公开(公告)号：US5808724A

公开(公告)日：1998-09-15

申请号：US620644

申请日：1996-03-22

Applicant: Hideki Ina ,  Tsuneo Kanda

Inventor： Hideki Ina ,  Tsuneo Kanda

IPC: G02B5/32 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G01B11/00

CPC classification number: G03F9/70

Abstract: An illumination system for illuminating an object, such as a system for detecting an alignment mark on a semiconductor wafer. The system includes a light source and an illumination optical system for directing light from the light source toward an object to be illuminated. A first optical element, which preferably is a hologram, is provided in a portion of the light path of the illumination optical system at a position optically conjugate with the object and has a function of amplitude-dividing the light and deflecting a divided light ray. A second optical element, which also preferably is a hologram, is provided in a portion of the light path that is closer to the object as compared to the first optical element and is disposed on a pupil plane of the illumination optical system. The second optical element also has a function of amplitude-dividing the light and deflecting a divided light ray.

Abstract translation: 用于照射物体的照明系统，例如用于检测半导体晶片上的对准标记的系统。 该系统包括光源和照明光学系统，用于将来自光源的光朝向要照明的物体引导。 优选为全息图的第一光学元件设置在照明光学系统的光路的与物体光学共轭的位置的一部分中，并且具有对光进行分频和偏转分割光线的功能。 第二光学元件（其也优选为全息图）设置在与第一光学元件相比更靠近物体的光路的一部分中，并且设置在照明光学系统的光瞳平面上。 第二光学元件还具有对光进行分频和偏转分割光线的功能。

公开(公告)号：US5048967A

公开(公告)日：1991-09-17

申请号：US579252

申请日：1990-09-05

Applicant: Akiyoshi Suzuki ,  Hideki Ina

Inventor： Akiyoshi Suzuki ,  Hideki Ina

IPC: G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66

CPC classification number: G03F9/7069

Abstract: A detection optical system for detecting a pattern on the surface of an object includes an illumination device for illuminating the surface of the object with a light beam, a scanning system cooperable with the illumination device to scan the surface of the object with the light beam, and an optical arrangement for receiving light from each point on the surface of the object scanningly illuminated with the light beam by the cooperation of the illumination device and the scanning system. The optical arrangement is effective to form an image of a light spot, formed by the light beam upon the surface of the object. The optical arrangement includes a stop member disposed at a position whereat the image of the light spot is formed. The stop member has an aperture of a size substantially the same as, or not greater than, that of the image of the light spot, wherein the pattern on the surface of the object is detected on the basis of light passed through the stop member.

Abstract translation: 用于检测物体表面上的图案的检测光学系统包括用光束照射物体的表面的照明装置，与照明装置配合的扫描系统，用光束扫描物体的表面， 以及光学装置，用于通过照明装置和扫描系统的协作从光束的扫描照射的物体的表面上的每个点接收光。 光学布置有效地形成由物体表面上的光束形成的光点的图像。 光学装置包括设置在形成光点的图像的位置处的止挡构件。 止挡构件具有与光斑图像基本相同或不大于的光圈，其中基于通过阻挡构件的光检测物体表面上的图案。

公开(公告)号：US4901109A

公开(公告)日：1990-02-13

申请号：US358505

申请日：1989-05-30

Applicant: Noriyuki Mitome ,  Hideki Ina

Inventor： Noriyuki Mitome ,  Hideki Ina

IPC: G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/67 ,  H01L21/68

CPC classification number: G03F9/70

Abstract: An alignment and exposure apparatus for aligning an original such as a reticle and a workpiece such as a wafer and for photolithographically transferring a pattern of the original onto the workpiece. The alignment of the original and the workpiece is achieved by detecting diffractively scattered light from alignment marks of the original and the workpiece. For this alignment, plural and different wavelengths are used. One of the wavelengths which is close to an exposure wavelength is used to detect both the original and the workpiece. Another wavelength is used to detect only the workpiece. By this, high-accuracy alignment of the original and the workpiece is ensured.

Abstract translation: 对准和曝光装置，用于对准诸如掩模版和诸如晶片的工件之类的原稿，并用于光刻地将原稿的图案转印到工件上。 通过检测来自原件和工件的对准标记的衍射散射光来实现原件和工件的对准。 对于这种对准，使用多个和不同的波长。 接近曝光波长的波长之一用于检测原稿和工件。 另一波长用于仅检测工件。 由此，能够确保原稿与工件的高精度对准。

公开(公告)号：US4888614A

公开(公告)日：1989-12-19

申请号：US333727

申请日：1989-04-03

Applicant: Akiyoshi Suzuki ,  Hideki Ina ,  Masao Kosugi

Inventor： Akiyoshi Suzuki ,  Hideki Ina ,  Masao Kosugi

IPC: G03F9/00

CPC classification number: G03F9/70

Abstract: An observation system, usable with a projection optical system for optically projecting a first object upon a second object by use of a light of a first wavelength, for observing the second object by way of the projection optical system and by use of a light of a second wavelength different from the first wavelength. The observation system includes an observation optical system having a lens element and a parallel-surface plate which is inclined with respect to an optical axis of the observation optical system, wherein the observation optical system is arranged to form an image of the second object on a predetermined image surface and wherein the parallel-surface plate is arranged to substantially correct coma caused by the projection optical system.

Abstract translation: 一种观察系统，可用于投影光学系统，用于通过使用第一波长的光将第一物体光学投射到第二物体上，用于通过投影光学系统观察第二物体，并且通过使用 第二波长不同于第一波长。 观察系统包括具有透镜元件和相对于观察光学系统的光轴倾斜的平行面板的观察光学系统，其中观察光学系统被布置成在第一对象的形状上形成第二物体的图像 预定的图像表面，并且其中平行表面板被布置成基本上校正由投影光学系统引起的彗差。

公开(公告)号：US4669883A

公开(公告)日：1987-06-02

申请号：US589341

申请日：1984-03-14

Applicant: Hideki Ina ,  Hiroshi Shinkai

Inventor： Hideki Ina ,  Hiroshi Shinkai

IPC: G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30 ,  G01B11/00

CPC classification number: G03F9/7065 ,  G03F9/7023 ,  G03F9/7069 ,  H01L21/30

Abstract: A method and apparatus for aligns two members each having an alignment mark which has mark elements extending in different directions. The marks are scanned with two linear illumination areas which are spaced apart by a predetermined distance and extend in different directions.

Abstract translation: 对准具有对准标记的两个构件的方法和装置，其具有沿不同方向延伸的标记元件。 标记用两个线性照明区域扫描，间隔开预定距离并沿不同方向延伸。

公开(公告)号：US4634240A

公开(公告)日：1987-01-06

申请号：US574351

申请日：1984-01-27

Applicant: Akiyoshi Suzuki ,  Hideki Ina

Inventor： Akiyoshi Suzuki ,  Hideki Ina

IPC: H01L21/30 ,  G02B27/28 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/66 ,  G02B7/11

CPC classification number: G03F9/7065 ,  G02B27/28

Abstract: An optical apparatus includes an illumination system for illuminating an object with a polarized beam in the desired state of polarization and an imaging system having a polarizing plate adapted to select a desired state of polarization of the beam and a variable magnification zoom erector, the state of polarization of the beam in the illuminating or imaging system being variable in accordance with the change of image magnification in the zoom erector, whereby the quantity of light for observation can effectively be controlled in accordance with the variations of image magnification in the imaging system.

Abstract translation: 一种光学装置包括用于以期望的偏振状态以偏振光束照射物体的照明系统和具有适于选择所需光束的期望偏振状态的偏振片的成像系统和可变放大缩放放大器的状态 照明或成像系统中的光束的偏振根据变焦放大器中的图像放大率的变化而变化，由此可以根据成像系统中的图像放大率的变化来有效地控制用于观察的光量。

公开(公告)号：US4621890A

公开(公告)日：1986-11-11

申请号：US555526

申请日：1983-11-28

Applicant: Akiyoshi Suzuki ,  Hideki Ina ,  Kazuo Takahashi

Inventor： Akiyoshi Suzuki ,  Hideki Ina ,  Kazuo Takahashi

IPC: G02B27/00 ,  G02B27/09 ,  G02B27/64 ,  G02B26/08

CPC classification number: G02B27/0927 ,  G02B27/09 ,  G02B27/0988

Abstract: An optical apparatus for imaging light from a laser device into a spot shape includes an objective lens for converting parallel rays into a spot-like light, the pupil plane of the objective lens being located at a position conjugate with the emitting plane of the laser device so that the amount of light at the spot will less be changed under variations of emitting angle in the laser device.

Abstract translation: 用于将来自激光装置的光成像为光斑形状的光学装置包括用于将平行光转换为点状光的物镜，物镜的光瞳面位于与激光装置的发射平面共轭的位置 使得在激光装置中的发射角度的变化下，在点处的光量将不会改变。

公开(公告)号：US09122149B2

公开(公告)日：2015-09-01

申请号：US13049207

申请日：2011-03-16

Applicant: Hiroshi Sato ,  Hideki Ina

Inventor： Hiroshi Sato ,  Hideki Ina

IPC: B05D3/12 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B29C59/02 ,  B82Y10/00 ,  B82Y40/00

Abstract: An imprint apparatus which cures a resin dispensed on a substrate while the resin and a pattern surface of a mold are in contact with each other, comprises a supply portion configured to supply a gas, used to accelerate filling of a concave portion of the pattern surface of the mold with the resin, to a space which the pattern surface of the mold faces, and a controller configured to control the supply portion to supply the gas to the space before the resin and the pattern surface of the mold are brought into contact with each other, wherein the supply portion is configured to supply the gas to the space via a porous portion formed in at least part of the mold.

Abstract translation: 一种压印装置，其在树脂和模具的图案表面彼此接触的同时固化分布在基板上的树脂，包括：供给部，被配置为供应用于加速图案表面的凹部的填充的气体 模具与模具表面的空间连接到模具表面的空间，以及控制器，被配置为控制供应部分将气体供应到模具的树脂和图案表面之前的空间，使其与 彼此相连，其中所述供应部分构造成经由形成在所述模具的至少一部分中的多孔部分将气体供应到所述空间。

公开(公告)号：US09046793B2

公开(公告)日：2015-06-02

申请号：US13153512

申请日：2011-06-06

Applicant: Nobuhito Suehira ,  Junichi Seki ,  Masao Majima ,  Atsunori Terasaki ,  Hideki Ina

Inventor： Nobuhito Suehira ,  Junichi Seki ,  Masao Majima ,  Atsunori Terasaki ,  Hideki Ina

IPC: B29C59/02 ,  G03F9/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00

CPC classification number: G03F9/7084 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7076

Abstract: A light transmissive mold used for imprinting a pattern onto a material applied on a semiconductor workpiece. The mold includes a first surface having an area of a pattern to be imprinted onto the material, a second surface located opposite from the first surface, and a third surface disposed between the first surface and the second surface, at a position inwardly away from the first surface. The third surface is arranged opposite to an area of the workpiece subjected to dicing. An alignment structure, provided for alignment between the mold and the workpiece, is formed in the third surface.

Abstract translation: 用于将图案压印到施加在半导体工件上的材料上的透光模具。 模具包括具有待印在材料上的图案区域的第一表面，与第一表面相对的第二表面和设置在第一表面和第二表面之间的第三表面， 第一表面。 第三表面布置成与被切割的工件的区域相对。 在第三表面中形成有用于在模具和工件之间对准的对准结构。

公开(公告)号：US08568639B2

公开(公告)日：2013-10-29

申请号：US13094354

申请日：2011-04-26

Applicant: Atsunori Terasaki ,  Junichi Seki ,  Nobuhito Suehira ,  Hideki Ina

Inventor： Atsunori Terasaki ,  Junichi Seki ,  Nobuhito Suehira ,  Hideki Ina

IPC: B29C59/02

CPC classification number: B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: In order to provide a mold and an imprint apparatus which permit adjustment of a depth of an imprint pattern after the imprint pattern is formed, the mold is constituted by a mold substrate including a first material and a surface layer, constituting a projection of the mold and including a second material, for forming a pattern on the photocurable resin material. The first material is more etchable than the second material. The first material and the second material have optical transmittances capable of curing the photocurable resin material with respect to at least a part of wavelength range of ultraviolet light.

Abstract translation: 为了提供能够在压印图案形成之后调整印痕图案的深度的模具和压印装置，模具由包括第一材料和表面层的模具基板构成，构成模具的突出部 并且包括用于在可光固化树脂材料上形成图案的第二材料。 第一种材料比第二种材料更可蚀刻。 第一材料和第二材料具有能够相对于紫外线的至少一部分波长范围固化光固化性树脂材料的光透射率。