公开(公告)号：US20090047873A1

公开(公告)日：2009-02-19

申请号：US12259708

申请日：2008-10-28

申请人： Steven M. Zuniga ,  Hung Chih Chen

发明人： Steven M. Zuniga ,  Hung Chih Chen

IPC分类号： B24B7/00 ,  B24B41/06

CPC分类号： B24B37/32 ,  B24B37/28

摘要： A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.

摘要翻译： 保持器用于抛光衬底的装置。 衬底具有上表面和下表面以及侧面，基本上圆形的周边。 该装置具有抛光垫，该抛光垫具有用于接触和抛光基底的下表面的上抛光表面。 保持器具有向内的保持面，用于在衬底的抛光期间接合和保持衬底以防止横向移动。 保持面在沿着周边的基本上一个单独的离散圆周位置处接合基底周边。

公开(公告)号：US20080119122A1

公开(公告)日：2008-05-22

申请号：US11741692

申请日：2007-04-27

申请人： Steven M. Zuniga ,  Andrew J. Nagengast ,  Jeonghoon Oh

发明人： Steven M. Zuniga ,  Andrew J. Nagengast ,  Jeonghoon Oh

IPC分类号： B24B41/06 ,  B24B37/04

CPC分类号： B24B37/30 ,  Y10T428/24174 ,  Y10T428/24182

摘要： A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. The flexible membrane has a main portion and an outer annular portion, wherein a junction between the main portion and the outer annular portion comprises a peripheral edge hinge and an annular recess above the hinge along the outer wall of the outer annular portion.

摘要翻译： 描述了具有基座组件，保持环组件，载体环和柔性膜的承载头。 柔性膜具有主要部分和外部环形部分，其中主要部分和外部环形部分之间的接合处包括周边边缘铰链和沿着外部环形部分的外壁的铰链上方的环形凹部。

公开(公告)号：US07153188B1

公开(公告)日：2006-12-26

申请号：US11245558

申请日：2005-10-07

申请人： Steven M. Zuniga ,  Hung Chih Chen ,  Stan D. Tsai ,  Kapila Wijekoon ,  Fred C. Redeker ,  Rajeev Bajaj

发明人： Steven M. Zuniga ,  Hung Chih Chen ,  Stan D. Tsai ,  Kapila Wijekoon ,  Fred C. Redeker ,  Rajeev Bajaj

IPC分类号： B24B49/00

CPC分类号： B24B37/015

摘要： The carrier head has a base and a substrate backing structure for holding a substrate against a polishing surface during polishing. The substrate backing structure is connected to the base and includes an external surface that contacts a backside of the substrate during polishing. The substrate backing structure also includes a resistive heating system to distribute heat over an area of the external surface and at least one thermally conductive membrane. The external surface is a first surface of the at least one thermally conductive membrane, and the resistive heating system is integrated within one of the at least one thermally conductive membrane.

摘要翻译： 承载头具有底座和衬底背衬结构，用于在抛光期间将衬底保持在抛光表面上。 衬底背衬结构连接到基底并且包括在抛光期间接触衬底背面的外表面。 衬底背衬结构还包括电阻加热系统以在外表面的区域和至少一个导热膜上分配热量。 所述外表面是所述至少一个导热膜的第一表面，并且所述电阻加热系统集成在所述至少一个导热膜之一内。

公开(公告)号：US07115024B2

公开(公告)日：2006-10-03

申请号：US11029287

申请日：2005-01-05

申请人： Hung Chih Chen ,  Steven M. Zuniga ,  Charles C. Garretson ,  Thomas H. Osterheld ,  Sen-Hou Ko ,  Mohsen Salek

发明人： Hung Chih Chen ,  Steven M. Zuniga ,  Charles C. Garretson ,  Thomas H. Osterheld ,  Sen-Hou Ko ,  Mohsen Salek

IPC分类号： B24B7/22

CPC分类号： B24B37/16

摘要： A platen for chemical mechanical polishing of a substrate includes a surface upon which a polishing pad can be placed, a support structure, and a controller. The surface has a first region and a second region and is operable to exert force against the polishing pad during polishing. The support structure is located beneath the second region and is operable to cause the second region to exert more force than the first region. The controller is operable to adjust the amount of force that is exerted by the second region.

摘要翻译： 用于基板的化学机械抛光的压板包括可以放置抛光垫的表面，支撑结构和控制器。 表面具有第一区域和第二区域，并且可操作以在抛光期间对抛光垫施加力。 支撑结构位于第二区域下方并且可操作以使第二区域施加比第一区域更多的力。 控制器可操作以调节由第二区域施加的力的量。

公开(公告)号：US06979250B2

公开(公告)日：2005-12-27

申请号：US10806649

申请日：2004-03-22

申请人： Steven M. Zuniga ,  Hung Chih Chen ,  Ming Kuie Tseng

发明人： Steven M. Zuniga ,  Hung Chih Chen ,  Ming Kuie Tseng

IPC分类号： B24B37/30 ,  B24B49/16 ,  B24B1/00

CPC分类号： B24B37/30 ,  B24B49/16

摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a controllable load to a substrate in an area with a controllable inner diameter.

摘要翻译： 用于化学机械抛光装置的载体头包括柔性膜，其在可控内径的区域中对基底施加可控制的载荷。

公开(公告)号：US06923714B1

公开(公告)日：2005-08-02

申请号：US10943296

申请日：2004-09-17

申请人： Steven M. Zuniga ,  Hung Chih Chen

发明人： Steven M. Zuniga ,  Hung Chih Chen

IPC分类号： B24B1/00 ,  B24B37/30 ,  B24B7/22

CPC分类号： B24B7/22 ,  B24B37/30

摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base to define a chamber. The flexible membrane has a core of a first material and an outer layer of a second material having a lower adhesion to the substrate than the first material. An exposed surface of the outer layer provides a mounting surface for the substrate.

公开(公告)号：US06890249B1

公开(公告)日：2005-05-10

申请号：US10327236

申请日：2002-12-20

申请人： Steven M. Zuniga ,  Ming-Kuei Tseng

发明人： Steven M. Zuniga ,  Ming-Kuei Tseng

IPC分类号： B24B37/04 ,  B24B47/02

CPC分类号： B24B37/32

摘要： A carrier head for chemical mechanical polishing of a substrate having a front surface, a back surface and an edge. The carrier head has a base, an inner retaining ring positioned beneath the base, and an outer retaining ring surrounding the inner retaining ring to retain the inner retaining ring. The inner retaining ring has a main portion with a first surface to apply a load to a perimeter portion of the back surface of the substrate and an annular lower projection protruding downwardly from the main portion with a second surface to circumferentially surround the edge of the substrate to retain the substrate.

摘要翻译： 用于具有前表面，后表面和边缘的基底的化学机械抛光的载体头。 承载头具有基座，位于基座下方的内部保持环和围绕内部保持环以保持内部保持环的外部保持环。 内保持环具有主要部分，其具有第一表面，以将负载施加到基板的后表面的周边部分;以及环形下突出部，其从主体部分向下突出并具有第二表面以周向地围绕基板的边缘 以保持基底。

公开(公告)号：US06857945B1

公开(公告)日：2005-02-22

申请号：US09712389

申请日：2000-11-13

申请人： Hung Chih Chen ,  Steven M. Zuniga

发明人： Hung Chih Chen ,  Steven M. Zuniga

IPC分类号： B24B37/27 ,  B24B37/04 ,  B24B41/06 ,  B24B49/16 ,  H01L21/304 ,  B24B29/00

CPC分类号： B24B37/30 ,  B24B41/061 ,  B24B49/16

摘要： A carrier head that has a base assembly and a flexible membrane. The flexible membrane has a generally circular main portion with a lower surface that provides a substrate-mounting surface and a plurality of concentric annular portions extending from the main portion and secured to the base assembly. The volume between the base assembly and the flexible membrane forming a plurality of pressurizable chambers.

公开(公告)号：US06848980B2

公开(公告)日：2005-02-01

申请号：US10124066

申请日：2002-04-16

申请人： Hung Chih Chen ,  Steven M. Zuniga ,  Ramakrishna Cheboli

发明人： Hung Chih Chen ,  Steven M. Zuniga ,  Ramakrishna Cheboli

IPC分类号： B24B37/04 ,  H01L21/304 ,  B24B7/00 ,  B24B9/00

CPC分类号： B24B37/32 ,  B24B37/30

摘要： A carrier head has a backing assembly with a substrate support surface, a housing connectable to a drive shaft to rotate with the drive shaft about a rotation axis, and a dampening material in a load path between the backing assembly and the housing. The dampening material reduces transmission of vibrations from the backing assembly to the housing.

摘要翻译： 载体头部具有背衬组件，其具有衬底支撑表面，可连接到驱动轴的壳体，其随驱动轴围绕旋转轴线旋转，以及在背衬组件和壳体之间的负载路径中的阻尼材料。 阻尼材料减少了从背衬组件到壳体的振动传播。

公开(公告)号：US06358121B1

公开(公告)日：2002-03-19

申请号：US09610582

申请日：2000-07-05

申请人： Steven M. Zuniga

发明人： Steven M. Zuniga

IPC分类号： B24B722

CPC分类号： B24B37/30 ,  B24B37/32

摘要： A carrier head for chemical mechanical polishing includes a base and a flexible membrane. A lower surface of the flexible membrane provides a substrate receiving surface of a substrate. The lower surface includes a first surface to apply a first pressure to a first portion of the substrate. A second surface surrounding the first surface applies a second pressure on a second portion of the substrate. An edge load ring surrounds the second surface. A lower surface of the edge load ring provides a third surface to apply a third pressure to a third portion of the substrate surrounding the second portion.

摘要翻译： 用于化学机械抛光的载体头包括基底和柔性膜。 柔性膜的下表面提供了基板的基板接收表面。 下表面包括将第一压力施加到基板的第一部分的第一表面。 围绕第一表面的第二表面在基底的第二部分上施加第二压力。 边缘负载环围绕第二表面。 边缘负载环的下表面提供第三表面，以将第三压力施加到围绕第二部分的基板的第三部分。