公开(公告)号：US20090193387A1

公开(公告)日：2009-07-30

申请号：US12019125

申请日：2008-01-24

申请人： Maharaj Mukherjee ,  James A. Culp ,  Alan E. Rosenbluth

发明人： Maharaj Mukherjee ,  James A. Culp ,  Alan E. Rosenbluth

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/44 ,  G03F1/68

摘要： A method is provided for designing a mask that includes the use of a pixel-based simulation of a lithographic process model, in which test structures are designed for determining numerical and discretization errors associated with the pixel grid as opposed to other model inaccuracies. The test structure has a plurality of rows of the same sequence of features, but each row is offset from other rows along an x-direction by a multiple of a minimum step size, such as used in modifying masks during optical proximity correction. The images for each row are simulated with a lithographic model that uses the selected pixel-grid size and the differences between row images are compared. If the differences between rows exceed or violate a predetermined criterion, the pixel grid size may be modified to minimize discretization and/or numerical errors due to the choice of pixel grid size.

摘要翻译： 提供了一种用于设计包括使用光刻处理模型的基于像素的仿真的掩模的方法，其中测试结构被设计用于确定与像素网格相关的数值和离散化误差，而不是其他模型不准确。 测试结构具有相同序列特征的多行，但是每一行都沿x方向与其他行偏移最小步长的倍数，例如在光学邻近校正期间用于修改掩模。 使用所选择的像素网格大小的光刻模型来模拟每行的图像，并比较行图像之间的差异。 如果行之间的差异超过或违反预定标准，则可以修改像素网格大小以使由于像素网格大小的选择而导致的离散化和/或数值误差最小化。

公开(公告)号：US07343582B2

公开(公告)日：2008-03-11

申请号：US11138172

申请日：2005-05-26

申请人： Maharaj Mukherjee ,  Scott M. Mansfield ,  Alan E. Rosenbluth ,  Kafai Lai

发明人： Maharaj Mukherjee ,  Scott M. Mansfield ,  Alan E. Rosenbluth ,  Kafai Lai

IPC分类号： G06F17/50

CPC分类号： G06F17/5068 ,  G03F1/36 ,  G03F7/70441 ,  G06F2217/12 ,  Y02P90/265

摘要： A method, program product and system is disclosed for performing optical proximity correction (OPC) wherein mask shapes are fragmented based on the effective image processing influence of neighboring shapes on the shape to be fragmented. Neighboring shapes are smoothed prior to determining their influence on the fragmentation of the shape of interest, where the amount of smoothing of a neighboring shape increases as the influence of the neighboring shape on the image process of the shape of interest decreases. A preferred embodiment includes the use of multiple regions of interactions (ROIs) around the shape of interest, and assigning a smoothing parameter to a given ROI that increases as the influence of shapes in that ROI decreases with respect to the shape to be fragmented. The invention provides for accurate OPC that is also efficient.

摘要翻译： 公开了一种用于执行光学邻近校正（OPC）的方法，程序产品和系统，其中基于相邻形状对要分段的形状的有效图像处理影响，掩模形状被分段。 相邻形状在确定其对感兴趣的形状的碎片的影响之前被平滑，其中相邻形状的平滑化量随着相关形状对感兴趣形状的图像处理的影响而增加。 优选实施例包括使用感兴趣的形状周围的多个交互区域（ROI），以及为给定的ROI分配平滑参数，随着该ROI中的形状的影响相对于待分割的形状而减小。 本发明提供了也是有效的精确OPC。

公开(公告)号：US20080037858A1

公开(公告)日：2008-02-14

申请号：US11874281

申请日：2007-10-18

申请人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

发明人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

IPC分类号： G06K9/00

CPC分类号： G03F1/36

摘要： Methods, and program storage devices, for performing model-based optical proximity correction by providing a region of interest (ROI) having an interaction distance and locating at least one polygon within the ROI. A cut line of sample points representative of a set of vertices, or plurality of cut lines, are generated within the ROI across at least one lateral edge of the polygon(s). An angular position, and first and second portions of the cut line residing on opposing sides of an intersection between the cut line and the lateral edge of the polygon are determined, followed by generating a new ROI by extending the original ROI beyond its interaction distance based on such angular position, and first and second portions of the cut line. In this manner, a variety of new ROIs may be generated, in a variety of different directions, to ultimately correct for optical proximity.

摘要翻译： 方法和程序存储设备，用于通过提供具有交互距离的感兴趣区域（ROI）和定位ROI内的至少一个多边形来执行基于模型的光学邻近度校正。 在多边形的至少一个侧边缘上，在ROI内产生代表一组顶点或多个切割线的采样点的切割线。 确定角位置，并且切割线的位于切割线和多边形的侧边缘之间的交叉点的相对侧上的切割线的第一和第二部分，然后通过将原始ROI延伸超过其相互作用距离来生成新的ROI 在这种角度位置上，以及切割线的第一和第二部分。 以这种方式，可以在各种不同的方向上产生各种新的ROI，以最终校正光学邻近度。

公开(公告)号：US20070220476A1

公开(公告)日：2007-09-20

申请号：US11306750

申请日：2006-01-10

申请人： Maharaj Mukherjee ,  James Culp ,  Lars Liebmann ,  Scott Mansfield

发明人： Maharaj Mukherjee ,  James Culp ,  Lars Liebmann ,  Scott Mansfield

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： A method is provided for designing a mask layout for an integrated circuit that ensures proper functional interaction among circuit features by including functional inter-layer and intra-layer constraints on the wafer. The functional constraints used according to the present invention are applied among the simulated wafer images to ensure proper functional interaction, while relaxing or eliminating the EPE constraints on the location of the wafer images.

摘要翻译： 提供了一种用于设计用于集成电路的掩模布局的方法，其通过在晶片上包括功能层间和层内约束来确保电路特征之间的适当的功能交互。 根据本发明使用的功能约束应用于模拟晶片图像中，以确保正确的功能交互，同时放松或消除对晶片图像的位置的EPE约束。

公开(公告)号：US07111188B2

公开(公告)日：2006-09-19

申请号：US10604585

申请日：2003-07-31

申请人： Maharaj Mukherjee

发明人： Maharaj Mukherjee

IPC分类号： G06F11/00

CPC分类号： G06F9/5061 ,  G06F2209/505 ,  H04L67/1002 ,  H04L67/1021 ,  H04L67/1023 ,  H04L67/1034 ,  H04L69/40

摘要： A method is described for configuring a system having a plurality of processors to provide the system with at least one cluster of processors, where each cluster has one service point. A distance is computed from each processor to other processors in the system. A plurality of total distances is then computed, where each total distance is associated with one processor. A minimum total distance is determined from the plurality of total distances. One processor is assigned to be the service point; this processor is the processor having the minimum total distance associated therewith.

摘要翻译： 描述了一种用于配置具有多个处理器的系统以向系统提供至少一个处理器群的方法，其中每个群集具有一个服务点。 从系统中的每个处理器到其他处理器计算距离。 然后计算多个总距离，其中每个总距离与一个处理器相关联。 从多个总距离确定最小总距离。 一个处理器被分配为服务点; 该处理器是具有与其相关联的最小总距离的处理器。

公开(公告)号：US07075532B2

公开(公告)日：2006-07-11

申请号：US10249982

申请日：2003-05-23

申请人： Maharaj Mukherjee ,  Lewis William Dewey, III

发明人： Maharaj Mukherjee ,  Lewis William Dewey, III

IPC分类号： G06T15/30 ,  G06T17/00 ,  G06F17/50 ,  G09G5/00

CPC分类号： G06T17/20

摘要： A tetrahedralization and triangulation method used with the proximity based rounding method to satisfy topological consistency of tetrahedralization with the bounded precision of a digital computer is described. Tetrahedralization is applied to a VLSI design, and more specifically for solving Maxwell's equation to extract parasitic capacitances and 3-D optical proximity correction applications. The exactness of solving Maxwell's equation and finite element analysis depends on the correctness of the topological properties of the tetrahedralization. Among the important aspects of the correctness of the topological properties is the absence of spurious intersection of two or more tetrahedra. In a typical digital computer, numbers are represented using finite sized words. Round-off errors occur when a long number is represented using the finite word size. As a result, tetrahedralization loses its topological consistency. The proximity based rounding method finds potential locations of spurious intersections and pre-corrects these locations to avoid the generation of any topological inconsistencies.

摘要翻译： 描述了使用基于邻近的舍入方法以满足四面体化的拓扑一致性与数字计算机的有界精度的四面体化和三角测量方法。 四面体化被应用于VLSI设计，并且更具体地用于求解麦克斯韦方程来提取寄生电容和3-D光学邻近校正应用。 求解麦克斯韦方程和有限元分析的准确性取决于四面体化的拓扑性质的正确性。 在拓扑性质的正确性的重要方面之一是没有两个或更多四面体的杂散交叉。 在典型的数字计算机中，使用有限大小的字表示数字。 当使用有限字大小表示长数字时，会出现舍入误差。 因此，四面体化失去其拓扑一致性。 基于邻近度的舍入方法找到伪交叉点的潜在位置并预先校正这些位置，以避免产生任何拓扑不一致。

公开(公告)号：US20060041851A1

公开(公告)日：2006-02-23

申请号：US11242723

申请日：2005-10-03

申请人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

发明人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/68 ,  G06F17/5068

摘要： Methods, and program storage devices, for performing model-based optical lithography corrections by partitioning a cell array layout, having a plurality of polygons thereon, into a plurality of cells covering the layout. This layout is representative of a desired design data hierarchy. A density map is then generated corresponding to interactions between the polygons and plurality of cells, and then the densities within each cell are convolved. An interaction map is formed using the convolved densities, followed by truncating the interaction map to form a map of truncated cells. Substantially identical groupings of the truncated cells are then segregated respectively into differing ones of a plurality of buckets, whereby each of these buckets comprise a single set of identical groupings of truncated cells. A hierarchal arrangement is generated using these buckets, and the desired design data hierarchy enforced using the hierarchal arrangement to ultimately correct for optical lithography.

公开(公告)号：US20050153212A1

公开(公告)日：2005-07-14

申请号：US10707778

申请日：2004-01-12

申请人： Mark Lavin ,  Lars Liebmann ,  Scott Mansfield ,  Maharaj Mukherjee ,  Zengqin Zhao

发明人： Mark Lavin ,  Lars Liebmann ,  Scott Mansfield ,  Maharaj Mukherjee ,  Zengqin Zhao

IPC分类号： G03C5/00 ,  G03F1/14 ,  G03F9/00 ,  G06F17/50

CPC分类号： G03F1/36

摘要： A method is disclosed for providing associated shapes of an optical lithography mask in relation to predetermined main shapes of the mask. The method includes generating simplified layout patterns from the predetermined main shapes of the mask. Such layout patterns are generated by eliminating detail of the main shapes which leads to unmanufacturable associated shapes while preserving geometrically relevant shape information. The associated shapes are then generated relative to the simplified mask patterns.

摘要翻译： 公开了一种相对于掩模的预定主要形状提供光学光刻掩模的相关形状的方法。 该方法包括从掩模的预定主要形状生成简化的布局图案。 通过消除导致不可制造的相关形状的主要形状的细节来产生这种布局图案，同时保留几何相关的形状信息。 然后相对于简化的掩模图案生成相关联的形状。

公开(公告)号：US20050091014A1

公开(公告)日：2005-04-28

申请号：US10694473

申请日：2003-10-27

申请人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

发明人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

IPC分类号： G03F1/08 ,  G03F1/14 ,  G03F7/20 ,  G06F17/10 ,  G06F17/50 ,  H01L21/00 ,  H01L21/027

CPC分类号： G03F1/36

摘要： Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices representative of the located points of interest is computed, followed by determining a spatial relation between its vertices and the ROI. The vertices of the first polygon are then pinned to boundaries of and within the ROI such that a second polygon is formed on the ROI. The process is repeated for all vertices of the first polygon such that the second polygon is collapsed onto the ROI. This collapsed second polygon is then used to correct for optical proximity.

摘要翻译： 方法和用于执行这种方法的程序存储装置，用于通过提供具有感兴趣区域（ROI）的掩模矩阵并且在掩模矩阵内定位多个感兴趣点来执行基于模型的光学邻近校正。 计算具有代表所述定位的兴趣点的顶点数的第一多边形，然后确定其顶点和ROI之间的空间关系。 然后将第一多边形的顶点固定在ROI的边界和内部，使得在ROI上形成第二多边形。 对第一多边形的所有顶点重复该过程，使得第二多边形折叠到ROI上。 然后使用这个折叠的第二个多边形来校正光学接近度。

公开(公告)号：US08627039B2

公开(公告)日：2014-01-07

申请号：US13292256

申请日：2011-11-09

申请人： Maharaj Mukherjee

发明人： Maharaj Mukherjee

IPC分类号： G06F12/00

CPC分类号： G06F11/3471 ,  G06F11/3409 ,  G06F2201/885

摘要： An embodiment of the invention provides a method for organizing data addresses within a virtual address space to reduce the number of data fetches to a cloud computing environment. More specifically, data access requests to the cloud computing environment are monitored to identifying data addresses having similar properties. Multi-dimensional clusters are created based on the monitoring to group the data addresses having similar properties. A memory page is created from a multi-dimensional cluster, wherein the creating of the memory page includes creating a cross-sectional partition from the multi-dimensional cluster. The multi-dimensional clusters and the memory page are stored in the cloud computing environment. A request for a data object in the cloud computing environment is received from a user interface. The data address corresponding to the data object is identified and mapped to the multi-dimensional cluster and/or the memory page. The memory page is transferred to the user interface.

摘要翻译： 本发明的实施例提供了一种用于组织虚拟地址空间内的数据地址以减少到云计算环境的数据获取数量的方法。 更具体地，监视对云计算环境的数据访问请求以识别具有相似属性的数据地址。 基于监视来创建多维集群，以对具有相似属性的数据地址进行分组。 从多维集群创建存储器页面，其中创建存储器页面包括从多维集群创建横截面分区。 多维集群和内存页面存储在云计算环境中。 从用户界面接收对云计算环境中的数据对象的请求。 识别对应于数据对象的数据地址并映射到多维集群和/或存储器页面。 内存页面被传送到用户界面。