公开(公告)号：US20060146305A1

公开(公告)日：2006-07-06

申请号：US11366743

申请日：2006-03-03

申请人： Nobutaka Magome ,  Naoyuki Kobayashi

发明人： Nobutaka Magome ,  Naoyuki Kobayashi

IPC分类号： G03B27/42

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70525 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/709

摘要： An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate via a projection optical system and a liquid. The exposure device has a liquid supply mechanism which supplies the liquid between the projection optical system and the substrate. The liquid feeding mechanism stops the supply of the liquid when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.

公开(公告)号：US20060098178A1

公开(公告)日：2006-05-11

申请号：US11312477

申请日：2005-12-21

申请人： Hiroyuki Nagasaka ,  Nobutaka Magome

发明人： Hiroyuki Nagasaka ,  Nobutaka Magome

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/709

摘要： A liquid immersion photolithography system has an exposure system that exposes an exposure area on a substrate with electromagnetic radiation and includes a projection optical system. In addition, a liquid flow is provided between the projection optical system and the exposure area. Further, a member at one side of the projection optical system provides the liquid flow having a desired velocity profile when the liquid flow is present in the exposure area.

摘要翻译： 液浸光刻系统具有利用电磁辐射曝光在基板上的曝光区域的曝光系统，并且包括投影光学系统。 此外，在投影光学系统和曝光区域之间提供液体流。 此外，当投影光学系统的一侧存在液体流动时，在投影光学系统的一侧的构件提供具有所需速度分布的液体流。

公开(公告)号：US20050237504A1

公开(公告)日：2005-10-27

申请号：US11147373

申请日：2005-06-08

申请人： Hiroyuki Nagasaka ,  Nobutaka Magome

发明人： Hiroyuki Nagasaka ,  Nobutaka Magome

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/709

摘要： In an exposure apparatus, an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system (PL) and the substrate (P) with a liquid (50) and projecting the image of a pattern onto the substrate (P) via the projection optical system (PL). An optical element (60) and a barrel (PK), which are in contact with the liquid (50) when the substrate (P) is moved, are surface-treated for adjusting the affinity with the liquid (50). Consequently, generation of bubbles in the liquid between the projection optical system and the substrate is suppressed and the liquid is always retained between the projection optical system and the substrate, thereby creating a good immersion state.

摘要翻译： 在曝光装置中，通过用液体（50）填充投影光学系统（PL）和基板（P）之间的至少一部分空间来进行基板（P）的曝光，并投影图像 通过投影光学系统（PL）将衬底（P）上的图案。 在移动衬底（P）时与液体（50）接触的光学元件（60）和镜筒（PK）进行表面处理以调节与液体（50）的亲和性。 因此，抑制投影光学系统和基板之间的液体中的气泡的产生，并且液体始终保持在投影光学系统和基板之间，从而形成良好的浸没状态。

公开(公告)号：US20050225735A1

公开(公告)日：2005-10-13

申请号：US11147356

申请日：2005-06-08

申请人： Nobutaka Magome ,  Hiroaki Takaiwa ,  Dai Arai

发明人： Nobutaka Magome ,  Hiroaki Takaiwa ,  Dai Arai

IPC分类号： G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70991 ,  G03F7/70341 ,  G03F7/7075 ,  Y10S430/146

摘要： An exposure apparatus which performs an exposure while filling a space between a projection optical system and a substrate with liquid, and in which deterioration of a device caused by adherent liquid on the substrate is suppressed is provided. A device manufacturing system (SYS) includes a main body of an exposure apparatus (EX) which fills a space between a projection optical system (PL) and a substrate (P) with a liquid (50) and projects an image of a pattern onto the substrate (P) via the projection optical system (PL) and the liquid (50); an interface section (IF) arranged between the exposure apparatus main body (EX) and a coater/developer main body (C/D) which processes the substrate (P) after exposure; and a liquid-removing unit (100) which removes the liquid (50) adhering to the substrate (P) before the exposed substrate (P) is transferred into the coater/developer main body (C/D) through the interface section (IF).

摘要翻译： 提供了一种曝光装置，其在用液体填充投影光学系统和基板之间的空间的同时进行曝光，并且其中抑制了由基板上的粘附液体引起的装置的劣化。 装置制造系统（SYS）包括曝光装置（EX）的主体，其用液体（50）填充投影光学系统（PL）和基板（P）之间的空间，并将图案的图像投影到 所述基板（P）经由所述投影光学系统（PL）和所述液体（50）; 布置在曝光装置主体（EX）和曝光后处理基板的涂布机/显影剂主体（C / D）之间的接口部分（IF） 以及在暴露的基板（P）通过界面部分（IF）传送到涂布机/显影剂主体（C / D）之前，去除粘附到基板（P）上的液体（50）的液体去除单元（100） ）。

公开(公告)号：US06876946B2

公开(公告)日：2005-04-05

申请号：US10299819

申请日：2002-11-20

申请人： Masahiko Yasuda ,  Osamu Furukawa ,  Masaharu Kawakubo ,  Hiroki Tateno ,  Nobutaka Magome

发明人： Masahiko Yasuda ,  Osamu Furukawa ,  Masaharu Kawakubo ,  Hiroki Tateno ,  Nobutaka Magome

IPC分类号： G03F9/00 ,  G03B27/42

CPC分类号： G03F9/7003

摘要： A method of transferring a pattern of a mask onto shot areas on a substrate determines two sets of parameters in a single model equation. The parameters in one of the two sets relate to arrangement of a plurality of shot areas on the substrate, and the parameters in the other set relate to the shot areas per se. The mask and the substrate are moved relatively in accordance with the determined parameters.

摘要翻译： 将掩模的图案转移到基板上的拍摄区域的方法在单个模型方程式中确定两组参数。 两组之一中的参数涉及衬底上的多个照射区域的布置，而另一组中的参数涉及拍​​摄区域本身。 掩模和基板根据确定的参数相对移动。

公开(公告)号：US6124933A

公开(公告)日：2000-09-26

申请号：US19565

申请日：1998-02-06

申请人： Hideo Mizutani ,  Naoyuki Kobayashi ,  Nobutaka Magome

发明人： Hideo Mizutani ,  Naoyuki Kobayashi ,  Nobutaka Magome

IPC分类号： G01B11/26 ,  G01B11/00 ,  G01B11/02 ,  G01C3/06 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/14

CPC分类号： G03F9/7026 ,  G01B11/026 ,  G03F7/70358

摘要： In an exposure apparatus and method utilizing a projection system, a surface state relating to an exposure area of the projection system is determined by illuminating the exposure area with light, receiving light from the exposure area, designating positions of a plurality of detection points in the exposure area in accordance with a size of the exposure area, and detecting, based on information of received light corresponding to the plurality of detection points, positions related to the plurality of detection points.

摘要翻译： 在利用投影系统的曝光装置和方法中，通过用光照射曝光区域来确定与投影系统的曝光区域相关的表面状态，从曝光区域接收光，指定多个检测点的位置 曝光区域，并且根据与所述多个检测点对应的接收光的信息，检测与所述多个检测点相关的位置。

公开(公告)号：US5801835A

公开(公告)日：1998-09-01

申请号：US940818

申请日：1997-09-30

申请人： Hideo Mizutani ,  Naoyuki Kobayashi ,  Nobutaka Magome

发明人： Hideo Mizutani ,  Naoyuki Kobayashi ,  Nobutaka Magome

IPC分类号： G01B11/26 ,  G01B11/00 ,  G01B11/02 ,  G01C3/06 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/14

CPC分类号： G03F9/7026 ,  G01B11/026 ,  G03F7/70358

摘要： In an apparatus and method for surface position detection, a position of a detection surface is determined by illuminating the detection surface with detection light, receiving detection light from the detection surface, designating different parts of the detection surface in accordance with a structure within an illuminated area on the detection surface, and detecting, based on information of the received light and information of the designated parts of the detection surface, positions corresponding to the designated parts of the detection surface.

摘要翻译： 在用于表面位置检测的装置和方法中，通过用检测光照射检测面来确定检测表面的位置，接收来自检测表面的检测光，根据照明中的结构指定检测表面的不同部分 并且根据所接收的光的信息和检测表面的指定部分的信息，检测与检测表面的指定部分相对应的位置。

公开(公告)号：US5118953A

公开(公告)日：1992-06-02

申请号：US528244

申请日：1990-05-24

申请人： Kazuya Ota ,  Nobutaka Magome ,  Hideo Mizutani ,  Kouichiro Komatsu

发明人： Kazuya Ota ,  Nobutaka Magome ,  Hideo Mizutani ,  Kouichiro Komatsu

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7065 ,  G03F9/7049

摘要： An alignment apparatus is provided with a first beam receiving device arranged to receive an interference beam which is produced at a diffraction grating of a substrate as a result of illumination with a pair of beams which intersect each other on the substrate, and a second beam receiving device arranged to receive a reference beam which is produced by the interference between regularly reflected beams of the pair of beams occurring on the substrate, wherein the positional offset of the substrate is obtained on the basis of a comparison between the output signal of the first beam receiving device and the output signal of the second beam receiving device. Since a beam transmitting path for transmitting a measurement beam is substantially common to a beam transmitting path for a reference beam, even if the fluctuations of air occur, both the measurement beam and the reference beam substantially equally reflect the influence of the fluctuations, whereby it is possible to cancel the same.

摘要翻译： 对准装置设置有第一光束接收装置，该第一光束接收装置被布置成接收在基板的衍射光栅处产生的干涉光束，所述干涉光束是由于在基板上彼此相交的一对光束照明的结果而产生的，并且第二光束接收 该设备被布置为接收由基板上出现的一对光束的规则反射光束之间的干涉产生的参考光束，其中基于第一光束的输出信号之间的比较获得基板的位置偏移 接收装置和第二光束接收装置的输出信号。 由于用于发送测量光束的光束传输路径对于参考光束的光束传输路径基本上是共同的，所以即使发生空气的波动，测量光束和参考光束都基本上等同地反映了波动的影响，由此 有可能取消相同的。

公开(公告)号：US4739373A

公开(公告)日：1988-04-19

申请号：US929078

申请日：1986-11-07

申请人： Kenji Nishi ,  Nobutaka Magome

发明人： Kenji Nishi ,  Nobutaka Magome

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68 ,  G03B27/42

CPC分类号： G03F9/70

摘要： A projection exposure apparatus of the type which employs an alignment light of the same wavelength as an exposure light and includes an optical system subjected to correction of chromatic aberration for the exposure light so as to simultaneously observe an alignment area on a reticle and an alignment area on a photosensitive substrate to bring the reticle and the photosensitive substrate into alignment. The apparatus includes light source means for emitting light of a wavelength different from that of the exposure light and capable of sensitizing the photosensitive substrate, and optical means for introducing the light source means into the optical system to project it on to the alignment area on the photosensitive substrate through the alignment area on the reticle.

摘要翻译： 一种投影曝光装置，其采用与曝光光相同波长的取向光，并且包括对曝光光进行色差校正的光学系统，以便同时观察掩模版上的取向区域和取向区域 在感光基板上，使掩模版和感光基片对准。 该装置包括用于发射波长与曝光光不同的光并能使感光基片敏化的光源装置，以及用于将光源装置引入光学系统的光学装置，将其投影到对准区域上 感光基板通过掩模版上的对准区域。

公开(公告)号：US08451424B2

公开(公告)日：2013-05-28

申请号：US11338661

申请日：2006-01-25

申请人： Nobutaka Magome ,  Naoyuki Kobayashi ,  Yasuyuki Sakakibara ,  Hiroaki Takaiwa ,  Hisatsune Kadota

发明人： Nobutaka Magome ,  Naoyuki Kobayashi ,  Yasuyuki Sakakibara ,  Hiroaki Takaiwa ,  Hisatsune Kadota

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70525 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/709

摘要： An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a pattern on the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure device (EX) has a liquid supply mechanism (10) which supplies the liquid (1) between the projection optical system (PL) and the substrate (P). The liquid feeding mechanism (10) stops the supply of the liquid (1) when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.

摘要翻译： 曝光装置（EX）通过投影光学系统（PL）和液体（1）将基板（P）上的图案的图像投射到基板（P）上。 曝光装置（EX）具有在投影光学系统（PL）和基板（P）之间供给液体（1）的液体供给机构（10）。 当检测到异常时，液体供给机构（10）停止供给液体（1）。 这抑制了由于形成液浸区域的液体的泄漏而导致的衬底周边的器件和构件的影响，从而实现令人满意的曝光处理。