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公开(公告)号：US10890436B2
公开(公告)日：2021-01-12
申请号：US13898828
申请日：2013-05-21
Applicant: KLA-Tencor Corporation
Inventor： Nuriel Amir , Guy Cohen , Vladimir Levinski , Michael Adel
Abstract: The disclosure is directed to designing and using an overlay target with orthogonal underlayer dummyfill. According to various embodiments, an overlay target may include one or more segmented overlay pattern elements forming at least one overlay target structure. The overlay target may further include one or more inactive pattern elements forming at least one dummyfill target structure. Each of the one or more inactive pattern elements may include dummyfill segmented along an axis orthogonal to a segmentation axis of at least one proximately disposed overlay pattern element. In some embodiments, each of the target structures or layers may be formed from a separate process layer successively disposed upon a substrate, such as a silicon wafer. In some embodiments, the overlay and dummyfill target structures may be twofold or fourfold rotationally symmetric to allow for certain manufacturing or metrology advantages.
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公开(公告)号：US10824082B2
公开(公告)日：2020-11-03
申请号：US16305629
申请日：2018-10-30
Applicant: KLA-TENCOR CORPORATION
Inventor： Yoel Feler , Vladimir Levinski
IPC: G03F7/20 , G03F9/00 , G01N21/956 , G01N21/95
Abstract: Metrology targets, target design methods and menology measurement methods are provided, which estimate the effects of asymmetric aberrations, independently or in conjunction with metrology overlay estimations. Targets comprise one or more pairs of segmented periodic structures having a same coarse pitch, a same 1:1 line to space ratio and segmented into fine elements at a same fine pitch, wherein the segmented periodic structures differ from each other in that one thereof lacks at least one of its corresponding fine elements and/or in that one thereof comprises two groups of the fine elements which are separated from each other by a multiple of the fine pitch. The missing element(s) and/or central gap enable deriving the estimation of aberration effects from measurements of the corresponding segmented periodic structures. The fine pitches may be selected to correspond to the device fine pitches in the corresponding layer.
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公开(公告)号：US10761023B2
公开(公告)日：2020-09-01
申请号：US15566868
申请日：2017-06-02
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski
IPC: G01N21/47 , G03F1/44 , G03F7/20 , G01N21/956 , H01L21/66
Abstract: Diffraction-based focus target cells, targets and design and measurement methods are provided, which enable sensitive focus measurements to be carried out by overlay measurement tools. Cells comprise a periodic structure having a coarse pitch and multiple elements arranged at a fine pitch. The coarse pitch is an integer multiple of the fine pitch, with the fine pitch being between one and two design rule pitches and smaller than a measurement resolution and the coarse pitch being larger than the measurement resolution. The elements are asymmetric to provide different amplitudes in +1st and −1st diffraction orders of scattered illumination, and a subset of the elements has a CD (critical dimension) larger than a printability threshold and the other elements have a CD smaller than the printability threshold.
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公开(公告)号：US20200133135A1
公开(公告)日：2020-04-30
申请号：US16305629
申请日：2018-10-30
Applicant: KLA-TENCOR CORPORATION
Inventor： Yoel Feler , Vladimir Levinski
IPC: G03F7/20
Abstract: Metrology targets, target design methods and menology measurement methods are provided, which estimate the effects of asymmetric aberrations, independently or in conjunction with metrology overlay estimations. Targets comprise one or more pairs of segmented periodic structures having a same coarse pitch, a same 1:1 line to space ratio and segmented into fine elements at a same fine pitch, wherein the segmented periodic structures differ from each other in that one thereof lacks at least one of its corresponding fine elements and/or in that one thereof comprises two groups of the fine elements which are separated from each other by a multiple of the fine pitch. The missing element(s) and/or central gap enable deriving the estimation of aberration effects from measurements of the corresponding segmented periodic structures. The fine pitches may be selected to correspond to the device fine pitches in the corresponding layer.
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公开(公告)号：US10565697B2
公开(公告)日：2020-02-18
申请号：US15739381
申请日：2017-10-22
Applicant: KLA-Tencor Corporation
Inventor： Tzahi Grunzweig , Nadav Gutman , David Gready , Mark Ghinovker , Vladimir Levinski , Claire E. Staniunas , Nimrod Shuall , Yuri Paskover
Abstract: Systems and methods are provided, which calculate overlay misregistration error estimations from analyzed measurements of each ROI (region of interest) in at least one metrology imaging target, and incorporate the calculated overlay misregistration error estimations in a corresponding estimation of overlay misregistration. Disclosed embodiments provide a graduated and weighted analysis of target quality which may be integrated in a continuous manner into the metrology measurement processes, and moreover evaluates target quality in terms of overlay misregistration, which forms a common basis for evaluation of errors from different sources, such as characteristics of production steps, measurement parameters and target characteristics. Such common basis then enables any of combining various error sources to give a single number associated with measurement fidelity, analyzing various errors at wafer, lot and process levels, and/or to trade-off the resulting accuracy for throughput by reducing the number of measurements, in a controlled manner.
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Patent Agency Ranking
公开(公告)号：US10551749B2
公开(公告)日：2020-02-04
申请号：US15442111
申请日：2017-02-24
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Amnon Manassen , Eran Amit , Nuriel Amir , Liran Yerushalmi , Amit Shaked
IPC: G03F7/20
Abstract: Metrology targets, production processes and optical systems are provided, which enable metrology of device-like targets. Supplementary structure(s) may be introduced in the target to interact optically with the bottom layer and/or with the top layer of the target and target cells configurations enable deriving measurements of device-characteristic features. For example, supplementary structure(s) may be designed to yield Moiré patterns with one or both layers, and metrology parameters may be derived from these patterns. Device production processes were adapted to enable production of corresponding targets, which may be measured by standard or by provided modified optical systems, configured to enable phase measurements of the Moiré patterns.
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公开(公告)号：US10458777B2
公开(公告)日：2019-10-29
申请号：US14949444
申请日：2015-11-23
Applicant: KLA-TENCOR CORPORATION
Inventor： Eran Amit , Barry Loevsky , Andrew Hill , Amnon Manassen , Nuriel Amir , Vladimir Levinski , Roie Volkovich
Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.
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68.发明授权公开(公告)号：US10337991B2
公开(公告)日：2019-07-02
申请号：US15115752
申请日：2016-06-01
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski
Abstract: Metrology scatterometry targets, optical systems and corresponding metrology tools and measurement methods are provided. Targets and/or optical systems are designed to enhance first order diffraction signals with respect to a zeroth order diffraction signal from the scatterometry target by creating a phase shift of 180° between zeroth order diffraction signals upon illumination of the scatterometry targets. For example, the targets may be designed to respond to polarized illumination by producing a first phase shift between zeroth order diffraction signals upon illumination thereof and optical systems may be designed to illuminate the target by polarized illumination and to analyze a resulting diffraction signal to yield a second phase shift between zeroth order diffraction signals upon illumination thereof. The phase shifts add up to 180° to cancel out the zeroth order diffraction signals, with either phase shift being between 0 and 180°.
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公开(公告)号：US10228320B1
公开(公告)日：2019-03-12
申请号：US14820917
申请日：2015-08-07
Applicant: KLA—Tencor Corporation
Inventor： Vladimir Levinski , Daniel Kandel
Abstract: Target design methods, targets as well as scanner aberration methods and device design improvements are provided. Metrology targets may be designed by identifying at least two geometric elements in a specified device design, and designing corresponding at least two target cells of an overlay metrology target to have structures related to the at least two geometric elements. Non-printed filling elements may be added to target or device designs which exhibit large spaces (e.g., larger than twice the minimal design rule pitch) in order to avoid placement error and other inaccuracies. Scanner aberrations themselves may be measured using corresponding targets as well.
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公开(公告)号：US10139528B1
公开(公告)日：2018-11-27
申请号：US15408351
申请日：2017-01-17
Applicant: KLA-Tencor Corporation
Inventor： Joel Seligson , Vladimir Levinski , Yuri Paskover , Amnon Manassen , Daniel Kandel , Andrew V. Hill
Abstract: Objective lenses and corresponding optical systems and metrology tools, as well as methods are provided. Objective lenses comprise a central region conforming to specified imaging requirements and a peripheral region conforming to specified scatterometry requirements. The optical systems may comprise common-path optical elements configured to handle both imaging and scatterometry signals received through the objective lens. Using a single objective lens simplifies the design of the optical system while maintaining, simultaneously, the performance requirements for imaging as well as for scatterometry.
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