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49 条记录 (耗时 0.028 秒)

    Surface active additive and photoresist composition comprising same
    6.
    发明授权
    Surface active additive and photoresist composition comprising same 有权
    包含其的表面活性添加剂和光致抗蚀剂组合物

    公开(公告)号：US08722825B2

    公开(公告)日：2014-05-13

    申请号：US13482574

    申请日：2012-05-29

    申请人： Deyan Wang ,  Chunyi Wu ,  Cong Liu ,  Gerhard Pohlers ,  Cheng-bai Xu ,  George G. Barclay

    发明人： Deyan Wang ,  Chunyi Wu ,  Cong Liu ,  Gerhard Pohlers ,  Cheng-bai Xu ,  George G. Barclay

    IPC分类号： C08F226/06 ,  C08F214/18 ,  C08F220/34

    CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/24 ,  C08F220/32 ,  C08F220/34 ,  C08F220/36 ,  C08F220/38 ,  C08F220/58 ,  C08F226/06 ,  C08F2220/1833 ,  C08F2220/283 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/09 ,  G03F7/2041

    摘要： A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a is 0 or 1, each Ra is independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is a straight chain or branched C1-20 alkylene group, or a monocyclic, polycyclic, or fused polycyclic C3-20 cycloalkylene group, each Rb is independently H, C1-10 alkyl, C3-20 cycloalkyl, C3-20 heterocycloalkyl, an aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group, where each Rb is separate or at least one Rb is attached to an adjacent Rb; LN is a nitrogen-containing monocyclic, polycyclic, or fused polycyclic C3-20 heterocycloalkylene group, and X is H, C1-10 alkyl, aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group; and each Rc is independently C1-10 alkyl, C3-20 cycloalkyl, or C3-20 heterocycloalkyl, wherein each Rc is separate or at least one Rc is attached to an adjacent Rc.

    摘要翻译： 聚合物包含包含式（Ia），式（Ib）或式（Ia）和（Ib）的组合的含氮单体的单体的聚合产物和具有式（II）的酸可去保护的单体， ：其中a为0或1，每个R a独立地为H，F，C 1-10烷基或C 1-10氟烷基，L 1为直链或支链C 1-20亚烷基，或单环，多环或稠合多环C3 -20个亚环烷基，每个R b独立地为H，C 1-10烷基，C 3-20环烷基，C 3-20杂环烷基，脂族C 5-20氧羰基或任选地包含杂原子取代基的C1-30酰基，其中每个R b 是分开的或至少一个Rb连接到相邻的Rb; LN是含氮单环，多环或稠合多环C 3-20杂环亚烷基，X是H，C 1-10烷基，脂肪族C 5-20氧羰基或任选包含杂原子取代基的C 1-3酰基; 并且每个R c独立地为C 1-10烷基，C 3-20环烷基或C 3-20杂环烷基，其中每个R c是分开的或至少一个R c连接到相邻的Rc。

    SURFACE ACTIVE ADDITIVE AND PHOTORESIST COMPOSITION COMPRISING SAME
    7.
    发明申请
    SURFACE ACTIVE ADDITIVE AND PHOTORESIST COMPOSITION COMPRISING SAME 有权
    表面活性添加剂和包含其的光电组合物

    公开(公告)号：US20130137035A1

    公开(公告)日：2013-05-30

    申请号：US13482574

    申请日：2012-05-29

    申请人： Deyan Wang ,  Chunyi Wu ,  Cong Liu ,  Gerhard Pohlers ,  Cheng-bai Xu ,  George G. Barclay

    发明人： Deyan Wang ,  Chunyi Wu ,  Cong Liu ,  Gerhard Pohlers ,  Cheng-bai Xu ,  George G. Barclay

    IPC分类号： C08F220/34 ,  C08F226/06

    CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/24 ,  C08F220/32 ,  C08F220/34 ,  C08F220/36 ,  C08F220/38 ,  C08F220/58 ,  C08F226/06 ,  C08F2220/1833 ,  C08F2220/283 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/09 ,  G03F7/2041

    摘要： A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a is 0 or 1, each Ra is independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is a straight chain or branched C1-20 alkylene group, or a monocyclic, polycyclic, or fused polycyclic C3-20 cycloalkylene group, each Rb is independently H, C1-10 alkyl, C3-20 cycloalkyl, C3-20 heterocycloalkyl, an aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group, where each Rb is separate or at least one Rb is attached to an adjacent Rb; LN is a nitrogen-containing monocyclic, polycyclic, or fused polycyclic C3-20 heterocycloalkylene group, and X is H, C1-10 alkyl, aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group; and each Rc is independently C1-10 alkyl, C3-20 cycloalkyl, or C3-20 heterocycloalkyl, wherein each Rc is separate or at least one Rc is attached to an adjacent Rc.

    摘要翻译： 聚合物包含包含式（Ia），式（Ib）或式（Ia）和（Ib）的组合的含氮单体的单体的聚合产物和具有式（II）的酸可去保护的单体， ：其中a为0或1，每个R a独立地为H，F，C 1-10烷基或C 1-10氟烷基，L 1为直链或支链C 1-20亚烷基，或单环，多环或稠合多环C3 -20个亚环烷基，每个R b独立地为H，C 1-10烷基，C 3-20环烷基，C 3-20杂环烷基，脂族C 5-20氧羰基或任选地包含杂原子取代基的C1-30酰基，其中每个R b 是分开的或至少一个Rb连接到相邻的Rb; LN是含氮单环，多环或稠合多环C 3-20杂环亚烷基，X是H，C 1-10烷基，脂肪族C 5-20氧羰基或任选包含杂原子取代基的C 1-3酰基; 并且每个R c独立地为C 1-10烷基，C 3-20环烷基或C 3-20杂环烷基，其中每个R c是分开的或至少一个R c连接到相邻的Rc。