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公开(公告)号：US08222753B2
公开(公告)日：2012-07-17
申请号：US12379463
申请日：2009-02-23
申请人： Kenichi Yoshida , Toshiyuki Suzuki
发明人： Kenichi Yoshida , Toshiyuki Suzuki
CPC分类号： H02K9/06 , F02B63/04 , F02B63/042 , H02K3/47 , H02K7/1815 , H02K11/048 , H02K21/24
摘要： A general purpose engine is provided with an engine main body, a rotary shaft, and an axial gap type motor/generator. The rotary shaft is rotated by a driving force of the engine main body. The rotary shaft includes a first shaft part disposed on one side portion of the engine main body and a second shaft part disposed on another side portion of the engine main body. The axial gap type motor/generator is attached integrally to the second shaft part. The axial gap type motor/generator is provided with a power generating rotor that rotates integrally with said rotary shaft, and a stator that is attached to the engine main body. The stator is disposed on a side closer to the engine main body than the power generating rotor and at a remove from the power generating rotor.
摘要翻译： 通用发动机设置有发动机主体，旋转轴和轴向间隙型电动机/发电机。 旋转轴由发动机主体的驱动力旋转。 旋转轴包括设置在发动机主体的一侧部的第一轴部和设置在发动机主体的另一侧部的第二轴部。 轴向间隙型马达/发电机与第二轴部一体地安装。 轴向间隙型马达/发电机具有与所述旋转轴一体地旋转的发电转子和附接到发动机主体的定子。 定子配置在比发电用转子更靠近发动机主体的一侧并与发电转子相脱离。
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62.发明授权公开(公告)号：US08221941B2
公开(公告)日：2012-07-17
申请号：US12647808
申请日：2009-12-28
申请人： Toshiyuki Suzuki , Masahiro Hashimoto , Kazunori Ono , Ryo Ohkubo , Kazuya Sakai
发明人： Toshiyuki Suzuki , Masahiro Hashimoto , Kazunori Ono , Ryo Ohkubo , Kazuya Sakai
IPC分类号： G03F1/22
CPC分类号： G03F1/32
摘要： A thin film made of a material containing a metal and silicon is formed on a light-transmissive substrate. Then, a treatment is performed to modify a main surface of the thin film in advance so that when exposure light having a wavelength of 200 nm or less is accumulatively irradiated on a thin film pattern of a photomask to be produced by patterning the thin film, the transfer characteristic of the thin film pattern does not change more than a predetermined degree. This treatment is performed by carrying out, for example, a heat treatment in an atmosphere containing oxygen at 450° C. to 900° C.
摘要翻译： 在透光性基板上形成由含有金属和硅的材料构成的薄膜。 然后，进行处理以预先修改薄膜的主表面，使得当将具有200nm或更小的波长的曝光光累积地照射到通过对薄膜进行图案化而制造的光掩模的薄膜图案上时， 薄膜图案的转印特性不会超过预定的程度。 该处理通过例如在450℃〜900℃的含氧气氛中进行热处理来进行。
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公开(公告)号：US20120129465A1
公开(公告)日：2012-05-24
申请号：US13382081
申请日：2010-06-30
申请人： Toshiyuki Suzuki , Mitsuru Murata
发明人： Toshiyuki Suzuki , Mitsuru Murata
IPC分类号： H04B17/00
CPC分类号： H04W52/0241 , H04W76/28 , Y02D70/144
摘要： A communication terminal (10) including a first communication unit (11) and a second communication unit (12) with a shorter communication distance than the first communication unit (11) includes a presence status detection unit (13) that detects that a distance from a personal computer (50) has changed from a state possible to communicate to a state not possible to communicate for the second communication unit (12), and a communication status control unit (14) that causes a standby interval in intermittent reception performed by the first communication unit (11) to become shorter when a change of the second communication unit (12) from the state possible to communicate to the state not possible to communicate is detected by the presence status detection unit (13). This enables more detailed and accurate tracking of the connection status of the first communication unit (11), which can advance the timing to bring the first communication unit (11) to transition to a disconnection state or a standby state, allowing reduction of power consumption in the first communication unit (11).
摘要翻译： 包括具有比第一通信单元（11）更短的通信距离的第一通信单元（11）和第二通信单元（12）的通信终端（10）包括存在状态检测单元（13），其检测距离 个人计算机（50）已经从可能的状态变为通信状态，而不能进行第二通信单元（12）的通信的状态;以及通信状态控制单元（14），其使由间歇接收执行的待机间隔 当存在状态检测单元（13）检测到第二通信单元（12）从可能通信状态改变到不可能通信的状态时变短的第一通信单元（11）。 这使得能够更详细和准确地跟踪第一通信单元（11）的连接状态，这可以提前使第一通信单元（11）转变到断开状态或待机状态的定时，从而降低功耗 在第一通信单元（11）中。
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公开(公告)号：US08143757B2
公开(公告)日：2012-03-27
申请号：US12379408
申请日：2009-02-20
申请人： Kenichi Yoshida , Toshiyuki Suzuki
发明人： Kenichi Yoshida , Toshiyuki Suzuki
CPC分类号： H02K7/1815 , H02K9/06 , H02K11/048 , H02K21/24
摘要： The present invention achieves reductions in the weight and size of a general purpose engine provided for a power generation application. An optional external apparatus can be attached to one shaft part of a rotary shaft, and an axial gap type motor/generator constituted by a power generating rotor (inner rotor) and a stator is attached integrally to another shaft part of the rotary shaft.
摘要翻译： 本发明实现了为发电应用提供的通用发动机的重量和尺寸的减小。 可选的外部装置可以附接到旋转轴的一个轴部分，并且由发电转子（内部转子）和定子构成的轴向间隙型电动机/发电机一体地附接到旋转轴的另一个轴部。
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65.发明申请PHOTOMASK BLANK, METHOD OF MANUFACTURING THE SAME, PHOTOMASK, AND METHOD OF MANUFACTURING THE SAME 有权PHOTOMASK BLANK，其制造方法，照相机及其制造方法公开(公告)号：US20120045713A1
公开(公告)日：2012-02-23
申请号：US13201368
申请日：2010-02-04
摘要： A photomask blank for use in the manufacture of a photomask adapted to be applied with exposure light having a wavelength of 200 nm or less has a thin film on a transparent substrate. The thin film is made of a material containing a transition metal, silicon, and carbon and comprising silicon carbide and/or a transition metal carbide.
摘要翻译： 用于制造适用于具有200nm以下的波长的曝光光的光掩模的光掩模坯料在透明基板上具有薄膜。 薄膜由含有过渡金属，硅和碳的材料制成，并且包含碳化硅和/或过渡金属碳化物。
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66.发明申请DIELECTRIC CERAMIC COMPOSITION, DIELECTRIC BODY, CERAMIC SUBSTRATE, ELECTRONIC COMPONENT, AND METHOD FOR PRODUCING DIELECTRIC BODY 有权电介质陶瓷组合物，电介体，陶瓷基板，电子部件和制造电介质体的方法公开(公告)号：US20120028787A1
公开(公告)日：2012-02-02
申请号：US13203922
申请日：2010-03-01
CPC分类号： H01G4/30 , C04B35/10 , C04B35/117 , C04B35/44 , C04B2235/3217 , C04B2235/34 , H01G4/10 , H01G4/1209
摘要： An electronic component 100 which includes: a dielectric body (a ceramic substrate) 110 containing a dielectric ceramic composition containing Al2TeO5 as a main component; and terminals 120 each provided on a pair of opposed side surfaces of the dielectric body 110 is provided.
摘要翻译： 电子部件100，其包括：包含以Al 2 TeO 5为主要成分的电介质陶瓷组合物的电介质体（陶瓷基板）110; 并且设置在电介质体110的一对相对侧面上的端子120。
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公开(公告)号：US08043771B2
公开(公告)日：2011-10-25
申请号：US12416468
申请日：2009-04-01
IPC分类号： G03F1/00
CPC分类号： G03F1/32
摘要： Disclosed is a phase shift mask blank (11) that can prevent the occurrence of a loading effect. The phase shift mask blank (11) includes a phase shift film (5) containing silicon, a light-shielding film (2) made of a material resistant to etching of the phase shift film (5), and an etching mask film (3) made of an inorganic material resistant to etching of the light-shielding film (2), which are formed in this order on a substrate (1) transparent to exposure light. Assuming that the thickness of the phase shift film (5) is t1, the etching rate of the phase shift film (5) by dry etching with an etchant using the etching mask film (3) and the light-shielding film (2) as a mask is v1, the thickness of the etching mask film (3) is t2, and the etching rate of the etching mask film (3) by dry etching with the above etchant is v2, (t1/v1)≦(t2/v2) is satisfied.
摘要翻译： 公开了能够防止发生负载效应的相移掩模坯料（11）。 相移掩模空白（11）包括含有硅的相移膜（5），由耐相变膜（5）的蚀刻材料制成的遮光膜（2）和蚀刻掩模膜（3） ）由能够对透光的基板（1）上的遮光膜（2）的蚀刻的无机材料制成。 假设相移膜（5）的厚度为t1，通过使用蚀刻掩模膜（3）和遮光膜（2）的蚀刻剂进行干蚀刻的相移膜（5）的蚀刻速率为 掩模为v1，蚀刻掩模膜（3）的厚度为t2，用上述蚀刻剂通过干蚀刻蚀刻掩模膜（3）的蚀刻速率为v2，（t1 / v1）＆nlE;（t2 / v2）满足。
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公开(公告)号：US07794901B2
公开(公告)日：2010-09-14
申请号：US12637258
申请日：2009-12-14
IPC分类号： G03F9/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/32 , G03F1/78 , Y10S430/143
摘要： In a method of manufacturing a mask blank adapted to be formed with a resist pattern by electron beam writing and having a light-shielding film and an etching mask film of an inorganic-based material resistant to etching of the light-shielding film which are formed in this order on a transparent substrate, when forming the etching mask film, shielding is performed using a shielding plate so as to prevent the etching mask film from being formed at least at a side surface of the substrate.
摘要翻译： 在适于通过电子束写入形成抗蚀剂图形的掩模板的制造方法中，具有遮光膜和耐蚀刻遮光膜的无机类材料的蚀刻掩模膜 在透明基板上按顺序，在形成蚀刻掩模膜时，使用屏蔽板进行屏蔽，以防止蚀刻掩模膜至少在基板的侧表面上形成。
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公开(公告)号：US07655364B2
公开(公告)日：2010-02-02
申请号：US12264424
申请日：2008-11-04
IPC分类号： G03F9/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/32 , G03F1/78 , Y10S430/143
摘要： In a method of manufacturing a mask blank adapted to be formed with a resist pattern by electron beam writing and having a light-shielding film and an etching mask film of an inorganic-based material resistant to etching of the light-shielding film which are formed in this order on a transparent substrate, when forming the etching mask film, shielding is performed using a shielding plate so as to prevent the etching mask film from being formed at least at a side surface of the substrate.
摘要翻译： 在适于通过电子束写入形成抗蚀剂图形的掩模板的制造方法中，具有遮光膜和耐蚀刻遮光膜的无机类材料的蚀刻掩模膜 在透明基板上按顺序，在形成蚀刻掩模膜时，使用屏蔽板进行屏蔽，以防止蚀刻掩模膜至少在基板的侧表面上形成。
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公开(公告)号：US20090117474A1
公开(公告)日：2009-05-07
申请号：US12264424
申请日：2008-11-04
IPC分类号： G03F1/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/32 , G03F1/78 , Y10S430/143
摘要： In a method of manufacturing a mask blank adapted to be formed with a resist pattern by electron beam writing and having a light-shielding film and an etching mask film of an inorganic-based material resistant to etching of the light-shielding film which are formed in this order on a transparent substrate, when forming the etching mask film, shielding is performed using a shielding plate so as to prevent the etching mask film from being formed at least at a side surface of the substrate.
摘要翻译： 在适于通过电子束写入形成抗蚀剂图形的掩模板的制造方法中，具有遮光膜和耐蚀刻遮光膜的无机类材料的蚀刻掩模膜 在透明基板上按顺序，在形成蚀刻掩模膜时，使用屏蔽板进行屏蔽，以防止蚀刻掩模膜至少在基板的侧表面上形成。
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