公开(公告)号：US5059512A

公开(公告)日：1991-10-22

申请号：US419047

申请日：1989-10-10

申请人： Edward D. Babich ,  Jeffrey D. Gelorme ,  Michael Hatzakis ,  Jane M. Shaw ,  Kevin J. Stewart ,  David F. Witman

发明人： Edward D. Babich ,  Jeffrey D. Gelorme ,  Michael Hatzakis ,  Jane M. Shaw ,  Kevin J. Stewart ,  David F. Witman

IPC分类号： G03F7/031 ,  C08F2/50 ,  C08G59/68 ,  C08G77/14 ,  C08G77/22 ,  C08G85/00 ,  C08L83/04 ,  C08L83/06 ,  G03F7/027 ,  G03F7/029 ,  G03F7/075

CPC分类号： G03F7/0755 ,  G03F7/027 ,  G03F7/029 ,  G03F7/0757 ,  Y10S430/127 ,  Y10S502/522

摘要： An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: ##STR1## wherein X is CH.dbd.CH.sub.2 or --(--CH.sub.2 --)--.sub.n O--(--R) with R being H or ##STR2## wherein each R.sup.I, R.sup.II and R.sup.III individually is selected from the group of alkyl, alkenyl, aryl, ##STR3## wherein each R.sup.IV, R.sup.V and R.sup.VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

公开(公告)号：US4615763A

公开(公告)日：1986-10-07

申请号：US688388

申请日：1985-01-02

申请人： Jeffrey D. Gelorme ,  William H. Lawrence ,  Peter Slota, Jr.

发明人： Jeffrey D. Gelorme ,  William H. Lawrence ,  Peter Slota, Jr.

IPC分类号： C08J7/00 ,  C08J7/12 ,  C23C18/22 ,  H05K3/18 ,  H05K3/38 ,  B44C1/22 ,  B29C17/08 ,  C03C15/00 ,  C03C25/06

CPC分类号： H05K3/381 ,  C23C18/22 ,  H05K2201/0209 ,  H05K2203/095 ,  H05K3/181

摘要： The surface of a substrate is roughened by providing a substrate which comprises a resinous material and an inorganic particulate material; and etching a surface of the substrate to selectively etch the resinous material and thereby produce the roughened surface.

摘要翻译： 通过提供包含树脂材料和无机颗粒材料的基底来使基底的表面粗糙化; 并且蚀刻所述衬底的表面以选择性地蚀刻所述树脂材料，从而产生所述粗糙表面。