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公开(公告)号:US5766817A
公开(公告)日:1998-06-16
申请号:US958397
申请日:1997-10-29
Applicant: Chieh-Min Cheng , Min-Hong Fu
Inventor: Chieh-Min Cheng , Min-Hong Fu
CPC classification number: G03G9/0804 , G03G9/0812
Abstract: A process for the preparation of toner involving (i) aggregating a colorant dispersion with a latex miniemulsion containing polymer, an ionic surfactant, a cosurfactant, and a nonionic surfactant; (ii) coalescing or fusing the aggregates generated; and optionally (iii) cooling, isolating, washing, and drying the toner, and wherein the polymer in said miniemulsion is of a diameter of from about 50 to about 500 nanometers.
Abstract translation: 一种制备调色剂的方法,其包括(i)用含乳液微乳液的聚合物,离子表面活性剂,辅助表面活性剂和非离子表面活性剂聚集着色剂分散体; (ii)聚集或融合生成的聚集体; 和任选地(iii)冷却,分离,洗涤和干燥调色剂,并且其中所述细乳液中的聚合物的直径为约50至约500纳米。
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公开(公告)号:US5620827A
公开(公告)日:1997-04-15
申请号:US469475
申请日:1995-06-06
Applicant: Chieh-Min Cheng , Anthony C. Giudice , John M. Hardin , Rong-Chang Liang , Leonard C. Wan
Inventor: Chieh-Min Cheng , Anthony C. Giudice , John M. Hardin , Rong-Chang Liang , Leonard C. Wan
CPC classification number: G03F7/36 , G03F7/002 , B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/08 , B41C2210/22 , B41C2210/24
Abstract: A lithographic printing plate precursor for use on a printing press, with minimal or no additional processing after exposure to actinic radiation, comprises a printing plate substrate, a polymeric resist layer capable of imagewise photodegradation or photohardening, and a plurality of microencapsulated developers capable of blanket-wise promoting the washing out of either exposed or unexposed areas of the polymeric resist. The microencapsulated developers may be integrated into the polymeric resist layer, or may form a separate layer deposited atop the polymeric resist layer, or may be coated onto a separate sheet support capable of being brought into face-to-face contact with conventional printing plates.
Abstract translation: 用于印刷机的平版印刷版原版在曝光于光化辐射之后具有极少的或没有额外的处理,包括印版基板,能够成像光降解或光硬化的聚合抗蚀剂层,以及能够覆盖的多个微囊化显影剂 从而促进从聚合物抗蚀剂的暴露或未曝光区域的洗涤。 微囊化的显影剂可以整合到聚合物抗蚀剂层中,或者可以形成沉积在聚合物抗蚀剂层顶上的单独的层,或者可以涂覆到能够与常规印刷版面对面接触的单独的片材载体上。
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公开(公告)号:US4771188A
公开(公告)日:1988-09-13
申请号:US29310
申请日:1987-03-23
Applicant: Jyi-Min Cheng , Julian H. Van Wyngaarden
Inventor: Jyi-Min Cheng , Julian H. Van Wyngaarden
IPC: H03K5/08 , G11B20/10 , H03K5/1532 , H03K5/153 , H03K5/24
CPC classification number: G11B20/10009
Abstract: A method and apparatus for instantaneously adjusting the threshold level for amplitude qualification in a signal peak detection system. Two threshold levels are provided, an upper threshold level and a lower threshold level. As the input signal level exceeds a first qualifying value, the amplitude threshold is set to the lower threshold level. If the input signal continues to increase and exceeds a second qualifying value higher than the first qualifying value, the amplitude threshold is set to the upper threshold level.
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公开(公告)号:US4432840A
公开(公告)日:1984-02-21
申请号:US372076
申请日:1982-04-26
Applicant: Shung-Chung Liau , Wei-Min Cheng , Uen-Long Young
Inventor: Shung-Chung Liau , Wei-Min Cheng , Uen-Long Young
IPC: C08G65/44 , C09D171/12 , C25D7/04
CPC classification number: C08G65/44 , C09D171/12
Abstract: A method of effectively preventing the buildup of polymers on the internal surfaces of polymerization reactors by coating the inner surfaces with a thin organic film produced by electrolysis of phenol or phenol derivatives in a solution of a Lewis Base and a non-aqueous solvent.
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公开(公告)号:USD1046510S1
公开(公告)日:2024-10-15
申请号:US29949642
申请日:2024-06-27
Applicant: Min Cheng
Designer: Min Cheng
Abstract: FIG. 1 is a front perspective view of a shoe organizer, showing my new design;
FIG. 2 is a rear perspective view thereof;
FIG. 3 is a front view thereof;
FIG. 4 is a rear view thereof;
FIG. 5 is a left side view thereof;
FIG. 6 is a right side view thereof;
FIG. 7 is a top view thereof;
FIG. 8 is a bottom view thereof;
FIG. 9 is the folded state diagram of its top surface;
FIG. 10 is the unfolded state diagram of its top surface;
FIG. 11 is its state diagram;
FIG. 12 is its state diagram;
FIG. 13 is its state diagram;
FIG. 14 is its state diagram;
FIG. 15 is its state diagram; and,
FIG. 16 is an enlarged detail view of area 16 in FIG. 2.
The broken lines in the drawings illustrate the portions of the shoe organizer, which form no part of the claimed design.
The dash-dot-dash broken lines encircling the enlarged views are for annotative purposes only and form no part of the claim thereof.-
公开(公告)号:USD1002046S1
公开(公告)日:2023-10-17
申请号:US29882088
申请日:2023-01-10
Applicant: Min Cheng
Designer: Min Cheng
Abstract: FIG. 1 is a perspective view of a camping lamp showing my new design;
FIG. 2 is another perspective view thereof;
FIG. 3 is a front elevational view thereof;
FIG. 4 is a rear elevational view thereof;
FIG. 5 is a left side elevational view thereof;
FIG. 6 is a right side elevational view thereof;
FIG. 7 is a top plan view thereof; and,
FIG. 8 is a bottom plan view thereof.
The broken lines in the drawings depict portions of the camping lamp that form no part of the claimed design.-
公开(公告)号:USD989372S1
公开(公告)日:2023-06-13
申请号:US29882087
申请日:2023-01-10
Applicant: Min Cheng
Designer: Min Cheng
Abstract: FIG. 1 is a perspective view of a LED lamp showing my new design;
FIG. 2 is another perspective view thereof;
FIG. 3 is a front elevational view thereof;
FIG. 4 is a rear elevational view thereof;
FIG. 5 is a left side elevational view thereof;
FIG. 6 is a right side elevational view thereof;
FIG. 7 is a top plan view thereof;
FIG. 8 is a bottom plan view thereof; and,
FIG. 9 is a perspective view of a LED lamp where the led lamp is in a configuration of use.
The broken lines in the drawings depict portions of the LED lamp that form no part of the claimed design.-
公开(公告)号:US09416459B2
公开(公告)日:2016-08-16
申请号:US13154420
申请日:2011-06-06
Applicant: Chun-Ling Lin , Yen-Liang Lu , Chi-Mao Hsu , Chin-Fu Lin , Chun-Hung Chen , Tsun-Min Cheng , Chi-Ray Tsai
Inventor: Chun-Ling Lin , Yen-Liang Lu , Chi-Mao Hsu , Chin-Fu Lin , Chun-Hung Chen , Tsun-Min Cheng , Chi-Ray Tsai
CPC classification number: C25D5/54 , C25D3/38 , C25D5/00 , C25D5/10 , C25D7/123 , H01L21/2885 , H01L21/76879
Abstract: An electrical chemical plating process is provided. A semiconductor structure is provided in an electrical plating platform. A pre-electrical-plating step is performed wherein the pre-electrical-plating step is carried out under a fixed voltage environment and lasts for 0.2 to 0.5 seconds after the current is above the threshold current of the electrical plating platform. After the pre-electrical-plating step, a first electrical plating step is performed on the semiconductor structure.
Abstract translation: 提供电化学镀工艺。 半导体结构设置在电镀平台中。 进行预电镀步骤,其中预电镀步骤在固定电压环境下进行,并且在电流高于电镀平台的阈值电流之后持续0.2至0.5秒。 在预电镀步骤之后,对半导体结构进行第一电镀步骤。
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公开(公告)号:US20150292191A1
公开(公告)日:2015-10-15
申请号:US14251873
申请日:2014-04-14
Applicant: Hsi-Min CHENG
Inventor: Hsi-Min CHENG
CPC classification number: E03C1/264
Abstract: A drain strainer includes a base, a drain plate and a cover. The base includes a drainpipe, a surrounding wall located over the drainpipe, and a connecting portion horizontally connected with the drainpipe and the surrounding wall. The drain plate is mounted in the base and includes a rod recess formed at a center of the drain plate and multiple drainage holes formed through the drain plate. The cover is mounted in the rod recess of the drain plate. The drain strainer can decorate the interior of the kitchen or the bathroom , and is able to filter away dirt or hair easily.
Abstract translation: 排水过滤器包括底座,排水板和盖。 基座包括排水管,位于排水管上方的周围壁,以及与排水管和周围壁水平连接的连接部。 排水板安装在基座中,包括形成在排水板中心的杆凹部和通过排水板形成的多个排水孔。 盖子安装在排水板的杆凹槽中。 排水过滤器可以装饰厨房或浴室的内部,并能轻松地过滤掉污垢或头发。
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公开(公告)号:US09012324B2
公开(公告)日:2015-04-21
申请号:US13593517
申请日:2012-08-24
Applicant: Jia-Jia Chen , Chi-Mao Hsu , Tsun-Min Cheng , Ching-Wei Hsu , Szu-Hao Lai , Huei-Ru Tsai , Tsai-Yu Wen , Ching-Li Yang , Chien-Li Kuo
Inventor: Jia-Jia Chen , Chi-Mao Hsu , Tsun-Min Cheng , Ching-Wei Hsu , Szu-Hao Lai , Huei-Ru Tsai , Tsai-Yu Wen , Ching-Li Yang , Chien-Li Kuo
IPC: H01L21/768 , H01L23/48
CPC classification number: H01L21/76898 , H01L23/49827 , H01L2924/0002 , H01L2924/00
Abstract: A through silicon via process includes the following steps. A substrate having a front side and a back side is provided. A passivation layer is formed on the back side of the substrate. An oxide layer is formed on the passivation layer.
Abstract translation: 硅通孔工艺包括以下步骤。 提供具有正面和背面的基板。 在基板的背面形成钝化层。 在钝化层上形成氧化物层。
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