公开(公告)号：US4864123A

公开(公告)日：1989-09-05

申请号：US189831

申请日：1988-05-03

申请人： Hideo Mizutani ,  Isao Sato ,  Masato Shibuya

发明人： Hideo Mizutani ,  Isao Sato ,  Masato Shibuya

IPC分类号： G01S7/499 ,  G01S17/46 ,  G02B7/32 ,  G03F9/00

CPC分类号： G03F9/7065 ,  G01S17/46 ,  G01S7/499 ,  G02B7/32 ,  G03F9/7023 ,  G03F9/7076

摘要： An apparatus for detecting the level of an object surface comprises a light source for supplying a light beam obliquely incident on the object surface, an imaging optical system provided to image the light beam reflected by the object surface, a light-receiving element having a detecting surface coincident with the imaging plane of the imaging optical system and determining the level of the object surface on the basis of the position of the image of the light beam on the detecting surface, and polarization correcting optics provided on an optical path leading from the light source via the object surface to the detecting surface for adjusting the intensity ration between the two mutally orthogonal polarized light components of the light beam.

摘要翻译： 一种用于检测物体表面的装置的装置包括：用于供应倾斜入射在物体表面上的光束的光源，用于对由物体表面反射的光束进行成像的成像光学系统;具有检测的光接收元件 表面与成像光学系统的成像平面重合，并且基于检测表面上的光束的图像的位置确定物体表面的水平，以及偏振校正光学器件，其设置在从光引导的光路上 源极经由物体表面到检测表面，用于调节光束的两个非正交偏振光分量之间的强度比例。

公开(公告)号：US4780747A

公开(公告)日：1988-10-25

申请号：US9261

申请日：1987-01-30

申请人： Kazuaki Suzuki ,  Hidemi Kawai ,  Hideo Mizutani

发明人： Kazuaki Suzuki ,  Hidemi Kawai ,  Hideo Mizutani

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/74 ,  G03B27/52 ,  G03B27/80

CPC分类号： G03F7/70558 ,  G03F7/70883 ,  G03F7/70891

摘要： A projection exposure apparatus includes illuminating means for applying energy rays to a mask having a predetermined pattern formed thereon, a projection optical system for forming the image of the pattern in a predetermined projected state on a responsive substrate, adjusting means for correcting the fluctuation of the projected state of the image caused by the passage of the energy rays, exposure control means for controlling the energy rays so that the pojected image of the pattern by the projection optical system is transferred onto the responsive substrate under a predetermined exposure condition, means for making information regarding the reflectivity of the responsive substrate, and main control means for controlling the adjusting means on the basis of the predetermined exposure condition of the exposure control means and the information regarding the reflectivity.

摘要翻译： 投影曝光装置包括用于将能量射线施加到其上形成有预定图案的掩模的照明装置，用于在响应基板上以预定的投影状态形成图案的图像的投影光学系统，用于校正图像的波动的调整装置 通过能量射线通过的图像的投影状态，用于控制能量射线的曝光控制装置，使得投影光学系统的图案的被投影图像在预定的曝光条件下被转印到响应基板上， 关于响应基板的反射率的信息，以及用于基于曝光控制装置的预定曝光条件和关于反射率的信息来控制调节装置的主控制装置。

公开(公告)号：US4748333A

公开(公告)日：1988-05-31

申请号：US30076

申请日：1987-03-25

申请人： Hideo Mizutani ,  Shoji Ishizaka ,  Takeshi Suto

发明人： Hideo Mizutani ,  Shoji Ishizaka ,  Takeshi Suto

IPC分类号： G01D5/30 ,  G01S17/46 ,  G03F9/00 ,  G01V9/04

CPC分类号： G03F9/7026 ,  G01D5/30 ,  G01S17/46

摘要： A surface displacement sensor is so designed that a stop or aperture for controlling an angle of opening is disposed at the position of a pupil of a detection optical system in which a slit image is focused on the surface to be detected and the light rays reflected from the surface to be detected are collected to re-focus the slit image on the light receiving surface of the sensor. When the height position of the surface to be detected is detected by such stop for controlling the angle of opening, the deviation of the distribution of intensity of light which tends to occur in the widthwise direction of the slit through which passes the light beam which in turn focuses a slit image, can be positively decreased by limiting the angle of opening N.A. in the widthwise direction of the slit for passing the light beam to focus a slit image to be narrow and consequently the degree of detection accuracy can be improved. The stop for controlling the angle of opening is so designed and constructed that in the case of detecting operation of the sensor, the angle of opening N.A. in the widthwise direction of the slit image is limited so that the slit image having a sufficiently narrow angle of opening can be obtained. Furthermore, in the case of the focal point adjustment of the optical system, the stop is so switched that a slit image having a sufficiently wide angle of opening N.A. in the widthwise direction thereof can be focused on a receiving slit. The focal point adjustment is further facilitated in the surface displacement sensor.

摘要翻译： 表面位移传感器被设计成使得用于控制开口角度的止动件或开口设置在检测光学系统的光瞳的位置处，其中狭缝图像聚焦在待检测的表面上，并且光线从 收集要检测的表面以将狭缝图像重新聚焦在传感器的光接收表面上。 当通过这种停止来检测要检测的表面的高度位置以控制开口角度时，倾向于在通过光束的狭缝的宽度方向上发生的光强度分布的偏差 转动对狭缝图像进行聚焦，可以通过限制狭缝的宽度方向上的开口角度NA，使光束聚焦而使狭缝图像变窄，从而可以提高检测精度。 用于控制开口角度的止挡被设计和构造成使得在检测传感器的操作的情况下，狭缝图像的宽度方向上的开口角度NA受到限制，使得狭缝图像具有足够窄的角度 可以打开。 此外，在光学系统的焦点调整的情况下，停止被切换，使得具有足够宽的开口N.A.在其宽度方向上的狭缝图像可以聚焦在接收狭缝上。 在表面位移传感器中进一步促进了焦点调整。

公开(公告)号：US4641964A

公开(公告)日：1987-02-10

申请号：US632866

申请日：1984-07-20

申请人： Kiyoharu Mitani ,  Kazuo Morohashi ,  Kenji Yamada ,  Tsunemi Gonda ,  Hideo Mizutani

发明人： Kiyoharu Mitani ,  Kazuo Morohashi ,  Kenji Yamada ,  Tsunemi Gonda ,  Hideo Mizutani

IPC分类号： G01M11/02 ,  G01B9/00

CPC分类号： G01M11/0235

摘要： An apparatus which comprises a collimating lens, light source means for selectively forming light sources in two positions on the optical axis of the collimating lens, means for defining the position of the lens to be inspected opposite to the light source with respect to the collimating lens, a mask plate having translucent or opaque areas symmetrical to the optical axis, a relay lens for placing the mask plate at a position conjugate with the lens position, an imaging lens positioned opposite to the mask plate with respect to the relay lens, and photoelectric converting means for producing image signals corresponding to the positions, in a plane perpendicular to the optical axis, of the image of the translucent or opaque areas of the mask plate formed by the imaging lens.

摘要翻译： 一种包括准直透镜的装置，用于在准直透镜的光轴上的两个位置中选择性地形成光源的光源装置，用于相对于准直透镜限定待检查的透镜与光源相对的位置的装置 ，具有与光轴对称的半透明或不透明区域的掩模板，用于将掩模板放置在与透镜位置共轭的位置的中继透镜，相对于中继透镜与掩模板相对定位的成像透镜，以及光电 转换装置，用于产生对应于垂直于光轴的平面中由成像透镜形成的掩模板的半透明或不透明区域的图像的位置的图像信号。