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公开(公告)号：US06677419B1
公开(公告)日：2004-01-13
申请号：US10293740
申请日：2002-11-13
申请人： Phillip J. Brock , Eiichi Kobayashi , Isao Nishimura , Yukio Nishimura , Thomas I. Wallow , Masafumi Yamamoto
发明人： Phillip J. Brock , Eiichi Kobayashi , Isao Nishimura , Yukio Nishimura , Thomas I. Wallow , Masafumi Yamamoto
IPC分类号： C08F1000
CPC分类号： C08F232/08 , C08F220/06 , C08F220/18 , C08F220/28
摘要： A scaleable and high-yielding method of preparing copolymers that is useful as a component of a radiation sensitive resin composition is provided. The method includes the step of reacting at least one monomer A which is an unsaturated alicyclic monomer and forms a polymer main chain by dissociation of the unsaturated bond, and at least one unsaturated monomer B, which also forms a polymer chain by dissociation of an unsaturated bond, wherein less than two electron-withdrawing groups are directly appended to said unsaturation, and where said monomer B is other than the unsaturated alicyclic monomer and forms a polymer main chain, in the presence of a free radical initiator. The reacting step is carried out in a stoichiometric excess of monomer A as compared to monomer B. By carrying out the reacting step in an excess of monomer A as compared to monomer B, the resultant copolymer will have a greater molar concentration of monomer A than is obtainable using other methods.
摘要翻译： 提供了可用作辐射敏感性树脂组合物的组分的共聚物的可扩展和高产率的方法。 所述方法包括使至少一种不饱和脂环族单体的单体A与不饱和键解离形成聚合物主链的至少一种不饱和单体B，其通过不饱和键解离形成聚合物链 键，其中少于两个吸电子基团直接连接到所述不饱和基团上，并且其中所述单体B不同于不饱和脂环族单体并形成聚合物主链，在自由基引发剂存在下。 与单体B相比，反应步骤在化学计量过量的单体A中进行。通过与单体B相比，通过进行过量单体A的反应步骤，所得共聚物将具有比单体A更大的摩尔浓度 可以使用其他方法获得。
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公开(公告)号：US07531286B2
公开(公告)日：2009-05-12
申请号：US10386707
申请日：2003-03-13
CPC分类号： G03F7/0397 , Y10S430/108 , Y10S430/111 , Y10S430/123 , Y10S430/126
摘要： 1. A radiation-sensitive resin composition comprising: (A) a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid and (B) a photoacid generator. The resin comprises (a) at least one recurring unit of the following formula (1-1) or (1-2), and (b) at least one recurring unit for the following formula (2-1), (2-2), or (2-3).
摘要翻译： 1.一种辐射敏感性树脂组合物，其包含：（A）不溶于或几乎不溶于碱的树脂，但通过酸的作用变得碱溶性，和（B）光酸产生剂。 树脂包含（a）至少一个下式（1-1）或（1-2）的重复单元，和（b）至少一个下式（2-1），（2-2）的重复单元 ）或（2-3）。
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公开(公告)号：US07521169B2
公开(公告)日：2009-04-21
申请号：US10533223
申请日：2003-10-23
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole
摘要翻译： 适用于利用KrF准分子激光器或ArF准分子激光器表示的各种类型的辐射如深紫外线的用于微细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物包含：（A）包含下式（I-1）所示的重复单元（1-1）和（B）的辐照敏感性酸产生剂的树脂， （4-正丁氧基萘基）四氢噻吩六氟正丁磺酸盐。 辐射敏感性树脂组合物还可以包含（C）酸扩散控制剂如苯基苯并咪唑
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公开(公告)号：US07638261B2
公开(公告)日：2009-12-29
申请号：US12348171
申请日：2009-01-02
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole.
摘要翻译： 适用于利用KrF准分子激光器或ArF准分子激光器表示的各种类型的辐射如深紫外线的用于微细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物包含：（A）包含下式（I-1）所示的重复单元（1-1）和（B）的辐照敏感性酸产生剂的树脂， （4-正丁氧基萘基）四氢噻吩六氟正丁磺酸盐。 辐射敏感性树脂组合物还可以包含（C）酸扩散控制剂如苯基苯并咪唑。
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公开(公告)号：US20090148790A1
公开(公告)日：2009-06-11
申请号：US12348171
申请日：2009-01-02
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole.
摘要翻译： 适用于利用KrF准分子激光器或ArF准分子激光器表示的各种类型的辐射如深紫外线的用于微细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物包含：（A）包含下式（I-1）所示的重复单元（1-1）和（B）的辐照敏感性酸产生剂的树脂， （4-正丁氧基萘基）四氢噻吩六氟正丁磺酸盐。 辐射敏感性树脂组合物还可以包含（C）酸扩散控制剂如苯基苯并咪唑。
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公开(公告)号：US20060234153A1
公开(公告)日：2006-10-19
申请号：US10533223
申请日：2003-10-23
IPC分类号： G03C1/00
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole.
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公开(公告)号：US20060234154A1
公开(公告)日：2006-10-19
申请号：US10541032
申请日：2003-12-24
申请人： Isao Nishimura , Kouichi Fujiwara , Eiichi Kobayashi , Tsutomu Shimokawa , Atsushi Nakamura , Eiji Yoneda , Yong Wang
发明人： Isao Nishimura , Kouichi Fujiwara , Eiichi Kobayashi , Tsutomu Shimokawa , Atsushi Nakamura , Eiji Yoneda , Yong Wang
IPC分类号： G03C1/00
CPC分类号： G03F7/039 , G03F7/0046 , G03F7/0397 , G03F7/2006
摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing resin is smaller than 1.5.
摘要翻译： 一种辐射敏感性树脂组合物，其包含通过活性自由基聚合而获得的含酸不稳定基团的树脂，其具有不溶于或几乎不溶于碱，但通过酸的作用而变得碱溶性的特定结构和光酸产生剂，其中 重均分子量与含酸不稳定基团树脂的数均分子量（重均分子量/数均分子量）的比例小于1.5。
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公开(公告)号：US09348226B2
公开(公告)日：2016-05-24
申请号：US10541032
申请日：2003-12-24
申请人： Isao Nishimura , Kouichi Fujiwara , Eiichi Kobayashi , Tsutomu Shimokawa , Atsushi Nakamura , Eiji Yoneda , Yong Wang
发明人： Isao Nishimura , Kouichi Fujiwara , Eiichi Kobayashi , Tsutomu Shimokawa , Atsushi Nakamura , Eiji Yoneda , Yong Wang
CPC分类号： G03F7/039 , G03F7/0046 , G03F7/0397 , G03F7/2006
摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing resin is smaller than 1.5.
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公开(公告)号：US07715065B2
公开(公告)日：2010-05-11
申请号：US11355900
申请日：2006-02-17
申请人： Isao Nishimura , Hiroyuki Nagano
发明人： Isao Nishimura , Hiroyuki Nagano
IPC分类号： H04N1/04
CPC分类号： H04N1/46
摘要： An image processing apparatus includes a detecting unit that detects whether image data for each of the lines in generated image information is chromatic or achromatic; and a determining unit that determines whether the original is chromatic or achromatic based on a detection result of the detecting unit for a first area of the image information, excluding a detection result for a predetermined second area of the image information, the predetermined second area including an end line among the lines in a scanning direction of the original.
摘要翻译： 图像处理装置包括：检测单元，其检测所生成的图像信息中的每行的图像数据是彩色还是无彩色; 以及确定单元，基于所述图像信息的第一区域的检测单元的检测结果，除了所述图像信息的预定第二区域的检测结果之外，确定所述原稿是彩色还是无彩色，所述预定第二区域包括 在原稿的扫描方向上的行中的结束行。
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公开(公告)号：US07517634B2
公开(公告)日：2009-04-14
申请号：US11300658
申请日：2005-12-12
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
CPC分类号： C08F220/28 , C08F20/18 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译： 本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。 用作单体体积大的酯单体作为聚合组分。 链转移剂的使用包括在聚合工艺条件中。 描述了包含杂原子的聚合物末端基团的切割。
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