-
公开(公告)号：US20100017445A1
公开(公告)日：2010-01-21
申请号：US12569566
申请日：2009-09-29
申请人： Eiichi Kobayashi
发明人： Eiichi Kobayashi
CPC分类号： G06F11/1466 , G06F11/1461
摘要： A backup control unit controls a normal backup process of backing up a file stored in a NAS device at file system level according to a task schedule set in advance, and controls a forcible backup process of forcibly backing up the file stored in the NAS device at file level upon being triggered by detection of file close of a file stored in a forcible-backup-target file list by an access monitoring unit.
摘要翻译： 备份控制单元根据预先设定的任务进度控制在文件系统级别备份存储在NAS设备中的文件的正常备份过程，并且控制强制备份存储在NAS设备中的文件的强制备份过程 通过由访问监视单元检测到存储在强制备份目标文件列表中的文件的文件关闭来触发文件级别。
-
公开(公告)号：US07638261B2
公开(公告)日：2009-12-29
申请号：US12348171
申请日：2009-01-02
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole.
摘要翻译： 适用于利用KrF准分子激光器或ArF准分子激光器表示的各种类型的辐射如深紫外线的用于微细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物包含：（A）包含下式（I-1）所示的重复单元（1-1）和（B）的辐照敏感性酸产生剂的树脂， （4-正丁氧基萘基）四氢噻吩六氟正丁磺酸盐。 辐射敏感性树脂组合物还可以包含（C）酸扩散控制剂如苯基苯并咪唑。
-
公开(公告)号：US20090148790A1
公开(公告)日：2009-06-11
申请号：US12348171
申请日：2009-01-02
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole.
摘要翻译： 适用于利用KrF准分子激光器或ArF准分子激光器表示的各种类型的辐射如深紫外线的用于微细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物包含：（A）包含下式（I-1）所示的重复单元（1-1）和（B）的辐照敏感性酸产生剂的树脂， （4-正丁氧基萘基）四氢噻吩六氟正丁磺酸盐。 辐射敏感性树脂组合物还可以包含（C）酸扩散控制剂如苯基苯并咪唑。
-
公开(公告)号：US07043951B2
公开(公告)日：2006-05-16
申请号：US10719478
申请日：2003-11-21
IPC分类号： B21F11/00
CPC分类号： B21F3/02 , B21F3/04 , B21F11/005 , B21F37/02
摘要： To provide a wire rod forming machine for which it is possible to increase the production speed above that of the prior art. In the ring-forming machine 10 of the present configuration, between the respective edges 42 and 51 of the moving die 40 and the fixed punch 50, a prescribed location of the belt-shaped wire rod 90 is sheared and the ring 91 is cut off from the belt-shaped wire rod 90. Then, by pushing the ring 91 that was cut off with the moving die 40, the ring is forcibly removed from the forming tools 31, 32 and 33. Therefore, the speed of removal of the ring 91 can be coupled to the acceleration of the manufacturing speed and increased, allowing the production speed to be improved compared to that of the prior art. In addition, since the ring 91 that is cut off from the belt-shaped wire rod 90, pushed by the moving die 40, moves to the end side of the shaft shaped chute 34 to be collected, transport to the next process becomes easy.
摘要翻译： 为了提供一种可以使生产速度提高到现有技术以上的线材成型机。 在本构造的环形成形机10中，在移动模具40的各边缘部分42和51之间以及固定冲头50之间，将带状线材90的规定位置剪切并将环91切断 从带状线材90。 然后，通过推动用移动模具40切断的环91，将环从成形工具31,32和33强制地移除。 因此，与现有技术相比，环91的移除速度可以与制造速度的加速相关联并且增加，从而能够提高生产速度。 此外，由于由带状线材90切断的环91由移动模具40推动移动到轴状滑槽34的端部侧以被收集，所以运送到下一个处理变得容易。
-
公开(公告)号：US20050020878A1
公开(公告)日：2005-01-27
申请号：US10498155
申请日：2003-07-31
CPC分类号： A61B1/00147 , A61B1/00009 , A61B1/0005 , A61B1/042 , A61B1/2676
摘要： In an endoscope device 1 in accordance with the present invention, a navigation screen 51 is displayed. The navigation screen 51 includes: an endoscopic live image display area 52 in which a live image produced by a bronchoscope 2 is displayed; a VBS image display area 53 in which a VBS image is displayed; and a thumbnail VBS image area 54 in which images constructed by reducing VBS images that represent all branch points on a route are displayed as thumbnail VBS images representing branch points. Consequently, an endoscope can be reliably navigated to reach a target region using guide images that represent actual branch positions.
摘要翻译： 在根据本发明的内窥镜装置1中，显示导航画面51。 导航画面51包括：显示由支气管镜2产生的实时图像的内窥镜实时图像显示区域52; 显示VBS图像的VBS图像显示区域53; 以及缩略图VBS图像区域54，其中通过减少表示路线上的所有分支点的VBS图像构成的图像被显示为表示分支点的缩略图VBS图像。 因此，可以使用代表实际分支位置的引导图像，可靠地导航内窥镜到达目标区域。
-
公开(公告)号：US06821705B2
公开(公告)日：2004-11-23
申请号：US10132249
申请日：2002-04-26
申请人： Tomoki Nagai , Jun Numata , Eiichi Kobayashi , Tsutomu Shimokawa
发明人： Tomoki Nagai , Jun Numata , Eiichi Kobayashi , Tsutomu Shimokawa
IPC分类号： G03F7039
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/121
摘要： A radiation-sensitive resin composition comprising (A) a compound of the following formula (1), (R1, R2, and R3 is hydrogen, hydroxyl group, or monovalent organic group and R4 is monovalent acid-dissociable group), (B) an alkali insoluble or scarcely soluble resin comprising a recurring unit of the following formula (2), (R5 is hydrogen or monovalent organic group, R′ hydrogen or methyl, n 1-3, m 0-3) and a recurring unit containing acid-dissociable group, and (C) a photoacid generator. The resin composition is useful as a chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure.
摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）下式（1）的化合物，（R 1，R 2和R 3）是氢，羟基或一价有机基团，R 4 （B）一种碱不溶性或几乎不溶的树脂，其包含下式（2）的重复单元，（R 5是氢或一价有机基团，R'氢或甲基，n 1-3，m 0-3）和含有酸解离基团的重复单元，和（C）光酸产生剂。 树脂组合物可用作化学放大抗蚀剂，显示出高灵敏度，分辨率，辐射透射率和表面光滑度，并且在过度曝光期间不存在部分不溶性的问题。
-
公开(公告)号：US06729764B2
公开(公告)日：2004-05-04
申请号：US09987174
申请日：2001-11-13
IPC分类号： F16C4300
CPC分类号： F16C19/54 , F16C35/042 , F16C35/077 , F16C2360/46
摘要： A metal bearing liner is formed by deep drawing press process sequentially subjecting a progressive sheet material (roll material) to a plurality of press processes. This makes it possible to form a metal bearing liner by a press work instead of a cutting work that has been conventionally employed while maintaining a requisite accuracy such as roundness and cylindricality thereby remarkably reducing the manufacturing cost of the metal bearing line thereby.
摘要翻译： 金属轴承衬套通过深冲压加工方法形成，顺序地对渐进片材（辊材料）进行多次冲压加工。 这使得可以通过冲压加工而不是常规使用的切削加工而形成金属轴承衬套，同时保持诸如圆度和圆柱度的必要精度，从而显着地降低了金属轴承线的制造成本。
-
公开(公告)号：US06677419B1
公开(公告)日：2004-01-13
申请号：US10293740
申请日：2002-11-13
申请人： Phillip J. Brock , Eiichi Kobayashi , Isao Nishimura , Yukio Nishimura , Thomas I. Wallow , Masafumi Yamamoto
发明人： Phillip J. Brock , Eiichi Kobayashi , Isao Nishimura , Yukio Nishimura , Thomas I. Wallow , Masafumi Yamamoto
IPC分类号： C08F1000
CPC分类号： C08F232/08 , C08F220/06 , C08F220/18 , C08F220/28
摘要： A scaleable and high-yielding method of preparing copolymers that is useful as a component of a radiation sensitive resin composition is provided. The method includes the step of reacting at least one monomer A which is an unsaturated alicyclic monomer and forms a polymer main chain by dissociation of the unsaturated bond, and at least one unsaturated monomer B, which also forms a polymer chain by dissociation of an unsaturated bond, wherein less than two electron-withdrawing groups are directly appended to said unsaturation, and where said monomer B is other than the unsaturated alicyclic monomer and forms a polymer main chain, in the presence of a free radical initiator. The reacting step is carried out in a stoichiometric excess of monomer A as compared to monomer B. By carrying out the reacting step in an excess of monomer A as compared to monomer B, the resultant copolymer will have a greater molar concentration of monomer A than is obtainable using other methods.
摘要翻译： 提供了可用作辐射敏感性树脂组合物的组分的共聚物的可扩展和高产率的方法。 所述方法包括使至少一种不饱和脂环族单体的单体A与不饱和键解离形成聚合物主链的至少一种不饱和单体B，其通过不饱和键解离形成聚合物链 键，其中少于两个吸电子基团直接连接到所述不饱和基团上，并且其中所述单体B不同于不饱和脂环族单体并形成聚合物主链，在自由基引发剂存在下。 与单体B相比，反应步骤在化学计量过量的单体A中进行。通过与单体B相比，通过进行过量单体A的反应步骤，所得共聚物将具有比单体A更大的摩尔浓度 可以使用其他方法获得。
-
公开(公告)号：US06403288B1
公开(公告)日：2002-06-11
申请号：US09520345
申请日：2000-03-07
申请人： Yukio Nishimura , Toshiyuki Kai , Eiichi Kobayashi , Takeo Shioya
发明人： Yukio Nishimura , Toshiyuki Kai , Eiichi Kobayashi , Takeo Shioya
IPC分类号： G03F7039
CPC分类号： G03F7/30 , G03F7/0045 , Y10S430/115
摘要： A method of forming a resist pattern from a chemically amplified positive radiation sensitive resin composition. The film thickness of an unexposed portion of a resist film formed from the chemically amplified positive radiation sensitive resin composition after wet development is 100 to 400 Å smaller than that before wet development. Alternatively, a resist film formed from the chemically amplified positive radiation sensitive resin composition is wet developed at both a temperature and a time enough to ensure that the film thickness of an unexposed portion of the resist film after wet development is 100 to 400 Å smaller than that before wet development. A resist film which is formed from a chemically amplified positive radiation sensitive resin composition and experiences a 100 to 400 Å reduction in the film thickness of an unexposed portion by wet development is useful as a resist film for forming a resist pattern.
摘要翻译： 从化学放大正射线敏感性树脂组合物形成抗蚀剂图案的方法。湿法显影后由化学放大的正性辐射敏感性树脂组合物形成的抗蚀剂膜的未曝光部分的膜厚比以前小100至400埃 湿发展。 或者，由化学放大的正性辐射敏感性树脂组合物形成的抗蚀剂膜在足以确保湿显影后抗蚀剂膜的未曝光部分的膜厚度比100至400小的温度和时间都被湿成型 在湿显影之前的抗蚀剂膜是由化学放大的正性辐射敏感性树脂组合物形成的抗蚀剂膜，通过湿显影而经历100〜400的未曝光部分的膜厚度的降低作为形成抗蚀剂图案的抗蚀剂膜是有用的 。
-
60.发明授权Dielectric filter with a unitary external coupling device coupled to multiple resonator stages 有权具有耦合到多个谐振器级的整体外部耦合器件的介质滤波器
公开(公告)号：US6081173A
公开(公告)日：2000-06-27
申请号：US146542
申请日：1998-09-03
申请人： Tomiya Sonoda , Eiichi Kobayashi
发明人： Tomiya Sonoda , Eiichi Kobayashi
CPC分类号： H01P1/2086 , H01P7/10
摘要： A dielectric filter utilizing a plurality of serially coupled resonators having attenuation maximums at the lower side or higher side, or both, of a pass band frequency region. The filter may include an input element which is coupled with both of a first resonator and a second resonator, and may also include an output element which is coupled with both the last and the next-to-last resonator. In the dielectric filter, it is not necessary to provide an external wire connection to generate such attenuation maximums.
摘要翻译： 一种利用多个串联耦合的谐振器的介质滤波器，其具有通带频率区域的下侧或更高侧或两者的衰减最大值。 滤波器可以包括与第一谐振器和第二谐振器两者耦合的输入元件，并且还可以包括与最后和最后一个谐振器耦合的输出元件。 在介质滤波器中，不需要提供外部线连接来产生这种衰减最大值。
-
-
-
-
-
-
-
-
-
搜索结果
81 条记录 (耗时 0.037 秒)
