公开(公告)号：US06365228B1

公开(公告)日：2002-04-02

申请号：US09685430

申请日：2000-10-10

申请人： Cheng-Yuan Tsai ,  Ming-Sheng Yang ,  Chin-Hsiang Lin

发明人： Cheng-Yuan Tsai ,  Ming-Sheng Yang ,  Chin-Hsiang Lin

IPC分类号： B05D312

CPC分类号： H01L21/02304 ,  H01L21/02118 ,  H01L21/0214 ,  H01L21/02164 ,  H01L21/02167 ,  H01L21/0217 ,  H01L21/02282 ,  H01L21/312 ,  H01L21/316

摘要： A process for spin-on coating with an organic material having a low dielectric constant, which is suitable for a substrate. A dielectric base layer capable of protecting metal is formed on the substrate, an adhesive promoter layer is formed on the dielectric base layer, and the adhesive promoter layer is baked. A solvent is then used to clean the substrate and simultaneously to dissolve a part of the adhesive promoter layer in order to flatten the adhesive promoter layer. Afterwards, a layer of an organic material with a low dielectric constant is spin-on coated on the adhesive promoter layer, and the layer of an organic material with a low dielectric constant is baked and cured.

摘要翻译： 一种适用于基材的具有低介电常数的有机材料的旋涂方法。 在基板上形成能够保护金属的电介质基层，在电介质基底层上形成粘合剂促进剂层，并烘烤粘合促进剂层。 然后使用溶剂来清洁基底并同时溶解部分粘合促进剂层以使粘合剂促进剂层变平。 然后，将具有低介电常数的有机材料层旋涂在粘合剂促进剂层上，并且将具有低介电常数的有机材料层烘焙和固化。

公开(公告)号：US6001733A

公开(公告)日：1999-12-14

申请号：US164856

申请日：1998-10-01

申请人： Yimin Huang ,  Ming-Sheng Yang ,  Tri-Rung Yew

发明人： Yimin Huang ,  Ming-Sheng Yang ,  Tri-Rung Yew

IPC分类号： H01L21/3205 ,  H01L21/321 ,  H01L21/768 ,  H01L23/52 ,  H01L21/44

CPC分类号： H01L21/76843 ,  H01L21/3212 ,  H01L21/76808 ,  H01L21/76813 ,  H01L21/7684 ,  H01L2221/1031

摘要： A method for forming dual damascene is provided. First, a first inter-metal dielectric layer and a stop layer is formed on a substrate, and then a first photoresist pattern including a via hole and a dummy metal line is patterned and the stop layer is etched for forming via hole. Next, a second inter-metal dielectric layer is deposited and then a second photoresist pattern is patterned for forming metal line trench by etching. Afterwards, a glue layer and a metal layer are blanketed and the dual damascene structure is formed by chemical mechanical polishing.

摘要翻译： 提供了一种形成双镶嵌的方法。 首先，在基板上形成第一金属间介电层和停止层，然后对包括通孔和虚拟金属线的第一光致抗蚀剂图案进行图案化，并且对停止层进行蚀刻以形成通孔。 接下来，沉积第二金属间介电层，然后对第二光致抗蚀剂图案进行图案化以通过蚀刻形成金属线沟槽。 然后，胶合层和金属层被覆盖，并通过化学机械抛光形成双镶嵌结构。

公开(公告)号：US5487485A

公开(公告)日：1996-01-30

申请号：US421535

申请日：1995-04-13

申请人： Ming-Sheng Yang ,  Yu-Show Cherng ,  Chien-Te Lu

发明人： Ming-Sheng Yang ,  Yu-Show Cherng ,  Chien-Te Lu

IPC分类号： B65D90/04 ,  B65D81/00

CPC分类号： B65D90/048 ,  B65D2590/046

摘要： A liner for a cargo container includes an expansible liner body shaped to fit a cargo space of the cargo container. The liner body includes top and bottom panels, left and right panels interconnecting the top and bottom panels, and front and rear panels. The top, bottom, left, right, front and rear panels together define an accommodation space thereamong for receiving bulk cargo. The rear panel has an outlet opening communicated with the accommodation space. Two first and second reinforcing members are secured respectively to and along the front edges of the left and right panels. Two first and second connecting members are secured respectively to and along the left and right edges of the bottom panel near the rear panel. Two left and right pulling members are mounted respectively to the first and second connecting members to pull the first and second connecting members upwardly and to raise the dead corners formed adjacent to the first and second connecting members to cause parts of the bulk cargo retaining in the dead corners to fall towards the outlet opening.

摘要翻译： 用于货物集装箱的衬里包括形状适合货物集装箱的货物空间的可膨胀衬管主体。 衬套主体包括顶部和底部面板，互连顶部和底部面板以及前后面板的左右面板。 顶部，底部，左侧，右侧，前部和后部面板一起定义了用于接收散装货物的容纳空间。 后面板具有与容纳空间连通的出口。 两个第一加强件和第二加强件分别固定在左边板和右边板的前边缘上。 两个第一和第二连接构件分别固定在底板的左右边缘并靠近后面板。 两个左右牵引构件分别安装在第一和第二连接构件上以将第一和第二连接构件向上拉动并且使靠近第一和第二连接构件形成的死角升高，以使散装货物的一部分保持在 死角落到出口处。