Three-dimensional resonant cells with tilt up fabrication
    52.
    发明授权
    Three-dimensional resonant cells with tilt up fabrication 有权
    具有倾斜制造的三维谐振单元

    公开(公告)号:US07545014B2

    公开(公告)日:2009-06-09

    申请号:US11580385

    申请日:2006-10-12

    IPC分类号: H01L31/00

    CPC分类号: H01Q15/0086 H01Q3/44

    摘要: A composite material for providing at least one of a negative effective permeability and a negative effective permittivity for incident radiation of at least one wavelength is described. The composite material comprises a plurality of three-dimensional resonant cells disposed across a first substrate. Each three-dimensional resonant cell comprises a base substantially parallel to the substrate and at least three sidewalls upwardly extending therefrom. Each upwardly extending sidewall comprises a sidewall substrate having at least one conductor patterned thereon. Each upwardly extending sidewall is fabricated by forming the sidewall substrate as a substantially horizontal layer above the first substrate, lithographically patterning the sidewall substrate with the at least one conductor while horizontally disposed above the first substrate, and tilting up the sidewall substrate to the upwardly extending position.

    摘要翻译: 描述了用于为至少一个波长的入射辐射提供负有效磁导率和负有效介电常数中的至少一个的复合材料。 复合材料包括跨越第一基板设置的多个三维谐振单元。 每个三维谐振单元包括基本上平行于基板的基座和从其向上延伸的至少三个侧壁。 每个向上延伸的侧壁包括具有图案化的至少一个导体的侧壁基板。 每个向上延伸的侧壁通过将侧壁基底形成为在第一基底之上的基本上水平的层来制造,在水平地设置在第一基底之上的情况下,利用至少一个导体光刻地图案化侧壁基底,并且将侧壁基底向上延伸 位置。

    MEMS device with nanowire standoff layer
    53.
    发明授权
    MEMS device with nanowire standoff layer 有权
    具有纳米线隔离层的MEMS器件

    公开(公告)号:US07477441B1

    公开(公告)日:2009-01-13

    申请号:US11881076

    申请日:2007-07-24

    IPC分类号: G02B26/00 G02B26/08

    摘要: A microelectromechanical systems (MEMS) device and related methods are described. The MEMS device comprises a first member having a first surface and a second member having a second surface, the first and second surfaces being separated by a gap that is closable by a MEMS actuation force applied to at least one of the first and second members. A standoff layer is disposed on the first surface of the first member, the standoff layer providing standoff between the first and second surfaces upon a closing of the gap by the MEMS actuation force. The standoff layer comprises a plurality of nanowires that are anchored to the first surface of the first member and that extend outward therefrom.

    摘要翻译: 描述了微机电系统(MEMS)装置及相关方法。 MEMS装置包括具有第一表面的第一构件和具有第二表面的第二构件,第一和第二表面被可由施加到第一和第二构件中的至少一个的MEMS致动力封闭的间隙分开。 隔离层设置在第一构件的第一表面上,间隔层通过MEMS致动力在间隙闭合时在第一和第二表面之间提供间隔。 隔离层包括锚定到第一构件的第一表面并从其向外延伸的多个纳米线。

    Optical Waveguide
    54.
    发明申请
    Optical Waveguide 有权
    光波导

    公开(公告)号:US20080253727A1

    公开(公告)日:2008-10-16

    申请号:US11786519

    申请日:2007-04-11

    申请人: Wei Wu Shih-Yuan Wang

    发明人: Wei Wu Shih-Yuan Wang

    IPC分类号: G02B6/10 C03B37/022

    摘要: An optical waveguide and method of making are disclosed. The method of making includes forming a layer on a substrate of a substantially optically transparent material. The layer includes an inner area and an outer area. A sufficient number of voids can be created in the inner area to form a first index of refraction. A plurality of the voids have a dimension that is less than a wavelength of the light beam. A sufficient number of voids can be created in the outer area to form a second index of refraction less than the first index.

    摘要翻译: 公开了一种光波导及其制造方法。 制造方法包括在基本上光学透明的材料的基底上形成层。 该层包括内部区域和外部区域。 可以在内部区域中产生足够数量的空隙以形成第一折射率。 多个空隙的尺寸小于光束的波长。 可以在外部区域中产生足够数量的空隙以形成小于第一索引的第二折射率。

    Alignment for contact lithography
    56.
    发明申请
    Alignment for contact lithography 审中-公开
    接触光刻对准

    公开(公告)号:US20080020303A1

    公开(公告)日:2008-01-24

    申请号:US11492502

    申请日:2006-07-24

    IPC分类号: G03F9/00

    摘要: A contact lithography system includes a patterning tool having a pattern for transfer to a substrate; and at least one alignment device coupled to the patterning tool. The alignment device is configured to measure alignment between the patterning tool and a substrate for receiving the pattern of the patterning tool. A contact lithography method includes aligning a patterning tool having a pattern for transfer with a substrate for receiving the pattern of the patterning tool using at least one alignment device coupled to the patterning tool.

    摘要翻译: 接触光刻系统包括具有用于转移到衬底的图案的图案形成工具; 以及耦合到图案形成工具的至少一个对准装置。 对准装置被配置为测量图案形成工具与用于接收图案形成工具的图案的衬底之间的对准。 接触式光刻方法包括使具有与图案形成工具连接的至少一个对准装置对准具有用于转印的图案的图案形成工具与基板接收图案形成工具的图案。

    Integrated circuit device with optically coupled layers
    57.
    发明申请
    Integrated circuit device with optically coupled layers 审中-公开
    具有光耦合层的集成电路器件

    公开(公告)号:US20060285799A1

    公开(公告)日:2006-12-21

    申请号:US11158660

    申请日:2005-06-21

    IPC分类号: G02B6/26

    摘要: Optical coupling between a first waveguide in a first layer of an integrated circuit device and a second waveguide in a second layer of the integrated circuit device vertically separated from the first layer is described. An optical signal is propagated through a spheroidal element optically coupled to each of the first and second waveguides and positioned between the first and second layers.

    摘要翻译: 描述了集成电路器件的第一层中的第一波导与第一层垂直分离的集成电路器件的第二层中的第二波导之间的光耦合。 光信号通过光学耦合到第一和第二波导中的每一个并且位于第一和第二层之间的球状元件传播。