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公开(公告)号：US20070298355A1
公开(公告)日：2007-12-27
申请号：US11808543
申请日：2007-06-11
申请人： Yuji Harada , Jun Hatakeyama
发明人： Yuji Harada , Jun Hatakeyama
IPC分类号： G03C5/00 , C08F12/30 , C08G63/685 , C08G63/688 , C08G75/26
CPC分类号： G03F7/11 , C08F2/38 , C08F20/18 , C08F220/18 , C08F220/22 , C08F220/28 , C08F232/08 , G03F7/0046 , G03F7/2041 , Y10S430/106 , Y10S430/108
摘要： There is disclosed a resist top coat composition, comprising at least a polymer that has an amino group or a sulfonamide group at a polymer end and that is represented by the following general formula (1); and a patterning process comprising: at least, a step of forming a photoresist film on a substrate; a step of forming a resist top coat on the photoresist film by using the resist top coat composition; a step of exposing the substrate; and a step of developing the substrate with a developer. There can be provided a resist top coat composition that makes it possible to provide more certainly rectangular and excellent resist patterns when a top coat is formed on a photoresist film; and a patterning process using such a composition.
摘要翻译： 公开了一种抗蚀剂面漆组合物，其至少包含在聚合物末端具有氨基或磺酰胺基团并由以下通式（1）表示的聚合物; 以及图案化工艺，包括：至少在衬底上形成光致抗蚀剂膜的步骤; 通过使用抗蚀剂面漆组合物在光致抗蚀剂膜上形成抗蚀剂面涂层的步骤; 使基板曝光的工序; 以及用显影剂显影衬底的步骤。 可以提供抗蚀剂面漆组合物，当在光致抗蚀剂膜上形成顶涂层时，可以提供更确定的矩形和优异的抗蚀剂图案; 以及使用这种组合物的图案化工艺。
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公开(公告)号：US06579658B2
公开(公告)日：2003-06-17
申请号：US09783446
申请日：2001-02-15
申请人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
发明人： Jun Hatakeyama , Jun Watanabe , Yuji Harada
IPC分类号： G03C1492
CPC分类号： C08F222/04 , G03F7/0045 , G03F7/0046 , G03F7/039 , Y10S430/108
摘要： Polymers comprising recurring units of fluorinated maleic anhydride and/or fluorinated maleimide are novel. Using the polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.
摘要翻译： 包含氟化马来酸酐和/或氟化马来酰亚胺的重复单元的聚合物是新颖的。 使用聚合物，获得了具有低的F2准分子激光吸收的抗蚀剂组合物。
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公开(公告)号：US08268528B2
公开(公告)日：2012-09-18
申请号：US12628794
申请日：2009-12-01
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： A resist composition is provided comprising (A) an additive polymer of acyl-protected hexafluoroalcohol structure, (B) a base polymer having a structure derived from lactone ring, hydroxyl group and/or maleic anhydride, the base polymer becoming soluble in alkaline developer under the action of acid, (C) a photoacid generator, and (D) an organic solvent. The additive polymer is transparent to radiation of wavelength up to 200 nm, and its properties can be tailored by a choice of the polymer structure.
摘要翻译： 提供了抗蚀剂组合物，其包含（A）酰基保护的六氟醇结构的添加剂聚合物，（B）具有衍生自内酯环，羟基和/或马来酸酐的结构的基础聚合物，所述基础聚合物在碱性显影剂中变得可溶 酸的作用，（C）光致酸发生剂，和（D）有机溶剂。 添加剂聚合物对波长高达200nm的辐射是透明的，并且其性质可以通过选择聚合物结构来定制。
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公开(公告)号：US08252504B2
公开(公告)日：2012-08-28
申请号：US12371455
申请日：2009-02-13
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0392 , G03F7/0397
摘要： A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected and a monomer having an acid labile group is useful as an additive to a photoresist composition for immersion lithography. When processed by immersion lithography, the resist composition exhibits good water repellency and water slip and produces few development defects.
摘要翻译： 通过使具有羟基部分被保护的六氟醇侧基的单体和具有酸不稳定基团的单体的共聚合得到的聚合物可用作浸渍光刻用光致抗蚀剂组合物的添加剂。 当通过浸渍光刻处理时，抗蚀剂组合物表现出良好的拒水性和水滑动，并且产生很少的显影缺陷。
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公开(公告)号：US08043788B2
公开(公告)日：2011-10-25
申请号：US12167151
申请日：2008-07-02
申请人： Tomohiro Kobayashi , Jun Hatakeyama , Yuji Harada
发明人： Tomohiro Kobayashi , Jun Hatakeyama , Yuji Harada
CPC分类号： G03F7/0382 , G03F7/0046 , G03F7/0392 , G03F7/11 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing amino and recurring units containing α-trifluoromethylhydroxy as an additive. The composition is suited for immersion lithography.
摘要翻译： 对于包含在酸作为基础树脂的作用下改变其碱溶解性的聚合物的抗蚀剂组合物，加入含有氨基的重复单元和含有α-三氟甲基羟基作为添加剂的重复单元的共聚物。 该组合物适用于浸没光刻。
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公开(公告)号：US07771913B2
公开(公告)日：2010-08-10
申请号：US11730289
申请日：2007-03-30
申请人： Tatsushi Kaneko , Jun Hatakeyama , Yuji Harada
发明人： Tatsushi Kaneko , Jun Hatakeyama , Yuji Harada
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0395 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： There is disclosed a resist composition comprising, at least, a polymer including repeating units represented by the following general formula (1). There can be provided a resist composition that has a good barrier property against water, prevents resist components from leaching to water, has high receding contact angle against water, does not require a protective film, has an excellent process applicability, suitable for the liquid immersion lithography and makes it possible to form micropatterns with high precision.
摘要翻译： 公开了一种抗蚀剂组合物，其至少包含由以下通式（1）表示的重复单元的聚合物。 可以提供对水具有良好的阻隔性的抗蚀剂组合物，防止抗蚀剂成分浸出水，与水的后退接触角高，不需要保护膜，具有优异的工艺适用性，适用于液浸 光刻，并且可以以高精度形成微图案。
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公开(公告)号：US07670750B2
公开(公告)日：2010-03-02
申请号：US11905727
申请日：2007-10-03
申请人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa
发明人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa
IPC分类号： G03F7/00 , G03F7/004 , C08F16/24 , C08F18/20 , C08F216/12
CPC分类号： G03F7/11 , C09D133/066 , C09D133/16 , G03F7/0046 , G03F7/2041
摘要： A resist protective coating material comprises a polymer comprising repeat units having formulae (1a) and (1b) and having a Mw of 1,000-500,000. R1a and R1b are H, F or alkyl or fluoroalkyl, R2a, R2b, R3a and R3b are H or alkyl, or R2a and R2b, and R3a and R3b may bond together to form a ring, 0
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公开(公告)号：US07598016B2
公开(公告)日：2009-10-06
申请号：US12053292
申请日：2008-03-21
申请人： Tomohiro Kobayashi , Jun Hatakeyama , Yuji Harada
发明人： Tomohiro Kobayashi , Jun Hatakeyama , Yuji Harada
CPC分类号： G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/12 , Y10S430/121
摘要： To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing a carboxylic acid ammonium salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.
摘要翻译： 对于包含在酸作为基础树脂的作用下改变其碱溶解性的聚合物的抗蚀剂组合物，添加包含含有羧酸铵盐的重复单元和含有至少一个氟原子的重复单元作为添加剂的共聚物。 该组合物适用于浸没光刻。
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公开(公告)号：US07455952B2
公开(公告)日：2008-11-25
申请号：US11105510
申请日：2005-04-14
申请人： Jun Hatakeyama , Yuji Harada
发明人： Jun Hatakeyama , Yuji Harada
CPC分类号： G03F7/11 , G03F7/2041
摘要： In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from a resist overcoat material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the resist overcoat material.
摘要翻译： 在浸没式光刻工艺中，通过在晶片上形成光致抗蚀剂层形成图案，在抗蚀剂外涂层材料上在光致抗蚀剂层上形成保护涂层，将层结构暴露于水中并进行显影。 使用水不溶性碱溶性材料作为抗蚀剂外涂层材料。
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公开(公告)号：US20080241736A1
公开(公告)日：2008-10-02
申请号：US12053292
申请日：2008-03-21
申请人： Tomohiro KOBAYASHI , Jun Hatakeyama , Yuji Harada
发明人： Tomohiro KOBAYASHI , Jun Hatakeyama , Yuji Harada
CPC分类号： G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/12 , Y10S430/121
摘要： To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing a carboxylic acid ammonium salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.
摘要翻译： 对于包含在酸作为基础树脂的作用下改变其碱溶解性的聚合物的抗蚀剂组合物，添加包含含有羧酸铵盐的重复单元和含有至少一个氟原子的重复单元作为添加剂的共聚物。 该组合物适用于浸没光刻。
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