公开(公告)号：US4799791A

公开(公告)日：1989-01-24

申请号：US198587

申请日：1988-05-23

申请人： Hiroshi Echizen ,  Masakatsu Ota ,  Akiyoshi Suzuki

发明人： Hiroshi Echizen ,  Masakatsu Ota ,  Akiyoshi Suzuki

IPC分类号： G01J1/42 ,  G03F7/20 ,  G01J1/00

CPC分类号： G03F7/70133 ,  G01J1/42

摘要： Illuminance distribution measuring method and apparatus, in which the quantity of light on an area irradiated by a light beam emitted from a light source is detected by a combination of first and second detectors. The first detector is movable along the area to be irradiated and detects the quantity of irradiating light incident on the area to be irradiated while moving along the area irradiated. The second detector is fixedly secured at a predetermined position relative to the light source and the area to be irradiated and receives the light beam emitted from the light source to irradiate the area to be irradiated. On the basis of the outputs from the first and second detectors, the illuminance distribution on the area irradiated is accurately measured irrespective of any intensity changes of the light beam emitted from the light source.

摘要翻译： 照度分布测量方法和装置，其中通过第一和第二检测器的组合检测由从光源发射的光束照射的区域上的光量。 第一检测器沿着被照射的区域是可移动的，并且在沿着被照射的区域移动的同时检测入射在被照射区域上的照射光的量。 第二检测器固定地固定在相对于光源和待照射区域的预定位置处，并接收从光源发射的光束照射被照射的区域。 基于来自第一和第二检测器的输出，可以精确地测量照射的区域上的照度分布，而与从光源发射的光束的任何强度变化无关。

公开(公告)号：US4798450A

公开(公告)日：1989-01-17

申请号：US144645

申请日：1988-01-11

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G02B17/00 ,  G02B17/06 ,  G02B27/18 ,  G03F7/20

CPC分类号： G03F7/70233 ,  G02B17/0663 ,  G03F7/70241

摘要： An imaging optical system including a first off-axis optical system for receiving light from an object disposed at a predetermined height from its optical axis and emitting the light; and a second off-axis optical system for receiving the light from said first optical system to form an image of the object at a predetermined height form its optical axis.

摘要翻译： 一种成像光学系统，包括：第一离轴光学系统，用于接收来自设置在与其光轴相关的预定高度处的物体的光并发射光; 以及第二离轴光学系统，用于接收来自所述第一光学系统的光以从其光轴形成预定高度的物体的图像。

公开(公告)号：US4780615A

公开(公告)日：1988-10-25

申请号：US134558

申请日：1987-12-15

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G03F9/00 ,  H01L21/30

CPC分类号： G03F9/70

摘要： An alignment system usable in a semiconductor device manufacturing exposure apparatus for superimposingly transferring a circuit pattern of a reticle onto each of patterns formed on individual portions of a semiconductor wafer, for sequentially aligning the individual portions of the wafer with respect to the reticle by use of alignment marks formed in or on scribe lines defined between the individual portions of the wafer. An optical system for detecting the alignment marks is disposed outside the path of light used for the sake of pattern transfer. In the course of movement of the wafer for bringing a particular shot area to an exposure station, the alignment marks for the particular shot area are photoelectrically detected through the mark detecting optical system and, on the basis of the detection of the alignment marks, the reticle and the wafer are relatively moved into alignment such that, when the particular shot area reaches the exposure station, the pattern of the reticle can be accurately superimposed on the pattern already formed on the particular shot area of the wafer. As a result, TTL (through-the-lens) alignment is assured without degradation of throughput of the exposure apparatus.

摘要翻译： 一种可用于半导体器件制造曝光装置的对准系统，用于将掩模版的电路图案叠加到形成在半导体晶片的各个部分上的每个图案上，用于使晶片相对于掩模版的各个部分通过使用 形成在限定在晶片的各个部分之间的划痕线中或之上的对准标记。 用于检测对准标记的光学系统设置在用于图案转印的光的路径的外部。 在用于将特定照射区域移动到曝光站的晶片的移动过程中，通过标记检测光学系统对特定照射区域的对准标记进行光电检测，并且基于对准标记的检测， 标线片和晶片相对移动成对准，使得当特定的照射区域到达曝光站时，标线的图案可以精确地叠加在已经形成在晶片的特定照射区域上的图案上。 结果，确保了TTL（透镜）对准，而不会使曝光装置的生产量下降。

公开(公告)号：US4653903A

公开(公告)日：1987-03-31

申请号：US690940

申请日：1985-01-14

申请人： Makoto Torigoe ,  Michio Kohno ,  Akiyoshi Suzuki

发明人： Makoto Torigoe ,  Michio Kohno ,  Akiyoshi Suzuki

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/70525 ,  G03F7/70991

摘要： An exposure apparatus having a single light source and a plurality of exposure stages for carrying thereon wafers, respectively. The light emitting from the light source is directed to a plurality of masks simultaneously or sequentially, so that the patterns of the masks are simultaneously or sequentially transferred onto the wafers, respectively, carried on the exposure stages. In a preferred form, the light source comprises an excimer laser providing a pulsed laser beam.

摘要翻译： 具有单个光源的曝光装置和分别用于承载晶片的多个曝光台。 从光源发射的光同时或顺序地引导到多个掩模，使得掩模的图案分别同时或顺序地转印到承载在曝光阶段上的晶片上。 在优选形式中，光源包括提供脉冲激光束的准分子激光器。

公开(公告)号：US4521082A

公开(公告)日：1985-06-04

申请号：US401895

申请日：1982-07-26

申请人： Akiyoshi Suzuki ,  Hirosi Sato ,  Takashi Omata ,  Masao Kosugi

发明人： Akiyoshi Suzuki ,  Hirosi Sato ,  Takashi Omata ,  Masao Kosugi

IPC分类号： G03B27/32 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G02F1/01

CPC分类号： G03F9/7065 ,  G03F7/20 ,  G03F7/70241 ,  G03F7/70875 ,  G03F9/00

摘要： An exposure apparatus includes a reticle provided with at least one mark, and operates on a wafer provided with at least one mark. The apparatus further includes a projection optical system for optically conjugately relating the reticle to the wafer, a mark detecting apparatus for detecting the mark of the reticle and detecting the mark of the wafer through the projection optical system, an illuminator for illuminating the wafer with a sensitizing light, and a phase converting element fixed between the wafer and the reticle for varying the direction of polarization of a light coming from the mark provided on the wafer.

摘要翻译： 曝光装置包括设置有至少一个标记的掩模版，并且在设置有至少一个标记的晶片上操作。 该装置还包括用于将掩模版光学共轭地连接到晶片的投影光学系统，用于检测标线的标记并通过投影光学系统检测晶片的标记的标记检测装置，用于通过投影光学系统照亮晶片的照明器 以及固定在晶片和掩模版之间的相变元件，用于改变来自设置在晶片上的标记的光的偏振方向。

公开(公告)号：US07217503B2

公开(公告)日：2007-05-15

申请号：US10132001

申请日：2002-04-24

申请人： Kenji Saitoh ,  Akiyoshi Suzuki ,  Kenji Yamazoe

发明人： Kenji Saitoh ,  Akiyoshi Suzuki ,  Kenji Yamazoe

IPC分类号： G03F7/20

CPC分类号： G03F1/30 ,  G03F1/36 ,  G03F7/70125 ,  G03F7/70466

摘要： An exposure method comprising the steps of forming onto a mask that arranges a pattern of a contact hole and a plurality of patterns each being smaller than the contact hole pattern, and illuminating the mask using plural kinds of light so as to resolve the desired pattern without the smaller patterns on a target via a projection optical system.

摘要翻译： 一种曝光方法，包括以下步骤：形成掩模，所述掩模布置接触孔和多个图案的图案，每个图案都小于接触孔图案，并且使用多种光照射所述掩模，以便解析所需图案而无需 通过投影光学系统在目标上的较小图案。

公开(公告)号：US07214453B2

公开(公告)日：2007-05-08

申请号：US10783218

申请日：2004-02-20

申请人： Kenji Yamazoe ,  Kenji Saitoh ,  Akiyoshi Suzuki

发明人： Kenji Yamazoe ,  Kenji Saitoh ,  Akiyoshi Suzuki

IPC分类号： G03F1/00

CPC分类号： G03F7/70433 ,  G03F1/36

摘要： A mask arranges a predetermined pattern and an auxiliary pattern smaller than the predetermined pattern so that where a virtual lattice is assumed which has a lattice point located at a center of the predetermined pattern, a center of the auxiliary pattern is offset from the lattice point of the virtual lattice.

摘要翻译： 掩模布置预定图案和小于预定图案的辅助图案，使得假定具有位于预定图案的中心的格子点的虚拟网格，辅助图案的中心偏离 虚拟网格。

公开(公告)号：US07046337B2

公开(公告)日：2006-05-16

申请号：US11229541

申请日：2005-09-20

申请人： Miyoko Kawashima ,  Akiyoshi Suzuki

发明人： Miyoko Kawashima ,  Akiyoshi Suzuki

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/72

CPC分类号： G03F7/70566 ,  G03F7/70091 ,  G03F7/70125 ,  G03F7/7025 ,  G03F7/70341 ,  G03F7/70958

摘要： An exposure method that transfers a pattern formed on a mask onto an object to be exposed via a projection optical system that is at least partly immersed in liquid. The exposure method forms on a pupil of the projection optical system an effective light source that emits, from an axis orthogonal to an optical axis of the projection optical system, light that has an incident angle θ upon the object, wherein the light includes only s-polarized light in an area of an incident angle θ that satisfies 90°−θNA≦θ≦θNA, where θNA is the largest value of the incident angle θ.

摘要翻译： 一种曝光方法，其通过至少部分浸没在液体中的投影光学系统将掩模上形成的图案转印到要曝光的物体上。 曝光方法在投影光学系统的光瞳上形成有效光源，其从与投影光学系统的光轴正交的轴发射具有对象上的入射角θ的光，其中光仅包括s 入射角度θ的区域中的偏振光，其满足90°-θNA NA，其中θ< 是入射角度θ的最大值。

公开(公告)号：US20060012764A1

公开(公告)日：2006-01-19

申请号：US11229541

申请日：2005-09-20

申请人： Miyoko Kawashima ,  Akiyoshi Suzuki

发明人： Miyoko Kawashima ,  Akiyoshi Suzuki

IPC分类号： G03B27/42

CPC分类号： G03F7/70566 ,  G03F7/70091 ,  G03F7/70125 ,  G03F7/7025 ,  G03F7/70341 ,  G03F7/70958

摘要： An exposure method immerses, in liquid, a surface of an object to be exposed, and a surface of a projection optical system closest to the object, and projects a repetitive pattern formed on a mask via the projection optical system onto the object. The exposure method forms on a pupil of the projection optical system an effective light source that emits, from an axis orthogonal to an optical axis of the projection optical system, light that is parallel to a repetitive direction of the repetitive pattern and has an incident angle θ upon the object, wherein the light includes only s-polarized light in an area of an incident angle θ that satisfies 90°−θNA≦θ≦θNA, where θNA is the largest value of the incident angle θ.

摘要翻译： 曝光方法将待暴露物体的表面和最接近物体的投影光学系统的表面浸没在液体中，并且通过投影光学系统将形成在掩模上的重复图案投影到物体上。 曝光方法在投影光学系统的光瞳上形成有效光源，其从与投影光学系统的光轴正交的轴发射平行于重复图案的重复方向的光，并具有入射角 θ，其中光仅在入射角度θ的区域中仅包括s偏振光，该入射角θ满足90°-θNA < ，其中θNA是入射角θ的最大值。

公开(公告)号：US06654101B2

公开(公告)日：2003-11-25

申请号：US09810488

申请日：2001-03-19

申请人： Akiyoshi Suzuki ,  Miyoko Kawashima

发明人： Akiyoshi Suzuki ,  Miyoko Kawashima

IPC分类号： G03B2742

CPC分类号： G03F7/7005 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70125 ,  G03F7/70133 ,  G03F7/70241 ,  G03F7/70558

摘要： In a projection exposure apparatus for illuminating a reticle with light from an illumination optical system and projecting a pattern of the reticle onto a substrate through a projection optical system. The illumination optical system includes a first optical element for switching a light distribution at a position optically conjugate with the pupil plane of the projection optical system, a second optical element for making the light uniform at the position optically conjugate with the an image plane of the projection optical system, and a third optical element for adjusting a non-uniformity of exposure resulting from switching the light distribution using the first optical element.

摘要翻译： 在用于利用来自照明光学系统的光照射掩模版并通过投影光学系统将掩模版的图案投影到基板上的投影曝光装置中。 照明光学系统包括：第一光学元件，用于在与投影光学系统的光瞳平面光学共轭的位置处切换光分布;第二光学元件，用于使光在与光学系统的像面光学共轭的位置处均匀; 投影光学系统和第三光学元件，用于调节使用第一光学元件切换光分布所产生的曝光的不均匀性。