公开(公告)号：US08671959B2

公开(公告)日：2014-03-18

申请号：US13252859

申请日：2011-10-04

申请人： John M. de Larios ,  Mike Ravkin ,  Jeffrey Farber ,  Mikhail Korolik ,  Fred C. Redeker

发明人： John M. de Larios ,  Mike Ravkin ,  Jeffrey Farber ,  Mikhail Korolik ,  Fred C. Redeker

IPC分类号： B08B3/00

CPC分类号： H01L21/67057 ,  B08B3/003 ,  B08B7/0014 ,  C11D7/5004 ,  C11D11/0047 ,  H01L21/02057 ,  H01L21/67051 ,  Y10S134/902

摘要： An apparatus for cleaning a substrate includes an application unit having a top inlet conduit and a bottom plate section. The top inlet conduit has an opening for receiving a non-Newtonian fluid and the bottom plate section has an opening through which the non-Newtonian fluid can flow. The bottom plate section is perpendicular to the top inlet conduit, and a surface of the bottom plate section is disposed above and parallel to a surface of a substrate so as to define a gap between the surface of the bottom plate section and the surface of the substrate. The defined gap has a height configured to create a flow of the non-Newtonian fluid in which a portion of the flow exhibits plug flow, and the plug flow moves over the surface of the substrate to remove particles from the surface of the substrate.

摘要翻译： 用于清洁基板的装置包括具有顶部入口导管和底板部分的施加单元。 顶部入口导管具有用于接收非牛顿流体的开口，底板部分具有非牛顿流体可以流过的开口。 底板部分垂直于顶部入口导管，并且底板部分的表面设置在基板的表面上方并平行于基板的表面，以便限定底板部分的表面与底板部分的表面之间的间隙 基质。 限定的间隙具有构造成产生非牛顿流体的流动的高度，其中流体的一部分显示出塞子流动，并且塞子流动在衬底的表面上移动以从衬底的表面移除颗粒。

公开(公告)号：US20120017950A1

公开(公告)日：2012-01-26

申请号：US13252859

申请日：2011-10-04

申请人： John M. de Larios ,  Mike Ravkin ,  Jeffrey Farber ,  Mikhail Korolik ,  Fred C. Redeker

发明人： John M. de Larios ,  Mike Ravkin ,  Jeffrey Farber ,  Mikhail Korolik ,  Fred C. Redeker

IPC分类号： B08B3/04

CPC分类号： H01L21/67057 ,  B08B3/003 ,  B08B7/0014 ,  C11D7/5004 ,  C11D11/0047 ,  H01L21/02057 ,  H01L21/67051 ,  Y10S134/902

摘要： A method for cleaning a substrate is provided. In this method, a flow of non-Newtonian fluid is provided where at least a portion of the flow exhibits plug flow. To remove particles from a surface of the substrate, the surface of the substrate is placed in contact with the portion of the flow that exhibits plug flow such that the portion of the flow exhibiting plug flow moves over the surface of the substrate. Additional methods and apparatuses for cleaning a substrate also are described.

摘要翻译： 提供一种清洗基板的方法。 在该方法中，提供了非牛顿流体的流动，其中至少一部分流动呈现出流动。 为了从基板的表面去除颗粒，将基板的表面与显示塞子流的流动部分接触，使得显示塞子流的流动部分在基板的表面上移动。 还描述了用于清洁基板的附加方法和装置。

公开(公告)号：US08043441B2

公开(公告)日：2011-10-25

申请号：US11153957

申请日：2005-06-15

申请人： John M. de Larios ,  Mike Ravkin ,  Jeffrey Farber ,  Mikhail Korolik ,  Fred C. Redeker

发明人： John M. de Larios ,  Mike Ravkin ,  Jeffrey Farber ,  Mikhail Korolik ,  Fred C. Redeker

IPC分类号： B08B3/00

CPC分类号： H01L21/67057 ,  B08B3/003 ,  B08B7/0014 ,  C11D7/5004 ,  C11D11/0047 ,  H01L21/02057 ,  H01L21/67051 ,  Y10S134/902

摘要： A method for cleaning a substrate is provided. In this method, a flow of non-Newtonian fluid is provided where at least a portion of the flow exhibits plug flow. To remove particles from a surface of the substrate, the surface of the substrate is placed in contact with the portion of the flow that exhibits plug flow such that the portion of the flow exhibiting plug flow moves over the surface of the substrate. Additional methods and apparatuses for cleaning a substrate also are described.

摘要翻译： 提供一种清洗基板的方法。 在该方法中，提供了非牛顿流体的流动，其中至少一部分流动呈现出流动。 为了从基板的表面去除颗粒，将基板的表面与显示塞子流的流动部分接触，使得显示塞子流的流动部分在基板的表面上移动。 还描述了用于清洁基板的附加方法和装置。

公开(公告)号：US20100071730A1

公开(公告)日：2010-03-25

申请号：US12624369

申请日：2009-11-23

申请人： Mike Ravkin ,  Mikhail Korolik ,  Mark Wilcoxson

发明人： Mike Ravkin ,  Mikhail Korolik ,  Mark Wilcoxson

IPC分类号： B08B3/00

CPC分类号： C25D5/08 ,  B82Y40/00 ,  C25D5/22 ,  C25D7/12 ,  C25D17/001 ,  C25D17/02 ,  C25D21/10 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051

摘要： Provided are methods for processing a substrate using a proximity system defined by one or more meniscus windows on one or more proximity heads. One method includes applying a first fluid meniscus to a surface of the substrate to apply a chemical precursor to the surface of the substrate. The first fluid meniscus is applied to first proximity meniscus window. Then, applying a second fluid meniscus to the surface of the substrate to leave an atomic layer of the chemical precursor on the surface of the substrate, through a second proximity meniscus window. A third fluid meniscus is applied to the surface of the substrate to apply a chemical reactant configured to react with the atomic layer of the chemical precursor to generate a layer of a material, through a third proximity meniscus window. The first, second and third proximity meniscus windows are arranged to apply the first fluid meniscus, the second fluid meniscus and the third fluid meniscus one after the other to a same location of the surface of the substrate during movement of the substrate through the proximity system.

摘要翻译： 提供了使用由一个或多个邻近头上的一个或多个弯液面窗口限定的接近系统来处理衬底的方法。 一种方法包括将第一流体弯月面施加到衬底的表面以将化学前体施加到衬底的表面。 第一流体弯液面被应用于第一接近弯月面窗口。 然后，将第二流体弯月面施加到衬底的表面，以通过第二接近弯月面窗口在衬底的表面上留下化学前体的原子层。 将第三流体弯液面施加到基底的表面，以施加配置成与化学前体的原子层反应以产生材料层的化学反应物，通过第三接近弯月面窗口。 第一，第二和第三接近弯液面窗口被布置成在衬底通过邻近系统移动期间将第一流体弯月面，第二流体弯月面和第三流体弯月面一个接一个地施加到衬底的表面的相同位置 。

公开(公告)号：US07632376B1

公开(公告)日：2009-12-15

申请号：US11173729

申请日：2005-06-30

申请人： Mike Ravkin ,  Mikhail Korolik ,  Mark Wilcoxson

发明人： Mike Ravkin ,  Mikhail Korolik ,  Mark Wilcoxson

IPC分类号： C23F1/00 ,  H01L21/306

CPC分类号： C25D5/08 ,  B82Y40/00 ,  C25D5/22 ,  C25D7/12 ,  C25D17/001 ,  C25D17/02 ,  C25D21/10 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051

摘要： An apparatus for processing a substrate is provided which includes a first process window configured to apply a first fluid meniscus between the first process window and a surface of the substrate. The apparatus further includes a second process window configured to generate a second fluid meniscus between the second process window and the surface of the substrate. The apparatus further includes a third process window configured to generate a third fluid meniscus between the third process window and the surface of the substrate. The apparatus is configured to apply the first fluid meniscus, the second fluid meniscus, and the third fluid meniscus to the surface of the substrate in order during an atomic layer deposition operation.

摘要翻译： 提供了一种用于处理衬底的设备，其包括构造成在第一工艺窗和衬底的表面之间施加第一流体弯月面的第一工艺窗。 该装置还包括第二处理窗口，其被配置为在第二处理窗口和基板的表面之间产生第二流体弯液面。 该装置还包括第三处理窗口，其被配置为在第三处理窗口和基板的表面之间产生第三流体弯液面。 该装置构造成在原子层沉积操作期间依次将第一流体弯液面，第二流体弯液面和第三流体弯月面施加到衬底的表面。

公开(公告)号：US07416370B2

公开(公告)日：2008-08-26

申请号：US11154129

申请日：2005-06-15

申请人： John M. de Larios ,  Mike Ravkin ,  John Parks ,  Mikhail Korolik ,  Fred C. Redeker

发明人： John M. de Larios ,  Mike Ravkin ,  John Parks ,  Mikhail Korolik ,  Fred C. Redeker

IPC分类号： B65G51/16

CPC分类号： H01L21/67784 ,  H01L21/67057

摘要： A method for transporting a substrate is provided. In this method, a non-Newtonian fluid is provided and the substrate is suspended in the non-Newtonian fluid. The non-Newtonian fluid is capable of supporting the substrate. Thereafter, a supply force is applied on the non-Newtonian fluid to cause the non-Newtonian fluid to flow, whereby the flow is capable of moving the substrate along a direction of the flow. Apparatuses and systems for transporting the substrate using the non-Newtonian fluid also are described.

摘要翻译： 提供了一种输送基板的方法。 在该方法中，提供了非牛顿流体，并将基底悬挂在非牛顿流体中。 非牛顿流体能够支撑基底。 此后，向非牛顿流体施加供应力以使非牛顿流体流动，由此流动能够沿着流动方向移动基底。 还描述了使用非牛顿流体输送基底的装置和系统。

公开(公告)号：US20060285930A1

公开(公告)日：2006-12-21

申请号：US11154129

申请日：2005-06-15

申请人： John de Larios ,  Mike Ravkin ,  John Parks ,  Mikhail Korolik ,  Fred Redeker

发明人： John de Larios ,  Mike Ravkin ,  John Parks ,  Mikhail Korolik ,  Fred Redeker

IPC分类号： B65G53/00

CPC分类号： H01L21/67784 ,  H01L21/67057

摘要： A method for transporting a substrate is provided. In this method, a non-Newtonian fluid is provided and the substrate is suspended in the non-Newtonian fluid. The non-Newtonian fluid is capable of supporting the substrate. Thereafter, a supply force is applied on the non-Newtonian fluid to cause the non-Newtonian fluid to flow, whereby the flow is capable of moving the substrate along a direction of the flow. Apparatuses and systems for transporting the substrate using the non-Newtonian fluid also are described.

摘要翻译： 提供了一种输送基板的方法。 在该方法中，提供了非牛顿流体，并将基底悬挂在非牛顿流体中。 非牛顿流体能够支撑基底。 此后，向非牛顿流体施加供应力以使非牛顿流体流动，由此流动能够沿着流动方向移动基底。 还描述了使用非牛顿流体输送基底的装置和系统。

公开(公告)号：US20060283486A1

公开(公告)日：2006-12-21

申请号：US11153957

申请日：2005-06-15

申请人： John de Larios ,  Mike Ravkin ,  Jeffrey Farber ,  Mikhail Korolik ,  Fred Redeker

发明人： John de Larios ,  Mike Ravkin ,  Jeffrey Farber ,  Mikhail Korolik ,  Fred Redeker

IPC分类号： B08B3/00

CPC分类号： H01L21/67057 ,  B08B3/003 ,  B08B7/0014 ,  C11D7/5004 ,  C11D11/0047 ,  H01L21/02057 ,  H01L21/67051 ,  Y10S134/902

摘要： A method for cleaning a substrate is provided. In this method, a flow of non-Newtonian fluid is provided where at least a portion of the flow exhibits plug flow. To remove particles from a surface of the substrate, the surface of the substrate is placed in contact with the portion of the flow that exhibits plug flow such that the portion of the flow exhibiting plug flow moves over the surface of the substrate. Additional methods and apparatuses for cleaning a substrate also are described.

摘要翻译： 提供一种清洗基板的方法。 在该方法中，提供了非牛顿流体的流动，其中至少一部分流动呈现出流动。 为了从基板的表面去除颗粒，将基板的表面与显示塞子流的流动部分接触，使得显示塞子流的流动部分在基板的表面上移动。 还描述了用于清洁基板的附加方法和装置。

公开(公告)号：US07534307B2

公开(公告)日：2009-05-19

申请号：US12129679

申请日：2008-05-30

申请人： Michael Ravkin ,  Michael G. R. Smith ,  John M. de Larios ,  Fritz Redeker ,  Mikhail Korolik ,  Christian DiPietro

发明人： Michael Ravkin ,  Michael G. R. Smith ,  John M. de Larios ,  Fritz Redeker ,  Mikhail Korolik ,  Christian DiPietro

IPC分类号： B08B5/04 ,  B08B3/04

CPC分类号： H01L21/67051 ,  C25D5/08 ,  C25D17/00 ,  C25D17/001 ,  H01L21/67023 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67063 ,  Y10S134/902

摘要： Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a fluid meniscus. The generating includes moving a head in proximity to the surface, applying a fluid from the head to the surface while the head is in proximity to the surface of the substrate to define the fluid layer, and removing the fluid from the surface through the proximity head by a vacuum. The fluid travels along the fluid layer between the head and the substrate at a velocity that increases as the head is in closer proximity to the surface.

摘要翻译： 在许多实施例中，在一个实施例中，公开了一种用于处理衬底的方法，其包括在衬底的表面上产生流体层，流体层限定流体弯液面。 该产生包括将头部移动到靠近表面的位置，将流体从头部施加到表面，同时头部靠近基底的表面以限定流体层，并且通过邻近头部从表面移除流体 通过真空。 流体沿着头部和基底之间的流体层以随着头部更接近表面而增加的速度行进。

公开(公告)号：US07383843B2

公开(公告)日：2008-06-10

申请号：US10882835

申请日：2004-06-30

申请人： Michael Ravkin ,  Michael G. R. Smith ,  John M. de Larios ,  Fritz Redeker ,  Mikhail Korolik ,  Christian DiPietro

发明人： Michael Ravkin ,  Michael G. R. Smith ,  John M. de Larios ,  Fritz Redeker ,  Mikhail Korolik ,  Christian DiPietro

IPC分类号： B08B3/00 ,  F26B5/04

CPC分类号： H01L21/67051 ,  C25D5/08 ,  C25D17/00 ,  C25D17/001 ,  H01L21/67023 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67063 ,  Y10S134/902

摘要： Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a fluid meniscus. The generating includes moving a head in proximity to the surface, applying a fluid from the head to the surface while the head is in proximity to the surface of the substrate to define the fluid layer, and removing the fluid from the surface through the proximity head by a vacuum. The fluid travels along the fluid layer between the head and the substrate at a velocity that increases as the head is in closer proximity to the surface.

摘要翻译： 在许多实施例中，在一个实施例中，公开了一种用于处理衬底的方法，其包括在衬底的表面上产生流体层，流体层限定流体弯液面。 该产生包括将头部移动到靠近表面的位置，将流体从头部施加到表面，同时头部靠近基底的表面以限定流体层，并且通过邻近头部从表面移除流体 通过真空。 流体沿着头部和基底之间的流体层以随着头部更接近表面而增加的速度行进。