公开(公告)号：US20130208271A1

公开(公告)日：2013-08-15

申请号：US13838460

申请日：2013-03-15

Applicant: Yoshimasa OSHIMA ,  Toshiyuki NAKAO ,  Shigeru MATSUI

Inventor： Yoshimasa OSHIMA ,  Toshiyuki NAKAO ,  Shigeru MATSUI

IPC: G01N21/95

CPC classification number: G01N21/9501 ,  G01N2021/4716

Abstract: A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.

Abstract translation: 一种表面缺陷检查装置和方法，用于将多个光束照射到检查样品的表面上的相同区域，分别通过检测光学系统检测来自相同区域的每个散射光以产生多个信号，并且其中照射光束包括执行 在样品表面的线照射区域上的光束的线照明。 线照明区域沿纵向方向以比线照明区域的长度方向的长度短的间距移动。

公开(公告)号：US20120008138A1

公开(公告)日：2012-01-12

申请号：US13221314

申请日：2011-08-30

Applicant: Yoshimasa OSHIMA ,  Toshiyuki NAKAO ,  Shigeru MATSUI

Inventor： Yoshimasa OSHIMA ,  Toshiyuki NAKAO ,  Shigeru MATSUI

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N2021/4716

Abstract: A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.

Abstract translation: 一种表面缺陷检查装置和方法，用于将多个光束照射到检查样品的表面上的相同区域，分别通过检测光学系统检测来自相同区域的每个散射光以产生多个信号，并且其中照射光束包括执行 在样品表面的线照射区域上的光束的线照明。 线照明区域沿纵向方向以比线照明区域的长度方向的长度短的间距移动。

公开(公告)号：US20110255082A1

公开(公告)日：2011-10-20

申请号：US13167298

申请日：2011-06-23

Applicant: Shigeru MATSUI

Inventor： Shigeru MATSUI

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/94

Abstract: In the conventional contaminant particle/defect inspection method, if the illuminance of the illumination beam is held at not more than a predetermined upper limit value not to give thermal damage to the sample, the detection sensitivity and the inspection speed being in the tradeoff relation with each other, it is very difficult to improve one of the detection sensitivity and the inspection speed without sacrificing the other or improve both at the same time. The invention provides an improved optical inspection method and an improved optical inspection apparatus, in which a pulse laser is used as a light source, and a laser beam flux is split into a plurality of laser beam fluxes which are given different time delay to form a plurality of illumination spots. The scattered light signal from each illumination spot is isolated and detected by using a light emission start timing signal for each illumination spot.

Abstract translation: 在常规污染物颗粒/缺陷检查方法中，如果照明光束的照度被保持在不对样品造成热损伤的预定上限值以下，则检测灵敏度和检查速度与 彼此难以提高检测灵敏度和检测速度之一而不牺牲另一方或同时改善两者。 本发明提供了一种改进的光学检查方法和改进的光学检查装置，其中使用脉冲激光器作为光源，并且激光束通量被分割成多个激光束，其被给予不同的时间延迟以形成 多个照明点。 通过使用每个照明点的发光开始定时信号来隔离并检测来自每个照明点的散射光信号。

公开(公告)号：US20100271625A1

公开(公告)日：2010-10-28

申请号：US12814518

申请日：2010-06-14

Applicant: Shigeru MATSUI

Inventor： Shigeru MATSUI

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/4738

Abstract: A surface inspection method and a surface inspection apparatus in which a plurality of photodetectors are arranged in a plurality of directions so that light scattered, diffracted or reflected on a surface of an object to be inspected or in the vicinity of the surface is detected and a plurality of signals obtained by this are subjected to weighted addition processing or weighted averaging processing by linear combination.

Abstract translation: 表面检查方法和表面检查装置，其中多个光电检测器被布置在多个方向上，使得在被检测物体的表面或表面附近检测到散射，衍射或反射的光，并且 通过这样获得的多个信号通过线性组合进行加权相加处理或加权平均处理。

公开(公告)号：US20100259750A1

公开(公告)日：2010-10-14

申请号：US12823290

申请日：2010-06-25

Applicant: Kenji OKA ,  Shigeru MATSUI

Inventor： Kenji OKA ,  Shigeru MATSUI

IPC: G01N21/00

CPC classification number: G01N21/8851 ,  G01N21/9501

Abstract: An appearance inspection apparatus analyzes a difference in detection characteristics of detection signals obtained by detectors to flexibly meet various inspection purposes without changing a circuit or software. The apparatus includes a signal synthesizing section that synthesizes detection signals from the detectors in accordance with a set condition. An input operating section sets a synthesizing condition of the detection signal by the signal synthesizing section, and an information display section displays a synthesizing map structured based on a synthesized signal which is synthesized by the signal synthesizing section in accordance with a condition set by the input operating section.

Abstract translation: 外观检查装置分析由检测器获得的检测信号的检测特性的差异，以灵活地满足各种检查目的，而不改变电路或软件。 该装置包括信号合成部，其根据设定条件合成来自检测器的检测信号。 输入操作部分通过信号合成部分设置检测信号的合成条件，并且信息显示部分显示由信号合成部分根据由输入设置的条件合成的合成信号构成的合成图 操作部分。

公开(公告)号：US20090323051A1

公开(公告)日：2009-12-31

申请号：US12556144

申请日：2009-09-09

Applicant: Shigeru MATSUI

Inventor： Shigeru MATSUI

IPC: G01N21/94

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N2021/8861

Abstract: An optical inspection apparatus irradiates a light beam onto the outer surface of an object to be inspected, in the form of an illumination spot having an illumination intensity which is higher in the outer peripheral part of the object to be inspected than in the inner peripheral part thereof while uniformly maintains a temperature rise caused by the irradiation of the light beam, over the outer surface of the object to be inspected, in order to prevent the effective entire signal value of a scattered light signal from lowering, without lowering the linear speed of a movable stage for the object to be inspected in the outer peripheral part of the object to be inspected, thereby it is possible to prevent lowering of the detectability for a foreign matter or a defect, for preventing lowering of inspection throughput.

Abstract translation: 光学检查装置将光束照射到被检查物体的外周部的照明强度比要检查对象的外周部的照明强度高于内周部的照明光斑的形状 同时在被检查物体的外表面上均匀地保持由光束照射引起的温度升高，以防止散射光信号的有效整体信号值降低，而不会降低线性速度 在待检查物体的外周部分中可检测物体的可移动台，从而可以防止异物或缺陷的可检测性的降低，以防止检查吞吐量的降低。

公开(公告)号：US20090041335A1

公开(公告)日：2009-02-12

申请号：US12249328

申请日：2008-10-10

Applicant: Shigeru MATSUI ,  Katsuya SUZUKI

Inventor： Shigeru MATSUI ,  Katsuya SUZUKI

IPC: G06K9/00

CPC classification number: G06T7/001 ,  G01N21/95607 ,  G03F7/7065 ,  G06T2207/30148

Abstract: The pattern defect inspection apparatus is operable to detect defects by comparing a detection image, which is obtained through scanning by an image sensor those patterns that have the identical shape and are continuously disposed on the object under tested at equal intervals in row and column directions, with a reference image obtained by scanning neighboring identical shape patterns in the row and column directions. This apparatus has a unit for generating an average reference image by statistical computation processing from the images of identical shape patterns lying next to the detection image including at least eight nearest chips on the up-and-down and right-and-left sides and at diagonal positions with the detection image being intermediately situated. The apparatus also includes a unit that detects a defect by comparing the detection image to the average reference image thus generated.

Abstract translation: 图案缺陷检查装置可以通过将通过图像传感器进行扫描而得到的检测图像进行比较来检测缺陷，所述检测图像具有相同形状且连续设置在被检测物体上的行和列方向上等间隔的那些图案， 具有通过扫描行和列方向上的相邻相同形状图案而获得的参考图像。 该装置具有用于通过统计计算处理从邻近检测图像的相同形状图案的图像生成平均参考图像的单元，该检测图像包括上下左右侧的至少八个最近的码片，以及在 对角位置，检测图像位于中间位置。 该装置还包括通过将检测图像与由此生成的平均参考图像进行比较来检测缺陷的单元。

公开(公告)号：US20120273660A1

公开(公告)日：2012-11-01

申请号：US13544739

申请日：2012-07-09

Applicant: Shigeru MATSUI

Inventor： Shigeru MATSUI

IPC: H03K17/78

CPC classification number: G01N21/9501 ,  G01N21/94

Abstract: In the conventional contaminant particle/defect inspection method, if the illuminance of the illumination beam is held at not more than a predetermined upper limit value not to give thermal damage to the sample, the detection sensitivity and the inspection speed being in the tradeoff relation with each other, it is very difficult to improve one of the detection sensitivity and the inspection speed without sacrificing the other or improve both at the same time. The invention provides an improved optical inspection method and an improved optical inspection apparatus, in which a pulse laser is used as a light source, and a laser beam flux is split into a plurality of laser beam fluxes which are given different time delay to form a plurality of illumination spots. The scattered light signal from each illumination spot is isolated and detected by using a light emission start timing signal for each illumination spot.

Abstract translation: 在常规污染物颗粒/缺陷检查方法中，如果照明光束的照度被保持在不对样品造成热损伤的预定上限值以下，则检测灵敏度和检查速度与 彼此难以提高检测灵敏度和检测速度之一而不牺牲另一方或同时改善两者。 本发明提供了一种改进的光学检查方法和改进的光学检查装置，其中使用脉冲激光器作为光源，并且激光束通量被分割成多个激光束，其被给予不同的时间延迟以形成 多个照明点。 通过使用每个照明点的发光开始定时信号来隔离并检测来自每个照明点的散射光信号。

公开(公告)号：US20110141461A1

公开(公告)日：2011-06-16

申请号：US13032165

申请日：2011-02-22

Applicant: Shigeru MATSUI ,  Masayuki Hachiya

Inventor： Shigeru MATSUI ,  Masayuki Hachiya

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Light from a light source becomes two illumination beams by a beam splitter. The beams are irradiated onto a semiconductor wafer from two mutually substantially orthogonal azimuthal angles having substantially equal elevation angles to form illumination spots. When the sum of scattered, diffracted, and reflected lights due to the illumination beams is detected, influence of the anisotropy which a contaminant particle and a defect existing in the wafer itself or thereon have with respect to an illumination direction, can be eliminated.

Abstract translation: 来自光源的光由分束器变成两个照明光束。 光束从具有基本相等的仰角的两个相互基本正交的方位角照射到半导体晶片上，以形成照明点。 当检测到由于照明光束引起的散射，衍射和反射光的总和时，可以消除晶片本身或其上存在的污染颗粒和缺陷相对于照明方向的各向异性的影响。

公开(公告)号：US20110075135A1

公开(公告)日：2011-03-31

申请号：US12964833

申请日：2010-12-10

Applicant: Shigeru MATSUI

Inventor： Shigeru MATSUI

IPC: G01N21/94

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/9505

Abstract: A surface inspection apparatus capable of acquiring scattered light intensity distribution information for each scattering azimuth angle, and detecting foreign matters and defects with high sensitivity. A concave mirror for condensation and another concave mirror for image formation are used to cope with a broad cubic angle. Since mirrors for condensation and image formation are used, a support for clamping the periphery of a lens is unnecessary, and an effective aperture area does not decrease. A plurality of azimuth-wise detection optical systems is disposed and reflected light at all azimuths can be detected by burying the entire periphery without calling for specific lens polishing. A light signal unification unit sums digital data from a particular system corresponding to a scattering azimuth designated in advance in the systems for improving an S/N ratio.

Abstract translation: 能够获取各散射方位角的散射光强度分布信息，高灵敏度地检测异物和缺陷的表面检查装置。 用于冷凝的凹面镜和用于成像的另一凹面镜用于处理宽的立方角。 由于使用用于冷凝和图像形成的反射镜，所以不需要用于夹持透镜周边的支撑件，并且有效开口面积不会降低。 设置多个方位检测光学系统，并且可以通过掩埋整个周边来检测所有方位角处的反射光，而不需要特定的透镜抛光。 光信号统一单元将来自与用于提高S / N比的系统中预先指定的散射方位相对应的特定系统的数字数据相加。