公开(公告)号：US4748333A

公开(公告)日：1988-05-31

申请号：US30076

申请日：1987-03-25

申请人： Hideo Mizutani ,  Shoji Ishizaka ,  Takeshi Suto

发明人： Hideo Mizutani ,  Shoji Ishizaka ,  Takeshi Suto

IPC分类号： G01D5/30 ,  G01S17/46 ,  G03F9/00 ,  G01V9/04

CPC分类号： G03F9/7026 ,  G01D5/30 ,  G01S17/46

摘要： A surface displacement sensor is so designed that a stop or aperture for controlling an angle of opening is disposed at the position of a pupil of a detection optical system in which a slit image is focused on the surface to be detected and the light rays reflected from the surface to be detected are collected to re-focus the slit image on the light receiving surface of the sensor. When the height position of the surface to be detected is detected by such stop for controlling the angle of opening, the deviation of the distribution of intensity of light which tends to occur in the widthwise direction of the slit through which passes the light beam which in turn focuses a slit image, can be positively decreased by limiting the angle of opening N.A. in the widthwise direction of the slit for passing the light beam to focus a slit image to be narrow and consequently the degree of detection accuracy can be improved. The stop for controlling the angle of opening is so designed and constructed that in the case of detecting operation of the sensor, the angle of opening N.A. in the widthwise direction of the slit image is limited so that the slit image having a sufficiently narrow angle of opening can be obtained. Furthermore, in the case of the focal point adjustment of the optical system, the stop is so switched that a slit image having a sufficiently wide angle of opening N.A. in the widthwise direction thereof can be focused on a receiving slit. The focal point adjustment is further facilitated in the surface displacement sensor.

摘要翻译： 表面位移传感器被设计成使得用于控制开口角度的止动件或开口设置在检测光学系统的光瞳的位置处，其中狭缝图像聚焦在待检测的表面上，并且光线从 收集要检测的表面以将狭缝图像重新聚焦在传感器的光接收表面上。 当通过这种停止来检测要检测的表面的高度位置以控制开口角度时，倾向于在通过光束的狭缝的宽度方向上发生的光强度分布的偏差 转动对狭缝图像进行聚焦，可以通过限制狭缝的宽度方向上的开口角度NA，使光束聚焦而使狭缝图像变窄，从而可以提高检测精度。 用于控制开口角度的止挡被设计和构造成使得在检测传感器的操作的情况下，狭缝图像的宽度方向上的开口角度NA受到限制，使得狭缝图像具有足够窄的角度 可以打开。 此外，在光学系统的焦点调整的情况下，停止被切换，使得具有足够宽的开口N.A.在其宽度方向上的狭缝图像可以聚焦在接收狭缝上。 在表面位移传感器中进一步促进了焦点调整。

公开(公告)号：US4801977A

公开(公告)日：1989-01-31

申请号：US198688

申请日：1988-05-24

申请人： Shoji Ishizaka ,  Hideo Mizutani ,  Susumu Makinouchi ,  Akikazu Tanimoto

发明人： Shoji Ishizaka ,  Hideo Mizutani ,  Susumu Makinouchi ,  Akikazu Tanimoto

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G03B27/74 ,  G03B27/80

CPC分类号： G03F7/706 ,  G03F7/70241 ,  G03F7/70858 ,  G03F7/70883

摘要： A projection optical apparatus comprises a projection optical system for projecting the image of an object onto a substrate, data collecting means for obtaining data regarding a factor which causes a variation in the optical characteristic of the projection optical system, adjusting means for adjusting the relation between the substrate and the image of the object relative to the variation in the optical characteristic of the projection optical system, means for determining the amount of adjustment by the adjusting means in accordance with a model formula using a predetermined parameter on the basis of the data obtained by the data collecting means, means for independently measuring the variation in the optical characteristic of the projection optical system, and means for correcting the parameter of the model formula on the basis of the result measured by the measuring means.

摘要翻译： 投影光学装置包括用于将物体的图像投影到基板上的投影光学系统，用于获得关于引起投影光学系统的光学特性变化的因素的数据的数据收集装置，用于调整投影光学系统的光学特性之间的关系的调整装置 基板和物体相对于投影光学系统的光学特性的变化的图像，用于根据获得的数据使用预定参数根据模型公式确定调节装置的调整量的装置 通过数据采集装置，用于独立地测量投影光学系统的光学特性的变化的装置，以及用于基于由测量装置测量的结果来校正模型公式的参数的装置。

公开(公告)号：US08264666B2

公开(公告)日：2012-09-11

申请号：US12692443

申请日：2010-01-22

申请人： Tohru Kiuchi ,  Hideo Mizutani

发明人： Tohru Kiuchi ,  Hideo Mizutani

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70791 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70425

摘要： An exposure apparatus of one aspect of the present invention is provided with a moving mechanism that moves a first portion of a belt-shaped substrate that has photosensitivity in a first heading along a first direction and moves a second portion of the substrate in a second heading along the first direction, a stage mechanism that holds a mask and moves it in a third heading along a second direction in synchronization with the movement of the substrate, and a projection optical system. The projection optical system forms a first projection image of the pattern on the first portion so that the third heading on the mask and the first heading on the first portion optically correspond, and forms a second projection image of the pattern on the second portion so that the third heading on the mask and the second heading on the second portion optically correspond.

摘要翻译： 本发明的一个方面的曝光装置设置有移动机构，该移动机构使沿第一方向的第一标题中具有感光性的带状基板的第一部分移动，并且在第二标题中移动基板的第二部分 沿着第一方向，具有平台机构，其保持掩模并且与基板的移动同步地沿着第二方向在第三方向移动;以及投影光学系统。 投影光学系统在第一部分上形成图案的第一投影图像，使得掩模上的第三标题和第一部分上的第一标题光学对应，并且在第二部分上形成图案的第二投影图像，使得 掩模上的第三个标题和第二部分的第二个标题光学对应。

公开(公告)号：US07379158B2

公开(公告)日：2008-05-27

申请号：US11350787

申请日：2006-02-10

申请人： Hideo Mizutani ,  Nobutaka Magome

发明人： Hideo Mizutani ,  Nobutaka Magome

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： A liquid immersion type exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate, a liquid film forming system for forming a liquid film in a predetermined region between the projection optical system and the substrate, and a sensor for detecting disappearance of at least a portion of the liquid film in the predetermined region.

摘要翻译： 液浸式曝光装置包括：投影光学系统，用于将掩模图案投射到基板上;液膜形成系统，用于在投影光学系统和基板之间的预定区域中形成液膜，以及用于检测的传感器 在预定区域中液膜的至少一部分消失。

公开(公告)号：US07081946B2

公开(公告)日：2006-07-25

申请号：US10639651

申请日：2003-08-13

申请人： Tsuneyuki Hagiwara ,  Hiromitsu Yoshimoto ,  Hiroto Horikawa ,  Hideo Mizutani

发明人： Tsuneyuki Hagiwara ,  Hiromitsu Yoshimoto ,  Hiroto Horikawa ,  Hideo Mizutani

IPC分类号： G03B27/32 ,  G03B27/42

CPC分类号： G03F7/707 ,  G03F7/70833 ,  H01L21/6838

摘要： A reticle holder 18 has; a first suction section 63 facing a precision warrantable area AR1 having a predetermined surface precision, of a lower face Ra of a reticle R; a second suction section 64 facing a precision unwarrantable area AR2 outside of the precision warrantable area AR1; a pore 70a connected to a suction apparatus which draws out gas in a space between the lower face Ra of the reticle R and the first suction section 63, and a pore 70b connected to the suction apparatus 72 which draws out gas in the space between the lower face Ra of the reticle R and the second suction section 64. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.

摘要翻译： 标线架保持架18具有： 与掩模版R的下表面Ra相对的具有预定表面精度的精密保证区域AR 1的第一吸入部63; 第二抽吸部分64面对精密保证区域AR 1之外的精确不可区域AR 2; 连接到在标线片R的下表面Ra和第一吸入部分63之间的空间中抽出气体的抽吸装置的孔70a和连接到抽吸装置72的孔70b，抽吸装置72在空间中抽出气体 在标线片R的下表面Ra和第二吸引部分64之间。 结果，可以使光罩保持稳定，而不会降低精密保证区域的表面精度。

公开(公告)号：US20060146312A1

公开(公告)日：2006-07-06

申请号：US11359468

申请日：2006-02-23

申请人： Tsuneyuki Hagiwara ,  Hiromitsu Yoshimoto ,  Hiroto Horikawa ,  Hideo Mizutani

发明人： Tsuneyuki Hagiwara ,  Hiromitsu Yoshimoto ,  Hiroto Horikawa ,  Hideo Mizutani

IPC分类号： G03B27/58

CPC分类号： G03F7/707 ,  G03F7/70833 ,  H01L21/6838

摘要： A reticle holder has a first suction section facing a precision warrantable area having a predetermined surface precision, of a lower face of a reticle, a second suction section facing a precision unwarrantable area outside of the precision warrantable area, a pore connected to a suction apparatus that draws out gas in a space between the lower face of the reticle and the first suction section, and a pore connected to the suction apparatus and that draws out gas in the space between the lower face of the reticle and the second suction section. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.

摘要翻译： 标线保持器具有面对具有预定表面精度的精密保证区域的第一抽吸部分，标线片的下表面，面对精密保留区域外部的精确不可区域的第二抽吸部分，连接到抽吸装置的孔 在标线片的下表面和第一吸引部之间的空间中抽出气体，以及连接到抽吸装置的孔，并且在标线片的下表面和第二吸引部之间的空间中抽出气体。 结果，可以使光罩保持稳定，而不会降低精密保证区域的表面精度。

公开(公告)号：US06320658B1

公开(公告)日：2001-11-20

申请号：US09455773

申请日：1999-12-07

申请人： Hideo Mizutani

发明人： Hideo Mizutani

IPC分类号： G01B1100

CPC分类号： G03F9/7026

摘要： The present invention relates to a detecting apparatus capable of detecting the position of a surface to be examined at higher accuracy and speed. Particularly, the detecting apparatus of the present invention allows a slit image, which is tilted relative to a base pattern on the surface of a substrate, to be applied to the surface of the substrate and its reflection on the surface to be re-imaged and recorded as a two-dimensional image on an image pick-up device. In particular, a row of imaging elements of the image pick-up device aligned in one dimension are arranged with its direction extending at an angle to the lengthwise direction of the two-dimensional image of the slit pattern reflection. Also, the two-dimensional image of the slit pattern reflection is defocused along the lengthwise direction by the action of a specific optics thus to average data of the optical characteristics on the surface of the substrate. An exposure apparatus according to the present invention is also provided capable of detecting the position of a surface to be examined along the normal to the surface from data of one dimensional image picked up by an image pick-up device and may also use two beams of light which interfere with each other for the purpose.

摘要翻译： 本发明涉及能够以更高的精度和速度检测被检查表面的位置的检测装置。 特别地，本发明的检测装置允许将相对于基板表面上的基底图案倾斜的狭缝图像施加到基板的表面并且在要重新成像的表面上的反射， 记录在图像拾取装置上的二维图像。 特别地，排列在一个维度上的摄像装置的一行成像元件被布置成其方向与狭缝图案反射的二维图像的长度方向成一角度延伸。 此外，狭缝图案反射的二维图像通过特定光学器件的作用沿着长度方向散焦，从而平均了基板表面上的光学特性的数据。 根据本发明的曝光装置还提供能够根据由摄像装置拾取的一维图像的数据来检测沿着与表面垂直的法线的位置的位置，并且还可以使用两束 为了目的而相互干扰的光。

公开(公告)号：US06230176B1

公开(公告)日：2001-05-08

申请号：US09018530

申请日：1998-02-04

申请人： Hideo Mizutani

发明人： Hideo Mizutani

IPC分类号： G06F1500

CPC分类号： G06F17/142

摘要： An object of the invention is to perform fast Fourier transform processes of radix 4 and 2 at a high speed. In order to attain this object, the invention divides complex number data in which the number of sampling points is 4n×2 or 4n into 4 groups A to D, and then repeats at n times a butterfly arithmetic operation of: ai={(Ai+Ci)+(Bi+Di)}×Wi1 ci={(Ai+Ci)−(Bi+Di)}×Wi3 bi={(Ai−Ci)−j(Bi−Di)}×Wi2 di={(Ai−Ci)+j(Bi−Di)}×Wi4, using the ith complex number data Ai, Bi, Ci and Di belonging to the groups A to D and twiddle factors Wi1, Wi2, Wi3 and Wi4, and then in case that the number of sampling points is 4n×2, the invention further performs once a butterfly arithmetic operation: ai=Ai+Bi bi=Ai−Bi ci=Ci+Di di=Ci−Di.

摘要翻译： 本发明的目的是高速执行基数4和2的快速傅立叶变换处理。 为了实现该目的，本发明将采样点数为4nx2或4n的复数数据分成4组A至D，然后在n次蝶形运算中重复：使用第i个复数数据Ai ，属于组A至D的旋转因子，旋转因子Wi1，Wi2，Wi3和Wi4，然后在采样点数为4nx2的情况下，本发明还执行一次蝶式运算：

公开(公告)号：US5633721A

公开(公告)日：1997-05-27

申请号：US643765

申请日：1996-05-06

申请人： Hideo Mizutani

发明人： Hideo Mizutani

IPC分类号： G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F9/7026

摘要： A surface position detection apparatus for detecting a surface position on a surface to be detected, comprises a projection pattern formed on a first surface, a projection optical system for projecting the pattern from an oblique direction onto the surface to be detected, a condensing optical system for condensing a light beam reflected by the surface to be detected, and forming an image of the pattern on a second surface, and a detector for photoelectrically detecting the image of the pattern. The first surface and the surface to be detected are arranged to satisfy a Scheimpflug condition in association with a principal plane of the projection optical system. The surface to be detected and the second surface are arranged to satisfy a Scheimpflug condition in association with a principal plane of the condensing optical system.

摘要翻译： 用于检测待检测表面上的表面位置的表面位置检测装置包括形成在第一表面上的突起图案，用于将图案从倾斜方向突出到待检测表面上的投影光学系统，聚光光学系统 用于聚集由待检测表面反射的光束，以及在第二表面上形成图案的图像;以及光电检测图案的检测器。 被检测的第一表面和表面被布置成与投影光学系统的主平面相关联地满足Scheimpflug条件。 待检测表面和第二表面被布置成满足与聚光光学系统的主平面相关联的Scheimpflug条件。

公开(公告)号：US5488230A

公开(公告)日：1996-01-30

申请号：US91501

申请日：1993-07-14

申请人： Hideo Mizutani ,  Kazuya Ota

发明人： Hideo Mizutani ,  Kazuya Ota

IPC分类号： G03F9/00 ,  G01N21/86 ,  H04N1/00

CPC分类号： G03F9/7049 ,  G03F9/7076

摘要： A position detecting apparatus comprises a double-beam producing device for producing two beams different in frequency from each other, which are guided to irradiate a diffraction grating on an object to be inspected in two predetermined directions, and a detector photoelectrically detecting through an objective optical system diffracted light produced by the diffraction grating, in which the double-beam producing device comprises a light source for supplying a beam of a single wavelength or multiple wavelengths, a beam splitting device for splitting the beam from the light source into two predetermined beams, a relay optical system for converging the two split beams at a predetermined position, and a frequency difference producing device disposed at or near a converging position by the relay optical system, for producing a predetermined frequency difference between the two split beams.