公开(公告)号：US07274813B2

公开(公告)日：2007-09-25

申请号：US11204181

申请日：2005-08-16

申请人： Shunji Maeda ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

发明人： Shunji Maeda ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T7/0004 ,  G06T2207/30148

摘要： A method of inspecting defects of a plurality of patterns that are formed on a substrate to have naturally the same shape. According to this method, in order to detect very small defects of the patterns with high sensitivity without being affected by irregular brightness due to the thickness difference between the patterns formed on a semiconductor wafer, a first pattern being inspected is detected to produce a first image of the first pattern, the first image is stored, a second pattern being inspected is detected to produce a second image of said second pattern, the stored first image and the second image are matched in brightness, and the brightness-matched first and second images are compared with each other so that the patterns can be inspected.

摘要翻译： 检查在基板上形成的具有自然相同形状的多个图案的缺陷的方法。 根据该方法，为了以高灵敏度检测图案的非常小的缺陷，不受由于在半导体晶片上形成的图案之间的厚度差而引起的不规则亮度的影响，检测出被检查的第一图案以产生第一图像 第一图案被存储，检测出被检查的第二图案以产生所述第二图案的第二图像，所存储的第一图像和第二图像的亮度相匹配，并且亮度匹配的第一和第二图像 彼此进行比较，从而可以检查图案。

公开(公告)号：US20070177787A1

公开(公告)日：2007-08-02

申请号：US11655226

申请日：2007-01-19

申请人： Shunji Maeda ,  Kaoru Sakai

发明人： Shunji Maeda ,  Kaoru Sakai

IPC分类号： G06K9/00

CPC分类号： G06K9/00557 ,  G06T7/001

摘要： A fault inspection method and apparatus in which the scattergram is separated or objects of comparison are combined in such a manner as to reduce the difference between an inspection object image and a reference image. As a result, the difference between images caused by the thickness difference in the wafer can be tolerated and the false information generation prevented without adversely affecting the sensitivity.

摘要翻译： 将分散图分离的故障检查方法和装置或比较对象组合起来，以减少检查对象图像与参考图像之间的差异。 结果，可以容忍由晶片的厚度差导致的图像之间的差异，并且可以防止错误的信息产生而不会不利地影响灵敏度。

公开(公告)号：US07231079B2

公开(公告)日：2007-06-12

申请号：US10050519

申请日：2002-01-18

申请人： Hirohito Okuda ,  Yuji Takagi ,  Masahiro Watanabe ,  Shunji Maeda ,  Minori Noguchi ,  Yoshimasa Ooshima ,  Makoto Ono

发明人： Hirohito Okuda ,  Yuji Takagi ,  Masahiro Watanabe ,  Shunji Maeda ,  Minori Noguchi ,  Yoshimasa Ooshima ,  Makoto Ono

IPC分类号： G06K9/00

CPC分类号： G01N21/956 ,  G01N21/9501 ,  G01N2021/8854 ,  G01N2021/8861

摘要： For the purpose of reducing a false report and shortening inspection time, an area to be inspected is locally inspected under optimum inspection conditions. In order to avoid the number of detected defects from increasing explosively, and thereby to facilitate control of a critical defect, general-purpose layout data, which is used for producing a mask of a semiconductor wafer, is accumulated in a design information server 2. With reference to the layout data, an area to be inspected, which is inspected by a pattern inspecting apparatus 1, is divided into partial inspection areas including a cell portion and a non-cell portion. Inspection parameters are set for each of the partial inspection areas. In addition, the defect reviewing apparatus 8 obtains an inspection result of the pattern inspecting apparatus 1. When obtaining a defect image, the defect reviewing apparatus 8 identifies a position, where the defect occurred, from among a cell portion, a non-cell portion, a pattern dense portion, and the like according to layout data. Moreover, the defect reviewing apparatus 8 sets inspection parameters, such as pickup magnification of this defect, in response to a result of the identification to set a control criterion of criticality.

摘要翻译： 为了减少虚假报告和缩短检查时间，在最佳检查条件下对被检查区域进行局部检查。 为了避免检测到的缺陷数量爆炸性增加，从而有利于控制关键缺陷，用于制造半导体晶片的掩模的通用布局数据被累积在设计信息服务器2中。 参照布局数据，由图案检查装置1检查的被检查区域被划分为包括单元部分和非单元部分的局部检查区域。 为每个部分检查区域设置检查参数。 另外，缺陷检查装置8获得图案检查装置1的检查结果。 当获得缺陷图像时，缺陷检查装置8根据布局数据从单元部分，非单元部分，图案密集部分等中识别发生缺陷的位置。 此外，缺陷检查装置8响应于识别的结果设置检查参数，例如该缺陷的拾取倍率，以设置关键性的控制标准。

公开(公告)号：US20070064225A1

公开(公告)日：2007-03-22

申请号：US11602247

申请日：2006-11-21

申请人： Yukihiro Shibata ,  Shunji Maeda

发明人： Yukihiro Shibata ,  Shunji Maeda

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01N21/21

摘要： A method and apparatus for detecting a defect in which image signals of a same area of a sample are obtained by imaging the sample under different optical conditions, and the obtained image signals are analyzed and optical conditions are selected which modify a contrast in the image signal. Image signals of the sample under the selected optical conditions are obtained by imaging the sample with an inspection system, and the images under the selected optical conditions are evaluated to adjust optical conditions for inspection including an inspection threshold, which is greater than a maximum contrast difference among false defects detected at the step of obtaining and with which a maximum number of actual defects can be detected. A defect of the sample is detected by processing the image signals of the sample obtained through the inspection system under the adjusted optical conditions.

摘要翻译： 一种检测缺陷的方法和装置，其中通过在不同光学条件下对样本进行成像而获得样品的相同区域的图像信号，并且分析所获得的图像信号，并且选择修改图像信号中的对比度的光学条件 。 通过用检查系统对样品进行成像获得样品的图像信号，并且在所选择的光学条件下评估图像以调整检查的光学条件，包括大于最大对比差的检查阈值 在获取步骤中检测到的虚假缺陷中，可以检测到最大数量的实际缺陷。 通过在调整光学条件下处理通过检查系统获得的样品的图像信号来检测样品的缺陷。

公开(公告)号：US20070058164A1

公开(公告)日：2007-03-15

申请号：US11478617

申请日：2006-07-03

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Hidetoshi Nishiyama

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Hidetoshi Nishiyama

IPC分类号： G01N21/88

CPC分类号： G01N21/95607 ,  G01N2021/8822

摘要： This invention provides a defect inspection method and apparatus that can easily and quickly determine, from among a plurality of inspection conditions, a condition that allows for an inspection with high sensitivity. The inspection apparatus has a variety of optical functions to cover a variety of kinds of defects to be inspected (shape, material, nearby pattern, etc.). For each optical function, grayscale depths of defects that the operator wants detected and of pseudo defects that he or she wants undetected are accumulated for future use, so that conditions conducive to a higher sensitivity and a lower pseudo defect detection rate can be selected efficiently. Conditions that can be selected for optical systems include a bright-field illumination, a dark-field illumination and a bright-/dark-field composite illumination, illumination wavelength bands, polarization filters and spatial filters.

摘要翻译： 本发明提供一种能够从多个检查条件中容易且快速地确定能够以高灵敏度进行检查的条件的缺陷检查方法和装置。 检查装置具有各种光学功能，可以覆盖要检查的各种缺陷（形状，材料，附近图案等）。 对于每个光学功能，操作者想要检测到的缺陷的灰度深度和他或她想要未检测到的伪缺陷被累积以供将来使用，使得可以有效地选择有利于更高灵敏度和更低伪缺陷检测率的条件。 可以选择用于光学系统的条件包括亮场照明，暗场照明和亮/暗场复合照明，照明波长带，偏振滤光器和空间滤光器。

公开(公告)号：US20070002318A1

公开(公告)日：2007-01-04

申请号：US11518195

申请日：2006-09-11

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

IPC分类号： G01N21/88

CPC分类号： G01N21/95607 ,  G01N21/9501 ,  G01N21/95684 ,  G01N2021/9513

摘要： A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.

摘要翻译： 用于检查发射激光束的图案缺陷的方法和装置，调节激光束的光量，将调整光量的激光束转换成狭缝状激光束，降低狭缝状激光光束的相干性 并且用相干减少的狭缝状激光束照射样品。 获得来自样品的反射光的图像，并且提供检测器，其包括用于接收反射光的图像并将其转换成检测到的图像信号的图像传感器。 提供了一种图像处理器，用于根据检测到的图像信号检测在样本上形成的图案上的缺陷。

公开(公告)号：US20060290930A1

公开(公告)日：2006-12-28

申请号：US11434070

申请日：2006-05-16

申请人： Hidetoshi Nishiyama ,  Yukihiro Shibata ,  Shunji Maeda ,  Sachio Uto

发明人： Hidetoshi Nishiyama ,  Yukihiro Shibata ,  Shunji Maeda ,  Sachio Uto

IPC分类号： G01N21/00

CPC分类号： G01N21/95623

摘要： The present invention relates to a pattern defect inspection apparatus, wherein light emitted from an illumination source capable of outputting a plurality of wavelengths is linearly illuminated by an illuminating optical system. Diffracted or scattered light due to a circuit pattern or defect on a wafer is collected by an imaging optical system onto a line sensor and converted into a digital signal, and the defect is detected by a signal processing section. Then, the defect can be detected with high sensitivity since a surface to be formed by an optical axis of the illuminating optical system and an optical axis of the imaging optical system is almost collimated to a direction of a wiring pattern and further since an angle to be formed by the optical axis of the imaging optical system and the wafer is set to an angle with less diffracted light from the pattern. Thereby, the pattern defect inspection detecting various defects on the wafer with high sensitivity at high speed can be achieved.

摘要翻译： 本发明涉及一种图案缺陷检查装置，其中从能够输出多个波长的照明源发射的光线由照明光学系统线性地照亮。 由于晶片上的电路图案或缺陷导致的衍射或散射光被成像光学系统收集到线传感器上并转换成数字信号，并且由信号处理部分检测缺陷。 然后，由于要由照明光学系统的光轴和成像光学系统的光轴形成的表面几乎准直到布线图案的方向，因此可以以高灵敏度检测缺陷，并且进一步由于与 由成像光学系统的光轴形成，并且将晶片设置成与来自图案的较少衍射光的角度。 由此，可以实现以高速度高灵敏度地检测晶片上的各种缺陷的图案缺陷检查。

公开(公告)号：US07142708B2

公开(公告)日：2006-11-28

申请号：US10176611

申请日：2002-06-24

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： An object of the present invention is to provide a defect detection method and its apparatus which can adjust sensitivity easily by managing both reduction in the number of false reports and highly-sensitive detection of a defect using single threshold value setting in comparison inspection that compares an image to be inspected with a reference image to detect a defect judging from a difference between the images. According to the present invention, adjusting the brightness before inspection so that a difference becomes small at the edges of a high-contrast pattern in a target image enables reduction in the number of false reports caused by an alignment error, and achievement of highly-sensitive defect inspection using a low threshold value, without increasing the threshold value. Moreover, in the case of inspection targeted for a semiconductor wafer, which produces a problem of irregularity in brightness of a pattern caused by a difference between film thicknesses, the present invention reduces the number of false reports caused by the irregularity in brightness, and realizes inspection with high sensitivity without increasing a threshold value, by adjusting the brightness of both images before the inspection.

公开(公告)号：US07142294B2

公开(公告)日：2006-11-28

申请号：US10020977

申请日：2001-12-19

申请人： Yukihiro Shibata ,  Shunji Maeda

发明人： Yukihiro Shibata ,  Shunji Maeda

IPC分类号： G01N21/00 ,  G06K9/00

CPC分类号： G01N21/9501 ,  G01N21/21

摘要： An image of a sample that has high contrast both in large and fine pattern parts is acquired by using an optical system for coaxial bright field epi-illumination, forming the optical image of the sample with various transmission ratio of 0-th order diffracted light that is reflected regularly from the sample, and capturing the image by an image sensor. Optical conditioning is automatically set and in a short time by detecting a plurality of optical images of the sample under various conditions for the transmission ratio of the 0-th order diffracted light, evaluating quality of the detected images, and determining the transmission ratio of the 0-th order diffracted light showing the maximum defect detection sensitivity.

摘要翻译： 通过使用用于同轴的亮场表面照明的光学系统来获得具有大的和精细图案部分中的高对比度的样本的图像，以0级衍射光的各种传输比形成样品的光学图像， 从样本中经常反射，并通过图像传感器捕获图像。 通过在各种条件下检测出0级衍射光的透射率，评估检测图像的质量，并确定检测到的图像的透射率，自动设置光学调理并且在短时间内检测样品的多个光学图像 表示最大缺陷检测灵敏度的0级衍射光。

公开(公告)号：US07110105B2

公开(公告)日：2006-09-19

申请号：US11192021

申请日：2005-07-29

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

IPC分类号： G01N21/00

CPC分类号： G01N21/95607 ,  G01N21/9501 ,  G01N21/95684 ,  G01N2021/9513

摘要： A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.