公开(公告)号：US20060110687A1

公开(公告)日：2006-05-25

申请号：US11266197

申请日：2005-11-04

申请人： Kenji Kawano ,  Tsuyoshi Shibata ,  Kei Hayasaki

发明人： Kenji Kawano ,  Tsuyoshi Shibata ,  Kei Hayasaki

IPC分类号： G03F7/00 ,  G03F7/38

CPC分类号： G03F7/38 ,  G03F7/2004 ,  G03F7/2006 ,  G03F7/2008 ,  G03F7/3021 ,  G03F7/70425 ,  G03F7/70558 ,  G03F7/70783

摘要： A pattern forming method is disclosed, which comprises forming a photo resist film on a substrate, irradiating the photo resist film with an energy ray to form a desired latent image pattern, placing the substrate on a spacer provided on a hot plate, heating the photo resist film by using the hot plate, and developing the photo resist film to form a photo resist pattern, wherein an amount of irradiation of the energy ray is set such that the amount of irradiation of the energy ray in an exposure region in which a distance between a back surface of the substrate and an upper surface of the hot plate is long is larger than the amount of irradiation of the energy ray in an exposure region in which a distance between the back surface of the substrate and the upper surface of the hot plate is short.

公开(公告)号：US07972765B2

公开(公告)日：2011-07-05

申请号：US12457108

申请日：2009-06-01

申请人： Kenji Kawano ,  Tsuyoshi Shibata ,  Kei Hayasaki

发明人： Kenji Kawano ,  Tsuyoshi Shibata ,  Kei Hayasaki

IPC分类号： G03F7/26

CPC分类号： G03F7/38 ,  G03F7/2004 ,  G03F7/2006 ,  G03F7/2008 ,  G03F7/3021 ,  G03F7/70425 ,  G03F7/70558 ,  G03F7/70783

摘要： A pattern forming method is disclosed, which comprises forming a photo resist film on a substrate, irradiating the photo resist film with an energy ray to form a desired latent image pattern, placing the substrate on a spacer provided on a hot plate, heating the photo resist film by using the hot plate, and developing the photo resist film to form a photo resist pattern, wherein an amount of irradiation of the energy ray is set such that the amount of irradiation of the energy ray in an exposure region in which a distance between a back surface of the substrate and an upper surface of the hot plate is long is larger than the amount of irradiation of the energy ray in an exposure region in which a distance between the back surface of the substrate and the upper surface of the hot plate is short.

摘要翻译： 公开了一种图案形成方法，其包括在基板上形成光致抗蚀剂膜，用能量射线照射光致抗蚀剂膜以形成期望的潜像图案，将基板放置在设置在热板上的间隔物上，加热照片 通过使用热板进行抗蚀剂膜的显影，并且显影光致抗蚀剂膜以形成光致抗蚀剂图案，其中能量射线的照射量被设定为使得在曝光区域中的能量射线的照射量 在基板的背面和加热板的上表面之间的距离大于在基板的背面与热的上表面之间的距离的曝光区域中的能量射线的照射量 盘子很短。

公开(公告)号：US07563561B2

公开(公告)日：2009-07-21

申请号：US11266197

申请日：2005-11-04

申请人： Kenji Kawano ,  Tsuyoshi Shibata ,  Kei Hayasaki

发明人： Kenji Kawano ,  Tsuyoshi Shibata ,  Kei Hayasaki

IPC分类号： G03F7/26

CPC分类号： G03F7/38 ,  G03F7/2004 ,  G03F7/2006 ,  G03F7/2008 ,  G03F7/3021 ,  G03F7/70425 ,  G03F7/70558 ,  G03F7/70783

摘要： A pattern forming method is disclosed, which comprises forming a photo resist film on a substrate, irradiating the photo resist film with an energy ray to form a desired latent image pattern, placing the substrate on a spacer provided on a hot plate, heating the photo resist film by using the hot plate, and developing the photo resist film to form a photo resist pattern, wherein an amount of irradiation of the energy ray is set such that the amount of irradiation of the energy ray in an exposure region in which a distance between a back surface of the substrate and an upper surface of the hot plate is long is larger than the amount of irradiation of the energy ray in an exposure region in which a distance between the back surface of the substrate and the upper surface of the hot plate is short.

摘要翻译： 公开了一种图案形成方法，其包括在基板上形成光致抗蚀剂膜，用能量射线照射光致抗蚀剂膜以形成期望的潜像图案，将基板放置在设置在热板上的间隔物上，加热照片 通过使用热板进行抗蚀剂膜的显影，并且显影光致抗蚀剂膜以形成光致抗蚀剂图案，其中能量射线的照射量被设定为使得在曝光区域中的能量射线的照射量 在基板的背面和加热板的上表面之间的距离大于在基板的背面与热的上表面之间的距离的曝光区域中的能量射线的照射量 盘子很短。

公开(公告)号：US20090246710A1

公开(公告)日：2009-10-01

申请号：US12457108

申请日：2009-06-01

申请人： Kenji Kawano ,  Tsuyoshi Shibata ,  Kei Hayasaki

发明人： Kenji Kawano ,  Tsuyoshi Shibata ,  Kei Hayasaki

IPC分类号： G03F7/20

CPC分类号： G03F7/38 ,  G03F7/2004 ,  G03F7/2006 ,  G03F7/2008 ,  G03F7/3021 ,  G03F7/70425 ,  G03F7/70558 ,  G03F7/70783

摘要： A pattern forming method is disclosed, which comprises forming a photo resist film on a substrate, irradiating the photo resist film with an energy ray to form a desired latent image pattern, placing the substrate on a spacer provided on a hot plate, heating the photo resist film by using the hot plate, and developing the photo resist film to form a photo resist pattern, wherein an amount of irradiation of the energy ray is set such that the amount of irradiation of the energy ray in an exposure region in which a distance between a back surface of the substrate and an upper surface of the hot plate is long is larger than the amount of irradiation of the energy ray in an exposure region in which a distance between the back surface of the substrate and the upper surface of the hot plate is short.

公开(公告)号：US20060102614A1

公开(公告)日：2006-05-18

申请号：US11304549

申请日：2005-12-16

申请人： Kenji Kawano ,  Shinichi Ito ,  Eishi Shiobara ,  Daisuke Kawamura ,  Kei Hayasaki

发明人： Kenji Kawano ,  Shinichi Ito ,  Eishi Shiobara ,  Daisuke Kawamura ,  Kei Hayasaki

IPC分类号： H05B3/68

CPC分类号： H01L21/6715 ,  B05C5/0254 ,  B05C11/08 ,  G03F7/168 ,  G03F7/3021 ,  G03F7/38 ,  G03F7/70358 ,  G03F7/70558 ,  H01L21/67109 ,  H01L21/67115

摘要： A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.

公开(公告)号：US06423977B1

公开(公告)日：2002-07-23

申请号：US09030510

申请日：1998-02-25

申请人： Kei Hayasaki ,  Shinichi Ito ,  Kenji Kawano ,  Soichi Inoue ,  Katsuya Okumura

发明人： Kei Hayasaki ,  Shinichi Ito ,  Kenji Kawano ,  Soichi Inoue ,  Katsuya Okumura

IPC分类号： G01N2186

CPC分类号： G01N21/956

摘要： A pattern size evaluation apparatus comprising an illumination optical system for projecting parallel light rays of a predetermined wavelength on a monitoring area formed on an object, the monitoring area being formed at a position different from a device pattern formed on the object, a light intensity detection optical system for detecting diffracted light from the monitoring area, and a device pattern size evaluation section for evaluating a size of the device pattern based on an intensity of diffracted light from the monitoring area.

摘要翻译： 一种图案尺寸评估装置，包括用于在形成在物体上的监视区域上投射预定波长的平行光线的照明光学系统，所述监视区域形成在与形成在物体上的装置图案不同的位置，光强度检测 用于检测来自监视区域的衍射光的光学系统，以及用于基于来自监视区域的衍射光的强度来评估装置图案的尺寸的装置图案尺寸评估部。

公开(公告)号：US06441351B2

公开(公告)日：2002-08-27

申请号：US09734924

申请日：2000-12-13

申请人： Kei Hayasaki ,  Shinichi Ito ,  Kenji Kawano

发明人： Kei Hayasaki ,  Shinichi Ito ,  Kenji Kawano

IPC分类号： H05B102

CPC分类号： H01L21/67115 ,  G03F7/168 ,  G03F7/38

摘要： A heating apparatus for performing heat treatment on a wafer applied with a resist before or after exposure includes a heating plate for heating a wafer which is placed on the heating plate, a light intensity detecting apparatus for irradiating light on the wafer to detect intensity of reflected light from the resist on the wafer, and a control section for controlling heating performed by the heating plate on the basis of the detected intensity of reflected light so that heating amount applied to a plurality of wafers becomes constant. Accordingly, the heating amount of the wafer can be controlled to be constant and variations in dimension of resist patterns can be reduced.

摘要翻译： 用于在曝光前后施加抗蚀剂的晶片上进行热处理的加热装置包括用于加热放置在加热板上的晶片的加热板，用于在晶片上照射光以检测反射的强度的光强度检测装置 来自晶片上的抗蚀剂的光，以及控制部分，用于根据检测到的反射光强度控制由加热板进行的加热，使得施加到多个晶片的加热量变得恒定。 因此，可以将晶片的加热量控制为恒定，并且可以减小抗蚀剂图案的尺寸变化。

公开(公告)号：US07662546B2

公开(公告)日：2010-02-16

申请号：US11304549

申请日：2005-12-16

申请人： Kenji Kawano ,  Shinichi Ito ,  Eishi Shiobara ,  Daisuke Kawamura ,  Kei Hayasaki

发明人： Kenji Kawano ,  Shinichi Ito ,  Eishi Shiobara ,  Daisuke Kawamura ,  Kei Hayasaki

IPC分类号： H05B3/68

CPC分类号： H01L21/6715 ,  B05C5/0254 ,  B05C11/08 ,  G03F7/168 ,  G03F7/3021 ,  G03F7/38 ,  G03F7/70358 ,  G03F7/70558 ,  H01L21/67109 ,  H01L21/67115

摘要： A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.

摘要翻译： 用涂膜处理的基板的加热装置具有内部空间的室，在内部空间中加热被处理基板的加热板和分隔构件。 加热板具有支撑表面，该支撑表面支撑在腔室内待处理的基底。 分隔构件布置在腔室中以面向支撑表面。 分隔构件将内部空间分隔成第一和第二空间，并且具有允许第一和第二空间彼此连通的多个孔。 加热板的支撑表面设置在第一空间中。 形成空气流的气流形成机构设置在第二空间中。 该机理将从光致抗蚀剂膜蒸发的物质排出。

公开(公告)号：US06191397B1

公开(公告)日：2001-02-20

申请号：US09345749

申请日：1999-07-01

申请人： Kei Hayasaki ,  Shinichi Ito ,  Kenji Kawano

发明人： Kei Hayasaki ,  Shinichi Ito ,  Kenji Kawano

IPC分类号： H01L21205

CPC分类号： H01L21/67115 ,  G03F7/168 ,  G03F7/38

摘要： A heating apparatus for performing heat treatment on a wafer applied with a resist before or after exposure includes a heating plate for heating a wafer which is placed on the heating plate, a light intensity detecting apparatus for irradiating light on the wafer to detect intensity of reflected light from the resist on the wafer, and a control section for controlling heating performed by the heating plate on the basis of the detected intensity of reflected light so that heating amount applied to a plurality of wafers becomes constant. Accordingly, the heating amount of the wafer can be controlled to be constant and variations in dimension of resist patterns can be reduced.

摘要翻译： 用于在曝光前后施加抗蚀剂的晶片上进行热处理的加热装置包括用于加热放置在加热板上的晶片的加热板，用于在晶片上照射光以检测反射的强度的光强度检测装置 来自晶片上的抗蚀剂的光，以及控制部分，用于根据检测到的反射光强度控制由加热板进行的加热，使得施加到多个晶片的加热量变得恒定。 因此，可以将晶片的加热量控制为恒定，并且可以减小抗蚀剂图案的尺寸变化。

公开(公告)号：US07364839B2

公开(公告)日：2008-04-29

申请号：US10624593

申请日：2003-07-23

申请人： Kei Hayasaki ,  Shinichi Ito ,  Tomoyuki Takeishi ,  Kenji Kawano ,  Tatsuhiko Ema

发明人： Kei Hayasaki ,  Shinichi Ito ,  Tomoyuki Takeishi ,  Kenji Kawano ,  Tatsuhiko Ema

IPC分类号： G03F7/26

CPC分类号： G03F7/40

摘要： A pattern forming method comprises forming a photosensitive resin film on a substrate, exposing the photosensitive resin film, forming a pattern of the photosensitive resin film by supplying a developing solution to the photosensitive resin film, and slimming to remove a surface layer of the pattern by causing the pattern to contact with an activated water.

摘要翻译： 图案形成方法包括在基板上形成感光性树脂膜，使感光性树脂膜曝光，通过向感光性树脂膜供给显影液而形成感光性树脂膜的图案，通过使感光性树脂膜变薄，从而除去图案的表面层 导致图案与活性水接触。