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公开(公告)号：US11912583B2
公开(公告)日：2024-02-27
申请号：US17521129
申请日：2021-11-08
发明人： Kazuhiro Wataya
IPC分类号： C01F17/10 , C01F17/206 , C01F17/218 , C01F17/224 , C01F17/229 , C01F17/235 , C01F17/241
CPC分类号： C01F17/10 , C01F17/206 , C01F17/218 , C01F17/224 , C01F17/229 , C01F17/235 , C01F17/241 , C01P2004/51
摘要： A slurry of a dispersion medium and rare earth oxide particles. The particles having a volume basis median particle size D50 of up to 50 nm. The rare earth oxide particles having a dispersity index S of up to 1, the dispersity index S being determined according to the formula (1):
(D90−D10)/D50 (1)
wherein D10, D50 and D90 are cumulative 10%, 50% and 90% diameters in volume basis particle size distribution, respectively.-
公开(公告)号：US11904521B2
公开(公告)日：2024-02-20
申请号：US15715442
申请日：2017-09-26
发明人： Daiyu Okafuji , Hiroyuki Yamazaki , Masao Ando , Masaki Takeuchi
CPC分类号： B29C59/026 , B24B9/065 , B29C33/3842 , G03F7/0002 , B29K2909/08
摘要： A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.
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公开(公告)号：US20240053678A1
公开(公告)日：2024-02-15
申请号：US18226436
申请日：2023-07-26
发明人： Yutaro Otomo , Tomohiro Kobayashi
CPC分类号： G03F7/0045 , G03F7/038
摘要： A resist composition comprising an acid compound, a photoacid generator of iodonium salt type and/or a photo-decomposable quencher of iodonium salt type, and a base polymer has a high sensitivity, reduced edge roughness or size variation, improved resolution and satisfactory storage stability.
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公开(公告)号：US11901545B2
公开(公告)日：2024-02-13
申请号：US17590849
申请日：2022-02-02
IPC分类号： H01M4/02 , H01M4/36 , H01M4/62 , H01M4/48 , H01M4/38 , H01M4/131 , H01M4/1391 , H01M4/485 , H01M10/0525
CPC分类号： H01M4/131 , H01M4/1391 , H01M4/485 , H01M10/0525 , H01M2004/027
摘要： Methods for producing a negative electrode active material particle which includes a silicon compound particle containing a silicon compound that contains oxygen. The methods including preparing a silicon compound particle containing a silicon compound that contains oxygen; inserting Li into the silicon compound particle; and heating, while stirring, the Li-inserted silicon compound particle in a furnace to produce a negative electrode active material particle, wherein at least part of Si constituting the silicon compound particle is present in at least one state selected from oxide of Si2+ to Si3+ containing no Li, and compound containing Li and Si2+ to Si3+.
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公开(公告)号：US11897773B2
公开(公告)日：2024-02-13
申请号：US18004342
申请日：2021-06-07
发明人： Akihiro Hirate , Waichi Yamamura
IPC分类号： C01B32/00 , C01B32/914 , C23C16/32 , C01B32/21
CPC分类号： C01B32/21 , C23C16/32 , C01P2002/54
摘要： A carbide-coated carbon material including a base material containing carbon as a main component and chlorine, and a carbide layer containing a carbide as a main component and chlorine, the carbide layer being disposed on the base material. The base material has, near an interface between the base material and the carbide layer, a base material buffer region where a chlorine concentration continuously changes in a direction toward the carbide layer. The carbide layer has, near the interface between the base material and the carbide layer, a carbide layer buffer region where the chlorine concentration continuously changes in a direction toward the base material. The carbide-coated carbon material has sufficient adhesion strength in the interface between the carbide layer and the base material containing carbon as a main component.
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公开(公告)号：US20240043983A1
公开(公告)日：2024-02-08
申请号：US18381485
申请日：2023-10-18
发明人： Yasushi Takai , Noriaki Hamaya
摘要： An yttrium-base sprayed coating is obtained by thermally spraying yttrium oxide, yttrium fluoride or yttrium oxyfluoride onto a substrate to form a coating of 10-500 μm thick, and chemically cleaning the coating with a cleaning liquid of organic acid, inorganic acid or a mixture thereof until the population of particles with a size of up to 300 nm becomes no more than 5 particles/mm2 of the coating surface. The yttrium-base sprayed coating exhibits high corrosion resistance even in a halogen gas plasma atmosphere and prevents yttrium-base particles from spalling off during etching treatment.
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公开(公告)号：US20240034859A1
公开(公告)日：2024-02-01
申请号：US17638790
申请日：2020-09-03
发明人： Shintaro MATSUSUE
CPC分类号： C08L1/284 , C08J5/18 , C08L2203/16 , C08J2301/28
摘要： [Problems] A composition capable of forming a film having both good solubility and good strength, and the film are provided.
[Solution] The composition includes first hydroxypropyl methyl cellulose (HPMC) polymer having a viscosity of 2.5-4.5 mPa·s, second HPMC polymer having 6.0-50.0 mPa·s, third HPMC polymer having 4.5-15.0 mPa·s, a gelling agent, and a solvent, each viscosity determined at 20° C. in a 2 mass % aqueous solution, wherein the first HPMC polymer is selected from three members: HPMC-IA in Group I and HPMC-IIA and HPMC-IIB in Group II, the second HPMC polymer is the same member as that of the first HPMC polymer, provided that DS (MS) of the second HPMC polymer may be the same as or different from the DS (MS) of the first HPMC polymer, and the third HPMC polymer is selected from a member or members in a Group different from the Group of the first HPMC polymer.-
公开(公告)号：US20240004286A1
公开(公告)日：2024-01-04
申请号：US18369486
申请日：2023-09-18
发明人： Yu YANASE
IPC分类号： G03F1/64
摘要： The present invention is to provide a pellicle frame in a frame shape having an upper end face on which a pellicle film is to be arranged and a lower end face to face a photomask, which is characterized by being provided with a notched part from the outer side face toward inner side face of the lower end face; a pellicle including the pellicle frame as an element; and a method for peeling a pellicle from a photomask onto which the pellicle has been attached, which is characterized by inserting a peeling jig into a notched part from a side face of a pellicle frame, and moving the peeling jig in an upper end face direction of the pellicle frame in this state to peel off the pellicle from the photomask.
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79.发明授权公开(公告)号：US11862755B2
公开(公告)日：2024-01-02
申请号：US17868949
申请日：2022-07-20
发明人： Chen-Fu Chu , Shih-Kai Chan , Yi-Feng Shih , David Trung Doan , Trung Tri Doan , Yoshinori Ogawa , Kohei Otake , Kazunori Kondo , Keiji Ohori , Taichi Kitagawa , Nobuaki Matsumoto , Toshiyuki Ozai , Shuhei Ueda
CPC分类号： H01L33/20 , H01L33/0093 , H01L33/0095 , H01L33/44 , H01L2933/0025
摘要： A method for fabricating light emitting diode (LED) dice includes the steps of: providing a substrate, and forming a plurality of die sized semiconductor structures on the substrate. The method also includes the steps of providing a receiving plate having an elastomeric polymer layer, placing the substrate and the receiving plate in physical contact with an adhesive force applied by the elastomeric polymer layer, and performing a laser lift-off (LLO) process by directing a uniform laser beam through the substrate to the semiconductor layer at an interface with the substrate to lift off the semiconductor structures onto the elastomeric polymer layer. During the laser lift-off (LLO) process the elastomeric polymer layer functions as a shock absorber to reduce momentum transfer, and as an adhesive surface to hold the semiconductor structures in place on the receiving plate.
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公开(公告)号：US11862754B2
公开(公告)日：2024-01-02
申请号：US17740729
申请日：2022-05-10
发明人： Chen-Fu Chu , Shih-Kai Chan , Yi-Feng Shih , David Trung Doan , Trung Tri Doan , Yoshinori Ogawa , Kohei Otake , Kazunori Kondo , Keiji Ohori , Taichi Kitagawa , Nobuaki Matsumoto , Toshiyuki Ozai , Shuhei Ueda
CPC分类号： H01L33/20 , H01L33/0093 , H01L33/0095 , H01L33/44 , H01L2933/0025
摘要： A method for fabricating light emitting diode (LED) dice includes the steps of: providing a substrate, and forming a plurality of die sized semiconductor structures on the substrate. The method also includes the steps of providing a receiving plate having an elastomeric polymer layer, placing the substrate and the receiving plate in physical contact with an adhesive force applied by the elastomeric polymer layer, and performing a laser lift-off (LLO) process by directing a uniform laser beam through the substrate to the semiconductor layer at an interface with the substrate to lift off the semiconductor structures onto the elastomeric polymer layer. During the laser lift-off (LLO) process the elastomeric polymer layer functions as a shock absorber to reduce momentum transfer, and as an adhesive surface to hold the semiconductor structures in place on the receiving plate.
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