Appearance Inspection Apparatus
    71.
    发明申请
    Appearance Inspection Apparatus 有权
    外观检查装置

    公开(公告)号:US20120194808A1

    公开(公告)日:2012-08-02

    申请号:US13432153

    申请日:2012-03-28

    CPC classification number: G01N21/8851 G01N21/9501

    Abstract: An appearance inspection apparatus analyzes a difference in detection characteristics of detection signals obtained by detectors to flexibly meet various inspection purposes without changing a circuit or software. The apparatus includes a signal synthesizing section that synthesizes detection signals from the detectors in accordance with a set condition. An input operating section sets a synthesizing condition of the detection signal by the signal synthesizing section, and an information display section displays a synthesizing map structured based on a synthesized signal which is synthesized by the signal synthesizing section in accordance with a condition set by the input operating section.

    Abstract translation: 外观检查装置分析由检测器获得的检测信号的检测特性的差异,以灵活地满足各种检查目的,而不改变电路或软件。 该装置包括信号合成部,其根据设定条件合成来自检测器的检测信号。 输入操作部分通过信号合成部分设置检测信号的合成条件,并且信息显示部分显示由信号合成部分根据由输入设置的条件合成的合成信号构成的合成图 操作部分。

    Method for detecting particles and defects and inspection equipment thereof
    72.
    发明授权
    Method for detecting particles and defects and inspection equipment thereof 有权
    检测颗粒和缺陷的方法及其检测设备

    公开(公告)号:US08094298B2

    公开(公告)日:2012-01-10

    申请号:US12574185

    申请日:2009-10-06

    Abstract: A method and equipment which includes an illustrated-spot illumination-distribution data table for storing an illumination distribution within an illustrated spot and which calculates a coordinate position for a particle or a defect and the diameter of the particle on the basis of detection light intensity data about the particle or defect and the illustrated-spot illumination-distribution data table. Thus, even when the illumination distribution within the illustrated spot based on an actual illumination optical system is not a Gaussian distribution, the calculation of the particle diameter of the detected particle or defect and the calculation of a coordinate position on the surface of an object to be inspected can be attained with an increased accuracy.

    Abstract translation: 一种方法和设备,其包括用于存储所示斑点内的照明分布的示出点照度分布数据表,并且基于检测光强度数据计算颗粒或缺陷的坐标位置和颗粒的直径 关于颗粒或缺陷以及所示的点光照度分布数据表。 因此,即使在基于实际的照明光学系统的所示光点内的照明分布不是高斯分布的情况下,检测出的粒子或缺陷的粒径的计算以及物体表面上的坐标位置的计算 被检查可以提高准确度。

    Surface Inspection Method and Surface Inspection Apparatus
    73.
    发明申请
    Surface Inspection Method and Surface Inspection Apparatus 失效
    表面检查方法和表面检查装置

    公开(公告)号:US20110141461A1

    公开(公告)日:2011-06-16

    申请号:US13032165

    申请日:2011-02-22

    CPC classification number: G01N21/9501 H01L22/12 H01L2924/0002 H01L2924/00

    Abstract: Light from a light source becomes two illumination beams by a beam splitter. The beams are irradiated onto a semiconductor wafer from two mutually substantially orthogonal azimuthal angles having substantially equal elevation angles to form illumination spots. When the sum of scattered, diffracted, and reflected lights due to the illumination beams is detected, influence of the anisotropy which a contaminant particle and a defect existing in the wafer itself or thereon have with respect to an illumination direction, can be eliminated.

    Abstract translation: 来自光源的光由分束器变成两个照明光束。 光束从具有基本相等的仰角的两个相互基本正交的方位角照射到半导体晶片上,以形成照明点。 当检测到由于照明光束引起的散射,衍射和反射光的总和时,可以消除晶片本身或其上存在的污染颗粒和缺陷相对于照明方向的各向异性的影响。

    SURFACE INSPECTION METHOD AND SURFACE INSPECTION APPARATUS
    74.
    发明申请
    SURFACE INSPECTION METHOD AND SURFACE INSPECTION APPARATUS 有权
    表面检查方法和表面检查装置

    公开(公告)号:US20110075135A1

    公开(公告)日:2011-03-31

    申请号:US12964833

    申请日:2010-12-10

    Applicant: Shigeru MATSUI

    Inventor: Shigeru MATSUI

    CPC classification number: G01N21/8806 G01N21/9501 G01N21/9505

    Abstract: A surface inspection apparatus capable of acquiring scattered light intensity distribution information for each scattering azimuth angle, and detecting foreign matters and defects with high sensitivity. A concave mirror for condensation and another concave mirror for image formation are used to cope with a broad cubic angle. Since mirrors for condensation and image formation are used, a support for clamping the periphery of a lens is unnecessary, and an effective aperture area does not decrease. A plurality of azimuth-wise detection optical systems is disposed and reflected light at all azimuths can be detected by burying the entire periphery without calling for specific lens polishing. A light signal unification unit sums digital data from a particular system corresponding to a scattering azimuth designated in advance in the systems for improving an S/N ratio.

    Abstract translation: 能够获取各散射方位角的散射光强度分布信息,高灵敏度地检测异物和缺陷的表面检查装置。 用于冷凝的凹面镜和用于成像的另一凹面镜用于处理宽的立方角。 由于使用用于冷凝和图像形成的反射镜,所以不需要用于夹持透镜周边的支撑件,并且有效开口面积不会降低。 设置多个方位检测光学系统,并且可以通过掩埋整个周边来检测所有方位角处的反射光,而不需要特定的透镜抛光。 光信号统一单元将来自与用于提高S / N比的系统中预先指定的散射方位相对应的特定系统的数字数据相加。

    Surface Inspection Method and Surface Inspection Apparatus
    75.
    发明申请
    Surface Inspection Method and Surface Inspection Apparatus 有权
    表面检查方法和表面检查装置

    公开(公告)号:US20100188656A1

    公开(公告)日:2010-07-29

    申请号:US12754634

    申请日:2010-04-06

    CPC classification number: G01N21/9501 H01L22/12 H01L2924/0002 H01L2924/00

    Abstract: Light from a light source becomes two illumination beams by a beam splitter. The beams are irradiated onto a semiconductor wafer from two mutually substantially orthogonal azimuthal angles having substantially equal elevation angles to form illumination spots. When the sum of scattered, diffracted, and reflected lights due to the illumination beams is detected, influence of the anisotropy which a contaminant particle and a defect existing in the wafer itself or thereon have with respect to an illumination direction, can be eliminated.

    Abstract translation: 来自光源的光由分束器变成两个照明光束。 光束从具有基本相等的仰角的两个相互基本正交的方位角照射到半导体晶片上,以形成照明点。 当检测到由于照明光束引起的散射,衍射和反射光的总和时,可以消除晶片本身或其上存在的污染颗粒和缺陷相对于照明方向的各向异性的影响。

    Optical inspection method and optical inspection apparatus
    76.
    发明授权
    Optical inspection method and optical inspection apparatus 有权
    光学检测方法和光学检测仪器

    公开(公告)号:US07755751B2

    公开(公告)日:2010-07-13

    申请号:US11819712

    申请日:2007-06-28

    Applicant: Shigeru Matsui

    Inventor: Shigeru Matsui

    CPC classification number: G01N21/9501 G01N21/94

    Abstract: In the conventional contaminant particle/defect inspection method, if the illuminance of the illumination beam is held at not more than a predetermined upper limit value not to give thermal damage to the sample, the detection sensitivity and the inspection speed being in the tradeoff relation with each other, it is very difficult to improve one of the detection sensitivity and the inspection speed without sacrificing the other or improve both at the same time. The invention provides an improved optical inspection method and an improved optical inspection apparatus, in which a pulse laser is used as a light source, and a laser beam flux is split into a plurality of laser beam fluxes which are given different time delay to form a plurality of illumination spots. The scattered light signal from each illumination spot is isolated and detected by using a light emission start timing signal for each illumination spot.

    Abstract translation: 在常规污染物颗粒/缺陷检查方法中,如果照明光束的照度被保持在不对样品造成热损伤的预定上限值以下,则检测灵敏度和检查速度与 彼此难以提高检测灵敏度和检测速度之一而不牺牲另一方或同时改善两者。 本发明提供了一种改进的光学检查方法和改进的光学检查装置,其中使用脉冲激光器作为光源,并且激光束通量被分割成多个激光束,其被给予不同的时间延迟以形成 多个照明点。 通过使用每个照明点的发光开始定时信号来隔离并检测来自每个照明点的散射光信号。

    Surface inspection method and surface inspection apparatus
    78.
    发明授权
    Surface inspection method and surface inspection apparatus 失效
    表面检查方法和表面检查装置

    公开(公告)号:US07671980B2

    公开(公告)日:2010-03-02

    申请号:US12207536

    申请日:2008-09-10

    Applicant: Shigeru Matsui

    Inventor: Shigeru Matsui

    CPC classification number: G01N21/8806 G01N21/9501 G01N21/9505

    Abstract: A surface inspection apparatus capable of acquiring scattered light intensity distribution information for each scattering azimuth angle, and detecting foreign matters and defects with high sensitivity. A concave mirror for condensation and another concave mirror for image formation are used to cope with a broad cubic angle. Since mirrors for condensation and image formation are used, a support for clamping the periphery of a lens is unnecessary, and an effective aperture area does not decrease. A plurality of azimuth-wise detection optical systems is disposed and reflected light at all azimuths can be detected by burying the entire periphery without calling for specific lens polishing. A light signal unification unit sums digital data from a particular system corresponding to a scattering azimuth designated in advance in the systems for improving an S/N ratio.

    Abstract translation: 能够获取各散射方位角的散射光强度分布信息,高灵敏度地检测异物和缺陷的表面检查装置。 用于冷凝的凹面镜和用于成像的另一凹面镜用于处理宽的立方角。 由于使用用于冷凝和图像形成的反射镜,所以不需要用于夹持透镜周边的支撑件,并且有效开口面积不会降低。 设置多个方位检测光学系统,并且可以通过掩埋整个周边来检测所有方位角处的反射光,而不需要特定的透镜抛光。 光信号统一单元将来自与用于提高S / N比的系统中预先指定的散射方位相对应的特定系统的数字数据相加。

    PATTERN DEFECT INSPECTION METHOD AND APPARATUS
    79.
    发明申请
    PATTERN DEFECT INSPECTION METHOD AND APPARATUS 审中-公开
    图案缺陷检查方法和装置

    公开(公告)号:US20100021041A1

    公开(公告)日:2010-01-28

    申请号:US12573482

    申请日:2009-10-05

    CPC classification number: G06T7/001 G01N21/95607 G03F7/7065 G06T2207/30148

    Abstract: The pattern defect inspection apparatus is operable to detect defects by comparing a detection image, which is obtained through scanning by an image sensor those patterns that have the identical shape and are continuously disposed on the object under tested at equal intervals in row and column directions, with a reference image obtained by scanning neighboring identical shape patterns in the row and column directions. This apparatus has a unit for generating an average reference image by statistical computation processing from the images of identical shape patterns lying next to the detection image including at least eight nearest chips on the up-and-down and right-and-left sides and at diagonal positions with the detection image being intermediately situated. The apparatus also includes a unit that detects a defect by comparing the detection image to the average reference image thus generated.

    Abstract translation: 图案缺陷检查装置可以通过将通过图像传感器进行扫描而得到的检测图像进行比较来检测缺陷,所述检测图像具有相同形状且连续设置在被检测物体上的行和列方向上等间隔的那些图案, 具有通过扫描行和列方向上的相邻相同形状图案而获得的参考图像。 该装置具有用于通过统计计算处理从邻近检测图像的相同形状图案的图像生成平均参考图像的单元,该检测图像包括上下左右侧至少八个最近的码片,以及在 对角位置,检测图像位于中间位置。 该装置还包括通过将检测图像与由此生成的平均参考图像进行比较来检测缺陷的单元。

    SURFACE INSPECTION METHOD AND SURFACE INSPECTION APPARATUS
    80.
    发明申请
    SURFACE INSPECTION METHOD AND SURFACE INSPECTION APPARATUS 失效
    表面检查方法和表面检查装置

    公开(公告)号:US20090284737A9

    公开(公告)日:2009-11-19

    申请号:US12207536

    申请日:2008-09-10

    Applicant: Shigeru MATSUI

    Inventor: Shigeru MATSUI

    CPC classification number: G01N21/8806 G01N21/9501 G01N21/9505

    Abstract: A surface inspection apparatus capable of acquiring scattered light intensity distribution information for each scattering azimuth angle, and detecting foreign matters and defects with high sensitivity. A concave mirror for condensation and another concave mirror for image formation are used to cope with a broad cubic angle. Since mirrors for condensation and image formation are used, a support for clamping the periphery of a lens is unnecessary, and an effective aperture area does not decrease. A plurality of azimuth-wise detection optical systems is disposed and reflected light at all azimuths can be detected by burying the entire periphery without calling for specific lens polishing. A light signal unification unit sums digital data from a particular system corresponding to a scattering azimuth designated in advance in the systems for improving an S/N ratio.

    Abstract translation: 能够获取各散射方位角的散射光强度分布信息,高灵敏度地检测异物和缺陷的表面检查装置。 用于冷凝的凹面镜和用于成像的另一凹面镜用于处理宽的立方角。 由于使用用于冷凝和图像形成的反射镜,所以不需要用于夹持透镜周边的支撑件,并且有效开口面积不会降低。 设置多个方位检测光学系统,并且可以通过掩埋整个周边来检测所有方位角处的反射光,而不需要特定的透镜抛光。 光信号统一单元将来自与用于提高S / N比的系统中预先指定的散射方位相对应的特定系统的数字数据相加。

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