公开(公告)号：US11804543B2

公开(公告)日：2023-10-31

申请号：US17540339

申请日：2021-12-02

Applicant: GlobalFoundries U.S. Inc.

Inventor： Vibhor Jain ,  Judson R. Holt

IPC: H01L29/739 ,  H01L29/66

CPC classification number: H01L29/7391 ,  H01L29/66356

Abstract: Structures for a diode and methods of fabricating a structure for a diode. The structure includes a layer comprised of a semiconductor material. The layer includes a first section, a second section, and a third section laterally positioned between the first section and the second section. The structure includes a first terminal having a raised semiconductor layer on the first section of the layer, a second terminal including a portion on the second section of the layer, and a gate on the third section of the layer.

公开(公告)号：US20230223463A1

公开(公告)日：2023-07-13

申请号：US17574661

申请日：2022-01-13

Applicant: GlobalFoundries U.S. Inc.

Inventor： Judson R. Holt ,  Vibhor Jain ,  Jeffrey B. Johnson ,  John J. Pekarik

IPC: H01L29/737 ,  H01L29/06 ,  H01L21/763 ,  H01L29/66

CPC classification number: H01L29/7371 ,  H01L29/0642 ,  H01L21/763 ,  H01L29/66242

Abstract: Embodiments of the disclosure provide a bipolar transistor structure with a collector on a polycrystalline isolation layer. A polycrystalline isolation layer may be on a substrate, and a collector layer may be on the polycrystalline isolation layer. The collector layer has a first doping type and includes a polycrystalline semiconductor. A base layer is on the collector layer and has a second doping type opposite the first doping type. An emitter layer is on the base layer and has the first doping type. A material composition of the doped collector region is different from a material composition of the base layer.

公开(公告)号：US20230087058A1

公开(公告)日：2023-03-23

申请号：US17549013

申请日：2021-12-13

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Shesh Mani Pandey ,  Judson R. Holt ,  Vibhor Jain

IPC: H01L29/732 ,  H01L29/66

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to bipolar transistors and methods of manufacture. The structure includes: a base region composed of a semiconductor on insulator material; an emitter region above the base region; and a collector region under the base region and within a cavity of a buried insulator layer.

公开(公告)号：US20230066437A1

公开(公告)日：2023-03-02

申请号：US17525634

申请日：2021-11-12

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Hong Yu ,  Judson R. Holt ,  Alexander Derrickson

IPC: H01L29/735 ,  H01L29/66 ,  H01L29/08 ,  H01L29/165 ,  H01L29/10

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a lateral bipolar transistor and methods of manufacture. The structure includes: an extrinsic base having at least one sidewall with a gradient concentration of semiconductor material; an emitter on a first side of the extrinsic base; and a collector on a second side of the extrinsic base.

公开(公告)号：US20230063301A1

公开(公告)日：2023-03-02

申请号：US17557176

申请日：2021-12-21

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Alexander M. Derrickson ,  Arkadiusz Malinowski ,  Jagar Singh ,  Mankyu Yang ,  Judson R. Holt

IPC: H01L29/737 ,  H01L29/165 ,  H01L29/08 ,  H01L29/10 ,  H01L29/66

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to annular bipolar transistors and methods of manufacture. The structure includes: a substate material; a collector region parallel to and above the substrate material; an intrinsic base region surrounding the collector region; an emitter region above the intrinsic base region; and an extrinsic base region contacting the intrinsic base region

公开(公告)号：US20230062194A1

公开(公告)日：2023-03-02

申请号：US17533882

申请日：2021-11-23

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Judson R. Holt ,  Vibhor Jain ,  Alexander M. Derrickson

IPC: H01L29/739 ,  H01L29/06 ,  H01L29/66

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a lateral bipolar transistor and methods of manufacture. The structure includes: an extrinsic base region; an emitter region on a first side of the extrinsic base region; a collector region on a second side of the extrinsic base region; and a gate structure comprising a gate oxide and a gate control in a same channel region as the extrinsic base region.

公开(公告)号：US11588043B2

公开(公告)日：2023-02-21

申请号：US17229950

申请日：2021-04-14

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Viorel C. Ontalus ,  Judson R. Holt

IPC: H01L29/06 ,  H01L29/732 ,  H01L29/66 ,  H01L29/161 ,  H01L29/167 ,  H01L29/10

Abstract: Aspects of the disclosure provide a bipolar transistor structure with an elevated extrinsic base, and related methods to form the same. A bipolar transistor according to the disclosure may include a collector on a substrate, and a base film on the collector. The base film includes a crystalline region on the collector and a non-crystalline region adjacent the crystalline region. An emitter is on a first portion of the crystalline region of the base film. An elevated extrinsic base is on a second portion of the crystalline region of the base film, and adjacent the emitter.

公开(公告)号：US11575029B2

公开(公告)日：2023-02-07

申请号：US17324183

申请日：2021-05-19

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Alexander M. Derrickson ,  Richard F. Taylor, III ,  Mankyu Yang ,  Alexander L. Martin ,  Judson R. Holt ,  Jagar Singh

IPC: H01L27/082 ,  H01L27/12 ,  H01L29/78 ,  H01L21/84 ,  H01L21/8238 ,  H01L21/768 ,  H01L29/735 ,  H01L29/739 ,  H01L29/66 ,  H01L29/08 ,  H01L29/10

Abstract: Disclosed is a semiconductor structure including at least one bipolar junction transistor (BJT), which is uniquely configured so that fabrication of the BJT can be readily integrated with fabrication of complementary metal oxide semiconductor (CMOS) devices on an advanced silicon-on-insulator (SOI) wafer. The BJT has an emitter, a base, and a collector laid out horizontally across an insulator layer and physically separated. Extension regions extend laterally between the emitter and the base and between the base and the collector and are doped to provide junctions between the emitter and the base and between the base and the collector. Gate structures are on the extension regions. The emitter, base, and collector are contacted. Optionally, the gate structures and a substrate below the insulator layer are contacted and can be biased to optimize BJT performance. Optionally, the structure further includes one or more CMOS devices. Also disclosed is a method of forming the structure.

公开(公告)号：US20220376093A1

公开(公告)日：2022-11-24

申请号：US17324183

申请日：2021-05-19

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Alexander M. Derrickson ,  Richard F. Taylor, III ,  Mankyu Yang ,  Alexander L. Martin ,  Judson R. Holt ,  Jagar Singh

IPC: H01L29/735 ,  H01L21/84 ,  H01L29/739 ,  H01L29/66 ,  H01L27/12 ,  H01L29/10 ,  H01L29/08

Abstract: Disclosed is a semiconductor structure including at least one bipolar junction transistor (BJT), which is uniquely configured so that fabrication of the BJT can be readily integrated with fabrication of complementary metal oxide semiconductor (CMOS) devices on an advanced silicon-on-insulator (SOI) wafer. The BJT has an emitter, a base, and a collector laid out horizontally across an insulator layer and physically separated. Extension regions extend laterally between the emitter and the base and between the base and the collector and are doped to provide junctions between the emitter and the base and between the base and the collector. Gate structures are on the extension regions. The emitter, base, and collector are contacted. Optionally, the gate structures and a substrate below the insulator layer are contacted and can be biased to optimize BJT performance. Optionally, the structure further includes one or more CMOS devices. Also disclosed is a method of forming the structure.

公开(公告)号：US20220336646A1

公开(公告)日：2022-10-20

申请号：US17229950

申请日：2021-04-14

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Viorel C. Ontalus ,  Judson R. Holt

IPC: H01L29/732 ,  H01L29/06 ,  H01L29/10 ,  H01L29/161 ,  H01L29/167 ,  H01L29/66

Abstract: Aspects of the disclosure provide a bipolar transistor structure with an elevated extrinsic base, and related methods to form the same. A bipolar transistor according to the disclosure may include a collector on a substrate, and a base film on the collector. The base film includes a crystalline region on the collector and a non-crystalline region adjacent the crystalline region. An emitter is on a first portion of the crystalline region of the base film. An elevated extrinsic base is on a second portion of the crystalline region of the base film, and adjacent the emitter.