公开(公告)号：US09285686B2

公开(公告)日：2016-03-15

申请号：US14586468

申请日：2014-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Johannes Sophia Maria Mertens ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Leon Joseph Marie Van Den Schoor ,  Sjoerd Nicolaas Lambertus Donders ,  Bob Streefkerk

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.

Abstract translation: 在浸没式光刻设备中，浸没液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度，以确保液体的恒定流动。

公开(公告)号：US09097987B2

公开(公告)日：2015-08-04

申请号：US13866879

申请日：2013-04-19

Applicant: ASML Netherlands B.V.

Inventor： Christiaan Alexander Hoogendam ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Joeri Lof ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Hans Jansen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Alexander Straaijer ,  Bob Streefkerk

IPC: G03B27/58 ,  G03B27/52 ,  G03B27/42 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Abstract translation: 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。

公开(公告)号：US09091940B2

公开(公告)日：2015-07-28

申请号：US13722830

申请日：2012-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Antonius Theodorus Anna Maria Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Yurievich Kolesnychenko ,  Joeri Lof ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Alexander Straaijer ,  Bob Streefkerk ,  Joannes Theodoor De Smit ,  Helmar Van Santen

IPC: G03B27/52 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

Abstract translation: 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在所述结构和所述基板的表面之间形成气体密封，以在该空间内容纳液体。

公开(公告)号：US20150055104A1

公开(公告)日：2015-02-26

申请号：US14473795

申请日：2014-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Sjoerd Nicolaas Lambertus DONDERS ,  Bob Streefkerk ,  Martinus Hendrikus Antonius LEENDERS

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.

Abstract translation: 公开了一种浸没式光刻设备，其中液体被供应到投影系统和基板之间的空间，并且提供板结构以将空间分成两部分。 板结构具有允许透射投影光束的孔，其中具有通孔，以减少板的存在的阻尼效果，并且可选地具有一个或多个入口和出口以提供围绕板的孔的各种流动。 本发明的实施例可以减少污染物的输送，杂散光，温度梯度和/或气泡对成像质量的影响。