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71.发明授权Lithographic apparatus and device manufacturing method involving a resistivity sensor 有权涉及电阻率传感器的平版印刷设备和器件制造方法公开(公告)号：US08937704B2
公开(公告)日：2015-01-20
申请号：US13288855
申请日：2011-11-03
申请人： Jeroen Johannes Sophia Maria Mertens , Christiaan Alexander Hoogendam , Hans Jansen , Patricius Aloysius Jacobus Tinnemans , Leon Joseph Maria Van Den Schoor , Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk
发明人： Jeroen Johannes Sophia Maria Mertens , Christiaan Alexander Hoogendam , Hans Jansen , Patricius Aloysius Jacobus Tinnemans , Leon Joseph Maria Van Den Schoor , Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： In an immersion lithography apparatus, the immersion liquid is supplied and removed by a liquid supply system. The immersion lithography apparatus includes a resistivity sensor configured to monitor the electrical resistivity of the immersion liquid to monitor a potential contamination within the liquid supply system and may include a cleaner supply system configured to supply a cleaning fluid to the liquid supply system to clean at least the liquid supply system.
摘要翻译： 在浸没式光刻设备中，通过液体供应系统供应和去除浸没液体。 浸没光刻设备包括电阻率传感器，其被配置为监测浸没液体的电阻率以监测液体供应系统内的潜在污染，并且可以包括清洁剂供应系统，其被配置为向液体供应系统提供清洁液体至少清洁 液体供应系统。
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公开(公告)号：US20120048193A1
公开(公告)日：2012-03-01
申请号：US13288855
申请日：2011-11-03
申请人： Jeroen Johannes Sophia Maria MERTENS , Christiaan Alexander Hoogendam , Hans Jansen , Patricius Aloysius Jacobus Tinnemans , Leon Joseph Maria Van Den Schoor , Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk
发明人： Jeroen Johannes Sophia Maria MERTENS , Christiaan Alexander Hoogendam , Hans Jansen , Patricius Aloysius Jacobus Tinnemans , Leon Joseph Maria Van Den Schoor , Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk
IPC分类号： B05C11/10
CPC分类号： G03F7/70341
摘要： In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
摘要翻译： 在浸没式光刻设备中，浸没液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度，以确保液体的恒定流动。
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公开(公告)号：US20110090474A1
公开(公告)日：2011-04-21
申请号：US12980406
申请日：2010-12-29
申请人： Hans JANSEN , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Hans JANSEN , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
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公开(公告)号：US07633073B2
公开(公告)日：2009-12-15
申请号：US11285774
申请日：2005-11-23
申请人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
发明人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号：US20090073408A1
公开(公告)日：2009-03-19
申请号：US12292329
申请日：2008-11-17
申请人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC分类号： G03F7/70341
摘要： Lithographic Apparatus and Device Manufacturing Method A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
摘要翻译： 平版印刷设备和设备制造方法公开了一种光刻投影设备，其中采取措施来防止或减少投影光束通过其流出的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。
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公开(公告)号：US08446568B2
公开(公告)日：2013-05-21
申请号：US12796482
申请日：2010-06-08
申请人： Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人： Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号：US20110122376A1
公开(公告)日：2011-05-26
申请号：US12796482
申请日：2010-06-08
申请人： Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人： Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
摘要翻译： 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
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公开(公告)号：US07932999B2
公开(公告)日：2011-04-26
申请号：US11499780
申请日：2006-08-07
申请人： Christiaan Alexander Hoogendam , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人： Christiaan Alexander Hoogendam , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
摘要翻译： 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
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公开(公告)号：US09229335B2
公开(公告)日：2016-01-05
申请号：US13361443
申请日：2012-01-30
申请人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen
发明人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
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公开(公告)号：US09146478B2
公开(公告)日：2015-09-29
申请号：US13240946
申请日：2011-09-22
申请人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen
发明人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
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