Image Forming System and Post-Processing Apparatus
    52.
    发明申请
    Image Forming System and Post-Processing Apparatus 审中-公开
    图像形成系统和后处理装置

    公开(公告)号:US20110033217A1

    公开(公告)日:2011-02-10

    申请号:US12905378

    申请日:2010-10-15

    IPC分类号: G03G15/00

    CPC分类号: G03G15/55 H04N2201/0094

    摘要: There is described an image forming system, which confirms a finished state of an image at any time during the implementation of the image forming job as needed. The system includes: an image forming section to respectively form images on recording materials; a stacking section to stack the recording materials continuously ejected from the image forming section; an instruction inputting section from which an operator inputs instruction information; an ejecting section to stack a part of the recording materials in such a manner that the operator can pick up stacked recording materials by hand; a controlling section to conduct controlling operations in response to the instruction information, inputted from the instruction inputting section during an implementation of an image forming job including an operation for stacking the recording materials ejected from the image forming section, in order to eject the part of the recording materials onto the ejecting section.

    摘要翻译: 描述了一种图像形成系统,其在根据需要执行图像形成作业期间的任何时间确认图像的完成状态。 该系统包括:图像形成部分,分别在记录材料上形成图像; 堆叠部分,堆叠从图像形成部分连续喷射的记录材料; 指令输入部,操作者从该指令输入部输入指示信息; 弹出部,其以使得操作者可以用手拾取堆叠的记录材料的方式堆叠一部分记录材料; 控制部分,用于在执行包括从图像形成部分排出的记录材料的堆叠操作的图像形成作业的实施期间从指令输入部分输入的指令信息进行控制操作,以便喷射部分 记录材料到喷射部分上。

    TRANSPARENT ELECTROCONDUCTIVE OXIDE LAYER AND PHOTOELECTRIC CONVERTER USING THE SAME
    53.
    发明申请
    TRANSPARENT ELECTROCONDUCTIVE OXIDE LAYER AND PHOTOELECTRIC CONVERTER USING THE SAME 失效
    透明电极氧化层和光电转换器

    公开(公告)号:US20110011461A1

    公开(公告)日:2011-01-20

    申请号:US12921657

    申请日:2009-03-13

    摘要: The present invention provides a transparent electroconductive oxide layer having a high transmittance and a high electroconductivity and further a thin-film photoelectric converter having a high photoelectric conversion efficiency by applying the transparent electroconductive oxide layer to a transparent electrode layer of a photoelectric converter. The transparent electroconductive oxide layer in the present invention is deposited on a transparent substrate with a first and a second impurities contained in the transparent electroconductive oxide layer, especially in the vicinity of a surface of the layer in a higher concentration, and carbon atoms contained in the vicinity of the surface of the layer, thereby achieving a high transmittance and a high electroconductivity simultaneously and thus solving the problem.

    摘要翻译: 本发明通过将透明导电氧化物层施加到光电转换器的透明电极层,提供了具有高透射率和高导电性的透明导电氧化物层,并且还提供了具有高光电转换效率的薄膜光电转换器。 本发明中的透明导电氧化物层沉积在透明基板上,其中第一和第二杂质包含在透明导电氧化物层中,特别是在较高浓度的层的表面附近,并且包含在 层的表面附近,从而同时实现高透射率和高导电性,从而解决问题。

    IMAGING DEVICE
    54.
    发明申请
    IMAGING DEVICE 有权
    成像装置

    公开(公告)号:US20100283884A1

    公开(公告)日:2010-11-11

    申请号:US12767482

    申请日:2010-04-26

    IPC分类号: H04N5/225

    摘要: Disclosed herein is an imaging device including: an imaging lens configured to have an aperture stop; an imaging element configured to include a plurality of pixels two-dimensionally arranged along a longitudinal direction and a lateral direction and acquire imaging data based on received light; and a microlens array configured to be disposed between the imaging lens and the imaging element and include a plurality of microlenses, a pixel area composed of m×n pixels (m and n denote a number equal to or larger than 2 in the longitudinal direction and the lateral direction) in the imaging element being assigned to a respective one of the microlenses, wherein positional displacement smaller than a width of one pixel is set between the microlens and the pixel area.

    摘要翻译: 本文公开了一种成像装置,包括:成像透镜,被配置为具有孔径光阑; 成像元件,被配置为包括沿着纵向方向和横向两维地排列的多个像素,并且基于接收的光获取成像数据; 以及微透镜阵列,被配置为设置在所述成像透镜和所述成像元件之间并且包括多个微透镜,由m×n个像素构成的像素区域(m和n表示在纵向方向上等于或大于2的数量, 成像元件中的横向方向)分配给微透镜中的相应一个,其中在微透镜和像素区域之间设置小于一个像素的宽度的位置位移。

    IMAGING DEVICE
    55.
    发明申请
    IMAGING DEVICE 有权
    成像装置

    公开(公告)号:US20100265381A1

    公开(公告)日:2010-10-21

    申请号:US12757520

    申请日:2010-04-09

    IPC分类号: H04N5/225

    摘要: Disclosed herein is an imaging device, including: an imaging lens having an aperture stop; an imaging element adapted to obtain image data based on received light; and a microlens array provided in the focal plane of the imaging lens between the imaging lens and imaging element, the microlens array including a plurality of microlenses arranged in such a manner that each microlens is associated with a plurality of imaging pixels of the imaging element, wherein the arrangement of the microlenses of the microlens array is corrected from an equidistant arrangement to a non-linear arrangement according to the height of the image from the imaging lens on the imaging element.

    摘要翻译: 本文公开了一种成像装置,包括:具有孔径光阑的成像透镜; 适于基于接收到的光获得图像数据的成像元件; 以及设置在成像透镜和成像元件之间的成像透镜的焦平面中的微透镜阵列,所述微透镜阵列包括以使得每个微透镜与所述成像元件的多个成像像素相关联的方式布置的多个微透镜, 其中根据成像元件上的成像透镜的图像的高度,将微透镜阵列的微透镜的布置从等距布置校正为非线性排列。

    COLD-WORK DIE STEEL AND DIE
    57.
    发明申请
    COLD-WORK DIE STEEL AND DIE 审中-公开
    冷轧DIE钢和DIE

    公开(公告)号:US20100135844A1

    公开(公告)日:2010-06-03

    申请号:US12598328

    申请日:2008-09-18

    IPC分类号: C22C38/42 C22C38/60 B21D37/00

    摘要: The present invention relates to a cold-work die steel, comprising by mass %: 0.5 to 0.7% of C; 0.5 to 2.0% of Si; 0.1 to 2.0% of Mn; 5 to 7% of Cr; 0.01 to 1.0% of Al; 0.003 to 0.025% of N; 0.25 to 1% of Cu; 0.25 to 1% of Ni; 0.5 to 3% of Mo; 2% or less (including 0%) of W; and 0.1% or less (excluding 0%) of S, with a remainder being iron and an unavoidable impurity; wherein the following requirements (1) to (3) are satisfied: (1) [Cr]×[C]≦4; (2) [Al]/[N]: 1 to 30; and (3) [Mo]+0.5×[W]: 0.5 to 3.00%, wherein the bracket means a content (%) of an element written therein.

    摘要翻译: 冷加工模具钢本发明涉及一种冷作模具钢,其质量%为C:0.5〜0.7% 0.5〜2.0%的Si; 0.1〜2.0%的Mn; 5〜7%的Cr; 0.01〜1.0%的Al; 0.003〜0.025%N; 0.25〜1%的Cu; 0.25〜1%的Ni; 0.5〜3%的Mo; 2%以下(含0%)W; 和0.1%以下(不含0%)的S,余量为铁和不可避免的杂质; 其中满足以下要求(1)至(3):(1)[Cr]×[C]≦̸ 4; (2)[Al] / [N]:1〜30; 和(3)[Mo] + 0.5×[W]:0.5〜3.00%,其中支架表示写入其中的元素的含量(%)。

    Semiconductor Device, and Power Source and Processor Provided with the Same
    59.
    发明申请
    Semiconductor Device, and Power Source and Processor Provided with the Same 有权
    半导体器件及其提供的电源和处理器

    公开(公告)号:US20100109752A1

    公开(公告)日:2010-05-06

    申请号:US12594038

    申请日:2008-11-06

    申请人: Kenji Yamamoto

    发明人: Kenji Yamamoto

    IPC分类号: H01L35/00

    摘要: A semiconductor device includes: a transistor having a first electrode coupled to a first power source node to which a first power source voltage is supplied, and a second electrode, and supplying a reference current to a temperature detection element; a diffused resistor including a first semiconductor region having a potential-fixing node coupled to the first power source node, and a second semiconductor region having a first resistor node coupled to the second electrode of the transistor and a second resistor node coupled to a second power source node to which a second power source voltage is supplied, and formed at a surface of the first semiconductor region; and a leakage current correction circuit for allowing a current having approximately the same magnitude and the same direction as a magnitude and a direction of a current flowing via the potential-fixing node and the second resistor node, to flow not via the diffused resistor but via the transistor.

    摘要翻译: 半导体器件包括:晶体管,其具有耦合到提供第一电源电压的第一电源节点的第一电极和第二电极,并将参考电流提供给温度检测元件; 扩散电阻器,其包括具有耦合到第一电源节点的电位固定节点的第一半导体区域和具有耦合到晶体管的第二电极的第一电阻器节点的第二半导体区域和耦合到第二电力的第二电阻器节点 源极节点,其被提供有第二电源电压,并形成在第一半导体区域的表面处; 以及泄漏电流校正电路,用于允许具有与经由电位固定节点和第二电阻器节点流动的电流的大小和方向大致相同的大小和相同方向的电流不经由扩散电阻器流过,而是经由 晶体管。

    Hard film and hard film-coated tool
    60.
    发明授权
    Hard film and hard film-coated tool 有权
    硬膜和硬膜涂层工具

    公开(公告)号:US07695829B2

    公开(公告)日:2010-04-13

    申请号:US11774990

    申请日:2007-07-09

    IPC分类号: B23B27/14

    CPC分类号: C23C30/005

    摘要: A hard coating film to be applied to the surface of a tool, said hard coating film having a composition represented by the formula Al1-a-b-cSiaMgbMc(BxCyNz), where M denotes at least one species of elements selected from Nb, V, Zr, Cr, Ti, Cu, and Y, and a, b, c, x, y, and z represent atomic ratios such that 0≦a≦0.35, 0≦b≦0.2, 0.03≦a+b≦0.5, 0≦c≦0.1, 0.9≦Al+Si+Mg, 0≦x≦0.2, 0≦y≦0.4, 0.5≦z≦1, and x+y+z=1. A tool coated with the hard coating film defined above. The hard coating film has excellent wear resistance owing to its improved hardness, oxidation resistance, and toughness. It is used for coating on a tool to improve wear resistance.

    摘要翻译: 一种施加到工具表面的硬涂层,所述硬涂层具有由式Al1-ab-cSiaMgbMc(BxCyNz)表示的组成,其中M表示选自Nb,V,Zr中的至少一种元素 ,Cr,Ti,Cu和Y,以及a,b,c,x,y和z表示0和nlE; a≦̸ 0.35,0和nlE; b≦̸ 0.2,0.03和nlE; a + b≦̸ 0.5,0& ; c≦̸ 0.1,0.9≦̸ Al + Si + Mg,0≦̸ x< lE; 0.2,0和nlE; y≦̸ 0.4,0.5& nlE; z≦̸ 1和x + y + z = 1。 涂有上述硬涂层的工具。 硬涂层由于其硬度,抗氧化性和韧性的改善而具有优异的耐磨性。 它用于在工具上涂层以提高耐磨性。