second gate line including aluminum or an aluminum alloy. A width of the first signal line is greater than a width of the second signal line.

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