公开(公告)号：US07293571B2

公开(公告)日：2007-11-13

申请号：US10817355

申请日：2004-04-01

申请人： Carl Woods ,  Michael G. R. Smith ,  John Parks

发明人： Carl Woods ,  Michael G. R. Smith ,  John Parks

IPC分类号： B08B3/00

CPC分类号： B08B3/02 ,  C25D5/08 ,  C25D17/00 ,  C25D17/001 ,  C25D21/00 ,  H01L21/02057 ,  H01L21/67023 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67051 ,  H01L21/67063 ,  H01L21/6708 ,  Y10S134/902

摘要： An apparatus for generating a fluid meniscus to be formed on a surface of a substrate is provided including a housing where the housing includes a housing surface to be placed proximate to a substrate surface of the substrate. The housing further includes a process configuration receiving region that is surrounded by the housing surface. The apparatus also includes a process configuration insert which has an insert surface where the process configuration insert is defined to fit within the process configuration receiving region of the housing such that the insert surface and the housing surface define a proximity face that can be placed proximate to the substrate surface of the substrate.

摘要翻译： 提供了一种用于产生要形成在基板的表面上的流体弯液面的装置，其包括壳体，其中壳体包括靠近基板的基板表面放置的壳体表面。 壳体还包括由壳体表面包围的过程配置接收区域。 该设备还包括具有插入表面的过程配置插入件，其中该过程配置插入件被限定为适合于壳体的过程配置接收区域内，使得插入表面和壳体表面限定可以靠近 衬底的衬底表面。

公开(公告)号：US06954993B1

公开(公告)日：2005-10-18

申请号：US10883301

申请日：2004-06-30

申请人： Michael G. R. Smith ,  Michael Ravkin ,  Robert J. O'Donnell

发明人： Michael G. R. Smith ,  Michael Ravkin ,  Robert J. O'Donnell

IPC分类号： F26B5/04 ,  F26B7/00 ,  F26B13/30 ,  H01L21/00

CPC分类号： H01L21/67051 ,  H01L21/67017 ,  H01L21/67023 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67063 ,  H01L21/67075 ,  H01L21/6708

摘要： In one of the many embodiments, a method for processing a substrate is disclosed which includes generating a first fluid meniscus and a second fluid meniscus at least partially surrounding the first fluid meniscus wherein the first fluid meniscus and the second fluid meniscus are generated on a surface of the substrate.

摘要翻译： 在许多实施例中的一个实施例中，公开了一种用于处理衬底的方法，其包括产生至少部分围绕第一流体弯液面的第一流体弯月面和第二流体弯液面，其中在表面上产生第一流体弯液面和第二流体弯液面 的基底。

公开(公告)号：US06302966B1

公开(公告)日：2001-10-16

申请号：US09439675

申请日：1999-11-15

申请人： Andrew D. Bailey, III ,  Alan M. Schoepp ,  Michael G. R. Smith ,  Andras Kuthi

发明人： Andrew D. Bailey, III ,  Alan M. Schoepp ,  Michael G. R. Smith ,  Andras Kuthi

IPC分类号： C23C1646

CPC分类号： H01J37/32522

摘要： A plasma processing system that includes a temperature management system and method that can achieve very accurate temperature control over a plasma processing apparatus is disclosed. In one embodiment, the temperature management system and method operate to achieve tight temperature control over surfaces of the plasma processing apparatus which interact with the plasma during fabrication of semiconductor devices. The tight temperature control offered by the invention can be implemented with combination heating and cooling blocks such that both heating and cooling can be provided from the same thermal interface.

摘要翻译： 公开了一种等离子体处理系统，其包括能够对等离子体处理装置实现非常精确的温度控制的温度管理系统和方法。 在一个实施例中，温度管理系统和方法用于在半导体器件的制造期间实现与等离子体相互作用的等离子体处理装置的表面的紧密温度控制。 本发明提供的严格的温度控制可以通过组合加热和冷却块实现，使得可以从相同的热界面提供加热和冷却。

公开(公告)号：US07383843B2

公开(公告)日：2008-06-10

申请号：US10882835

申请日：2004-06-30

申请人： Michael Ravkin ,  Michael G. R. Smith ,  John M. de Larios ,  Fritz Redeker ,  Mikhail Korolik ,  Christian DiPietro

发明人： Michael Ravkin ,  Michael G. R. Smith ,  John M. de Larios ,  Fritz Redeker ,  Mikhail Korolik ,  Christian DiPietro

IPC分类号： B08B3/00 ,  F26B5/04

CPC分类号： H01L21/67051 ,  C25D5/08 ,  C25D17/00 ,  C25D17/001 ,  H01L21/67023 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67063 ,  Y10S134/902

摘要： Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a fluid meniscus. The generating includes moving a head in proximity to the surface, applying a fluid from the head to the surface while the head is in proximity to the surface of the substrate to define the fluid layer, and removing the fluid from the surface through the proximity head by a vacuum. The fluid travels along the fluid layer between the head and the substrate at a velocity that increases as the head is in closer proximity to the surface.

摘要翻译： 在许多实施例中，在一个实施例中，公开了一种用于处理衬底的方法，其包括在衬底的表面上产生流体层，流体层限定流体弯液面。 该产生包括将头部移动到靠近表面的位置，将流体从头部施加到表面，同时头部靠近基底的表面以限定流体层，并且通过邻近头部从表面移除流体 通过真空。 流体沿着头部和基底之间的流体层以随着头部更接近表面而增加的速度行进。

公开(公告)号：US06518705B2

公开(公告)日：2003-02-11

申请号：US10033807

申请日：2001-12-18

申请人： Mark H. Wilcoxson ,  Andrew D. Bailey, III ,  Andras Kuthi ,  Michael G. R. Smith ,  Alan M. Schoepp

发明人： Mark H. Wilcoxson ,  Andrew D. Bailey, III ,  Andras Kuthi ,  Michael G. R. Smith ,  Alan M. Schoepp

IPC分类号： H01J724

CPC分类号： H01J37/321 ,  H01J37/32467

摘要： An antenna arrangement for generating an electric field inside a process chamber is provided. Generally, the antenna arrangement comprises a first loop disposed around an antenna axis. The first loop comprises a first turn with a first turn gap; a second turn with a second turn gap, where the second turn is concentric and coplanar with the first turn and spaced apart from the first turn, and where the antenna axis passes through the center of the first turn and second turn; and a first turn-second turn connector electrically connected between a second end of the first turn and a first end of the second turn comprising a spanning section between and coplanar with the first turn and the second turn and which spans the first turn gap and the second turn gap.

公开(公告)号：US08236382B2

公开(公告)日：2012-08-07

申请号：US10882716

申请日：2004-06-30

申请人： Michael Ravkin ,  John M. de Larios ,  Mikhail Korolik ,  Michael G. R. Smith ,  Carl Woods

发明人： Michael Ravkin ,  John M. de Larios ,  Mikhail Korolik ,  Michael G. R. Smith ,  Carl Woods

IPC分类号： B05D3/00 ,  B05D3/10

CPC分类号： H01L21/67046 ,  B08B1/04 ,  B08B3/04 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051

摘要： A method for preparing a surface of a substrate is provided. The method includes scanning the surface of the substrate by a meniscus, preparing the surface of the substrate using the meniscus, and performing a next preparation operation on the surface of the substrate that was prepared without performing a rinsing operation.

摘要翻译： 提供了制备基板表面的方法。 该方法包括通过弯液面扫描基板的表面，使用弯月面准备基板的表面，并且在不执行漂洗操作的情况下对基板的表面进行下一个准备操作。

公开(公告)号：US07406972B2

公开(公告)日：2008-08-05

申请号：US11903289

申请日：2007-09-21

申请人： Carl Woods ,  Michael G. R. Smith ,  John Parks

发明人： Carl Woods ,  Michael G. R. Smith ,  John Parks

IPC分类号： B08B3/00

CPC分类号： B08B3/02 ,  C25D5/08 ,  C25D17/00 ,  C25D17/001 ,  C25D21/00 ,  H01L21/02057 ,  H01L21/67023 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67051 ,  H01L21/67063 ,  H01L21/6708 ,  Y10S134/902

摘要： An apparatus for generating a fluid meniscus to process a substrate is provided. The apparatus includes a manifold head with a manifold surface having a plurality of conduits configured to generate a fluid meniscus on a substrate surface when positioned proximate the substrate. The manifold head has a plurality of passages capable of communicating fluids with the plurality of conduits. The apparatus also includes an interface membrane attached to a portion of the manifold head. The interface membrane is configured to block a portion of the plurality of conduits during operation.

摘要翻译： 提供了一种用于产生流体弯液面以处理衬底的装置。 该装置包括具有歧管表面的歧管头，歧管表面具有多个导管，其被配置成当定位在衬底附近时在衬底表面上产生流体弯液面。 歧管头部具有能够与多个管道连通的多个通道。 该装置还包括附接到歧管头部的一部分的界面膜。 界面膜构造成在操作期间阻挡多个管道的一部分。

公开(公告)号：US07909934B2

公开(公告)日：2011-03-22

申请号：US11217523

申请日：2005-08-31

申请人： John Boyd ,  Andras Kuthi ,  Michael G. R. Smith ,  Thomas W. Anderson ,  William Thie

发明人： John Boyd ,  Andras Kuthi ,  Michael G. R. Smith ,  Thomas W. Anderson ,  William Thie

IPC分类号： B08B7/00 ,  B08B7/04

CPC分类号： H01L21/67253 ,  B06B1/0253 ,  B06B2201/71 ,  B08B3/10 ,  B08B3/12 ,  H01L21/67057 ,  Y10S134/902

摘要： A system and method of cleaning a substrate includes a megasonic chamber that includes a transducer and a substrate. The transducer is being oriented toward the substrate. A variable distance d separates the transducer and the substrate. The system also includes a dynamically adjustable RF generator that has an output coupled to the transducer.

摘要翻译： 清洁衬底的系统和方法包括包括换能器和衬底的兆声波室。 换能器朝向基板。 可变距离d分离换能器和基板。 该系统还包括具有耦合到换能器的输出的动态可调的RF发生器。

公开(公告)号：US07534307B2

公开(公告)日：2009-05-19

申请号：US12129679

申请日：2008-05-30

申请人： Michael Ravkin ,  Michael G. R. Smith ,  John M. de Larios ,  Fritz Redeker ,  Mikhail Korolik ,  Christian DiPietro

发明人： Michael Ravkin ,  Michael G. R. Smith ,  John M. de Larios ,  Fritz Redeker ,  Mikhail Korolik ,  Christian DiPietro

IPC分类号： B08B5/04 ,  B08B3/04

CPC分类号： H01L21/67051 ,  C25D5/08 ,  C25D17/00 ,  C25D17/001 ,  H01L21/67023 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67063 ,  Y10S134/902

摘要： Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a fluid meniscus. The generating includes moving a head in proximity to the surface, applying a fluid from the head to the surface while the head is in proximity to the surface of the substrate to define the fluid layer, and removing the fluid from the surface through the proximity head by a vacuum. The fluid travels along the fluid layer between the head and the substrate at a velocity that increases as the head is in closer proximity to the surface.

摘要翻译： 在许多实施例中，在一个实施例中，公开了一种用于处理衬底的方法，其包括在衬底的表面上产生流体层，流体层限定流体弯液面。 该产生包括将头部移动到靠近表面的位置，将流体从头部施加到表面，同时头部靠近基底的表面以限定流体层，并且通过邻近头部从表面移除流体 通过真空。 流体沿着头部和基底之间的流体层以随着头部更接近表面而增加的速度行进。

公开(公告)号：US07389783B2

公开(公告)日：2008-06-24

申请号：US10817133

申请日：2004-04-01

申请人： Carl Woods ,  Michael G. R. Smith ,  John Parks ,  James P. Garcia ,  John M. de Larios

发明人： Carl Woods ,  Michael G. R. Smith ,  John Parks ,  James P. Garcia ,  John M. de Larios

IPC分类号： B08B3/02

CPC分类号： H01L21/67063 ,  B05C9/02 ,  H01L21/02052 ,  H01L21/67023 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67051 ,  H01L21/6708 ,  Y10S134/902

摘要： An apparatus for processing a substrate is provided which includes a first manifold module to generate a fluid meniscus on a substrate surface. The apparatus also includes a second manifold module to connect with the first manifold module and also to move the first manifold module into close proximity to the substrate surface to generate the fluid meniscus.

摘要翻译： 提供了一种用于处理衬底的设备，其包括用于在衬底表面上产生流体弯液面的第一歧管模块。 该装置还包括与第一歧管模块连接并且还将第一歧管模块移动到靠近衬底表面以产生流体弯液面的第二歧管模块。