摘要:
There is provided an ink jet printing apparatus in which unevenness that may occur at the edges of printing areas can be reduced also for various printing media including unspecified printing media. In the ink jet printing apparatus which uses a print head for ejecting ink and performs printing by scanning a predetermined area on a printing medium with the print head multiple times, the multiple times of scan including a forward scan and a backward scan, the apparatus comprising: a control unit that cases the print head to print patterns each of which is printed through multiple times of scan of the print head and has different portions in a time interval between the multiple times of scan, with different printing ratios for the multiple times of scan; and a setting unit that sets the printing ratios based on the test patterns.
摘要:
A spliced ink-jet head including head chips, each of which is capable of discharging inks of two or more colors, and which are spliced in a staggered manner which restrains the occurrence of splice streaks, white streaks caused by deflection at ends or uneven colors attributable to different landing orders of ink droplets in spliced portions of different colors when one-pass recording is carried out. The head chips is arranged such that, in a relationship between two adjoining head chips, at least one discharge port of one head chip and one discharge port of the other head chip for the same color tone ink in end portions overlap on a line in a recording material feeding direction, while discharge ports for different color tone inks do not overlap.
摘要:
A baking apparatus according to one embodiment of the invention includes a hotplate which performs heat treatment to a substrate placed on the hotplate, a base which has at least three support pins passing through through-holes made in the hotplate and supporting the substrate on the hotplate from a backside of the substrate and is vertically movably placed, and a plurality of sensors which are provided at a tip portion of each support pin respectively and sense contact with the substrate. A pattern forming method according to one embodiment of the invention includes forming an antireflection film and a resist film on a substrate to be processed and forming a resist pattern by performing pattern exposing. onto the resist film, baking, and development process (S01 to S06) measuring a dimension of a predetermined monitor pattern after the formation of the resist pattern (S07), and controlling a heat treatment condition of the resist pattern to deform the resist pattern on the basis of information obtained by measurement of the monitor pattern so that the resist pattern becomes the desired dimension (S08-S13).
摘要:
A method of preventing image degradation due to nonejecting nozzles of a recording head is provided for an inkjet recording apparatus for recording images by ejecting ink from plural nozzles disposed in the recording head. The method according to the present invention includes the steps of measuring and recording a pattern for checking an ejection state of the head, determining a nonejecting nozzle from the pattern, obtaining density distribution for each nozzle, and determining a complementary table for every nozzle from the density distribution in the nonejecting nozzle portion for performing different-color complementing.
摘要:
In an ink jet printing apparatus in which satellites are produced, it is an object to minimize image impairments caused by the satellites in a variety of print modes. To this end, index patterns are prepared which have different sizes for different print modes. This enables satellites to land at print positions of main dots in other pixels in any of the print modes that have different distances between main dots and satellites. It is therefore possible to minimize image impairments caused by the satellites and to output a crisp image.
摘要:
In the present invention, a plurality of heat treatment units are arranged side by side in a linear form and a substrate transfer mechanism for transferring the substrate between the heat treatment units is provided in a heat treatment apparatus. The substrate is sequentially heat-treated in the arrangement order, whereby one heat treatment as a whole is dividedly and successively performed in the plurality of heat treatment units. This allows substrates to be heat-treated along the same route and uniforms the thermal history among the substrates. At the time when heat-treating a plurality of substrates the present invention causes less variation in thermal history among the substrates as compared to the case of parallel heat treatments.
摘要:
An ink jet printing apparatus, which can prevent unwanted visible bands or stripes from appearing in a printed image, performs a nozzle information generation step for generating nozzle information representing an ejection characteristic of each nozzle, according to a landing state on a print medium of an ink droplet ejected from each nozzle of the print head; an estimation step for estimating, based on the generated nozzle information and the print data, an effect that the ink droplet ejected from each nozzle has on the image to be formed; a correction information generation step for generating correction information to correct an ink ejection condition of each nozzle according to a result of estimation by the estimation step; and a control step for controlling a driving of the nozzles according to the correction information.
摘要:
In an ink jet printing apparatus in which satellites are produced, it is an object to minimize image impairments caused by the satellites in a variety of print modes. To this end, index patterns are prepared which have different sizes for different print modes. This enables satellites to land at print positions of main dots in other pixels in any of the print modes that have different distances between main dots and satellites. It is therefore possible to minimize image impairments caused by the satellites and to output a crisp image.
摘要:
A pattern forming method is disclosed, which comprises forming a photo resist film on a substrate, irradiating the photo resist film with an energy ray to form a desired latent image pattern, placing the substrate on a spacer provided on a hot plate, heating the photo resist film by using the hot plate, and developing the photo resist film to form a photo resist pattern, wherein an amount of irradiation of the energy ray is set such that the amount of irradiation of the energy ray in an exposure region in which a distance between a back surface of the substrate and an upper surface of the hot plate is long is larger than the amount of irradiation of the energy ray in an exposure region in which a distance between the back surface of the substrate and the upper surface of the hot plate is short.
摘要:
A lithography apparatus includes a resist processing apparatus to perform a process of applying a resist on a substrate, a process of heating a resist film on the substrate, and a process of developing the resist film on the substrate, an immersion exposure apparatus including a projection optical system which projects an image of a pattern on a photomask onto the resist film and configured to perform exposure through liquid located on an optical path between the projection optical system and resist film, a transporting apparatus connected to the resist processing and immersion exposure apparatuses to perform transportation of the substrate between the resist processing and immersion exposure apparatuses, and a temperature/humidity control apparatus configured to control at least one of temperature and humidity in at least one of the resist processing and transporting apparatuses based on temperature and humidity or the in humidity the immersion exposure apparatus.