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110 条记录 (耗时 0.035 秒)

    INDEPENDENT SUSPENSION SYSTEM
    71.
    发明申请
    INDEPENDENT SUSPENSION SYSTEM 审中-公开
    独立悬挂系统

    公开(公告)号：US20080042391A1

    公开(公告)日：2008-02-21

    申请号：US11697521

    申请日：2007-04-06

    申请人： John Holland ,  Tomas McCabe

    发明人： John Holland ,  Tomas McCabe

    IPC分类号： B60G9/00 ,  B60G11/00 ,  B60G7/00

    CPC分类号： B60G3/20 ,  B60G7/02 ,  B60G11/16 ,  B60G2200/144 ,  B60G2204/1244 ,  B60G2206/0114 ,  B60G2206/50 ,  B60G2206/60

    摘要： An independent suspension system for mounting on a vehicle chassis which includes a pair of spaced-apart longitudinal chassis rails has a U-shaped support frame for attachment to the vehicle chassis rails. The support frame has a pair of side frame members, upper ends of which are adapted for engagement with the chassis rails. Lower ends of the side frame members are interconnected by a pair of spaced-apart cross members which are demountably secured between the side frame members. Each cross member has an elongate tubular body with flanged ends having through holes for reception of mounting bolts to secure the cross member to the side frame members.

    摘要翻译： 用于安装在包括一对间隔开的纵向底盘轨道的车辆底盘上的独立悬架系统具有用于附接到车辆底盘轨道的U形支撑框架。 支撑框架具有一对侧框架构件，其上端适于与底盘轨道接合。 侧框架构件的下端通过一对间隔开的横向构件相互连接，该横向构件可拆卸地固定在侧框架构件之间。 每个横向构件具有细长的管状体，其具有法兰端部，其具有用于接收安装螺栓以将横梁固定到侧框架构件的通孔。

    METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE
    73.
    发明申请
    METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE 审中-公开
    控制基板温度的方法和装置

    公开(公告)号：US20070102118A1

    公开(公告)日：2007-05-10

    申请号：US11563272

    申请日：2006-11-27

    申请人： John Holland ,  Theodoros Panagopoulos

    发明人： John Holland ,  Theodoros Panagopoulos

    IPC分类号： C23F1/00 ,  C23C16/00

    CPC分类号： H01L21/67248 ,  H01L21/67103 ,  H01L21/6831 ,  Y10T279/23

    摘要： A pedestal assembly and method for controlling temperature of a substrate during processing is provided. In one embodiment, the pedestal assembly includes a support member that is coupled to a base by a material layer. The material layer has at least two regions having different coefficients of thermal conductivity. In another embodiment, the support member is an electrostatic chuck. In further embodiments, a pedestal assembly has channels formed between the base and support member for providing cooling gas in proximity to the material layer to further control heat transfer between the support member and the base, thereby controlling the temperature profile of a substrate disposed on the support member.

    摘要翻译： 提供了一种用于在处理期间控制基板的温度的基座组件和方法。 在一个实施例中，基座组件包括通过材料层联接到基座的支撑构件。 材料层具有至少两个具有不同导热系数的区域。 在另一个实施例中，支撑构件是静电卡盘。 在另外的实施例中，基座组件具有形成在基部和支撑构件之间的通道，用于在材料层附近提供冷却气体，以进一步控制支撑构件和基座之间的热传递，从而控制设置在基座上的基板的温度分布 支持会员

    Fire resistant glazings
    74.
    发明申请
    Fire resistant glazings 失效
    防火玻璃

    公开(公告)号：US20070026242A1

    公开(公告)日：2007-02-01

    申请号：US11543615

    申请日：2006-10-05

    申请人： John Holland ,  Karikath Varma ,  David Holden

    发明人： John Holland ,  Karikath Varma ,  David Holden

    IPC分类号： B32B17/06 ,  B32B13/00

    CPC分类号： C09K21/00 ,  B32B17/069

    摘要： Solutions comprising a sodium silicate waterglass having a modulus of less than 3 and at least 8% by weight of an organic polyhydroxy compound such as glycerol are useful in the production of interlayers used in fire resistant glass laminates. The solutions are dried on a flat surface such as glass to produce a clear intumescent interlayer having improved impact resistance. The dried interlayer may be removed from the surface in the form of an elastomeric material which may also be used as an interlayer in a fire resistant glazing.

    摘要翻译： 包含模量小于3且至少8重量％的有机多羟基化合物如甘油的硅酸钠水玻璃的溶液可用于生产用于耐火玻璃层压材料的夹层。 将溶液在诸如玻璃的平坦表面上干燥以产生具有改善的抗冲击性的透明膨胀中间层。 干燥的中间层可以以弹性材料的形式从表面去除，该弹性体材料也可以用作耐火玻璃中的中间层。

    MULTI-FREQUENCY PLASMA ENHANCED PROCESS CHAMBER HAVING A TOROIDAL PLASMA SOURCE
    75.
    发明申请
    MULTI-FREQUENCY PLASMA ENHANCED PROCESS CHAMBER HAVING A TOROIDAL PLASMA SOURCE 审中-公开
    具有等离子体等离子体源的多频等离子体增强过程室

    公开(公告)号：US20070017897A1

    公开(公告)日：2007-01-25

    申请号：US11536014

    申请日：2006-09-28

    申请人： Ashok Sinha ,  Daniel Hoffman ,  John Holland

    发明人： Ashok Sinha ,  Daniel Hoffman ,  John Holland

    IPC分类号： G01L21/30 ,  C23F1/00

    CPC分类号： H01J37/32165 ,  H01J37/321

    摘要： A method and apparatus for processing a substrate includes a reactor chamber having a chamber wall and containing a substrate support. An electrode overlies the substrate and is spaced apart from the substrate support. One or more plasma sources maintains plasma in the reactor in one or more toroidal paths using a first frequency. One or more RF power generators supply power to the electrode at a second frequency that is different from the first frequency.

    摘要翻译： 用于处理衬底的方法和装置包括具有室壁并包含衬底支撑件的反应室。 电极覆盖在衬底上并且与衬底支撑件间隔开。 一个或多个等离子体源使用第一频率在一个或多个环形路径中维持反应器中的等离子体。 一个或多个RF发电机以不同于第一频率的第二频率向电极供电。

    PLASMA GENERATION AND CONTROL USING A DUAL FREQUENCY RF SOURCE
    76.
    发明申请
    PLASMA GENERATION AND CONTROL USING A DUAL FREQUENCY RF SOURCE 审中-公开
    使用双频RF源的等离子体生成和控制

    公开(公告)号：US20070006971A1

    公开(公告)日：2007-01-11

    申请号：US11531615

    申请日：2006-09-13

    申请人： Steven Shannon ,  Alex Paterson ,  Theodoros Panagopoulos ,  John Holland ,  Dennis Grimard ,  Yashushi Takakura

    发明人： Steven Shannon ,  Alex Paterson ,  Theodoros Panagopoulos ,  John Holland ,  Dennis Grimard ,  Yashushi Takakura

    IPC分类号： C23F1/00

    CPC分类号： H01J37/32082 ,  H01J37/32165 ,  H01J37/32706

    摘要： A method and apparatus for generating and controlling a plasma in a semiconductor substrate processing chamber using a dual frequency RF source is provided. The method includes the steps of supplying a first RF signal from the source to an electrode within the processing chamber at a first frequency and supplying a second RF signal from the source to the electrode within the processing chamber at a second frequency. The second frequency is different from the first frequency by an amount equal to a desired frequency. Characteristics of a plasma formed in the chamber establish a sheath modulation at the desired frequency.

    摘要翻译： 提供了一种使用双频RF源在半导体衬底处理室中产生和控制等离子体的方法和装置。 该方法包括以第一频率将来自源的第一RF信号提供给处理室内的电极的步骤，并以第二频率将来自源的第二RF信号提供给处理室内的电极。 第二频率与第一频率不等于期望频率的量。 在腔室中形成的等离子体的特性以期望的频率建立护套调制。

    Process to prepare a lubricating base oil
    80.
    发明申请
    Process to prepare a lubricating base oil 审中-公开
    润滑油基础油的制备方法

    公开(公告)号：US20050194288A1

    公开(公告)日：2005-09-08

    申请号：US11065980

    申请日：2005-02-25

    申请人： John Holland ,  John Powers ,  Bryan Schorzman ,  Michael Smith

    发明人： John Holland ,  John Powers ,  Bryan Schorzman ,  Michael Smith

    IPC分类号： C10G21/00 ,  C10G45/02 ,  C10G67/04 ,  C10G69/00 ,  C10G73/02

    CPC分类号： C10G21/00 ,  C10G2400/10

    摘要： Process to prepare a lubricating base oil having a saturates content of greater than 90 wt % and a viscosity index of greater than 90 starting from a vacuum distillate feedstock by performing the following steps: (a) contacting the vacuum distillate feedstock with an extraction solvent selective for extracting aromatic compounds from the vacuum distillate, (b) mixing the extracted oil obtained in step (a) with a feed comprising of more than 50 wt % wax or comprising of more than 80 wt % of paraffins and having a pour point greater than 0° C., (c) hydrotreating the blend obtained in step (b), (d) catalytically dewaxing the hydrotreated oil obtained in step (c) to obtained the lubricating base oil and (e) contacting the dewaxed oil with an aromatics saturation catalyst.

    摘要翻译： 通过进行以下步骤从真空馏分原料制备饱和物含量大于90重量％和粘度指数大于90的润滑基础油的方法：（a）使真空馏分原料与萃取溶剂选择性接触 用于从真空馏出物中提取芳族化合物，（b）将步骤（a）中获得的提取的油与包含大于50重量％的蜡或包含大于80重量％的链烷烃并且具有大于 （c）对步骤（b）中获得的共混物进行加氢处理，（d）催化脱蜡步骤（c）中获得的加氢处理油，得到润滑基础油，和（e）使脱蜡油与芳烃饱和 催化剂。