公开(公告)号：US08711122B2

公开(公告)日：2014-04-29

申请号：US13228686

申请日：2011-09-09

申请人： Yutaka Wada ,  Naohiro Takahashi ,  Takashi Itaya

发明人： Yutaka Wada ,  Naohiro Takahashi ,  Takashi Itaya

IPC分类号： G06F3/045 ,  G06F3/041

CPC分类号： G06F3/044 ,  G06F3/0414

摘要： A sensor apparatus includes: a sensor panel that includes an input operation surface and is configured to detect positional coordinates of a detection object that comes into contact with the input operation surface; a casing; and a pressure-sensitive sensor that includes a first electrode fixed on the sensor panel side, a second electrode fixed on the casing side, and an elastic member that is provided between the sensor panel and the casing and elastically supports the sensor panel with respect to the casing, includes, between the first electrode and the second electrode, a first area formed with a first capacitance and a second area formed with a second capacitance larger than the first capacitance, and is configured to detect a pressing force input to the input operation surface as a change in a capacitance between the first electrode and the second electrode.

摘要翻译： 传感器装置包括：传感器面板，包括输入操作面，被配置为检测与输入操作面接触的检测对象的位置坐标; 套管 以及压敏传感器，其包括固定在所述传感器面板侧的第一电极，固定在所述壳体侧的第二电极和设置在所述传感器面板与所述壳体之间的弹性部件，并相对于所述传感器面板弹性地支撑所述传感器面板 壳体在第一电极和第二电极之间包括形成有第一电容的第一区域和形成有大于第一电容的第二电容的第二区域，并且被配置为检测输入到输入操作的按压力 表面作为第一电极和第二电极之间的电容的变化。

公开(公告)号：US08105750B2

公开(公告)日：2012-01-31

申请号：US11909781

申请日：2007-01-26

申请人： Yutaka Wada ,  Masatsugu Suwabe ,  Toru Yano ,  Koichi Shigeno

发明人： Yutaka Wada ,  Masatsugu Suwabe ,  Toru Yano ,  Koichi Shigeno

IPC分类号： G11B7/24

CPC分类号： G11B7/248 ,  G11B7/24038 ,  G11B7/24079 ,  G11B7/2472 ,  G11B7/259 ,  G11B7/263 ,  G11B2007/24612 ,  Y10S430/146 ,  Y10T156/10

摘要： Recording and reproducing characteristics and data saving reliability are secured in a write-once two-layer recording medium.A second recording layer from a side irradiated with light for recording and reproduction includes organic dye shown by a general formula of a chemical formula 3 described below (in the formula, R1 and R2 are alkyl groups of carbon number 1 to 4; Y1, Y2 respectively are organic groups independently; and X is Cl04, BF4, PF6, SbF6), and organic dye shown by a general formula of a chemical formula 4 described below (in the formula, R1, R4 are alkyl groups of carbon number 1 to 4; R2, R3 are alkyl groups of carbon number 1 to 4 or groups forming 3 to 6 membered rings by being coupled; Y1, Y2 respectively are organic groups independently; and X is Cl04, BF4, PF6, SbF6), to secure durability.

摘要翻译： 记录和再现特性和数据保存可靠性确保在一次写入的双层记录介质中。 从用于记录和再现的光照射的一侧的第二记录层包括由下述化学式3的通式表示的有机染料（在该式中，R 1和R 2是碳数1至4的烷基; Y 1，Y 2 分别为有机基团，X为ClO 4，BF 4，PF 6，SbF 6），下述化学式4的通式表示的有机染料（式中，R 1，R 4为碳数1〜4的烷基 ; R 2，R 3为碳数为1〜4的烷基或通过偶联形成3〜6元环的基团; Y1，Y2分别独立地为有机基团，X为ClO 4，BF 4，PF 6，SbF 6），以确保耐久性。

公开(公告)号：US20110293964A1

公开(公告)日：2011-12-01

申请号：US13114386

申请日：2011-05-24

申请人： Hiroshi Tabata ,  Yousuke Fujii ,  Yutaka Wada

发明人： Hiroshi Tabata ,  Yousuke Fujii ,  Yutaka Wada

IPC分类号： B32B19/00 ,  C23C14/34 ,  C23C14/08

CPC分类号： G11B7/24038 ,  G11B7/243 ,  G11B7/2578 ,  G11B7/263 ,  G11B7/266 ,  G11B2007/24304 ,  G11B2007/24312 ,  G11B2007/24314 ,  G11B2007/2432 ,  G11B2007/24324 ,  G11B2007/25708 ,  G11B2007/25715 ,  Y10T428/21

摘要： An optical recording medium includes: an inorganic recording layer; and a protective layer including a composite oxide containing an indium oxide provided on at least one surface of the inorganic recording layer, wherein the composite oxide is represented by the formula [(In2O3)1-X(A)X], wherein A is cerium oxide or gallium oxide and X satisfies a range of 0.15≦X≦0.75.

摘要翻译： 光记录介质包括：无机记录层; 以及包含设置在无机记录层的至少一个表面上的含有氧化铟的复合氧化物的保护层，其中复合氧化物由式[（In 2 O 3）1-X（A）X]表示，其中A为铈 氧化物或氧化镓，X满足0.15＆nlE; X＆lt; NE; 0.75的范围。

公开(公告)号：US08029976B2

公开(公告)日：2011-10-04

申请号：US11257325

申请日：2005-10-24

申请人： Yutaka Wada ,  Masatsugu Suwabe ,  Junko Shimada ,  Toru Yano ,  Keiji Oya ,  Koichi Shigeno

发明人： Yutaka Wada ,  Masatsugu Suwabe ,  Junko Shimada ,  Toru Yano ,  Keiji Oya ,  Koichi Shigeno

IPC分类号： G11B7/24

CPC分类号： G11B7/2472 ,  G11B7/246 ,  G11B7/2467 ,  G11B7/248 ,  G11B2007/24612 ,  Y10S430/146 ,  Y10T428/21

摘要： Disclosed is to provide with an optical recording medium of a write-once type in which an excellent recording characteristic can be obtained over low speed recording to high speed recording.In an optical recording medium having a recording layer that contains an organic dye, the recording layer is configured to have at least an organic dye expressed by a general formula shown in the following chemical formula 1 (in this formula, R1 represents an alkyl group of carbon number 1 through 4, R2 and R3 represent respectively an alkyl group of carbon number 1 through 4 and a benzyl group or group forming three to six-member ring by coupling, each of Y1 and Y2 represents independently an organic group, and X represents ClO4, FB4, PF6, and SbF6) and an organic dye expressed by a general formula shown in the following chemical formula 2 (in this formula, R1 and R4 represent an alkyl group of carbon number 1 through 4, R2 and R3 represent respectively an alkyl group of carbon number 1 through 4 and a benzyl group or group forming three to six-member ring by coupling, each of Y1 and Y2 represents independently an organic group, and X represents ClO4, FB4, PF6, and SbF6).

摘要翻译： 公开了提供一种一次写入型光记录介质，其中通过低速记录到高速记录可以获得优异的记录特性。 在具有含有有机染料的记录层的光学记录介质中，记录层被配置为至少具有由以下化学式1所示的通式表示的有机染料（在该式中，R1表示 碳数1至4，R 2和R 3分别表示碳数1至4的烷基和通过偶联形成3至6元环的苄基或基团，Y1和Y2各自独立地表示有机基团，X表示 ClO4，FB4，PF6和SbF6）和由以下化学式2所示的通式表示的有机染料（在该式中，R 1和R 4表示碳数1至4的烷基，R 2和R 3分别表示 碳数为1〜4的烷基和通过偶联形成3〜6元环的苄基或基团，Y1和Y2各自独立地表示有机基团，X表示ClO4，FB4，PF6和SbF6）。

公开(公告)号：US07316836B2

公开(公告)日：2008-01-08

申请号：US10973444

申请日：2004-10-27

申请人： Yutaka Wada ,  Masatsugu Suwabe ,  Toshihiro Akimori ,  Junko Shimada ,  Keiji Oya ,  Koichi Shigeno ,  Toru Yano

发明人： Yutaka Wada ,  Masatsugu Suwabe ,  Toshihiro Akimori ,  Junko Shimada ,  Keiji Oya ,  Koichi Shigeno ,  Toru Yano

IPC分类号： B32B3/02

CPC分类号： G11B7/00455 ,  G11B7/246 ,  G11B7/2472 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/259 ,  G11B2007/24612 ,  Y10T428/21

摘要： An optical recording medium comprises a transmission substrate and a recording layer formed on the transmission substrate, the recording layer containing at least a dye material expressed by a general formula shown at the following chemical formula (in the chemical formula 1, R1 represents alkyl group having carbon numbers 1 to 4, R2, R3 represent alkyl group having carbon numbers 1 to 4, benzyl group or groups combined to form 3 to 6 rings, Y1 and Y2 independently represent organic groups and X represent ClO4, BF4, PF6, SbF6) and a dye material expressed by a general formula represented by the following chemical formula 2(in the chemical formula 2, R1 and R2 represent alkyl groups having carbon numbers 1 to 4, benzyl groups or groups combined to form 3 to 6 rings, Y1, Y2 independently represent organic groups and X represent ClO4, BF4, PF6, SbF6): In a write once type optical recording medium such as DVD−R and DVD+R, satisfactory recording characteristics can be obtained from low-speed recording to high-speed recording.

摘要翻译： 光记录介质包括传输基板和形成在传输基板上的记录层，该记录层至少含有由以下化学式表示的通式表示的染料材料（化学式1中，R1表示具有 碳数1至4，R2，R3表示碳数为1至4的烷基，苄基或组合形成3至6个环的基团，Y1和Y2独立地表示有机基团，X表示ClO 4 ，BF 4，PF 6，SbF 6）和由以下化学式2表示的通式表示的染料（在 化学式2，R 1和R 2表示碳数为1至4的烷基，苄基或组合形成3至6个环的基团，Y 1，Y 2独立地表示有机基团，X表示ClO 4，BF 在一次写入型光记录媒体中，例如， 作为DVD-R和DVD + R，可以从低速记录到高速记录获得令人满意的记录特性。

公开(公告)号：US20070173177A1

公开(公告)日：2007-07-26

申请号：US11727727

申请日：2007-03-28

申请人： Kazuto Hirokawa ,  Shunsuke Nakai ,  Shinrou Ohta ,  Yutaka Wada ,  Yoichi Kobayashi

发明人： Kazuto Hirokawa ,  Shunsuke Nakai ,  Shinrou Ohta ,  Yutaka Wada ,  Yoichi Kobayashi

IPC分类号： B24B49/00

CPC分类号： B24B37/205 ,  B24B37/013 ,  B24B49/12 ,  H01L21/30625

摘要： A substrate polishing apparatus is used to polish a surface of a substrate such as a semiconductor wafer to a flat mirror finish. The substrate polishing apparatus has a polishing table and a polishing pad mounted on the polishing table for polishing a semiconductor substrate. The polishing pad has a through hole formed therein. The substrate polishing apparatus also has a light emission and reception device for emitting measurement light through the through hole formed in the polishing pad to the semiconductor substrate and receiving reflected light from the semiconductor substrate so as to measure a film on the semiconductor substrate. The light emission and reception device is disposed in the polishing table. The substrate polishing apparatus includes a supply passage for supplying a fluid to a path of the measurement light. The supply passage has an outlet portion detachably mounted on the polishing table. The substrate polishing apparatus also includes a protection cover mounted on the polishing table and fitted into the through hole when the polishing pad is attached to the polishing table.

公开(公告)号：US06827633B2

公开(公告)日：2004-12-07

申请号：US10330189

申请日：2002-12-30

申请人： Yutaka Wada ,  Tomohiko Akatsuka ,  Tatsuya Sasaki

发明人： Yutaka Wada ,  Tomohiko Akatsuka ,  Tatsuya Sasaki

IPC分类号： B24B100

CPC分类号： B24B53/017 ,  B24B7/228 ,  B24B53/095 ,  H01L21/31053

摘要： A wafer is pressed against a fixed abrasive and brought into sliding contact with the fixed abrasive. Thus, the wafer is polished. A surface of the fixed abrasive is dressed so as to generate free abrasive particles thereon. A liquid or a gas, composed of a mixture of liquid or inert gas and pure water or chemical liquid, is ejected onto the surface of the fixed abrasive during or after the dressing process.

摘要翻译： 将晶片压靠固定的磨料并与固定的磨料滑动接触。 因此，晶片被抛光。 修整固定磨料的表面以在其上产生游离的磨料颗粒。 由液体或惰性气体与纯水或化学液体的混合物组成的液体或气体在修整过程中或之后被喷射到固定磨料的表面上。

公开(公告)号：US5559939A

公开(公告)日：1996-09-24

申请号：US386623

申请日：1995-02-10

申请人： Yutaka Wada ,  Yukihiro Oda ,  Tunemasa Miyo ,  Yasuhiro Noguchi ,  Kazuo Takei

发明人： Yutaka Wada ,  Yukihiro Oda ,  Tunemasa Miyo ,  Yasuhiro Noguchi ,  Kazuo Takei

IPC分类号： G06F17/21 ,  G06F17/10 ,  G06F15/00

CPC分类号： G06F17/10 ,  G06F17/215

摘要： Each of formula constituent elements represented in real mathematical notation is written by a user via an input device on a display screen. While confirming positions of graphic elements indicative of each of the respective inputted constituent elements with respect to the display screen, the user forms a desired formula. On the basis of types of the inputted constituent elements and their positions on the display screen, an arithmetic relationship between the formula constituent elements is automatically obtained by a computer. A computer program to solve this formula is automatically produced by the computer based on the resultant arithmetic relationship. The solutions of the formula are displayed on the display screen as numeral values and graphic representations.

摘要翻译： 用实际数学符号表示的公式构成要素中的每一个都由用户通过显示屏上的输入装置写入。 在确认相对于显示画面指示各个输入的构成要素的图形元素的位置的同时，用户形成期望的公式。 基于输入的构成要素的种类及其在显示画面上的位置，通过计算机自动获得公式构成要素之间的算术关系。 计算机根据最终的算术关系自动产生一个解决这个公式的计算机程序。 公式的解决方案在显示屏幕上显示为数字值和图形表示。

公开(公告)号：US08449964B2

公开(公告)日：2013-05-28

申请号：US13114386

申请日：2011-05-24

申请人： Hiroshi Tabata ,  Yousuke Fujii ,  Yutaka Wada

发明人： Hiroshi Tabata ,  Yousuke Fujii ,  Yutaka Wada

IPC分类号： G11B7/24

CPC分类号： G11B7/24038 ,  G11B7/243 ,  G11B7/2578 ,  G11B7/263 ,  G11B7/266 ,  G11B2007/24304 ,  G11B2007/24312 ,  G11B2007/24314 ,  G11B2007/2432 ,  G11B2007/24324 ,  G11B2007/25708 ,  G11B2007/25715 ,  Y10T428/21

摘要： An optical recording medium includes: an inorganic recording layer; and a protective layer including a composite oxide containing an indium oxide provided on at least one surface of the inorganic recording layer, wherein the composite oxide is represented by the formula [(In2O3)1-X(A)X], wherein A is cerium oxide or gallium oxide and X satisfies a range of 0.15≦X≦0.75.

摘要翻译： 光记录介质包括：无机记录层; 以及包含设置在无机记录层的至少一个表面上的含有氧化铟的复合氧化物的保护层，其中复合氧化物由式[（In 2 O 3）1-X（A）X]表示，其中A为铈 氧化物或氧化镓，X满足0.15 @ X @ 0.75的范围。

公开(公告)号：US07507144B2

公开(公告)日：2009-03-24

申请号：US11727727

申请日：2007-03-28

申请人： Kazuto Hirokawa ,  Shunsuke Nakai ,  Shinrou Ohta ,  Yutaka Wada ,  Yoichi Kobayashi

发明人： Kazuto Hirokawa ,  Shunsuke Nakai ,  Shinrou Ohta ,  Yutaka Wada ,  Yoichi Kobayashi

IPC分类号： B24B49/00

CPC分类号： B24B37/205 ,  B24B37/013 ,  B24B49/12 ,  H01L21/30625

摘要： A substrate polishing apparatus is used to polish a surface of a substrate such as a semiconductor wafer to a flat mirror finish. The substrate polishing apparatus has a polishing table and a polishing pad mounted on the polishing table for polishing a semiconductor substrate. The polishing pad has a through hole formed therein. The substrate polishing apparatus also has a light emission and reception device for emitting measurement light through the through hole formed in the polishing pad to the semiconductor substrate and receiving reflected light from the semiconductor substrate so as to measure a film on the semiconductor substrate. The light emission and reception device is disposed in the polishing table. The substrate polishing apparatus includes a supply passage for supplying a fluid to a path of the measurement light. The supply passage has an outlet portion detachably mounted on the polishing table. The substrate polishing apparatus also includes a protection cover mounted on the polishing table and fitted into the through hole when the polishing pad is attached to the polishing table.

摘要翻译： 基板抛光装置用于将诸如半导体晶片的基板的表面抛光到平面镜面。 基板研磨装置具有安装在研磨台上的用于研磨半导体基板的研磨台和研磨垫。 抛光垫在其中形成有通孔。 基板研磨装置还具有发光和接收装置，用于通过形成在抛光垫中的通孔将测量光发射到半导体衬底并接收来自半导体衬底的反射光，以测量半导体衬底上的膜。 发光和接收装置设置在抛光台中。 衬底抛光装置包括用于将流体供应到测量光的路径的供给通道。 供给通道具有可拆卸地安装在抛光台上的出口部分。 衬底抛光装置还包括安装在抛光台上并当抛光垫附接到抛光台时装配到通孔中的保护盖。