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公开(公告)号：US20130061678A1
公开(公告)日：2013-03-14
申请号：US13600399
申请日：2012-08-31
IPC分类号： G01N29/00
CPC分类号： G01N29/2418 , A61B5/0095 , A61B5/14542 , A61B2576/00 , G01N29/06 , G01N29/09 , G01N2291/02466
摘要： This invention employs an object information acquiring apparatus including a probe for receiving, as a received signal, an acoustic wave which is generated within an object irradiated with light and propagates on an object surface, and a processor for generating object information, which is information based on an internal optical characteristic value of the object, by using intensity of the received signal. The processor corrects the intensity of the received signal by using the reflectance upon the acoustic wave entering the probe which is calculated based on the angle of the acoustic wave entering the probe, and on the acoustic impedance and acoustic velocity of the object and the probe.
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公开(公告)号：US08071057B2
公开(公告)日：2011-12-06
申请号：US12268521
申请日：2008-11-11
申请人： Toshinobu Tokita , Kosuke Fujimoto
发明人： Toshinobu Tokita , Kosuke Fujimoto
IPC分类号： B01J19/18
CPC分类号： B01J19/0093 , B01J2219/00783 , B01J2219/00833 , B01J2219/00873 , B01J2219/00889 , B01J2219/00891 , B01J2219/00932 , B01L3/502738 , B01L2400/065 , F16K99/0001 , F16K99/0005 , F16K99/0011 , F16K99/0028 , F16K99/0042 , F16K2099/0084
摘要： A microfluidic valve device includes a microfluidic chip including a substrate having a channel, a valve disposed within the channel and configured to change a conductance of the channel, with the valve having an inner channel formed therein, and an oscillator configured to generate a traveling wave. The valve is moved by generating the traveling wave to open and close the channel.
摘要翻译： 微流体阀装置包括微流体芯片，其包括具有通道的基板，设置在通道内的阀，并且构造成改变通道的电导，阀具有形成在其中的内部通道;以及振荡器，其被配置为产生行波 。 通过产生行波来使阀门移动以打开和关闭通道。
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公开(公告)号：US20100289190A1
公开(公告)日：2010-11-18
申请号：US11531856
申请日：2006-09-14
CPC分类号： G03F7/0002 , B29C43/021 , B29C2043/025 , B82Y10/00 , B82Y40/00
摘要： A processing method for transferring a relief pattern of a mold to a resist includes the steps of compressing the mold having the relief pattern against the resist on a substrate, irradiating an exposure light onto the resist through the mold, vibrating the mold and the substrate relative to each other during the irradiating step, and releasing the mold from the resist.
摘要翻译： 用于将模具的浮雕图案转印到抗蚀剂的处理方法包括以下步骤：将具有凹凸图案的模具压靠在基板上的抗蚀剂上，通过模具将曝光光照射到抗蚀剂上，使模具和基板相对振动 在照射步骤期间彼此相对，并且从抗蚀剂中释放模具。
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74.发明授权Pattern transferring mold, pattern transferring apparatus and device manufacturing method using the same 有权图案转印模具，图案转印装置和使用其的装置制造方法公开(公告)号：US07690912B2
公开(公告)日：2010-04-06
申请号：US11364631
申请日：2006-02-27
CPC分类号： B82Y10/00 , B81C99/009 , B81C2201/0152 , B81C2201/036 , B82Y40/00 , G03F7/0002
摘要： One object of the present invention is to provide a pattern transferring mold which can provide a starting area of mold release easily and certainly and a pattern transferring apparatus with the same. A pattern transferring mold is disclosed which is used in a pattern transferring apparatus that brings the mold into contact with a photo-curing resin on a substrate and cures the photo-curing resin by light irradiation to transfer a pattern formed on the mold onto the photo-curing resin. The mold comprises a bottom face which contacts the photo-curing resin, the bottom face portion including a first area in which the pattern is formed and a second area formed outside the first area. The mold has a mold-releasing shape in the second area, the mold-releasing shape providing a starting area of mold release from the cured photo-curing resin.
摘要翻译： 本发明的一个目的是提供一种图案转印模具，其可以容易且确定地提供脱模的起始区域和具有该图案转印模具的图案转印装置。 公开了一种图案转印模具，其用于使模具与基板上的光固化树脂接触的图案转印装置，并通过光照射固化光固化树脂，以将形成在模具上的图案转印到照片上 固化树脂。 模具包括与光固化树脂接触的底面，底面部分包括形成图案的第一区域和形成在第一区域外部的第二区域。 模具在第二区域具有脱模形状，脱模形状提供了从固化的光固化树脂脱模的起始区域。
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公开(公告)号：US07224434B2
公开(公告)日：2007-05-29
申请号：US11252440
申请日：2005-10-17
申请人： Toshinobu Tokita
发明人： Toshinobu Tokita
CPC分类号： G03F7/70341
摘要： An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto an object to be exposed, via a liquid that is filled in a space between said projection optical system and the object, and a removing part for removing an air bubble and/or a foreign particle mixed in the liquid by forming a predetermined flow velocity distribution in the liquid.
摘要翻译： 曝光装置包括：投影光学系统，用于通过填充在所述投影光学系统和物体之间的空间的液体和用于去除气泡的去除部分，将掩模版的图案投射到待曝光的物体上;以及 /或通过在液体中形成预定的流速分布而混合在液体中的外来颗粒。
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76.发明申请Pattern transferring mold, pattern transferring apparatus and device manufacturing method using the same 有权图案转印模具，图案转印装置和使用其的装置制造方法公开(公告)号：US20060192320A1
公开(公告)日：2006-08-31
申请号：US11364631
申请日：2006-02-27
IPC分类号： B29C59/02
CPC分类号： B82Y10/00 , B81C99/009 , B81C2201/0152 , B81C2201/036 , B82Y40/00 , G03F7/0002
摘要： One object of the present invention is to provide a pattern transferring mold which can provide a starting area of mold release easily and certainly and a pattern transferring apparatus with the same. A pattern transferring mold is disclosed which is used in a pattern transferring apparatus that brings the mold into contact with a photo-curing resin on a substrate and cures the photo-curing resin by light irradiation to transfer a pattern formed on the mold onto the photo-curing resin. The mold comprises a bottom face which contacts the photo-curing resin, the bottom face portion including a first area in which the pattern is formed and a second area formed outside the first area. The mold has a mold-releasing shape in the second area, the mold-releasing shape providing a starting area of mold release from the cured photo-curing resin.
摘要翻译： 本发明的一个目的是提供一种图案转印模具，其可以容易且确定地提供脱模的起始区域和具有该图案转印模具的图案转印装置。 公开了一种图案转印模具，其用于使模具与基板上的光固化树脂接触的图案转印装置，并通过光照射固化光固化树脂，以将形成在模具上的图案转印到照片上 固化树脂。 模具包括与光固化树脂接触的底面，底面部分包括形成图案的第一区域和形成在第一区域外部的第二区域。 模具在第二区域具有脱模形状，脱模形状提供了从固化的光固化树脂脱模的起始区域。
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公开(公告)号：US20060082749A1
公开(公告)日：2006-04-20
申请号：US11252440
申请日：2005-10-17
申请人： Toshinobu Tokita
发明人： Toshinobu Tokita
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto an object to be exposed, via a liquid that is filled in a space between said projection optical system and the object, and a removing part for removing an air bubble and/or a foreign particle mixed in the liquid by forming a predetermined flow velocity distribution in the liquid.
摘要翻译： 曝光装置包括：投影光学系统，用于通过填充在所述投影光学系统和物体之间的空间的液体和用于去除气泡的去除部分，将掩模版的图案投射到待曝光的物体上;以及 /或通过在液体中形成预定的流速分布而混合在液体中的外来颗粒。
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公开(公告)号：US20050275125A1
公开(公告)日：2005-12-15
申请号：US11149046
申请日：2005-06-08
IPC分类号： G03F7/20 , G03F7/00 , H01L21/027 , B29C31/00 , B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, and an irradiation of light for exposing the resist onto the resist includes a mold chuck for holding the mold and for compressing the mold against the resist, and a deformation reducing part for reducing a deformation of the mold when the mold chuck applies a compression force to the mold.
摘要翻译： 一种处理装置，用于通过将模具压靠在抗蚀剂上将模具上的浮雕图案转印到基板上的抗蚀剂上，以及用于将抗蚀剂暴露于抗蚀剂上的光的照射包括用于保持模具并压缩的模具卡盘 抵抗抗蚀剂的模具，以及用于当模具卡盘向模具施加压缩力时减小模具的变形的变形减小部件。
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79.发明申请Exposure apparatus, and method, device manufacturing method, pattern generator and maintenance method 审中-公开曝光装置和方法，装置制造方法，图案发生器和维护方法公开(公告)号：US20050248659A1
公开(公告)日：2005-11-10
申请号：US11112901
申请日：2005-04-22
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , H04N5/225
CPC分类号： G03F9/7015 , G03F7/70291
摘要： An exposure apparatus includes a projection optical system for projecting a predetermined pattern onto an object to be exposed, and a pattern generating unit that includes plural pixels, and generates the predetermined pattern by driving the plural pixels, wherein the pattern generating unit has an alignment mark used for an alignment between the predetermined pattern and the object, on approximately the same surface as a surface on which the predetermined pattern is formed.
摘要翻译： 曝光装置包括：投影光学系统，用于将预定图案投射到要曝光的物体上;以及图案生成单元，包括多个像素，并通过驱动多个像素产生预定图案，其中，图案生成单元具有对准标记 用于在与预定图案形成的表面大致相同的表面上的预定图案和物体之间的对准。
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公开(公告)号：US20050230346A1
公开(公告)日：2005-10-20
申请号：US11092228
申请日：2005-03-28
CPC分类号： B29C43/021 , B29C43/003 , B29C43/04 , B29C43/14 , B29C2043/025 , B29C2043/142 , B29C2043/3438 , B29C2043/3634 , B29L2011/0016 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, includes a supplier for supplying the resist between the substrate and the mold, and a recovery unit for recovering the resist.
摘要翻译： 一种处理装置，用于通过将模具压靠在抗蚀剂上将模具上的浮雕图案转移到基板上的抗蚀剂上，包括用于在基板和模具之间供应抗蚀剂的供应商和用于回收抗蚀剂的回收单元。
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