公开(公告)号：US20140295347A1

公开(公告)日：2014-10-02

申请号：US13854078

申请日：2013-03-30

Applicant: Rohm and Haas Electronic Materials, LLC

Inventor： Emad Aqad ,  Irvinder Kaur ,  Cong Liu ,  Cheng-Bai Xu

IPC: G03F7/004 ,  C07D317/34 ,  G03F7/20 ,  C07D319/06

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C2603/74 ,  C07D317/34 ,  C07D317/72 ,  C07D319/06 ,  C07D319/08 ,  G03F7/039 ,  G03F7/0392

Abstract: Acid generator compounds are provided that comprise an oxo-1,3-dioxolane moiety and/or an oxo-1,3-dioxane moiety. The acid generators are particularly useful as a photoresist composition component.

Abstract translation: 提供酸产生剂化合物，其包含氧代-1,3-二氧戊环部分和/或氧代-1,3-二恶烷部分。 酸发生剂特别可用作光致抗蚀剂组合物组分。

公开(公告)号：US08790861B2

公开(公告)日：2014-07-29

申请号：US13723973

申请日：2012-12-21

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Cong Liu ,  Mingqi Li ,  Cheng-Bai Xu

IPC: G03F7/039 ,  G03F7/09 ,  G03F7/20 ,  C07C69/54 ,  C08F20/68

CPC classification number: G03F7/039 ,  C07C69/54 ,  C07C2601/08 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.

Abstract translation: 单体具有式I：其中R 1，R 2和R 3各自独立地为C 1-30单价有机基团，并且R 1，R 2和R 3各自独立地为未取代的或包括卤素，腈，醚，酯，酮，醇 ，或包含至少一个前述官能团的组合; R4包括H，F，C 1-4烷基或C 1-4氟代烷基; A是单键或二价连接基团，其中A是未取代的或被取代的，包括卤素，腈，醚，酯，酮，醇或包含至少一个前述官能团的组合; m和n各自独立地为1至8的整数; x为0〜2n + 2，y为0〜2m + 2。

公开(公告)号：US20130171429A1

公开(公告)日：2013-07-04

申请号：US13711175

申请日：2012-12-11

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Cong Liu ,  Mingqi Li ,  Cheng-Bai Xu

IPC: C07C69/533 ,  G03F7/027

CPC classification number: C07C69/533 ,  C07C69/54 ,  C07C2601/08 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/0397 ,  G03F7/2041 ,  Y10T428/24802

Abstract: A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.

Abstract translation: 单体具有式I：其中R 1，R 2和R 3各自独立地为C 1-30单价有机基团，并且R 1，R 2和R 3各自独立地为未取代的或包括卤素，腈，醚，酯，酮，醇 ，或包含至少一个前述官能团的组合; R4包括H，F，C 1-4烷基或C 1-4氟代烷基; A是单键或二价连接基团，其中A是未取代的或被取代的，包括卤素，腈，醚，酯，酮，醇或包含至少一个前述官能团的组合; m和n各自独立地为1至8的整数; x为0〜2n + 2，y为0〜2m + 2。