公开(公告)号：US20180016136A1

公开(公告)日：2018-01-18

申请号：US15546260

申请日：2016-01-21

申请人： THE REGENTS OF THE UNIVERSITY OF CALIFORNIA

发明人： Muchen Xu ,  Chang-Jin Kim

IPC分类号： B81C1/00 ,  B29C33/64 ,  B29C33/42 ,  B29C33/44

CPC分类号： B81C1/00373 ,  B29C33/42 ,  B29C33/44 ,  B29C33/64 ,  B81B2207/056 ,  B81C1/00111 ,  B81C1/00357 ,  B81C1/00555 ,  B81C99/0085 ,  B81C2201/0198 ,  B81C2201/036 ,  B81C2203/0136 ,  B81C2203/036 ,  B81C2203/0757

摘要： A method of making microstructures having re-entrant or doubly re-entrant topology includes forming a mold defining the negative surface features of the re-entrant or doubly re-entrant topology that is to be formed. In one embodiment, a soft or flowable material is formed on a first substrate and the mold is contacted with the same to form a solid, now positive surface having the re-entrant or doubly re-entrant topology. The mold is then released from the first substrate. The microstructures are secured to a second, different substrate, and the first substrate is removed. Any residual microstructure material located between adjacent microstructures may be removed to form the separate microstructures on the second substrate. The second substrate may be thin and flexible any manipulated into useful or desired shapes having the microstructures on one side thereof.

公开(公告)号：US20160207758A1

公开(公告)日：2016-07-21

申请号：US14914015

申请日：2014-08-26

申请人： SILEX MICROSYSTEMS AB

发明人： Edvard KALVESTEN ,  Thorbjorn EBEFORS ,  Niklas SVEDIN

IPC分类号： B81B7/00 ,  B81C1/00

CPC分类号： B81B7/007 ,  B81B2201/01 ,  B81B2201/0264 ,  B81B2201/0271 ,  B81B2203/0118 ,  B81B2203/0127 ,  B81B2207/095 ,  B81C1/00301 ,  B81C2201/0153 ,  B81C2201/036 ,  B81C2203/0109 ,  B81C2203/0145 ,  H01L21/50 ,  H01L23/08 ,  H01L24/94 ,  H01L2924/16235

摘要： A device includes a base substrate (700) with a micro component (702) attached thereto. Suitably it is provided with routing elements (704) for conducting signals to and from the component (702). It also includes spacer members (706) which also can act as conducting structures for routing signals vertically. There is a capping structure (708) of a glass material, provided above the base substrate (700), bonded via the spacer members (706), preferably by eutectic bonding, wherein the capping structure (708) includes vias (710) including metal for providing electrical connection through the capping structure. The vias can be made by a stamping/pressing method entailing pressing needles under heating to soften the glass and applying pressure, to a predetermined depth in the glass. However, other methods are possible, e-g- drilling, etching, blasting.

摘要翻译： 一种装置包括具有附接到其上的微型部件（702）的基底（700）。 适当地，它设置有用于向组件（702）进行信号的路由选择元件（704）。 它还包括间隔件（706），其也可以用作垂直路线信号的导电结构。 优选地通过共晶接合，通过间隔件（706），设置在基底基板（700）上方的玻璃材料的封盖结构（708），其中封盖结构（708）包括通孔（710），包括金属 用于提供通过封盖结构的电连接。 通孔可以通过冲压/压制方法制成，在加热下需要加压针，使玻璃软化并施加压力至玻璃中预定的深度。 然而，其他方法是可行的，例如钻孔，蚀刻，爆破。

公开(公告)号：US20090080323A1

公开(公告)日：2009-03-26

申请号：US12226923

申请日：2007-05-04

申请人： Massimiliano Cavallini ,  Gianluca Massaccesi ,  Francesco Cino Matacotta ,  Fabio Biscarini

发明人： Massimiliano Cavallini ,  Gianluca Massaccesi ,  Francesco Cino Matacotta ,  Fabio Biscarini

IPC分类号： G11B3/70 ,  B29C59/02 ,  B32B3/00

CPC分类号： G03F7/0002 ,  B29C59/022 ,  B29C2059/023 ,  B81C1/00111 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00 ,  Y10T428/24802

摘要： A method for providing a locally rough surface which is spatially structured on micrometric and/or nanometric scale and is formed by a substrate, so as to obtain a product. The method comprises the steps of flattening and/or smoothing the rough substrate in preset regions.

摘要翻译： 一种用于提供局部粗糙表面的方法，该表面由微米和/或纳米尺度空间结构，并由基底形成，以获得产品。 该方法包括在预设区域中平坦化和/或平滑粗糙衬底的步骤。

公开(公告)号：US20070063390A1

公开(公告)日：2007-03-22

申请号：US10562014

申请日：2004-06-22

申请人： Tormen Massimo

发明人： Tormen Massimo

IPC分类号： B29C59/02

CPC分类号： G03F7/0002 ,  B29C33/02 ,  B81C99/0085 ,  B81C2201/0153 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00

摘要： A lithographic process for forming a pattern in relief (20) on a mass (10) of polymeric material comprises the steps of: preparing the mass (10) of polymeric material and a die (12) having a surface region (14) facing towards the mass (10) of polymeric material and which reproduces in negative the pattern in relief (20); heating the die (12) and putting the mass (10) of polymeric material into contact with the die (12) in any temporal sequence, in such a way that the part of the mass (10) of polymeric material in contact with the surface zone (14) is subject to softening; and separating the die (12) from the mass (10) of polymeric material on the surface of which the pattern in relief (20) has been formed. The heating of at least one part of the die (12) is obtained by generation of thermal energy upon dissipation of another form of energy in at least one region (16) of the die (12).

摘要翻译： 用于在聚合物材料（10）上形成浮雕（20）中的图案的平版印刷工艺包括以下步骤：制备聚合物材料块（10）和模具（12），所述模具（12）具有面向 聚合物材料的质量（10）并且以凹凸（20）的形式呈现为负值; 加热模具（12）并将聚合材料的质量块（10）以任何时间顺序与模具（12）接触，使得聚合材料质量（10）的与表面接触的部分 区域（14）容易软化; 以及将模具（12）与形成有凹凸图案（20）的表面上的聚合材料块（10）分离。 模具（12）的至少一部分的加热通过在模具（12）的至少一个区域（16）中消散另一形式的能量时产生热能而获得。

公开(公告)号：US20030192587A1

公开(公告)日：2003-10-16

申请号：US10454985

申请日：2003-06-04

发明人： Guillaume Guzman ,  Jean-Pierre Themont

IPC分类号： F15C001/06

CPC分类号： B81C1/00119 ,  B01L3/5027 ,  B33Y70/00 ,  B33Y80/00 ,  B81B2201/058 ,  B81B2203/0353 ,  B81C1/00071 ,  B81C2201/019 ,  B81C2201/036 ,  C03B19/063 ,  C03B23/20 ,  Y10T137/0391 ,  Y10T137/0402 ,  Y10T137/2224 ,  Y10T137/6416

摘要： The present invention relates to microfluidic devices and to their method of manufacture. The microfluidic devices are original by their specific structure (of sandwich type) and by the materials from which they are made (mainly glasses, glass ceramics, ceramics), and also by their specific method of manufacture, which is based on a vacuum-forming operation. The microfluidic device includes a first assembly including a microstructure and a first substrate, wherein the microstructure is constructed and arranged on the substrate under vacuum. A second assembly includes a second substrate positioned on the microstructure after the first assembly is presintered and adhered thereto by heat treatment to form a one-piece microstructure defining at least one recess between the first and second substrates.

公开(公告)号：US06451240B1

公开(公告)日：2002-09-17

申请号：US09579798

申请日：2000-05-26

申请人： Faiz Feisal Sherman ,  Vadim Vladimirovich Yuzhakov ,  Vladimir Gartstein ,  Grover David Owens

发明人： Faiz Feisal Sherman ,  Vadim Vladimirovich Yuzhakov ,  Vladimir Gartstein ,  Grover David Owens

IPC分类号： B26F124

CPC分类号： B29C51/082 ,  A61M37/00 ,  A61M37/0015 ,  A61M2037/0023 ,  A61M2037/003 ,  A61M2037/0053 ,  B26F1/24 ,  B29C33/0033 ,  B29C33/42 ,  B29C37/0053 ,  B29C45/2628 ,  B29C51/00 ,  B29C2059/023 ,  B29L2031/7544 ,  B29L2031/756 ,  B81B2201/055 ,  B81C1/00111 ,  B81C2201/036

摘要： A microneedle array is manufactured using a mold preparation procedure that begins by placing an optical mask over a layer of PMMA material, exposing the PMMA material to x-rays, then developing using a photoresist process. The remaining PMMA material is then electroplated with metal. Once the metal has reached an appropriate thickness, it is detached to become a metal mold that is used in a microembossing procedure, in which the metal mold is pressed against a heated layer of plastic material. Once the mold is pressed down to its proper distance, the plastic material is cooled until solidified, and the mold is then detached, thereby leaving behind an array of microneedles.

摘要翻译： 使用模具制备程序制造微针阵列，其通过在PMMA材料层上放置光学掩模开始，将PMMA材料暴露于x射线，然后使用光致抗蚀剂工艺显影。 然后将剩余的PMMA材料用金属电镀。 一旦金属达到适当的厚度，就将其分离成为用于微压制程序的金属模具，其中金属模具被压在加热的塑料材料层上。 一旦将模具按压到适当的距离，塑料材料被冷却直到固化，然后将模具分离，从而留下一组微针。

公开(公告)号：US5512131A

公开(公告)日：1996-04-30

申请号：US131841

申请日：1993-10-04

申请人： Amit Kumar ,  George M. Whitesides

发明人： Amit Kumar ,  George M. Whitesides

IPC分类号： B05D1/28 ,  C40B60/14 ,  G02B5/18 ,  G02B6/12 ,  G02B6/36 ,  G03F7/00 ,  G03F7/16 ,  H01L21/48 ,  H01L21/768 ,  B44C1/22

CPC分类号： B81C1/00206 ,  B05D1/283 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  G02B5/1857 ,  G03F7/0002 ,  G03F7/165 ,  H01L21/4867 ,  H01L21/768 ,  B01J2219/00382 ,  B01J2219/00605 ,  B01J2219/00612 ,  B01J2219/00619 ,  B01J2219/0063 ,  B01J2219/00659 ,  B81B2201/0214 ,  B81C2201/036 ,  C40B60/14 ,  G02B2006/12102 ,  G02B2006/12107 ,  G03H1/182

摘要： A method of patterning a material surface is provided in which an elastomeric stamp having a stamping surface is coated with a self-assembled monolayer forming species having a functional group selected to bind to a particular material, and the stamping surface is placed against a surface of material and is removed to leave a self-assembled monolayer of the species according to the stamping surface pattern of the stamp. Additional stamping steps may be subsequently effected to produce any of a variety of SAM patterns on the surface. Additionally, portions of the material surface that are not coated with a stamped SAM pattern may be filled in with another SAM-forming species. Alternately, portions that are not covered by a SAM layer may be etched or plated. Additionally, an optical switch and other optical devices and elements are provided, comprising articles similar to the inventive stamp.

摘要翻译： 提供了图案化材料表面的方法，其中具有冲压表面的弹性体印模涂覆有具有选定成结合特定材料的官能团的自组装单层形成物质，并且将冲压表面放置在 材料，并根据印模的冲压表面图案移除以留下物种的自组装单层。 随后可以进行额外的冲压步骤以产生表面上的各种SAM图案中的任何一种。 此外，未涂覆冲压的SAM图案的材料表面的部分可以用另外的SAM形成物质填充。 或者，可以蚀刻或镀覆未被SAM层覆盖的部分。 另外，提供光学开关和其它光学装置和元件，其包括与本发明的印模相似的制品。

公开(公告)号：US20240092628A1

公开(公告)日：2024-03-21

申请号：US18517694

申请日：2023-11-22

申请人： BOE TECHNOLOGY GROUP CO., LTD.

发明人： Xiaochen MA ,  Guangcai YUAN ,  Ce NING ,  Xin GU ,  Xiao ZHANG ,  Chao LI

IPC分类号： B81B1/00 ,  B01L3/00 ,  B81C1/00

CPC分类号： B81B1/002 ,  B01L3/502715 ,  B81C1/00071 ,  B01L2300/0645 ,  B81B2201/05 ,  B81B2203/0338 ,  B81C2201/0111 ,  B81C2201/036

摘要： A micro-nano channel structure, a method for manufacturing the micro-nano channel structure, a sensor, a method for manufacturing the sensor, and a microfluidic device are provided. The micro-nano channel structure includes: a base substrate; a base layer, on the base substrate and including a plurality of protrusions; a channel wall layer, on a side of the plurality of the protrusions away from the base substrate, the channel wall layer has a micro-nano channel; a recessed portion is provided between adjacent protrusions of the plurality of the protrusions, an orthographic projection of the micro-nano channel on the base substrate is located within an orthographic projection of the recessed portion on the base substrate. The micro-nano channels have a high resolution or an ultra-high resolution, and have different sizes and shapes.

公开(公告)号：US20120298617A1

公开(公告)日：2012-11-29

申请号：US13559640

申请日：2012-07-27

申请人： Kwangyeol LEE

发明人： Kwangyeol LEE

IPC分类号： B29C59/16 ,  C23F1/14 ,  B29C59/02 ,  C23F1/00 ,  B82Y40/00

CPC分类号： B29C33/3857 ,  B81C1/00031 ,  B81C2201/036

摘要： One or more techniques for nano structure fabrication are provided. In an embodiment, an apparatus for manufacturing a nano structure is disclosed. The apparatus includes a stamp having a line pattern on a surface thereof that comprises a plurality of protrusions, a die configured to hold a substrate thereon, and a mechanical processing unit configured to press the plurality of protrusions of the stamp against the substrate with a predetermined pressure so as to form at least one channel pore therebetween.

摘要翻译： 提供一种或多种用于纳米结构制造的技术。 在一个实施例中，公开了一种用于制造纳米结构的装置。 该装置包括在其表面上具有线图案的印模，该印模包括多个凸起，模具，其构造成在其上保持基板;以及机械处理单元，其构造成以预定的方式将印模的多个突起压靠在基板上 以在其间形成至少一个通道孔。

公开(公告)号：US20110189446A1

公开(公告)日：2011-08-04

申请号：US13003484

申请日：2009-07-03

申请人： Graham L. W. Cross ,  Warren McKenzie ,  John B. Pethica

发明人： Graham L. W. Cross ,  Warren McKenzie ,  John B. Pethica

IPC分类号： B32B3/00 ,  C23F1/00 ,  C23F1/08 ,  B82Y30/00 ,  B82Y40/00 ,  B82Y5/00

CPC分类号： G03F7/11 ,  B81C1/00634 ,  B81C2201/0143 ,  B81C2201/0159 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0337

摘要： The invention provides a system and process of patterning structures on a carbon based surface comprising exposing part of the surface to an ion flux, such that material properties of the exposed surface are modified to provide a hard mask effect on the surface. A further step of etching unexposed parts of the surface forms the structures on the surface. The inventors have discovered that by controlling the ion exposure, alteration of the surface structure at the top surface provides a mask pattern, without substantially removing any material from the exposed surface. The mask allows for subsequent ion etching of unexposed areas of the surface leaving the exposed areas raised relative to the unexposed areas thus manufacturing patterns onto the surface. For example, a Ga+ focussed ion beam exposes a pattern onto a diamond surface which produces such a pattern after its exposure to a plasma etch. The invention is particularly suitable for patterning of clear well-defined structures down to nano-scale dimensions.

摘要翻译： 本发明提供了一种在碳基表面上构图结构的系统和工艺，包括将表面的一部分暴露于离子通量，使得暴露表面的材料特性被修饰以在表面上提供硬掩模效应。 蚀刻表面的未曝光部分的另一步骤形成表面上的结构。 发明人已经发现，通过控制离子暴露，顶表面上的表面结构的改变提供掩模图案，而基本上不从暴露表面移除任何材料。 该掩模允许对表面的未曝光区域的后续离子蚀刻，离开暴露区域相对于未曝光区域升高，从而将图案制造到表面上。 例如，Ga +聚焦离子束将图案暴露在金刚石表面上，其在暴露于等离子体蚀刻之后产生这种图案。 本发明特别适用于直到纳米级尺寸的清晰明确定义的结构的图案化。