摘要:
A packaged memory device for storing information comprises a stack, a package lid, a first magnet structure fixedly connected to the package lid, a package body and a second magnet structure connected with the package body. The stack includes a tip substrate, a cap, and a media arranged between the tip substrate and cap and movable relative to the tip substrate. The tip substrate includes a plurality of tips extending from the tip substrate so that the tips can access the media. The first magnet structure includes a first magnet connected with a first flux plate. The second magnet structure includes a second magnet connected with a second flux plate. The second flux plate is integrated with the package body so that the second flux plate provides structural rigidity to the package body. The stack is connected to one or both of the package body and the second magnet.
摘要:
A method to fabricate a device including a micro-electro-mechanical system structure and a monolithic integrated circuit comprises using a first wafer as a first substrate, fabricating the micro-electro-mechanical system structure on the first substrate, and forming a first oxide layer over the micro-electro-mechanical system structure. The method further comprises using a second wafer as a second substrate, fabricating the monolithic integrated circuit on the second substrate, and forming a second oxide layer over the monolithic integrated circuit. The first wafer and the second wafer are arranged so that the first oxide layer opposes the second oxide layer. The micro-electro-mechanical system structure is aligned with the monolithic integrated circuit, the first oxide layer is contacted with the second oxide layer; and bonded with the second oxide layer.
摘要:
Embodiments of a process comprising forming one or more micro-electro-mechanical (MEMS) probe on a conductive metal oxide semiconductor (CMOS) wafer, wherein each MEMS probe comprises a cantilever beam with a fixed end and a free end and wherein the CMOS wafer has circuitry thereon; forming an unsharpened tip at or near the free end of each cantilever beam; depositing a silicide-forming material over the tip; annealing the wafer to sharpen the tip; and exposing the sharpened tip. Embodiments of an apparatus comprising a conductive metal oxide semiconductor (CMOS) wafer including circuitry therein; one or more micro-electro-mechanical (MEMS) probes integrally formed on the CMOS wafer, wherein each MEMS probe comprises a cantilever beam with a fixed end and a free end and a sharpened tip at or near the free end, the sharpened tip formed by a process comprising forming an unsharpened tip at or near the free end of each cantilever beam, depositing a silicide-forming material over the unsharpened tip, annealing the wafer to sharpen the unsharpened tip, and exposing the sharpened tip.
摘要:
Embodiments include electronic assemblies and methods for forming electronic assemblies. One embodiment includes a method of forming a MEMS device assembly, including forming an active MEMS region on a substrate. A plurality of bonding pads electrically coupled to the active MEMS region are formed. A seal ring wetting layer is also formed on the substrate, the seal ring wetting layer surrounding the active MEMS region. A single piece solder preform is positioned on the bonding pads and on the seal ring wetting layer, the single piece solder preform including a seal ring region and a bonding pad region. The seal ring region is connected to the bonding pad region by a plurality of solder bridges. The method also includes heating the single piece solder preform to a temperature above the reflow temperature, so that the bridges split and the solder from the preform accumulates on the seal ring wetting layer and the bonding pads. A lid is coupled to the solder. In certain embodiments the lid may include vias having conductive material therein for providing electrical contact to the MEMS device.
摘要:
An electromechanical switch includes an actuation electrode, an anchor, a cantilever electrode, a contact, and signal lines. The actuation electrode and anchor are mounted to a substrate. The cantilever electrode is supported by the anchor above the actuation electrode. The contact is mounted to the cantilever electrode. The signal lines are positioned to form a closed circuit with the contact when an actuation voltage is applied between the actuation electrode and the cantilever electrode causing the cantilever electrode to bend towards the actuation electrode in a zipper like movement starting from a distal end of the cantilever electrode.
摘要:
A microfabricated vacuum sensor may be formed using semiconductor integrated circuit processes. The sensor may be formed inside an enclosure with a microfabricated component. The sensor may then be used to measure the pressure within the enclosure.