Abstract:
Pattern treatment methods comprise: (a) providing a semiconductor substrate comprising a patterned feature on a surface thereof; (b) applying a pattern treatment composition to the patterned feature, wherein the pattern treatment composition comprises a block copolymer and a solvent, wherein the block copolymer comprises a first block and a second block, wherein the first block comprises a unit formed from a first monomer comprising an ethylenically unsaturated polymerizable group and a hydrogen acceptor group, wherein the hydrogen acceptor group is a nitrogen-containing group, and the second block comprises a unit formed from a second monomer comprising an ethylenically unsaturated polymerizable group and an aromatic group, provided that the second monomer is not styrene; and (c) rinsing residual pattern treatment composition from the substrate, leaving a portion of the block copolymer bonded to the patterned feature. The methods find particular applicability in the manufacture of semiconductor devices for providing high resolution patterns.
Abstract:
Copolymers, especially multi-block copolymer containing therein two or more segments or blocks differing in tacticity, are prepared by polymerizing propylene, 4-methyl-1-pentene, or another C4-8 α-olefin in the presence of a composition comprising the admixture or reaction product resulting from combining: (A) a first metal complex olefin polymerization catalyst, (B) a second metal complex olefin polymerization catalyst capable of preparing polymers differing in tacticity from the polymer prepared by catalyst (A) under equivalent polymerization conditions, and (C) a chain shuttling agent.
Abstract:
Disclosed herein is a composition comprising a block copolymer; where the block copolymer comprises a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other and the block copolymer forms a phase separated structure; an additive polymer comprising a polymer wherein the surface tension of the polymer with the first polymer and the surface tension of the polymer with the second polymer are both lower than the surface tension between the first polymer and second polymer; where the additive polymer comprises a reactive functional moiety that forms a bond or a complex or a coordinate with the substrate upon being disposed on the substrate; where the reactive functional moiety is unreacted when it is a part of the composition; and a solvent.
Abstract:
The present invention relates to compositions and processes of making ethylene/α-olefins. More particularly, the invention relates to processes of producing ethylene/α-olefin compositions having a controlled molecular weight distribution. The molecular weight distribution is controlled, for example, by controlling the relative monomer concentrations during contact with a pre-catalyst and/or using a catalyst comprising a catalytic amount of a molecule having the structure: wherein M=group 2-8 metal, preferably group 4 as a neutral or charged moiety; Y=any substituent including fused rings; L=any ligating group, especially a pyridyl or pyridylamide; X=alkyl, aryl, substituted alkyl, H or hydride, halide, or other anionic moiety; y=an integer from 0 to the complete valence of M; R=alkyl, aryl, haloalkyl, haloaryl, hydrogen, etc; x=1-6, especially 2; Dashed line=optional bond, especially a weak bond; and X and (CR2)x may be tethered or part of a ring.
Abstract translation:本发明涉及制备乙烯/α-烯烃的组合物和方法。 更具体地说,本发明涉及生产具有受控分子量分布的乙烯/α-烯烃组合物的方法。 分子量分布例如通过控制与预催化剂接触期间的相对单体浓度和/或使用包含催化量的具有以下结构的分子的催化剂进行控制:其中M = 2-8金属,优选 组4作为中性或带电部分; Y =任何取代基,包括稠环; L =任何连接基团,特别是吡啶基或吡啶基酰胺; X =烷基,芳基,取代的烷基,H或氢化物,卤化物或其它阴离子部分; y =从0到完全化合价的整数; R =烷基,芳基,卤代烷基,卤代芳基,氢等; x = 1-6,特别是2; 虚线=可选债券,特别是弱债券; X和(CR2)x可以是连接的或环的一部分。
Abstract:
The invention generally relates to chain shuttling agents (CSAs), a process of preparing the CSAs, a composition comprising a CSA and a catalyst, a process of preparing the composition, a processes of preparing polyolefins, end functional polyolefins, and telechelic polyolefins with the composition, and the polyolefins, end functional polyolefins, and telechelic polyolefins prepared by the processes.
Abstract:
The invention generally relates to chain shuttling agents (CSAs), a process of preparing the CSAs, a composition comprising a CSA and a catalyst, a process of preparing the composition, a processes of preparing polyolefins, end functional polyolefins, and telechelic polyolefins with the composition, and the polyolefins, end functional polyolefins, and telechelic polyolefins prepared by the processes.
Abstract:
The invention generally relates to chain shuttling agents (CSAs), a process of preparing the CSAs, a composition comprising a CSA and a catalyst, a process of preparing the composition, a processes of preparing polyolefins, end functional polyolefins, and telechelic polyolefins with the composition, and the polyolefins, end functional polyolefins, and telechelic polyolefins prepared by the processes.
Abstract:
The invention generally relates to chain shuttling agents (CSAs), a process of preparing the CSAs, a composition comprising a CSA and a catalyst, a process of preparing the composition, a processes of preparing polyolefins, end functional polyolefins, and telechelic polyolefins with the composition, and the polyolefins, end functional polyolefins, and telechelic polyolefins prepared by the processes.
Abstract:
The present disclosure provides a multilayer film. The multilayer film includes at least two layers including a sealant layer and a second layer in contact with the sealant layer. The sealant layer contains (A) a first ethylene-based polymer having a density from 0.900 g/cc to 0.925 g/cc and a melt index from 0.5 g/10 min to 30 g/10 min; and (B) a polyethylene-polydimethylsiloxane block copolymer having a weight average molecular weight from 1,000 g/mol to 10,000 g/mol. The second layer contains a second ethylene-based polymer.
Abstract:
The present disclosure provides a multilayer film. The multilayer film includes at least two layers including a sealant layer and a second layer in contact with the sealant layer. The sealant layer contains (A) a first ethylene-based polymer having a density from 0.900 g/cc to 0.925 g/cc and a melt index from 0.5 g/10 min to 30 g/10 min; and (B) a polyethylene-polydimethylsiloxane block copolymer having a weight average molecular weight from 1,000 g/mol to 10,000 g/mol. The second layer contains a second ethylene-based polymer.