公开(公告)号：US20120278433A1

公开(公告)日：2012-11-01

申请号：US13519898

申请日：2010-09-03

Applicant: Cong Liu ,  Zhiping Zhang ,  Qihong Fu ,  Lihui Pei

Inventor： Cong Liu ,  Zhiping Zhang ,  Qihong Fu ,  Lihui Pei

IPC: G06F15/16

CPC classification number: H04W28/06 ,  H04L51/26 ,  H04L65/602 ,  H04W28/065

Abstract: The disclosure discloses a method for transmitting and receiving multimedia information and a terminal. The method for transmitting multimedia information includes: dividing multimedia information to be transmitted into multiple information segments; combining the information segments to obtain multiple messages, wherein each of the information segments includes a position identification of the information segment in the multimedia information to be transmitted; in addition, a length of each of the messages is less than or equal to a predetermined length, and each of the messages contains at least one information segment; and sending some or all of the multiple messages to a receiver. By means of the disclosure, a more complete message can be obtained, and multimedia information can be transmitted by lesser messages, so that a cost of a user is reduced and a network burden is alleviated.

Abstract translation: 本公开公开了一种用于发送和接收多媒体信息和终端的方法。 用于发送多媒体信息的方法包括：将要发送的多媒体信息划分成多个信息段; 组合信息段以获得多个消息，其中每个信息段包括要发送的多媒体信息中的信息段的位置标识; 此外，每个消息的长度小于或等于预定长度，并且每个消息包含至少一个信息段; 并将多个消息中的一些或全部发送到接收器。 通过该公开，可以获得更完整的消息，并且可以通过较少的消息来发送多媒体信息，从而减少用户的成本并减轻网络负担。

公开(公告)号：US20120129104A1

公开(公告)日：2012-05-24

申请号：US13297031

申请日：2011-11-15

Applicant: Emad AQAD ,  Mingqi Li ,  Cheng-Bai Xu ,  Cong Liu

Inventor： Emad AQAD ,  Mingqi Li ,  Cheng-Bai Xu ,  Cong Liu

IPC: G03F7/20 ,  G03F7/027 ,  C07D493/08

CPC classification number: G03F7/0045 ,  C07D493/08 ,  G03F7/0046 ,  G03F7/0397

Abstract: New lactone-containing photoacid generator compounds (“PAGs”) and photoresist compositions that comprise such PAG compounds are provided. These photoresist compositions are useful in the manufacture of electronic devices

Abstract translation: 提供了含有这种PAG化合物的新的含内酯的光酸产生剂化合物（“PAG”）和光致抗蚀剂组合物。 这些光致抗蚀剂组合物可用于制造电子器件

公开(公告)号：US20110255061A1

公开(公告)日：2011-10-20

申请号：US12966928

申请日：2010-12-13

Applicant: Deyan Wang ,  Jinrong Liu ,  Cong Liu ,  Doris Kang ,  Anthony Zampini ,  Cheng-Bai Xu

Inventor： Deyan Wang ,  Jinrong Liu ,  Cong Liu ,  Doris Kang ,  Anthony Zampini ,  Cheng-Bai Xu

IPC: G03B27/00 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/322

Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have base-reactive groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.

Abstract translation: 提供了可用于浸没式光刻的新的光致抗蚀剂组合物。 本发明优选的光致抗蚀剂组合物包含一种或多种具有碱反应性基团的材料。 本发明的特别优选的光致抗蚀剂可以在浸没光刻处理期间将抗蚀剂材料的浸出降低到与抗蚀剂层接触的浸没流体中。

公开(公告)号：US20100323294A1

公开(公告)日：2010-12-23

申请号：US12820331

申请日：2010-06-22

Applicant: Mingqi LI ,  Cheng-Bai XU ,  Emad AQAD ,  Cong LIU

Inventor： Mingqi LI ,  Cheng-Bai XU ,  Emad AQAD ,  Cong LIU

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397

Abstract: This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise a multi cyclic lactone moiety.

Abstract translation: 本发明涉及包含这些化合物的新的光酸产生剂化合物和光致抗蚀剂组合物。 特别地，本发明涉及包含多环内酯部分的光酸产生剂化合物。