公开(公告)号：US06897445B2

公开(公告)日：2005-05-24

申请号：US10704821

申请日：2003-11-12

申请人： Yoshinori Nakada ,  Shunsuke Koshihara ,  Ryuichirou Tamochi ,  Yayoi Hosoya ,  Hidetoshi Morokuma

发明人： Yoshinori Nakada ,  Shunsuke Koshihara ,  Ryuichirou Tamochi ,  Yayoi Hosoya ,  Hidetoshi Morokuma

IPC分类号： G01N23/225 ,  G01Q10/00 ,  G01Q30/02 ,  G01Q30/04 ,  G01Q30/06 ,  G21K7/00 ,  H01J37/20 ,  H01J37/26 ,  H01J37/28

CPC分类号： H01J37/28 ,  H01J37/265 ,  H01J2237/221 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2826

摘要： In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.

摘要翻译： 为了提供一种全自动扫描电子显微镜，其从精细调整到全面自动执行调查工作，本发明的扫描电子显微镜具有在校正坐标之后计算校正精度的功能，并且用 向量39，根据坐标校正后的获取信息自动确定自动对象检测的搜索倍率的功能，以及根据搜索倍率和条件来计算物体或缺陷的发生频率以及测量所需的时间的功能 测量。

公开(公告)号：US20050037271A1

公开(公告)日：2005-02-17

申请号：US10894044

申请日：2004-07-20

申请人： Chie Shishido ,  Hidetoshi Morokuma ,  Yuki Ojima ,  Maki Tanaka ,  Wataru Nagatomo

发明人： Chie Shishido ,  Hidetoshi Morokuma ,  Yuki Ojima ,  Maki Tanaka ,  Wataru Nagatomo

IPC分类号： H01L21/66 ,  G03C5/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/70641 ,  G03F7/705 ,  G03F7/70625 ,  Y10S430/143

摘要： In monitoring of an exposure process, a highly isolative pattern greatly changed in a shape of cross section by fluctuations in the exposure dose and the focal position is an observation target. Especially, to detect a change in a resist shape of cross section from a tapered profile to an inverse tapered profile, one of the following observation methods is employed to obtain observation data: (1) a tilt image of a resist pattern is imaged by using tilt imaging electron microscopy, (2) an electron beam image of a resist pattern is imaged under imaging conditions for generating asymmetry on an electron beam signal waveform, and (3) scattering characteristic data of a resist pattern is obtained by an optical measurement system. The observation data is applied to model data created beforehand in accordance with the exposure conditions to estimate fluctuations in the exposure dose and the focal position.

公开(公告)号：US06791096B2

公开(公告)日：2004-09-14

申请号：US10079855

申请日：2002-02-22

申请人： Osamu Komuro ,  Hidetoshi Morokuma ,  Chie Shishido

发明人： Osamu Komuro ,  Hidetoshi Morokuma ,  Chie Shishido

IPC分类号： G01N23225

CPC分类号： G03F7/70641 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70625 ,  H01J37/304 ,  H01J37/3174

摘要： In order to accurately monitor changes in exposure conditions (changes in exposure level and focus) at a product wafer level during lithography, changes in exposure conditions can be calculated by acquiring electron beam images of a first pattern portion and a second pattern portion different from one another in terms of the tendency of the changes in dimensional characteristic quantities against the changes in exposure conditions, then calculating the respective dimensional characteristic quantities of the first pattern portion and the second pattern portion, and applying these dimensional characteristic quantities to the models which logically link the exposure conditions and the dimensional characteristic quantities. Hereby, it is possible to supply the process conditions change monitoring systems and methods that enable output of accurate changes in exposure level and focus.

公开(公告)号：US08881067B2

公开(公告)日：2014-11-04

申请号：US13738795

申请日：2013-01-10

申请人： Wataru Nagatomo ,  Atsushi Miyamoto ,  Hidetoshi Morokuma

发明人： Wataru Nagatomo ,  Atsushi Miyamoto ,  Hidetoshi Morokuma

IPC分类号： G06F17/50 ,  G06K9/00 ,  G03F7/20 ,  H01J37/22 ,  G06T7/60 ,  G06K9/48 ,  H01J37/28 ,  G06T7/00

CPC分类号： G03F7/70625 ,  G06K9/00798 ,  G06K9/48 ,  G06T7/001 ,  G06T7/62 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/24592 ,  H01J2237/2804 ,  H01J2237/2817

摘要： To enable SEM-based management of a cross-sectional shape or manufacturing process parameters of a semiconductor device pattern to be measured, the association between the shape or parameters and SEM image characteristic quantities effective for estimating the shape or parameters is saved as learning data. The image characteristic quantities are collated with learning data to estimate the shape or to monitor the process parameters. Accuracy and reliability is achievable by calculating three kinds of reliability (reliability of the image characteristic quantities, reliability of estimation engines, and reliability of estimating results) based on the distribution of the image characteristic quantities and then judging whether additional learning is necessary, or selecting and adjusting image characteristic quantities and estimation engine based on the reliability.

摘要翻译： 为了能够对待测量的半导体器件图案的横截面形状或制造工艺参数进行基于SEM的管理，可以将有效估计形状或参数的形状或参数与SEM图像特征量之间的关联保存为学习数据。 图像特征量与学习数据进行比较，以估计形状或监视过程参数。 根据图像特征量的分布，通过计算三种可靠性（图像特征量的可靠性，估计引擎的可靠性和估计结果的可靠性），然后判断是否需要额外的学习，或者选择 并根据可靠性调整图像特征量和估计引擎。

公开(公告)号：USRE45224E1

公开(公告)日：2014-10-28

申请号：US12621307

申请日：2009-11-18

申请人： Atsushi Miyamoto ,  Wataru Nagatomo ,  Ryoichi Matsuoka ,  Hidetoshi Morokuma ,  Takumichi Sutani

发明人： Atsushi Miyamoto ,  Wataru Nagatomo ,  Ryoichi Matsuoka ,  Hidetoshi Morokuma ,  Takumichi Sutani

IPC分类号： G06F17/50 ,  G06K9/00

CPC分类号： G03F7/70625

摘要： In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.

公开(公告)号：USRE45204E1

公开(公告)日：2014-10-21

申请号：US12614358

申请日：2009-11-06

申请人： Atsushi Miyamoto ,  Wataru Nagatomo ,  Ryoichi Matsuoka ,  Hidetoshi Morokuma ,  Takumichi Sutani

发明人： Atsushi Miyamoto ,  Wataru Nagatomo ,  Ryoichi Matsuoka ,  Hidetoshi Morokuma ,  Takumichi Sutani

IPC分类号： G06F17/50

CPC分类号： G03F7/70625

摘要： In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.

摘要翻译： 在使用扫描电子显微镜创建半导体图案的SEM观察的成像配方的成像配方制作装置中，为了从观察图像测量布线宽度和图案的其他各种尺寸值的成像配方，从而 通过使用通过从CAD数据转换获得的CAD图像的分析，在最小时间内自动生成图案的形状，通过将CAD数据转换为图像格式来创建CAD图像的CAD图像创建单元， 量化宽度确定部分，亮度信息提供部分和图案形状变形处理部分; 使用由CAD图像创建单元创建的CAD图像来创建成像配方。

公开(公告)号：US08669518B2

公开(公告)日：2014-03-11

申请号：US13168427

申请日：2011-06-24

申请人： Kouji Ishiguro ,  Hidetoshi Morokuma

发明人： Kouji Ishiguro ,  Hidetoshi Morokuma

IPC分类号： B01D59/44 ,  H01J49/00

CPC分类号： H01J49/04 ,  H01J49/0013 ,  H01J49/067

摘要： An object of the present invention is to provide means for solving troubles. Examples of the troubles include sensitivity degradation and resolution degradation of a mass spectrometer, which are caused by an axis deviation of a component, particularly at least one orifice located between an ion source and a detector, to decrease the number of ions reaching the detector, and a variation in performance caused by exchange of components such as the orifice.For example, the invention has the following configuration in order to solve the troubles. A mass spectrometer includes: an ion source; a detector that detects an ion; an orifice and a mass separator that are disposed between the ion source and the detector; and an axis adjusting mechanism that adjusts axis positions of the orifice and/or the mass separator such that an opening of the orifice and/or an incident port of the mass separator is disposed on a line connecting the ion source and an incident port of the detector.

摘要翻译： 本发明的目的是提供解决问题的方法。 麻烦的例子包括质量分析仪的灵敏度下降和分解降解，这是由组分的轴偏差，特别是位于离子源和检测器之间的至少一个孔径的偏离引起的，以减少到达检测器的离子数， 以及由诸如孔口的部件的交换引起的性能变化。 例如，为了解决问题，本发明具有以下结构。 质谱仪包括：离子源; 检测离子的检测器; 设置在离子源和检测器之间的孔口和质量分离器; 以及轴线调节机构，其调节孔口和/或质量分离器的轴线位置，使得孔口和/或质量分离器的入口的开口设置在连接离子源和离子源的入口的线上 探测器。

公开(公告)号：US20130195346A1

公开(公告)日：2013-08-01

申请号：US13738795

申请日：2013-01-10

申请人： Wataru Nagatomo ,  Atsushi Miyamoto ,  Hidetoshi Morokuma

发明人： Wataru Nagatomo ,  Atsushi Miyamoto ,  Hidetoshi Morokuma

IPC分类号： G06T7/00

CPC分类号： G03F7/70625 ,  G06K9/00798 ,  G06K9/48 ,  G06T7/001 ,  G06T7/62 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/24592 ,  H01J2237/2804 ,  H01J2237/2817

摘要： To enable SEM-based management of a cross-sectional shape or manufacturing process parameters of a semiconductor device pattern to be measured, the association between the shape or parameters and SEM image characteristic quantities effective for estimating the shape or parameters is saved as learning data. The image characteristic quantities are collated with learning data to estimate the shape or to monitor the process parameters. Accuracy and reliability is achievable by calculating three kinds of reliability (reliability of the image characteristic quantities, reliability of estimation engines, and reliability of estimating results) based on the distribution of the image characteristic quantities and then judging whether additional learning is necessary, or selecting and adjusting image characteristic quantities and estimation engine based on the reliability.

摘要翻译： 为了能够对待测量的半导体器件图案的横截面形状或制造工艺参数进行基于SEM的管理，可以将有效估计形状或参数的形状或参数与SEM图像特征量之间的关联保存为学习数据。 图像特征量与学习数据进行比较，以估计形状或监视过程参数。 根据图像特征量的分布，通过计算三种可靠性（图像特征量的可靠性，估计引擎的可靠性和估计结果的可靠性），然后判断是否需要额外的学习，或者选择 并根据可靠性调整图像特征量和估计引擎。

公开(公告)号：US08356260B2

公开(公告)日：2013-01-15

申请号：US11673065

申请日：2007-02-09

申请人： Wataru Nagatomo ,  Atsushi Miyamoto ,  Hidetoshi Morokuma

发明人： Wataru Nagatomo ,  Atsushi Miyamoto ,  Hidetoshi Morokuma

IPC分类号： G06F17/50

CPC分类号： G03F7/70625 ,  G06K9/00798 ,  G06K9/48 ,  G06T7/001 ,  G06T7/62 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/24592 ,  H01J2237/2804 ,  H01J2237/2817

摘要： A method is provided for estimating a cross-sectional shape or for monitoring manufacturing process parameters of a semiconductor device pattern to be measured. In this method, in order to enable SEM-based management of the cross-sectional shape or manufacturing process parameters of the pattern to be measured, the association between the cross-sectional shape or process parameters of the pattern and SEM image characteristic quantities effective for estimating the cross-sectional shape or process parameters of the pattern, is saved as learning data, and then the image characteristic quantities that have been calculated from a SEM image of the pattern are collated with the learning data to estimate the cross-sectional shape or to monitor process parameters of the pattern. Estimation with high accuracy and reliability is achievable by calculating all or part of three kinds of reliability (reliability of the image characteristic quantities, reliability of estimation engines, and reliability of estimating results) based on the distribution of the image characteristic quantities and judging from the calculated reliability whether additional learning of the learning data is necessary, or selecting and adjusting image characteristic quantities and estimation engine based on the reliability.

摘要翻译： 提供了一种用于估计横截面形状或用于监测待测量的半导体器件图案的制造工艺参数的方法。 在该方法中，为了能够对待测图案的截面形状或制造工艺参数进行基于SEM的管理，图案的截面形状或工艺参数与SEM图像特征量之间的关联对于 估计图案的截面形状或工艺参数被保存为学习数据，然后将从图案的SEM图像计算出的图像特征量与学习数据进行对照以估计横截面形状或 监视模式的进程参数。 基于图像特征量的分布，通过计算三种可靠性（图像特征量的可靠性，估计引擎的可靠性，估计引擎的可靠性和估计结果的可靠性），可以实现高精度和可靠性的估计。 计算的可靠性是否需要学习数据的附加学习，或者基于可靠性来选择和调整图像特征量和估计引擎。

公开(公告)号：US08319194B2

公开(公告)日：2012-11-27

申请号：US13214654

申请日：2011-08-22

申请人： Makoto Hashimoto ,  Takefumi Yokokura ,  Masuyoshi Yamada ,  Hiroyuki Inoue ,  Hidetoshi Morokuma

发明人： Makoto Hashimoto ,  Takefumi Yokokura ,  Masuyoshi Yamada ,  Hiroyuki Inoue ,  Hidetoshi Morokuma

IPC分类号： H01J49/04 ,  H01J49/26

CPC分类号： H01J49/04

摘要： The mass spectrometer includes an ion source; a mass spectrometry part; a sample container; a heater for the sample container; a first gas tube connected to the sample container to introduce a gas into the sample container; and a second gas tube connected to the sample container to transfer a headspace gas of the sample container to the ion source, in which the ion source generates ions of the headspace gas and the mass spectrometry part performs mass spectrometry of the ions.Thereby, the mass spectrometer as a drug detection equipment can analyze various drugs in urine rapidly and with high sensitivity.

摘要翻译： 质谱仪包括离子源; 质谱部分; 样品容器 用于样品容器的加热器; 连接到样品容器以将气体引入样品容器中的第一气体管; 以及连接到样品容器以将样品容器的顶空气体转移到离子源的第二气体管，其中离子源产生顶空气体的离子，并且质谱部分进行离子的质谱分析。 因此，作为药物检测装置的质谱仪可以快速，高灵敏度地分析尿液中的各种药物。